KR20130054184A - 고주파 안테나 회로 및 유도 결합 플라즈마 처리 장치 - Google Patents

고주파 안테나 회로 및 유도 결합 플라즈마 처리 장치 Download PDF

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Publication number
KR20130054184A
KR20130054184A KR1020120128714A KR20120128714A KR20130054184A KR 20130054184 A KR20130054184 A KR 20130054184A KR 1020120128714 A KR1020120128714 A KR 1020120128714A KR 20120128714 A KR20120128714 A KR 20120128714A KR 20130054184 A KR20130054184 A KR 20130054184A
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KR
South Korea
Prior art keywords
antenna
split
inductively coupled
processing apparatus
coupled plasma
Prior art date
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KR1020120128714A
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English (en)
Korean (ko)
Inventor
가즈오 사사키
츠토무 사토요시
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20130054184A publication Critical patent/KR20130054184A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q7/00—Loop antennas with a substantially uniform current distribution around the loop and having a directional radiation pattern in a plane perpendicular to the plane of the loop
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
KR1020120128714A 2011-11-15 2012-11-14 고주파 안테나 회로 및 유도 결합 플라즈마 처리 장치 KR20130054184A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2011-249826 2011-11-15
JP2011249826A JP2013105664A (ja) 2011-11-15 2011-11-15 高周波アンテナ回路及び誘導結合プラズマ処理装置

Publications (1)

Publication Number Publication Date
KR20130054184A true KR20130054184A (ko) 2013-05-24

Family

ID=48315960

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120128714A KR20130054184A (ko) 2011-11-15 2012-11-14 고주파 안테나 회로 및 유도 결합 플라즈마 처리 장치

Country Status (4)

Country Link
JP (1) JP2013105664A (ja)
KR (1) KR20130054184A (ja)
CN (1) CN103108483A (ja)
TW (1) TWI645069B (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150077533A (ko) * 2013-12-27 2015-07-08 세메스 주식회사 플라즈마 발생 장치 및 그를 포함하는 기판 처리 장치
KR20160018152A (ko) * 2014-08-08 2016-02-17 엘아이지인베니아 주식회사 플라즈마 처리장치용 플라즈마 발생모듈
KR20160066871A (ko) * 2014-12-03 2016-06-13 인베니아 주식회사 플라즈마 발생모듈 및 이를 포함하는 플라즈마 처리장치
KR20160068254A (ko) * 2014-12-05 2016-06-15 인베니아 주식회사 플라즈마 발생모듈 및 이를 포함하는 플라즈마 처리장치
US11456154B2 (en) 2014-04-29 2022-09-27 Semes Co., Ltd. Plasma-generating unit and substrate treatment apparatus including the same

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015138602A (ja) * 2014-01-21 2015-07-30 株式会社アルバック プラズマ処理用整合器、プラズマ処理装置、および、プラズマ処理用整合器の駆動方法
JP6305825B2 (ja) * 2014-05-12 2018-04-04 東京エレクトロン株式会社 プラズマ処理装置およびそれに用いる排気構造
KR101652845B1 (ko) * 2014-08-08 2016-09-01 인베니아 주식회사 플라즈마 발생모듈 및 이를 포함하는 플라즈마 처리장치
CN104579196B (zh) * 2015-01-28 2018-06-05 中国科学院微电子研究所 一种射频信号放大器
WO2017126662A1 (ja) * 2016-01-22 2017-07-27 Ｓｐｐテクノロジーズ株式会社 プラズマ制御装置
JP6851188B2 (ja) * 2016-11-28 2021-03-31 東京エレクトロン株式会社 プラズマ処理装置及びシャワーヘッド
KR20180092684A (ko) * 2017-02-10 2018-08-20 주식회사 유진테크 Icp 안테나 및 이를 포함하는 기판 처리 장치
JP6353963B2 (ja) * 2017-07-13 2018-07-04 東京エレクトロン株式会社 マイクロ波プラズマ処理装置及びマイクロ波供給方法
JP7139181B2 (ja) 2018-07-26 2022-09-20 ワイエイシイテクノロジーズ株式会社 プラズマ処理装置
US11515122B2 (en) * 2019-03-19 2022-11-29 Tokyo Electron Limited System and methods for VHF plasma processing
KR102137913B1 (ko) * 2019-10-29 2020-07-24 주식회사 기가레인 플라즈마 안테나 모듈

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3935401B2 (ja) * 2002-07-22 2007-06-20 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP2006278219A (ja) * 2005-03-30 2006-10-12 Utec:Kk Ｉｃｐ回路、プラズマ処理装置及びプラズマ処理方法
JP5399151B2 (ja) * 2008-10-27 2014-01-29 東京エレクトロン株式会社 誘導結合プラズマ処理装置、プラズマ処理方法及び記憶媒体
JP5479867B2 (ja) * 2009-01-14 2014-04-23 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP5231308B2 (ja) * 2009-03-31 2013-07-10 東京エレクトロン株式会社 プラズマ処理装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150077533A (ko) * 2013-12-27 2015-07-08 세메스 주식회사 플라즈마 발생 장치 및 그를 포함하는 기판 처리 장치
US11456154B2 (en) 2014-04-29 2022-09-27 Semes Co., Ltd. Plasma-generating unit and substrate treatment apparatus including the same
KR20160018152A (ko) * 2014-08-08 2016-02-17 엘아이지인베니아 주식회사 플라즈마 처리장치용 플라즈마 발생모듈
KR20160066871A (ko) * 2014-12-03 2016-06-13 인베니아 주식회사 플라즈마 발생모듈 및 이를 포함하는 플라즈마 처리장치
KR20160068254A (ko) * 2014-12-05 2016-06-15 인베니아 주식회사 플라즈마 발생모듈 및 이를 포함하는 플라즈마 처리장치

Also Published As

Publication number Publication date
JP2013105664A (ja) 2013-05-30
TW201337034A (zh) 2013-09-16
TWI645069B (zh) 2018-12-21
CN103108483A (zh) 2013-05-15

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