KR20150038238A - 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 ｅｌ 표시 장치 및 액정 표시 장치 - Google Patents

감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 ｅｌ 표시 장치 및 액정 표시 장치 Download PDF

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Publication number
KR20150038238A
KR20150038238A KR20157004578A KR20157004578A KR20150038238A KR 20150038238 A KR20150038238 A KR 20150038238A KR 20157004578 A KR20157004578 A KR 20157004578A KR 20157004578 A KR20157004578 A KR 20157004578A KR 20150038238 A KR20150038238 A KR 20150038238A
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KR
South Korea
Prior art keywords
compound
resin composition
photosensitive resin
group
mass
Prior art date
Application number
KR20157004578A
Other languages
English (en)
Korean (ko)
Inventor
다이스케 카시와기
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20150038238A publication Critical patent/KR20150038238A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyurethanes Or Polyureas (AREA)
KR20157004578A 2012-09-03 2013-07-12 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 ｅｌ 표시 장치 및 액정 표시 장치 KR20150038238A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012192993 2012-09-03
JPJP-P-2012-192993 2012-09-03
PCT/JP2013/069161 WO2014034301A1 (ja) 2012-09-03 2013-07-12 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置および液晶表示装置

Publications (1)

Publication Number Publication Date
KR20150038238A true KR20150038238A (ko) 2015-04-08

Family

ID=50183121

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20157004578A KR20150038238A (ko) 2012-09-03 2013-07-12 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 ｅｌ 표시 장치 및 액정 표시 장치

Country Status (4)

Country Link
JP (1) JP5981554B2 (zh)
KR (1) KR20150038238A (zh)
TW (1) TWI622855B (zh)
WO (1) WO2014034301A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6397697B2 (ja) * 2014-08-27 2018-09-26 東京応化工業株式会社 層間絶縁膜形成用感光性樹脂組成物、層間絶縁膜及び層間絶縁膜の形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006276159A (ja) * 2005-03-28 2006-10-12 Toray Ind Inc スペーサー形成用感放射線性組成物およびそれを用いた液晶表示装置用基板の製造方法、液晶表示装置用基板
JP5163899B2 (ja) * 2006-06-15 2013-03-13 日産化学工業株式会社 環構造を持つ高分子化合物を含有するポジ型感光性樹脂組成物
JP5362811B2 (ja) * 2009-02-21 2013-12-11 デクセリアルズ株式会社 保護膜形成用原料液、保護膜、保護膜付き配線基板
JP2011064869A (ja) * 2009-09-16 2011-03-31 Fujifilm Corp 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5736718B2 (ja) * 2010-10-18 2015-06-17 Jsr株式会社 感放射線性樹脂組成物、硬化膜及びその形成方法

Also Published As

Publication number Publication date
TW201411280A (zh) 2014-03-16
TWI622855B (zh) 2018-05-01
JP5981554B2 (ja) 2016-08-31
JPWO2014034301A1 (ja) 2016-08-08
WO2014034301A1 (ja) 2014-03-06

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