KR20180061217A - 절단가능한 가교결합제를 포함하는 패턴화된 필름 물품 및 방법 - Google Patents
절단가능한 가교결합제를 포함하는 패턴화된 필름 물품 및 방법 Download PDFInfo
- Publication number
- KR20180061217A KR20180061217A KR1020187009626A KR20187009626A KR20180061217A KR 20180061217 A KR20180061217 A KR 20180061217A KR 1020187009626 A KR1020187009626 A KR 1020187009626A KR 20187009626 A KR20187009626 A KR 20187009626A KR 20180061217 A KR20180061217 A KR 20180061217A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- formula
- copolymer
- subscript
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 0 *C(C(OCOC(*=I)(N)OIOC(C(*)=C)=O)=O)=C Chemical compound *C(C(OCOC(*=I)(N)OIOC(C(*)=C)=O)=O)=C 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/12—Polymerisation in non-solvents
- C08F2/16—Aqueous medium
- C08F2/22—Emulsion polymerisation
- C08F2/24—Emulsion polymerisation with the aid of emulsifying agents
- C08F2/28—Emulsion polymerisation with the aid of emulsifying agents cationic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1808—C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/28—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J143/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Adhesives based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1806—C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2343/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Derivatives of such polymers
-
- C09J2201/40—
-
- C09J2205/114—
-
- C09J2205/31—
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/20—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
- C09J2301/21—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive layer being formed by alternating adhesive areas of different nature
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/414—Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562233455P | 2015-09-28 | 2015-09-28 | |
| US62/233,455 | 2015-09-28 | ||
| PCT/US2016/051877 WO2017058528A1 (en) | 2015-09-28 | 2016-09-15 | Patterned film article comprising cleavable crosslinker and methods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20180061217A true KR20180061217A (ko) | 2018-06-07 |
Family
ID=57137231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187009626A Ceased KR20180061217A (ko) | 2015-09-28 | 2016-09-15 | 절단가능한 가교결합제를 포함하는 패턴화된 필름 물품 및 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10768528B2 (https=) |
| EP (1) | EP3356450B1 (https=) |
| JP (1) | JP6983766B2 (https=) |
| KR (1) | KR20180061217A (https=) |
| CN (1) | CN108026291B (https=) |
| WO (1) | WO2017058528A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20230056043A (ko) * | 2020-09-28 | 2023-04-26 | 후지필름 가부시키가이샤 | 패턴화 점착층 및 그 제조 방법, 경화성 조성물, 적층체 및 그 제조 방법, 및, 반도체 소자의 제조 방법 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021157668A1 (ja) * | 2020-02-07 | 2021-08-12 | 国立研究開発法人物質・材料研究機構 | 高分子化合物、高分子化合物の製造方法、接着剤組成物、硬化物、接着剤組成物の製造方法および接着力の調整方法 |
| JP7838583B2 (ja) * | 2021-10-26 | 2026-04-01 | 日産化学株式会社 | プライマー層形成用組成物、積層体、及び積層体の分解方法 |
| KR102707076B1 (ko) * | 2022-01-10 | 2024-09-20 | 주식회사 아스플로 | 고분자 조성물, 이를 포함하는 불화수소 흡착용 필름 및 이를 포함하는 복합필터 |
| US12578261B2 (en) | 2023-06-05 | 2026-03-17 | The United States Of America As Represented By The Government Publishing Office | ID card peel sample preparation apparatus and method |
| WO2026059751A1 (en) * | 2024-09-12 | 2026-03-19 | Synthomer Inc. | Formaldehyde free reversible crosslinkers |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3708296A (en) | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
| GB1512982A (en) | 1974-05-02 | 1978-06-01 | Gen Electric | Salts |
| US4250311A (en) | 1974-05-02 | 1981-02-10 | General Electric Company | P, As, and Sb hexafluoride onium salts as photoinitiators |
| US4216288A (en) | 1978-09-08 | 1980-08-05 | General Electric Company | Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents |
| US4330590A (en) | 1980-02-14 | 1982-05-18 | Minnesota Mining And Manufacturing Company | Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine |
| US4771891A (en) | 1986-06-12 | 1988-09-20 | Avery International Corporation | Patterned adhesive label structures |
| US5084586A (en) | 1990-02-12 | 1992-01-28 | Minnesota Mining And Manufacturing Company | Novel initiators for cationic polymerization |
| US5124417A (en) | 1990-02-12 | 1992-06-23 | Minnesota Mining And Manufacturing Company | Initiators for cationic polymerization |
| US5506279A (en) | 1993-10-13 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Acrylamido functional disubstituted acetyl aryl ketone photoinitiators |
| KR970704849A (ko) | 1994-07-29 | 1997-09-06 | 워렌 리차드 보비 | 가교 점탄성 물질로 경화가능한 아크릴 시럽 |
| US5554664A (en) | 1995-03-06 | 1996-09-10 | Minnesota Mining And Manufacturing Company | Energy-activatable salts with fluorocarbon anions |
| US5976690A (en) | 1995-05-18 | 1999-11-02 | 3M Innovative Properties Company | Opaque adhesives and method therefor |
| US5872158A (en) * | 1997-06-12 | 1999-02-16 | International Business Machines Corporation | Cleavable diacrylate for removable acrylate compositions |
| KR100362937B1 (ko) * | 1998-12-31 | 2003-10-04 | 주식회사 하이닉스반도체 | 신규의포토레지스트가교제,이를포함하는포토레지스트중합체및포토레지스트조성물 |
| US6495229B1 (en) | 1999-09-17 | 2002-12-17 | Avery Dennison Corporation | Pattern coated adhesive article |
| KR100557585B1 (ko) | 1999-10-29 | 2006-03-03 | 주식회사 하이닉스반도체 | 레지스트 플로우 공정용 포토레지스트 조성물 및 이를 이용한 컨택홀의 형성방법 |
| US6652970B1 (en) | 2000-07-07 | 2003-11-25 | 3M Innovative Properties Company | Degradable crosslinkers, compositions therefrom, and methods of their preparation and use |
| US7108920B1 (en) | 2000-09-15 | 2006-09-19 | Henkel Corporation | Reworkable compositions incorporating episulfide resins |
| JP2002296782A (ja) * | 2001-03-30 | 2002-10-09 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| DE60310030T2 (de) | 2002-01-23 | 2007-06-21 | Contra Vision Ltd., Bramhall | Drucken durch differentialadhäsion |
| US6897164B2 (en) | 2002-02-14 | 2005-05-24 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US6821348B2 (en) | 2002-02-14 | 2004-11-23 | 3M Innovative Properties Company | In-line deposition processes for circuit fabrication |
| US20030151118A1 (en) | 2002-02-14 | 2003-08-14 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| JP2006003844A (ja) * | 2004-06-21 | 2006-01-05 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US20060128165A1 (en) | 2004-12-13 | 2006-06-15 | 3M Innovative Properties Company | Method for patterning surface modification |
| US20060234014A1 (en) | 2005-04-14 | 2006-10-19 | Liu Yaoqi J | Patterned adhesives for tamper evident feature |
| JP4548616B2 (ja) | 2006-05-15 | 2010-09-22 | 信越化学工業株式会社 | 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法 |
| MX2013011139A (es) | 2011-04-12 | 2013-10-30 | Procter & Gamble | Envases de barrera flexible derivados de recursos renovables. |
| CN103930472B (zh) * | 2011-07-29 | 2016-01-06 | 艾德昂有限责任公司 | 一种通过电子束辐射、并通过气体产生的等离子和紫外辐射进行固化组合物的方法 |
| CN105073849A (zh) * | 2012-12-11 | 2015-11-18 | 粘合剂研究股份有限公司 | 反应性膜粘合剂 |
| WO2015164087A1 (en) | 2014-04-24 | 2015-10-29 | 3M Innovative Properties Company | Compositions comprising cleavable crosslinker and methods |
-
2016
- 2016-09-15 WO PCT/US2016/051877 patent/WO2017058528A1/en not_active Ceased
- 2016-09-15 US US15/745,737 patent/US10768528B2/en active Active
- 2016-09-15 JP JP2018515529A patent/JP6983766B2/ja active Active
- 2016-09-15 EP EP16781888.9A patent/EP3356450B1/en active Active
- 2016-09-15 CN CN201680054141.9A patent/CN108026291B/zh active Active
- 2016-09-15 KR KR1020187009626A patent/KR20180061217A/ko not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20230056043A (ko) * | 2020-09-28 | 2023-04-26 | 후지필름 가부시키가이샤 | 패턴화 점착층 및 그 제조 방법, 경화성 조성물, 적층체 및 그 제조 방법, 및, 반도체 소자의 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017058528A1 (en) | 2017-04-06 |
| JP2019500432A (ja) | 2019-01-10 |
| EP3356450B1 (en) | 2019-10-23 |
| CN108026291B (zh) | 2021-04-13 |
| CN108026291A (zh) | 2018-05-11 |
| US20180231891A1 (en) | 2018-08-16 |
| JP6983766B2 (ja) | 2021-12-17 |
| US10768528B2 (en) | 2020-09-08 |
| EP3356450A1 (en) | 2018-08-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20180061217A (ko) | 절단가능한 가교결합제를 포함하는 패턴화된 필름 물품 및 방법 | |
| JP6490100B2 (ja) | 開裂型架橋剤を含む組成物及び方法 | |
| US7862898B2 (en) | Adhesive composition and articles made therefrom | |
| RU2620384C2 (ru) | Самоклеящаяся клейкая лента и изделия из нее | |
| KR20150087293A (ko) | 고도로 점착부여된 아크릴레이트 감압 접착제 | |
| JP2018520215A (ja) | アクリルポリマーに基づくuv硬化性接着剤 | |
| KR20190015184A (ko) | 중압 수은등에 의해 uv 경화된 양이온성 감압성 접착제 | |
| JP2988549B2 (ja) | 両面粘着テープの製造方法 | |
| JP2006299017A (ja) | 紫外線硬化型粘着剤組成物及びそれを用いてなる粘着シート状物 | |
| JP3577172B2 (ja) | 難燃性光重合性組成物及びこれを用いた難燃性粘着テープ | |
| WO2019166919A1 (en) | Pressure-sensitive adhesive composition, pressure-sensitive adhesive, pressure-sensitive adhesive layer, method for preparing pressure-sensitive adhesive, and method for preparing pressure-sensitive adhesive layer | |
| JP5175192B2 (ja) | 接着剤組成物および当該組成物から製造される物品 | |
| JPH0625625A (ja) | 両面テープの製造方法 | |
| JPH10219200A (ja) | 硬化型粘接着シート及び部材の接合方法 | |
| JPH07278502A (ja) | 紫外線硬化型粘着剤組成物及び両面粘着テープ | |
| JP2010070609A (ja) | 貼り直しが容易な粘着テープ | |
| JP3154739B2 (ja) | 光重合性接着剤組成物とこれを用いた感圧性接着剤およびその接着シ―ト類 | |
| JPH08157781A (ja) | 粘着部材の製造方法 | |
| JP2002194312A (ja) | 粘着剤及びそれを用いた粘着シート | |
| JPH11166168A (ja) | アクリル系粘着剤組成物及び粘着テープの製造方法 | |
| JPH01287114A (ja) | 光硬化型感圧接着剤組成物 | |
| JPH07278501A (ja) | 紫外線硬化型粘着剤組成物及び両面粘着テープ | |
| JPH05125343A (ja) | 感圧性接着剤 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20180405 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20210811 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20221018 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20230531 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20221018 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |