KR20210068387A - 티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물 - Google Patents
티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물 Download PDFInfo
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- KR20210068387A KR20210068387A KR1020217001305A KR20217001305A KR20210068387A KR 20210068387 A KR20210068387 A KR 20210068387A KR 1020217001305 A KR1020217001305 A KR 1020217001305A KR 20217001305 A KR20217001305 A KR 20217001305A KR 20210068387 A KR20210068387 A KR 20210068387A
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- polymerizable composition
- acrylate
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- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical group C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 title claims abstract description 42
- 150000002978 peroxides Chemical class 0.000 title claims abstract description 36
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 13
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- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 9
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
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- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 6
- 125000001424 substituent group Chemical group 0.000 claims abstract description 6
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims abstract description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 43
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 13
- 229910052753 mercury Inorganic materials 0.000 abstract description 13
- 238000012719 thermal polymerization Methods 0.000 abstract description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 57
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- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 3
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- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
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- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
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- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
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- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
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- 238000005507 spraying Methods 0.000 description 1
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- 239000010935 stainless steel Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 239000013076 target substance Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/28—Oxygen or compounds releasing free oxygen
- C08F4/32—Organic compounds
- C08F4/34—Per-compounds with one peroxy-radical
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Polymerization Catalysts (AREA)
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PCT/JP2019/037507 WO2020067118A1 (ja) | 2018-09-26 | 2019-09-25 | チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合性組成物 |
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KR (1) | KR102710878B1 (zh) |
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JP7385830B2 (ja) * | 2020-03-13 | 2023-11-24 | 日油株式会社 | 硬化物の製造方法 |
JP7382010B2 (ja) * | 2020-03-19 | 2023-11-16 | 日油株式会社 | 重合開始剤混合物、重合性組成物、硬化物、および硬化物の製造方法 |
JP7354891B2 (ja) * | 2020-03-19 | 2023-10-03 | 日油株式会社 | 光硬化型インク |
JP7371548B2 (ja) * | 2020-03-19 | 2023-10-31 | 日油株式会社 | 粘着性組成物及び粘着シート |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS59197401A (ja) | 1983-04-26 | 1984-11-09 | Nippon Oil & Fats Co Ltd | 光重合開始剤 |
JP2000096002A (ja) | 1998-09-24 | 2000-04-04 | Nitto Denko Corp | 熱硬化型感圧性接着剤とその接着シ―ト類 |
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GB8312721D0 (en) * | 1983-05-09 | 1983-06-15 | Vickers Plc | Photoinitiators |
JPS63146903A (ja) * | 1986-12-10 | 1988-06-18 | Hitachi Chem Co Ltd | 光開始剤およびこれを用いた光重合性組成物 |
US5091586A (en) * | 1989-07-19 | 1992-02-25 | Nippon Oil And Fats Company, Limited | Novel dialkyl peroxides, production method and use thereof |
JP2734113B2 (ja) * | 1989-09-05 | 1998-03-30 | 日本油脂株式会社 | ジアルキルペルオキシドおよびその用途 |
JP2734101B2 (ja) * | 1989-07-19 | 1998-03-30 | 日本油脂株式会社 | ジアルキルペルオキシドおよびその用途 |
JP4211096B2 (ja) * | 1998-10-26 | 2009-01-21 | 日油株式会社 | アクリロニトリル系共重合体用重合開始剤及びそれを用いるアクリロニトリル系共重合体の製造方法 |
JP6923130B2 (ja) * | 2017-08-31 | 2021-08-18 | 学校法人東京理科大学 | ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法 |
JP6995309B2 (ja) * | 2017-08-31 | 2022-01-14 | 学校法人東京理科大学 | ペルオキシエステル基を有するチオキサントン誘導体を含有する重合性組成物およびその硬化物、当該硬化物の製造方法 |
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- 2019-09-25 CN CN201980037771.9A patent/CN112236420B/zh active Active
- 2019-09-25 KR KR1020217001305A patent/KR102710878B1/ko active IP Right Grant
- 2019-09-25 TW TW108134528A patent/TWI818087B/zh active
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS59197401A (ja) | 1983-04-26 | 1984-11-09 | Nippon Oil & Fats Co Ltd | 光重合開始剤 |
JP2000096002A (ja) | 1998-09-24 | 2000-04-04 | Nitto Denko Corp | 熱硬化型感圧性接着剤とその接着シ―ト類 |
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TWI818087B (zh) | 2023-10-11 |
TW202024048A (zh) | 2020-07-01 |
CN112236420B (zh) | 2023-11-24 |
JPWO2020067118A1 (ja) | 2021-09-02 |
CN112236420A (zh) | 2021-01-15 |
KR102710878B1 (ko) | 2024-09-26 |
JP7421169B2 (ja) | 2024-01-24 |
WO2020067118A1 (ja) | 2020-04-02 |
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