KR20170019632A - LED array light source module for exposing large area pattern and apparatus for controlling the LED array light source module - Google Patents
LED array light source module for exposing large area pattern and apparatus for controlling the LED array light source module Download PDFInfo
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- KR20170019632A KR20170019632A KR1020150113693A KR20150113693A KR20170019632A KR 20170019632 A KR20170019632 A KR 20170019632A KR 1020150113693 A KR1020150113693 A KR 1020150113693A KR 20150113693 A KR20150113693 A KR 20150113693A KR 20170019632 A KR20170019632 A KR 20170019632A
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- Prior art keywords
- led array
- light source
- led
- source module
- units
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
Abstract
Description
The present invention relates to an LED light source, and more particularly, to an LED array unit in which a plurality of LED units each emitting light of different wavelengths are arranged, and a plurality of LED array units are arranged in a specific form, And a controller for controlling the LED array light source module so as to expose a large area pattern.
A stepper is a type of exposure apparatus that transfers light from a photomask to a semiconductor wafer or a TFT LCD glass substrate in a manufacturing line requiring a circuit process such as a semiconductor or a TFT LCD (Thin Film Transistor Liquid Crystal Display) Alignment and exposure are performed for each unit chip while moving back and forth and left and right in several chip units per wafer.
The exposure is performed by placing a mask on which a desired pattern is formed on a sample (wafer or glass substrate) on which a film (photosensitive film) coated with a photosensitive material (PhotoResist; PR) is formed and irradiating ultraviolet rays to transfer a desired pattern to the photosensitive film When the pattern size is less than 1 탆 or the same shape is repeated, the stepper expands the mask to an integer multiple of the desired pattern size, and then holds the sample coated with the mask and the photoresist film at a proper distance, Since the exposure process is performed by irradiating ultraviolet rays after positioning the miniaturization optical system, it is a miniaturized optical exposure apparatus that transfers a pattern by irradiating ultraviolet rays while moving the wafer or mask in x and y directions by one step.
The stepper described above improves the uniformity of the light intensity by defining the exposure area.
A mercury lamp is used as a light source according to the prior art used in such a stepper. The mercury lamp is a light source that meets the light intensity and uniformity required in the field. However, since mercury, which is a heavy metal, is used, it is accompanied by environmental destructive factors.
In addition, since mercury lamps have a service life of one month, they have to be replaced 12 times a year, resulting in constant replacement costs, and the cost of purchasing a light source is also very high. In addition, it is urgent to develop a light source to replace the mercury lamp because the degradation phenomenon of the exposure apparatus is serious, periodic maintenance is required, and the environmental burden cost of the abandoned light source is large.
A light source using an LED (Light Emitting Diode) is partially used as a light source to replace the above-described mercury lamp.
Particularly, Korean Patent Registration No. 10-1532352 (published on June 29, 2015), filed and filed by the applicant of the present invention, discloses a method of manufacturing a light emitting device using two or more types of LEDs having different wavelengths for exposure of a PCB substrate, a semiconductor wafer, A light source device including a plurality of light source units and a management system capable of efficiently managing the same are disclosed.
In this patent, it is difficult to uniformly irradiate a beam when constructing an exposure apparatus using a UV LED having a single wavelength. Since the size of the LED lamp unit for exposure is determined from the beginning, the size of the exposure apparatus The present invention provides an LED light source device for exposure and an LED light source device management system for exposure that can easily perform exposure to exposure objects of various shapes and sizes . To this end, the patent discloses arranging a plurality of LED light source units in the form of a 3 x 3 matrix, with one 405 nm LED light source unit in the center and eight 365 nm LED light source units in the periphery to form a central LED light source unit and a peripheral LED light source unit The central 405nm LED light source unit is configured to be larger and the irradiation area of the LED is adjusted to be larger than the LED size so that the output of the beam overlapping unit is not degraded.
Accordingly, the above-mentioned patent discloses an LED light source module in which two or more types of LED light source units having different wavelengths are arranged in a matrix form, and an intensity, a uniformity, and a light efficiency It is possible to easily perform exposure with respect to a large-area exposure object.
However, in the case of the LED light source according to the above patent, since the LED light source modules in which a plurality of LED light source units are arranged in a matrix form are arranged in a matrix again to constitute a large-area light source device on the same plane, There is a problem that almost all the related components except for the object to be exposed and their structures from the optical system to the mask and the structure thereof need to be changed or replaced so as to correspond to the LED light source device.
Therefore, an object of the present invention to solve the above-mentioned problems is to provide an LED array light source module capable of simply replacing a mercury lamp with an LED array unit in which a plurality of LED units each emitting light of different wavelengths are arranged, An LED array light source module for large-area pattern exposure that can reduce the power consumption and the replacement and maintenance costs by improving energy efficiency while being eco-friendly, and a control device thereof.
It is another object of the present invention to provide a large-area pattern exposure LED array light source module capable of photo-sensing various photo resistors without replacing a light source with respect to different photo resistors (PR) And a control device therefor.
According to an aspect of the present invention, there is provided an LED array light source module for large area pattern exposure, comprising at least two of a first LED, a second LED and a third LED which emit light of a first wavelength, a second wavelength and a third wavelength, One LED array unit in which a plurality of the above LED units are arranged is disposed at the center, and eight LED array units (hereinafter referred to as " peripheral LED array ") are arranged around the center of the LED array unit Unit ") is radially arranged on the same plane, and the peripheral LED array unit is arranged in the same plane so that the light sources emitted from the central LED array unit and the light sources emitted from the respective peripheral LED array units overlap in the work distance (WD) In the direction of the central LED array unit.
Here, in the LED array light source module for large-area pattern exposure according to the present invention, the LED unit may include a fly-eye lens that changes an unstable light source generated by lighting the LED to a uniform light source desirable.
Also, in the LED array light source module for large-area pattern exposure according to the present invention, the LED array unit may include a condensing lens for condensing light sources of different complex wavelengths in the form of scattered light uniformly changed through the fly-eye lens, And a focusing lens for focusing the light of the complex wavelength light source condensed by the condensing lens.
According to another aspect of the present invention, there is provided an apparatus for controlling an LED array light source module for large area pattern exposure, the LED array light source module for large area pattern exposure according to any one of
In this case, the monitoring server may store the usage history of the LED array light source module as a separate file by date, and may provide the user with a history of the light source by date And displays the requested light source history so that the user can confirm the history of the LED light source up to the present time and displays the requested light source history in a real time through the simulator communicating with the controller in real time And a function of confirming the state of the user.
As described above, the present invention minimizes the change of the existing exposure apparatus and can replace only the mercury lamp easily. Therefore, it is possible to reduce the power consumption and the replacement and maintenance cost by improving the energy efficiency while being environmentally friendly have.
The present invention also provides a method of controlling a plurality of LEDs emitting light of different wavelengths, respectively, by controlling only LEDs emitting light of the same wavelength, It is possible to reduce the cost of replacement and maintenance of the light source, and it is possible to use various kinds of photoresistors without restriction.
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an exposure apparatus using a mercury lamp as a light source according to the prior art,
FIG. 2 is a block diagram schematically showing an LED array unit constituting the LED array light source module for large area pattern exposure according to the present invention, which replaces the mercury lamp of FIG. 1;
3 is a three-dimensional view for explaining the array structure of the LED unit constituting the LED array unit of FIG. 2,
FIG. 4 is a conceptual diagram of an LED array light source module in which the LED array unit of FIG. 2 is arranged in a specific form according to the present invention;
5 is a view schematically showing a cross-sectional view of the LED array light source module of FIG. 4,
FIG. 6 is a view for helping to understand how light is emitted from the LED array light source module of FIG. 4,
FIG. 7 is a block diagram schematically showing a control device for controlling the LED array light source module according to the present invention.
8 is an example of a screen for monitoring and controlling the LED array light source module through communication with the controller,
FIG. 9 is an example of a screen for searching a desired date and storing a date-specific file to confirm the light source history up to now,
10 is an example of a screen for monitoring an On time and a status of a current light source.
Hereinafter, embodiments of the LED array light source module for large area pattern exposure according to the present invention and its control device will be described in detail with reference to the drawings. It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed.
BRIEF DESCRIPTION OF THE DRAWINGS The same features of the figures represent the same symbols wherever possible. It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. , ≪ / RTI > equivalents, and alternatives. In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.
The terms first, second, etc. may be used to describe various components, but the components are not limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.
The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprises" or "having" and the like are used to specify that there is a feature, a number, a step, an operation, an element, a component or a combination thereof described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.
Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning in the context of the relevant art and are to be interpreted in an ideal or overly formal sense unless explicitly defined in the present application Do not.
Hereinafter, an LED light source device for large area pattern exposure according to a preferred embodiment of the present invention will be described in detail with reference to the drawings.
First, FIG. 1 is a schematic view illustrating an exposure apparatus using a mercury lamp according to the related art as a light source. FIG. 1 schematically shows an internal structure of a stepper, for example. The stepper differs in appearance and internal structure from one manufacturer to another. However, the exposed portion of the stepper generally includes a stage for positioning an object to be exposed, a lamp as a light source, and a light source for transmitting light emitted from the lamp to the object to be exposed A lens system and a mask for providing an exposure pattern.
The light emitted from the
FIG. 2 is a block diagram schematically showing an LED array unit constituting the LED array light source module for large area pattern exposure according to the present invention, which replaces the mercury lamp of FIG. 1, FIG. 3 is a cross- Fig. 3 is a three-dimensional view for explaining the array structure of the
2, the
In an embodiment of the present invention, the
The fly's
3, the
In addition, since the heat dissipation of the LED is an important issue in the LED light source device, it is preferable to provide the
Next, a water-cooled heat dissipation device may be used. The water-cooled type has a somewhat complicated structure compared to the air-cooled type, but the thermal efficiency is very good, and the radiator and the water pump are basically constructed. The radiator densely follows the pipe of a very fine diameter of the straw, and attaches the thin plate to the densely, so that the hot water flowing in the fine pipe that has greatly enlarged the surface area passes through the large surface area of the radiator, . Cooling water is then circulated through the coolant pump to the device to be heated and then cooled. In addition, a gas-cooling heat-dissipating device using a refrigerant such as Freon gas may be used.
As described above, various types of cooling methods can be used for the large area pattern exposure
As described above, the LED array light source module for large area pattern exposure according to the present invention can replace only a mercury lamp while minimizing changes in other components of the conventional exposure apparatus.
Meanwhile, in the LED array light source module for large area pattern exposure according to the present invention, the shutter can be removed from an exposure device using a conventional mercury lamp, and the
FIG. 4 is a conceptual diagram of the LED array
4 to 6, the LED array
The LED array
The light sources emanating from the central
Therefore, when a plurality of
That is, for each of the overlapping positions, the same power value is assigned to each wavelength band (the LED unit emitting light of the same wavelength), so that the power supply of each
Therefore, when ON / OFF control of the supply power is performed for each
Thus, it is possible to provide a light source in which the uniformity is formed without replacing the light source unit with respect to the photoresist that reacts to light of each wavelength.
In addition, as described above, the LED array light source module for large area pattern exposure according to the present invention includes a plurality of peripheral
7 is a block diagram schematically showing a control device for controlling the LED array light source module according to the present invention. 7, a controller for controlling the LED array
The
Since the LED array
The
The
The
The
FIG. 8 is a view illustrating an example of a screen for monitoring and controlling the LED array
Accordingly, the LED array light source module for large-area pattern exposure according to the present invention and the control device thereof control only LEDs emitting light of the same wavelength for a plurality of LEDs emitting light of different wavelengths, It is possible to reduce the cost of replacement and maintenance of the light source and to use various kinds of photoresistors without restriction because the various photoresists that react to light can be respectively exposed without replacing the light source.
Although the preferred embodiments of the present invention have been disclosed for illustrative purposes, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope and spirit of the invention as disclosed in the accompanying claims. Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims and equivalents thereof.
Claims (5)
And a fly-eye lens for changing an unstable light source generated by lighting of the LED into a uniform light source.
A condensing lens for condensing light sources of different complex wavelengths in the form of scattered light uniformly changed through the fly-eye lens, and a focusing lens for focusing the combined wavelength light source condensed in the condensing lens And a light source module for exposing the large area pattern LED array light source module.
A controller that has a plurality of control channels, assigns a designated control channel to each of LEDs having different wavelengths, and controls supply power through on / off and current / voltage control of LEDs according to wavelengths;
A simulator for accumulating current state indicating data including temperature, illuminance and use time of the LEDs collected through real-time communication with the controller for a short time;
A facility PC that receives an external command of a user through an input device such as a keyboard, a mouse, and a touchpad and controls on / off of the LED by the wavelength band through the controller; And
The LED array light source module receives and stores the current status display data accumulated at a predetermined period from the simulator, monitors the light source status, illuminance, temperature, and usage time data of the LEDs constituting the LED array light source module, And transmits the control signal to the controller through the simulator so as to control the magnitude of the light reaching the exposure area and thereby control the magnitude of the current supplied to the LED, Wherein the LED array light source module for large area pattern exposure comprises:
A history of use of the LED array light source module is stored as a separate file for each date, a light source history can be searched for each date by a user, and a light source history requested by the user to check the history of the LED light source Further comprising a function of displaying the status of the LED array light source module and realizing the status of the LEDs constituting the LED array light source module in real time through the simulator communicating with the controller in real time.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2019101361A (en) * | 2017-12-07 | 2019-06-24 | 株式会社ユメックス | Scan type exposure equipment |
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KR20220118101A (en) | 2021-02-18 | 2022-08-25 | (주)포인트엔지니어링 | Cooling system of Light source apparatus for exposure machine and Light source apparatus for exposure machine including the same and exposure equipment including the same |
Citations (4)
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KR101073671B1 (en) | 2009-11-26 | 2011-10-14 | (주)와이티에스 | LED lamp for exposure and apparatus exposure using the same |
KR101344037B1 (en) | 2011-10-19 | 2013-12-24 | 주식회사 인피테크 | LED light source module, LED light source apparatus and LED light source apparatus management system for exposure resist |
KR101401238B1 (en) | 2012-09-28 | 2014-05-29 | 주식회사 인피테크 | LED light source apparatus for exposure resist |
KR101532352B1 (en) | 2013-10-30 | 2015-06-29 | 주식회사 인피테크 | LED light source apparatus for exposure resist and management system for the same |
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2015
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101073671B1 (en) | 2009-11-26 | 2011-10-14 | (주)와이티에스 | LED lamp for exposure and apparatus exposure using the same |
KR101344037B1 (en) | 2011-10-19 | 2013-12-24 | 주식회사 인피테크 | LED light source module, LED light source apparatus and LED light source apparatus management system for exposure resist |
KR101401238B1 (en) | 2012-09-28 | 2014-05-29 | 주식회사 인피테크 | LED light source apparatus for exposure resist |
KR101532352B1 (en) | 2013-10-30 | 2015-06-29 | 주식회사 인피테크 | LED light source apparatus for exposure resist and management system for the same |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2019101361A (en) * | 2017-12-07 | 2019-06-24 | 株式会社ユメックス | Scan type exposure equipment |
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