KR20210068387A - 티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물 - Google Patents

티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물 Download PDF

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KR20210068387A
KR20210068387A KR1020217001305A KR20217001305A KR20210068387A KR 20210068387 A KR20210068387 A KR 20210068387A KR 1020217001305 A KR1020217001305 A KR 1020217001305A KR 20217001305 A KR20217001305 A KR 20217001305A KR 20210068387 A KR20210068387 A KR 20210068387A
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South Korea
Prior art keywords
compound
meth
group
polymerizable composition
acrylate
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KR1020217001305A
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English (en)
Korean (ko)
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KR102710878B1 (ko
Inventor
마사키 하야시
료스케 이토야마
아키요 야노
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니치유 가부시키가이샤
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D335/00Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12Thioxanthenes
    • C07D335/14Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16Oxygen atoms, e.g. thioxanthones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00Polymerisation catalysts
    • C08F4/28Oxygen or compounds releasing free oxygen
    • C08F4/32Organic compounds
    • C08F4/34Per-compounds with one peroxy-radical
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Polymerization Catalysts (AREA)
KR1020217001305A 2018-09-26 2019-09-25 티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물 KR102710878B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2018-179726 2018-09-26
JP2018179726 2018-09-26
PCT/JP2019/037507 WO2020067118A1 (ja) 2018-09-26 2019-09-25 チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合性組成物

Publications (2)

Publication Number Publication Date
KR20210068387A true KR20210068387A (ko) 2021-06-09
KR102710878B1 KR102710878B1 (ko) 2024-09-26

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KR1020217001305A KR102710878B1 (ko) 2018-09-26 2019-09-25 티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물

Country Status (5)

Country Link
JP (1) JP7421169B2 (zh)
KR (1) KR102710878B1 (zh)
CN (1) CN112236420B (zh)
TW (1) TWI818087B (zh)
WO (1) WO2020067118A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7385830B2 (ja) * 2020-03-13 2023-11-24 日油株式会社 硬化物の製造方法
JP7382010B2 (ja) * 2020-03-19 2023-11-16 日油株式会社 重合開始剤混合物、重合性組成物、硬化物、および硬化物の製造方法
JP7354891B2 (ja) * 2020-03-19 2023-10-03 日油株式会社 光硬化型インク
JP7371548B2 (ja) * 2020-03-19 2023-10-31 日油株式会社 粘着性組成物及び粘着シート

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197401A (ja) 1983-04-26 1984-11-09 Nippon Oil & Fats Co Ltd 光重合開始剤
JP2000096002A (ja) 1998-09-24 2000-04-04 Nitto Denko Corp 熱硬化型感圧性接着剤とその接着シ―ト類

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8312721D0 (en) * 1983-05-09 1983-06-15 Vickers Plc Photoinitiators
JPS63146903A (ja) * 1986-12-10 1988-06-18 Hitachi Chem Co Ltd 光開始剤およびこれを用いた光重合性組成物
US5091586A (en) * 1989-07-19 1992-02-25 Nippon Oil And Fats Company, Limited Novel dialkyl peroxides, production method and use thereof
JP2734113B2 (ja) * 1989-09-05 1998-03-30 日本油脂株式会社 ジアルキルペルオキシドおよびその用途
JP2734101B2 (ja) * 1989-07-19 1998-03-30 日本油脂株式会社 ジアルキルペルオキシドおよびその用途
JP4211096B2 (ja) * 1998-10-26 2009-01-21 日油株式会社 アクリロニトリル系共重合体用重合開始剤及びそれを用いるアクリロニトリル系共重合体の製造方法
JP6923130B2 (ja) * 2017-08-31 2021-08-18 学校法人東京理科大学 ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法
JP6995309B2 (ja) * 2017-08-31 2022-01-14 学校法人東京理科大学 ペルオキシエステル基を有するチオキサントン誘導体を含有する重合性組成物およびその硬化物、当該硬化物の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197401A (ja) 1983-04-26 1984-11-09 Nippon Oil & Fats Co Ltd 光重合開始剤
JP2000096002A (ja) 1998-09-24 2000-04-04 Nitto Denko Corp 熱硬化型感圧性接着剤とその接着シ―ト類

Also Published As

Publication number Publication date
TWI818087B (zh) 2023-10-11
TW202024048A (zh) 2020-07-01
CN112236420B (zh) 2023-11-24
JPWO2020067118A1 (ja) 2021-09-02
CN112236420A (zh) 2021-01-15
KR102710878B1 (ko) 2024-09-26
JP7421169B2 (ja) 2024-01-24
WO2020067118A1 (ja) 2020-04-02

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