KR20160094776A - 인쇄회로기판 가공 방법 - Google Patents
인쇄회로기판 가공 방법 Download PDFInfo
- Publication number
- KR20160094776A KR20160094776A KR1020150016208A KR20150016208A KR20160094776A KR 20160094776 A KR20160094776 A KR 20160094776A KR 1020150016208 A KR1020150016208 A KR 1020150016208A KR 20150016208 A KR20150016208 A KR 20150016208A KR 20160094776 A KR20160094776 A KR 20160094776A
- Authority
- KR
- South Korea
- Prior art keywords
- pcb
- copper foil
- laser
- drilling
- panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 86
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000005553 drilling Methods 0.000 claims abstract description 26
- 239000011889 copper foil Substances 0.000 claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 238000010030 laminating Methods 0.000 claims abstract description 3
- 239000010949 copper Substances 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 230000003746 surface roughness Effects 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 238000003672 processing method Methods 0.000 abstract description 11
- 230000007547 defect Effects 0.000 abstract description 7
- 238000004080 punching Methods 0.000 abstract 2
- 230000001603 reducing effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 5
- 238000003475 lamination Methods 0.000 description 5
- 230000008602 contraction Effects 0.000 description 4
- 238000009966 trimming Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 241000784732 Lycaena phlaeas Species 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
- H05K3/0047—Drilling of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
- H05K3/0061—Laminating printed circuit boards onto other substrates, e.g. metallic substrates onto a metallic substrate, e.g. a heat sink
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Laser Beam Processing (AREA)
Abstract
PCB 가공 방법은
표면 조도 및 색상 처리된 동박 및 프리프레그를 준비하는 과정;
동박-프리프레그-동박의 순서대로 적층하여 PCB 패널을 제조하는 과정;
상기 적층된 기판을 가압열처리하여 PCB 패널을 성형하는 가압열처리 과정;
X-Ray 드릴링에 의해 상기 PCB 패널에 가이드 홀을 천공하는 과정; 및
레이저 드릴링에 의해 상기 가이드 홀을 기준으로 상기 PCB 패널에 비아홀을 천공하는 과정;
을 포함한다.
Description
도 2는 스케일 보정의 개념을 도시한다.
도 3은 Laser Drill 가공을 위한 Window Open 방식으로 기존 Laser Drill 가공에 대한 방법을 나타낸다.
도 4는 종래의 Window Open 방식의 Laser Drill 공법 시 Scale의 오적용 및 제품의 신장, 신축에 의한 LVH 틀어짐 불량을 표현한다.
도 5는 종래의 Window Open 방식과 DLD 방식 적용 DLD 공법의 진행 순서를 비교한다.
도 6은 Oxide 공정 後 제품의 취급에 의한 Laser 오가공 및 미가공 현상을 도식화 한다.
도 7은 일반 Copper Foil 과 DTF Copper의 차이를 나타낸다.
도 8은 본 개발에 따른 PCB 가공 가공방법을 간략하게 도시한다.
도 9는 X-ray Drill 가공과 Trimming 공정의 역할에 대해 설명한다.
도 10은 종래의 Direct Laser Drill 가공 방법과 본 발명에 따른 PCB 가공 방법 즉, DTF Copper를 적용한 Direct Laser Drill 가공 방법의 Process의 차이점과 Laser Hole 가공에 대한 신뢰성 자료를 나타낸다.
도 11은 DTF Copper 적용한 제품의 사진과 사양에 대한 부분을 표기 한다.
도 12는 종래의 Window Open 방식과 DLD 방식 그리고 개발하고자 하는 DTF(Double Treatment Foil) 적용 DLD 공법의 진행 순서를 비교한다.
Claims (2)
- 표면 조도 및 색상 처리된 동박(copper foil) 및 프리프레그(prepreg)를 준비하는 과정;
동박-프리프레그-동박의 순서대로 적층하여 PCB (Printed Circuit Board) 패널을 제조하는 과정;
상기 적층된 기판을 가압열처리하여 PCB 패널을 성형하는 가압열처리 과정;
엑스레이 드릴링(X-Ray Drilling)에 의해 상기 PCB 패널에 가이드 홀을 천공하는 과정; 및
레이저 드릴링에 의해 상기 가이드 홀을 기준으로 상기 PCB 패널에 비아홀을 천공하는 과정;
을 포함하는 인쇄회로기판 가공 방법.
- 제1항에 있어서, 상기 표면 조도 및 색상 처리된 동박은
동박을 복합금속산화물로 처리하여 색상을 조절하고, 디핑(Dipping) 방식을 통해 코팅 처리한 것임을 특징으로 하는 인쇄회로기판 가공 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150016208A KR101659439B1 (ko) | 2015-02-02 | 2015-02-02 | 인쇄회로기판 가공 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150016208A KR101659439B1 (ko) | 2015-02-02 | 2015-02-02 | 인쇄회로기판 가공 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160094776A true KR20160094776A (ko) | 2016-08-10 |
KR101659439B1 KR101659439B1 (ko) | 2016-09-23 |
Family
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---|---|---|---|
KR1020150016208A Active KR101659439B1 (ko) | 2015-02-02 | 2015-02-02 | 인쇄회로기판 가공 방법 |
Country Status (1)
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KR (1) | KR101659439B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112074096A (zh) * | 2020-10-13 | 2020-12-11 | 安捷利(番禺)电子实业有限公司 | 一种5g高频lcp材料钻孔方法 |
CN113423195A (zh) * | 2021-05-28 | 2021-09-21 | 安捷利(番禺)电子实业有限公司 | 一种pcb板的制备方法及制备的pcb板 |
KR20220151297A (ko) * | 2021-05-06 | 2022-11-15 | 주식회사 디에이피 | 층간편심불량개선방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11261216A (ja) * | 1998-03-09 | 1999-09-24 | Ibiden Co Ltd | プリント配線板及びその製造方法 |
JP2004172343A (ja) * | 2002-11-20 | 2004-06-17 | Nikko Materials Co Ltd | レーザー穴開け用銅箔及びその製造方法 |
KR20130057185A (ko) * | 2011-11-23 | 2013-05-31 | 삼성전기주식회사 | 인쇄회로기판의 제조 방법 |
KR101425566B1 (ko) * | 2013-12-26 | 2014-08-01 | 대원이노베이션 주식회사 | Pcb용 코어보드의 비아홀 가공방법 |
-
2015
- 2015-02-02 KR KR1020150016208A patent/KR101659439B1/ko active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11261216A (ja) * | 1998-03-09 | 1999-09-24 | Ibiden Co Ltd | プリント配線板及びその製造方法 |
JP2004172343A (ja) * | 2002-11-20 | 2004-06-17 | Nikko Materials Co Ltd | レーザー穴開け用銅箔及びその製造方法 |
KR20130057185A (ko) * | 2011-11-23 | 2013-05-31 | 삼성전기주식회사 | 인쇄회로기판의 제조 방법 |
KR101425566B1 (ko) * | 2013-12-26 | 2014-08-01 | 대원이노베이션 주식회사 | Pcb용 코어보드의 비아홀 가공방법 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112074096A (zh) * | 2020-10-13 | 2020-12-11 | 安捷利(番禺)电子实业有限公司 | 一种5g高频lcp材料钻孔方法 |
KR20220151297A (ko) * | 2021-05-06 | 2022-11-15 | 주식회사 디에이피 | 층간편심불량개선방법 |
CN113423195A (zh) * | 2021-05-28 | 2021-09-21 | 安捷利(番禺)电子实业有限公司 | 一种pcb板的制备方法及制备的pcb板 |
Also Published As
Publication number | Publication date |
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KR101659439B1 (ko) | 2016-09-23 |
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