KR20190094731A - 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치 - Google Patents

착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치 Download PDF

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Publication number
KR20190094731A
KR20190094731A KR1020180014221A KR20180014221A KR20190094731A KR 20190094731 A KR20190094731 A KR 20190094731A KR 1020180014221 A KR1020180014221 A KR 1020180014221A KR 20180014221 A KR20180014221 A KR 20180014221A KR 20190094731 A KR20190094731 A KR 20190094731A
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KR
South Korea
Prior art keywords
resin composition
photosensitive resin
contact angle
coloring
colored photosensitive
Prior art date
Application number
KR1020180014221A
Other languages
English (en)
Korean (ko)
Inventor
김훈식
박슬기
이재을
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020180014221A priority Critical patent/KR20190094731A/ko
Priority to TW108101543A priority patent/TWI766141B/zh
Priority to PCT/KR2019/001385 priority patent/WO2019151807A1/ko
Priority to JP2020534451A priority patent/JP2021508087A/ja
Priority to CN201980011830.5A priority patent/CN111684357B/zh
Publication of KR20190094731A publication Critical patent/KR20190094731A/ko
Priority to JP2022076613A priority patent/JP2022103263A/ja
Priority to KR1020230011527A priority patent/KR20230023678A/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
KR1020180014221A 2018-02-05 2018-02-05 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치 KR20190094731A (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1020180014221A KR20190094731A (ko) 2018-02-05 2018-02-05 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치
TW108101543A TWI766141B (zh) 2018-02-05 2019-01-15 著色感光性樹脂組成物及使用其製造的彩色像素和顯示裝置
PCT/KR2019/001385 WO2019151807A1 (ko) 2018-02-05 2019-01-31 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치
JP2020534451A JP2021508087A (ja) 2018-02-05 2019-01-31 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置
CN201980011830.5A CN111684357B (zh) 2018-02-05 2019-01-31 着色感光性树脂组合物及使用其制造的滤色器元件和显示装置
JP2022076613A JP2022103263A (ja) 2018-02-05 2022-05-06 着色感光性樹脂組成物、およびそれを用いて製造されたカラー素子並びに表示装置
KR1020230011527A KR20230023678A (ko) 2018-02-05 2023-01-30 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020180014221A KR20190094731A (ko) 2018-02-05 2018-02-05 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020230011527A Division KR20230023678A (ko) 2018-02-05 2023-01-30 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치

Publications (1)

Publication Number Publication Date
KR20190094731A true KR20190094731A (ko) 2019-08-14

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ID=67478791

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020180014221A KR20190094731A (ko) 2018-02-05 2018-02-05 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치
KR1020230011527A KR20230023678A (ko) 2018-02-05 2023-01-30 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020230011527A KR20230023678A (ko) 2018-02-05 2023-01-30 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러소자 및 표시장치

Country Status (5)

Country Link
JP (2) JP2021508087A (zh)
KR (2) KR20190094731A (zh)
CN (1) CN111684357B (zh)
TW (1) TWI766141B (zh)
WO (1) WO2019151807A1 (zh)

Citations (2)

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KR20130132655A (ko) 2011-03-30 2013-12-04 히타치가세이가부시끼가이샤 감광성 수지 조성물, 이를 사용한 감광성 엘리먼트, 화상 표시 장치의 격벽의 형성 방법 및 화상 표시 장치의 제조 방법
KR101420470B1 (ko) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스

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JP2011102991A (ja) * 2005-02-21 2011-05-26 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
US8493267B2 (en) * 2006-11-10 2013-07-23 Qualcomm Incorporated Method and apparatus for position determination with extended SPS orbit information
CN102947359B (zh) * 2010-06-23 2014-12-24 旭硝子株式会社 固化性组合物和固化膜的制造方法
WO2012147626A1 (ja) * 2011-04-28 2012-11-01 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
JP2013050549A (ja) * 2011-08-30 2013-03-14 Asahi Glass Co Ltd ネガ型感光性樹脂組成物、隔壁、光学素子
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JP6915960B2 (ja) * 2015-01-07 2021-08-11 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色感光性樹脂組成物
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KR101420470B1 (ko) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스
KR20130132655A (ko) 2011-03-30 2013-12-04 히타치가세이가부시끼가이샤 감광성 수지 조성물, 이를 사용한 감광성 엘리먼트, 화상 표시 장치의 격벽의 형성 방법 및 화상 표시 장치의 제조 방법

Also Published As

Publication number Publication date
KR20230023678A (ko) 2023-02-17
WO2019151807A1 (ko) 2019-08-08
CN111684357A (zh) 2020-09-18
TW201940523A (zh) 2019-10-16
JP2021508087A (ja) 2021-02-25
CN111684357B (zh) 2023-10-13
JP2022103263A (ja) 2022-07-07
TWI766141B (zh) 2022-06-01

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