KR20130112753A - 광학계, 노광 장치 및 디바이스 제조 방법 - Google Patents

광학계, 노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR20130112753A
KR20130112753A KR1020130032659A KR20130032659A KR20130112753A KR 20130112753 A KR20130112753 A KR 20130112753A KR 1020130032659 A KR1020130032659 A KR 1020130032659A KR 20130032659 A KR20130032659 A KR 20130032659A KR 20130112753 A KR20130112753 A KR 20130112753A
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KR
South Korea
Prior art keywords
optical element
optical system
lens
optical
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020130032659A
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English (en)
Korean (ko)
Inventor
노부히코 야부
Original Assignee
캐논 가부시끼가이샤
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Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20130112753A publication Critical patent/KR20130112753A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/22—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with movable lens means specially adapted for focusing at close distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020130032659A 2012-04-04 2013-03-27 광학계, 노광 장치 및 디바이스 제조 방법 Ceased KR20130112753A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012085893A JP2013219089A (ja) 2012-04-04 2012-04-04 光学系、露光装置、およびデバイス製造方法
JPJP-P-2012-085893 2012-04-04

Publications (1)

Publication Number Publication Date
KR20130112753A true KR20130112753A (ko) 2013-10-14

Family

ID=49366682

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130032659A Ceased KR20130112753A (ko) 2012-04-04 2013-03-27 광학계, 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
JP (1) JP2013219089A (enrdf_load_stackoverflow)
KR (1) KR20130112753A (enrdf_load_stackoverflow)
CN (1) CN103364963A (enrdf_load_stackoverflow)
TW (1) TW201344378A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170077190A (ko) * 2014-10-29 2017-07-05 상하이 마이크로 일렉트로닉스 이큅먼트 컴퍼니 리미티드 노광 장치 및 노광 장치를 위한 조정 방법
KR20180008713A (ko) * 2015-05-24 2018-01-24 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 노광 장치

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) * 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP2023004358A (ja) 2021-06-25 2023-01-17 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法
WO2023081041A1 (en) * 2021-11-02 2023-05-11 Corning Incorporated Magnification adjustable projection system using movable lens plates

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1184287A (ja) * 1997-09-08 1999-03-26 Ricoh Co Ltd 光走査装置
EP1231513A1 (en) * 2001-02-08 2002-08-14 Asm Lithography B.V. Lithographic projection apparatus with adjustable focal surface
JP4211272B2 (ja) * 2002-04-12 2009-01-21 株式会社ニコン 露光装置及び露光方法
JP2008166650A (ja) * 2007-01-05 2008-07-17 Nikon Corp 走査型露光装置、デバイスの製造方法及びマスク
TWI426295B (zh) * 2007-03-05 2014-02-11 尼康股份有限公司 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置
JP2010039347A (ja) * 2008-08-07 2010-02-18 Mejiro Precision:Kk 投影露光装置
TWI531872B (zh) * 2008-09-22 2016-05-01 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170077190A (ko) * 2014-10-29 2017-07-05 상하이 마이크로 일렉트로닉스 이큅먼트 컴퍼니 리미티드 노광 장치 및 노광 장치를 위한 조정 방법
KR20180008713A (ko) * 2015-05-24 2018-01-24 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 노광 장치

Also Published As

Publication number Publication date
TW201344378A (zh) 2013-11-01
JP2013219089A (ja) 2013-10-24
CN103364963A (zh) 2013-10-23

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