KR20130010806A - Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof - Google Patents

Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof Download PDF

Info

Publication number
KR20130010806A
KR20130010806A KR1020110071685A KR20110071685A KR20130010806A KR 20130010806 A KR20130010806 A KR 20130010806A KR 1020110071685 A KR1020110071685 A KR 1020110071685A KR 20110071685 A KR20110071685 A KR 20110071685A KR 20130010806 A KR20130010806 A KR 20130010806A
Authority
KR
South Korea
Prior art keywords
substrate
electrophoretic
layer
mask
forming
Prior art date
Application number
KR1020110071685A
Other languages
Korean (ko)
Inventor
권오남
백승한
Original Assignee
엘지디스플레이 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지디스플레이 주식회사 filed Critical 엘지디스플레이 주식회사
Priority to KR1020110071685A priority Critical patent/KR20130010806A/en
Publication of KR20130010806A publication Critical patent/KR20130010806A/en

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133377—Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/3433—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
    • G09G3/344—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on particles moving in a fluid or in a gas, e.g. electrophoretic devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675—Constructional details
    • G02F2001/1678—Constructional details characterised by the composition or particle type

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

The present invention relates to a method for manufacturing an electrophoretic display device for forming a rapid electrophoretic layer, and furthermore, to an electrophoretic display device manufacturing method according to the present invention, an image display region in which a plurality of pixels are arranged and the display region; Providing a first substrate including a non-display area outside the image display area and a second substrate corresponding to the first substrate; Forming a thin film transistor for each pixel on the first substrate; Forming a protective layer on the first substrate on which the thin film transistor is formed; Forming a pixel electrode for each pixel on the passivation layer; Forming a partition between each pixel on the passivation layer; Disposing an accommodating part in which a discharge hole is formed in a mask and a lower portion of the first substrate on which the partition wall is formed, and accommodates the electrophoretic material therein; Advancing the housing from one side to the other side and discharging the electrophoretic material stored in the housing to a pixel between the partition walls through a discharge port and a mask; Forming a common electrode on the second substrate; And bonding the first substrate and the second substrate, wherein the viscosity of the electrophoretic material is 1-100 cps.

Description

FIELD OF CONTAINING ELECTROPHORETIC MATERIAL AND METHOD OF FABRICAING ELECTROPHORETIC DISPLAY DEVICE USING THEREOF}

The present invention relates to an electrophoretic material filling apparatus and a method for manufacturing an electrophoretic display device using the same, and in particular, by directly filling a low viscosity electrophoretic material on a substrate on which a thin film transistor is formed, manufacturing cost can be reduced and manufacturing time can be shortened. The present invention relates to an electrophoretic material filling apparatus and a method of manufacturing an electrophoretic display device using the same.

An electrophoretic display device is an image display device using a phenomenon in which colloidal particles move to either polarity when a pair of electrodes to which voltage is applied is immersed in a colloidal solution. Unlike the liquid crystal display device, such an electrophoretic display device does not use a backlight and has advantages such as a wide viewing angle, high reflectance, and low power consumption. Therefore, the electrophoretic display device has been spotlighted as a display that can be bent such as electronic paper.

Such an electrophoretic display device has a structure in which an electrophoretic layer is interposed between two substrates. One of the two substrates is composed of a transparent substrate and the other substrate is composed of an array substrate on which a driving element is formed to display an image in a reflective mode reflecting light input from the outside of the element.

1 is a view showing a structure of a conventional electrophoretic display element 1. Fig. 1, the electrophoretic display element 1 includes a first substrate 20 and a second substrate 40, a thin film transistor and a pixel electrode 18 formed on the first substrate 20, A common electrode 42 formed on the second substrate 40 and an electrophoretic layer 60 formed between the first substrate 20 and the second substrate 40. The electrophoretic layer 60 and the pixel And an adhesive layer (56) formed between the electrodes (18).

The thin film transistor includes a gate electrode 11 formed on the first substrate 2, a gate insulating layer 22 formed on the entire first substrate 20 on which the gate electrode 11 is formed, And a source electrode 15 and a drain electrode 16 formed on the semiconductor layer 13. The source electrode 15 and the drain electrode 16 are formed on the semiconductor layer 13, A protective layer 24 is formed on the source electrode 15 and the drain electrode 16 of the thin film transistor.

On the protective layer 24, a pixel electrode 18 for applying a signal to the electrophoretic layer 60 is formed. In this case, a contact hole 28 is formed in the passivation layer 24, and the pixel electrode 18 is connected to the drain electrode 16 of the thin film transistor through the contact hole 28.

In addition, a color filter layer 44 and a common electrode 42 are formed on the second substrate 40. An electrophoretic layer 60 is formed on the color filter layer 42, and an adhesive layer 56 is formed on the electrophoretic layer 60. The electrophoretic layer 60 includes a capsule 70 filled with white particles 74 and black particles 76 therein. When a signal is applied to the pixel electrode 18, an electric field is generated between the common electrode 42 and the pixel electrode 18, and the white particles 74 and the black particles inside the capsule 70 are generated by the electric field. An image is realized by moving the 76 in the direction of the common electrode 42 or the pixel electrode 18.

For example, when (-) voltage is applied to the pixel electrode 18 on the first substrate 20 and (+) voltage is applied to the common electrode 42 on the second substrate 40, (+) The charged white particles 74 move toward the first substrate 20, and the negative black charges 76 move toward the second substrate 40. In this state, when light is input from the outside, that is, from the upper portion of the second substrate 40, since the input light is reflected by the black particles 76, black is realized in the electrophoretic display element.

On the contrary, when a positive voltage is applied to the pixel electrode 18 on the first substrate 20 and a negative voltage is applied to the common electrode 42 on the second substrate 40, a positive charge is applied. The white particles 74 having the movement to the second substrate 40 and the black particles 76 having the negative charge move to the first substrate 20. In this state, when light is input from the outside, that is, from the upper portion of the second substrate 40, the input light is reflected by the white particles 74, so that the electrophoretic display device is white.

However, in the conventional electrophoretic display element 1 having the above-described structure, the following problems arise.

First, in the conventional electrophoretic display device manufacturing method, it is difficult to attach the first substrate 20 and the second substrate 40.

In the conventional electrophoretic display device 1, the first substrate 20 and the second substrate 40 are separately manufactured, and then the first substrate 20 and the second substrate 40 are bonded by the adhesive layer 56. It is completed by. That is, a thin film transistor for driving unit pixels and a pixel electrode 18 for applying an electric field to the electrophoretic layer are formed on the first substrate 20, and the common electrode (2) is formed on the second substrate 40 in a separate process. 42), the color filter layer 44, the electrophoretic layer 60, and the adhesive layer 56 are formed, and then, the first substrate 20 and the second substrate 40 are bonded to each other.

However, since the unit pixels of the electrophoretic display device are generally formed in a small size of less than 150 micrometers in width and length, it is very difficult to align the electrophoretic layer to exactly match this size. When the electrophoretic layer is aligned, if the electrophoretic layer and the first substrate on which the thin film transistor is formed are not aligned correctly, the electric field may not be correctly transferred to the electrophoretic particles, which may cause driving errors.

Second, the manufacturing method of the conventional electrophoretic display device is complicated.

Since the first substrate 20 and the second substrate 40 are each manufactured on different processes, the first and second substrates 20 and 40 must be transported by a conveying means and then bonded to each other in the bonding process, thereby making it impossible to form a manufacturing process inline.

Third, in the bonding process of the first substrate 20 and the second substrate 40, the static electricity is generated, causing a defect in the initial arrangement of the electrophoretic particles.

The common electrode 42, the color filter layer 44, and the electrophoretic layer 60 are formed on the second substrate 40, and the adhesive layer 56 is coated on the electrophoretic layer 60. In addition, a protective film is attached to the adhesive layer 56 to prevent the adhesion of the adhesive layer 56 from being lowered and from adhering to the adhesive layer 56. However, in order to attach the second substrate 40 to the first substrate 20, the protective film must be peeled from the second substrate 40. An electrostatic particle is generated during the peeling process of the protective film, and thus the initial arrangement of the electrophoretic particles is performed. Can cause misalignment. The misalignment of the electrophoretic particles by the static electricity causes a comb-shaped moiré when the electrophoretic display device is operated.

The present invention is to solve the above problems, by forming the electrophoretic layer directly on the substrate on which the thin film transistor is formed to prevent misalignment between the electrophoretic layer and the first substrate, to reduce the manufacturing cost and simplify the manufacturing process An object of the present invention is to provide a method for manufacturing an electrophoretic display device.

Another object of the present invention is to provide an electrophoretic material filling apparatus and a method of manufacturing an electrophoretic display device using the same, which can quickly fill the electrophoretic material between partition walls, thereby speeding up the entire manufacturing process.

In order to achieve the above object, the fluid filling apparatus according to the present invention comprises a mask; And an accommodating part disposed above the mask and having an outlet formed at the bottom thereof to accommodate the fluid therein, and discharging the received fluid to the mask through the outlet as the fluid flows from one side of the mask to the other side.

The fluid is a viscosity of 1-100cp, the filling speed of the fluid filled through the mask is the viscosity of the fluid, the pressure of the gas applied to the housing, the width of the opening formed in the housing, the speed of the housing to move the mask Determined by

In addition, a method of manufacturing an electrophoretic display device according to the present invention includes a first substrate including an image display region in which a plurality of pixels are arranged and a non display region outside the image display region; Providing a second substrate corresponding to the first substrate; Forming a thin film transistor for each pixel on the first substrate; Forming a protective layer on the first substrate on which the thin film transistor is formed; Forming a pixel electrode for each pixel on the passivation layer; Forming a partition between each pixel on the passivation layer; Disposing an accommodating part in which a discharge hole is formed in a mask and a lower portion of the first substrate on which the partition wall is formed, and accommodates the electrophoretic material therein; Advancing the housing from one side to the other side and discharging the electrophoretic material stored in the housing to a pixel between the partition walls through a discharge port and a mask; Forming a common electrode on the second substrate; And bonding the first substrate and the second substrate, wherein the viscosity of the electrophoretic material is 1-100 cps.

In the present invention, since the electrophoretic layer is directly formed on the array substrate on which the thin film transistor is formed, the protective film for protecting the adhesive layer or the adhesive layer for bonding the electrophoretic layer, compared to the conventional electrophoretic layer was formed on a separate substrate This eliminates the need to reduce manufacturing costs as well as simplifying the manufacturing process because the electrophoretic layer can be formed in-line on existing thin film transistor manufacturing lines. In addition, since the electrophoretic layer is formed directly on the array substrate, an alignment process for accurately aligning the electrophoretic layer and the array substrate is not necessary, and thus the problem of misalignment between the first substrate and the electrophoretic layer can be fundamentally solved.

In addition, in the present invention, the electrophoretic material having a low viscosity is filled by the mask and the accommodating portion to form the electrophoretic layer quickly, thereby making it possible to quickly manufacture the electrophoretic display device.

1 is a view showing a conventional electrophoretic display device.
2A-2G illustrate a method of manufacturing an electrophoretic display device according to the present invention.
3A and 3B are views showing the structure of an electrophoretic material filling apparatus according to the present invention, respectively.
4 is a view showing a method of forming a black and white electrophoretic layer of the electrophoretic display device according to the present invention.
5 is a view showing a method of forming a color electrophoretic layer of the electrophoretic display device according to the present invention.

Hereinafter, an electrophoretic display device according to the present invention will be described in detail with reference to the accompanying drawings.

In the present invention, the electrophoretic layer is formed on the first substrate on which the thin film transistor is formed. That is, in the present invention, the electrophoretic layer is formed following the thin film transistor manufacturing process. Therefore, by forming the electrophoretic layer on the second substrate in another process and then bonding the second substrate to the first substrate, the manufacturing process can be greatly simplified compared to the conventional method of completing the electrophoretic display device.

In a conventional electrophoretic display device manufacturing process of forming an electrophoretic layer on a second substrate, the electrophoretic layer is supplied from another factory or even another part supplier and transferred to a manufacturing factory where the thin film transistor is formed, There is a problem that the manufacturing process is delayed and troublesome, and the second substrate is damaged in the process of transferring the second substrate by the transfer means such as a vehicle.

2A-2G illustrate a method of manufacturing an electrophoretic display device according to the present invention. Although the electrophoretic display device is substantially composed of a plurality of unit pixels, only one pixel is shown in the drawing for convenience of description.

The terms used in this embodiment are defined. An area where pixels are arranged on the first substrate is called an image display area, and an outer portion of the image display area, that is, an area where no pixel is formed, is called an image non-display area.

First, as shown in FIG. 2A, Cr, Mo, Ta, Cu, Ti, Al, or Al alloys are formed on a first substrate 120 including an image display area and an image non-display area and made of a transparent material such as glass or plastic. After stacking the opaque metal having good conductivity by the sputtering process and etching by the photolithography process to form the gate electrode 111, the first substrate on which the gate electrode 111 is formed The gate insulating layer 122 is formed by stacking an inorganic insulating material, such as SiO 2 or SiNx, by the CVD (Chemicla Vapor Deposition) method over the entirety of the 120.

Subsequently, as illustrated in FIG. 2B, a semiconductor material such as amorphous silicon (a-Si) is deposited on the entire first substrate 120 by CVD and then etched to form a semiconductor layer 113. Although not shown in the drawing, an amorphous silicon doped with impurities or doped with impurities is doped in a part of the semiconductor layer 113, and the ohmic contact (not shown) in which a source electrode and a drain electrode, which will be formed later, Thereby forming an ohmic contact layer.

Thereafter, as shown in FIG. 2C, an opaque metal having good conductivity such as Cr, Mo, Ta, Cu, Ti, Al, or Al alloy is laminated on the first substrate 120 by sputtering and then etched to form a semiconductor. On the layer 113, strictly speaking, the source electrode 115 and the drain electrode 116 are formed on the ohmic contact layer, and then the entire first substrate 120 having the source electrode 115 and the drain electrode 116 formed thereon. A protective layer 124 is formed by stacking an organic insulating material such as BCB (Benzo Cyclo Butene) or photo acryl.

Also, although not shown in the figure, the protective layer 124 may be formed of a plurality of layers. For example, the protective layer 124 may be formed as a double layer of the inorganic insulating layer made of an inorganic insulating material such as a layer of organic insulation made of an organic insulating material such as BCB or the picture acrylic and SiO 2, or SiNx, inorganic An insulating layer, an organic insulating layer, and an inorganic insulating layer. As the organic insulating layer is formed, the surface of the protective layer 124 is formed flat and the interface characteristic with the protective layer 124 is improved by applying the inorganic insulating layer.

In addition, a contact hole 117 is formed in the protective layer 124 to expose the drain electrode 116 of the thin film transistor to the outside.

Subsequently, as illustrated in FIG. 2D, a pixel electrode 118 is formed for each pixel in the image display area on the passivation layer 124. In this case, the pixel electrode 118 is electrically connected to the drain electrode 116 of the thin film transistor through the contact hole 117.

The pixel electrode 118 may be formed by stacking a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) or a metal such as Mo and AlNd, and then etching the same by a photolithography method. In addition, the pixel electrode 118 may be formed of a plurality of metal layers. That is, it may be formed by successively stacking a plurality of metal layers, such as Cu and MoTi, and then etching by a photolithography method. The pixel electrode 118 may be formed using carbon nanotubes or water-soluble conductive polymers.

Thereafter, as shown in FIG. 2E, the partition wall 180 is formed on the protective layer 124. The partition wall 180 is formed between the pixel and the pixel in the image display area. Pixels are substantially defined by the partitions. The barrier ribs 180 are also formed on the first substrate 120 in the form of a matrix on the first substrate 120 so that the barrier ribs 180 are formed on the first substrate 120 along the boundary regions of the pixels arranged in a matrix, .

The barrier ribs 180 may be formed by laminating an insulating layer made of resin or the like and then etching them by a photolithography method using a photoresist. Alternatively, the barrier ribs 180 may be formed by laminating a photosensitive resin and etching them by a photolithography method. In addition, the partition wall 180 may be formed by printing the partition wall 180 patterned by a printing method such as a printing roll, and after manufacturing a mold having grooves corresponding to the partition wall, the insulating material of the mold is formed. It may be formed by transferring to the first substrate 120. The barrier ribs 180 may be formed in an imprint manner.

In practice, the formation of the partition wall 180 is not limited by a specific method. The above description of specific methods is for convenience of explanation and is not intended to limit the present invention. The partition 180 may be formed by various known methods.

Meanwhile, although the pixel electrode 118 is formed only on the passivation layer 124 in the drawing, the passivation layer 124 may extend to the sidewall of the partition 18, for the following reason.

First, image quality is improved by extending the pixel electrode 118 to the side wall of the barrier ribs 180. When the pixel electrode 118 is formed only on the passivation layer 124, the pixel electrode 118 at the bottom of the partition wall 180, that is, the corner region of the partition 180 and the passivation layer 124 may be formed. When 118 is not normally formed and an electric field is applied, this area becomes a dead area where an electric field is abnormally applied. Such a warp region lowers the aperture ratio of the liquid crystal display element and causes many problems such as a decrease in contrast.

However, when the pixel electrode 118 is formed to the sidewall of the partition wall 180 as in the present invention, since the pixel electrode 118 is formed to the corner region between the partition wall 180 and the protective layer 124, the dead area is formed. It does not occur, and as a result, the aperture ratio is improved, the contrast is improved, and the response speed is improved.

Second, as the pixel electrode 118 is formed on the sidewall of the partition wall 180, the process is easy. As will be mentioned later in the process, the electrophoretic material is filled in the upper region of the first substrate 120 defined by the partition wall 180 and the protective layer 124. When the pixel electrode 118 is formed only on the passivation layer 124 and the pixel electrode is not formed on the sidewall of the barrier 180, the pixel electrode 118 formed on the passivation layer 124 when the electrophoretic material is filled. Since the surface characteristics of and the surface characteristics of the partition 180 is different, the electrophoretic material is not well applied to the surface of the partition 180 when filling the electrophoretic material is not easy to inject the electrophoretic material. In order to prevent this, the surface of the barrier rib can be plasma-treated or chemically treated to improve the surface characteristics, but in this case, the process becomes complicated and the cost increases.

However, when the pixel electrode 118 extends not only on the protective layer 124 but also to the sidewall of the barrier 180 as in the present invention, the side surface of the barrier 180, that is, the pixel electrode 118 is formed without any surface treatment. Since the electrophoretic material is easily applied to the sidewalls, the electrophoretic material can be smoothly filled into the partition wall 180.

The pixel electrode 118 is not formed on the partition wall 180. When the pixel electrode 118 is formed on the partition wall 180, the pixel electrodes 118 formed in the pixels adjacent to each other are electrically connected to each other, so that the pixel electrodes 118 are electrically shorted between the adjacent pixels. When forming the 118, it is preferable to remove the pixel electrode 118 on the partition 180.

Thereafter, as shown in FIG. 2F, the electrophoretic material is filled in the pixels between the partition walls 180 to form the electrophoretic layer 160.

The electrophoretic material is composed of particles having positive and negative charge characteristics. The particles may be white particles 164 and black particles 165 or may be color particles such as cyan, magenta and yellow or red (R), green (G), and blue (Blue). ≪ / RTI >

In the case of white particles 164, particles having good reflectance such as TiO 2 are used. In the case of black particles 165, particles having black characteristics such as carbon black are used. At this time, the white particles 164 may have a negative charge characteristic, the black particles 165 may have a positive charge characteristic, the white particles 164 may have a positive charge characteristic, and the black particles 165 may have positive and negative charge characteristics.

Also, in the case of color particles, coloring matter having charge characteristics, color particles may have a negative charge or a negative charge.

The electrophoretic material may include a dispersion medium such as a liquid polymer. This dispersion medium is a black particle, a white particle, or a colored particle, and may be a liquid such as a liquid polymer or air itself. As described above, when the dispersion medium is the air itself, it means that the particles move in the air as the voltage is applied without the dispersion medium.

When a liquid polymer is used as the dispersion medium, a black dispersion medium or a color dispersion medium may be used as the dispersion medium. In the case of using the black dispersion medium, since the light incident from the outside is absorbed, a clear black is displayed in the black implementation, and the contrast can be improved. In addition, the color dispersion medium is used when the electrophoretic material realizes color, and each color pixel includes a dispersion medium of a corresponding color, so that it becomes possible to express a clearer color in a color implementation.

In addition, the electrophoretic material may be a material in which capsules filled with a polymer binder are filled with an electronic ink. At this time, the electronic ink distributed in the capsule is composed of white particles (or white ink) and black particles (or black ink). At this time, the white particles and the black particles have positive and negative charge characteristics, respectively.

On the other hand, white particles, black particles, and color particles may not be used for only specific materials, but all known particles may be used.

Filling of the electrophoretic material into the partition wall 180 is made by an electrophoretic material filling apparatus, the electrophoretic material filling apparatus and the method of filling the electrophoretic material using the same will be described.

3a and 3b is a view showing the structure of an electrophoretic material filling apparatus according to the present invention.

As shown in FIG. 3A, the electrophoretic material filling apparatus according to the present invention includes a mask 220 and an accommodating part 230 disposed above the mask 220 to accommodate the electrophoretic material therein.

The mask 220 includes a main body 222 and a plurality of openings 224 formed in the main body 222, and the accommodating part 230 has a bottom portion 232 and a predetermined portion from the bottom portion 232. The wall surface 234 extending in height and accommodating the electrophoretic material therein, and the outlet 236 for discharging the electrophoretic material formed and formed in the bottom portion 232. The mask 220 may be made of a metal having the opening 224 formed in the set area, or may be formed in a mesh form.

The accommodating part 230 is a gas supply pipe 242 for supplying gas, a flow meter 244 installed in the gas supply pipe 242 to adjust the flow rate of the gas supplied to the accommodating part 230 through the gas supply pipe 242. ), A gas supply unit 240 for supplying gas to the accommodating part 230 through the gas supply pipe 242 is installed.

The gas supplied to the accommodating part 230 applies pressure to the electrophoretic material filled in the accommodating part 230 so that the electrophoretic material is discharged through the outlet 236 of the accommodating part 230. At this time, the gas to be supplied may be used in various ways, for the chemical stability of the electrophoretic material, an inert gas such as nitrogen will be preferable.

As shown in FIG. 3B, the outlet 236 may be formed in a rectangular shape, but may be formed in various shapes such as square, elliptical, and circular. In addition, the width (a) and the length (b) of the outlet 236 is the viscosity of the electrophoretic material actually discharged, the moving speed of the receiving portion 230 on the mask 220, of the gas applied to the electrophoretic material Pressure and the like.

In the electrophoretic material filling apparatus having the above configuration, the electrophoretic material is accommodated in the accommodating part 230, and the electrophoretic material is accommodated in the accommodating part 230 while the accommodating part 230 moves on the mask 220. The electrophoretic material is discharged through the outlet 236 and the discharged electrophoretic material is discharged downward through the opening 224 of the mask 220 to apply the electrophoretic material. In this case, as the electrophoretic material is supplied from the gas supply unit 240, the pressure is increased and discharged through the outlet 236.

In the electrophoretic material filling apparatus of the present invention, the accommodating portion 230 not only serves as a storage space for receiving the electrophoretic material but also serves as a squeeze for discharging the electrophoretic material through the opening 224 of the mask 220. Execute at the same time.

Typically, the electrophoretic material may be filled using a mask and a squeeze, but the filling device using the conventional mask and squeeze and the filling device according to the present invention have the following differences.

In the conventional filling apparatus, after placing the squeeze on the mask, the material is discharged through the mask while moving the squeeze. However, the conventional filling device using a mask and squeeze is mainly suitable for discharging a high viscosity material. That is, the mask is disposed at a predetermined distance from the filling object, for example, the substrate, and a filling material is applied thereon. When pressure is applied to the mask by squeeze, the mask contacts the surface of the electrophoretic display element, and the filling material collects in this area (i.e., the area where pressure is applied by the squeeze) and then is applied to the substrate through the opening of the mask. It is filled.

In the case of using a highly viscous material in this method, since only a part of the material applied to the surface of the mask is collected due to the viscosity of the material into the region where the pressure by the squeeze is applied, the emission of the material can be properly controlled. In the case of using the material, a large amount of the material is gathered at the same time by the pressure applied by the squeeze, making it impossible to control the amount of the material discharged. Therefore, when such a device is applied to the electrophoretic material filling method of the electrophoretic display device of the present invention, the electrophoretic material cannot be filled in the pixel between the partition wall and the partition wall, thereby causing a defect in the electrophoretic display device. Done.

However, in the present invention, instead of pushing the electrophoretic material into the opening 224 formed in the mask 220 by the squeeze, the electrophoretic material discharged through the outlet 236 of the accommodating part 230 by the gas pressure again. Since it is discharged through the opening 224 of the mask 220, by controlling the size of the outlet 236, even when using a low-viscosity electrophoretic material can be precisely controlled to discharge the discharge through the mask 220 Will be.

In general, the mask and squeeze method of discharge can control the amount of emissions emitted when the high viscosity material of about 30,000-200,000cp, while the electrophoretic material used in the present invention is a low viscosity material of about 1-100cp Therefore, the exact amount of filling is impossible by the conventional method using a mask and squeeze, but in the present invention, such a low-viscosity electrophoretic material can accurately control the emission amount.

4 and 5 are diagrams showing the actual filling of the electrophoretic material in the pixel between the partition walls using the filling device shown in FIG. At this time, Figure 4 is a view showing the filling black and white electrophoretic material and Figure 5 is a view showing the filling color electrophoretic material.

As shown in FIG. 4, after the filling device including the mask 220 and the accommodating part 230 is positioned on the substrate 120 on which the partition wall 180 is formed, the accommodating part 230 is moved from one side to the other side. Proceeding to fill the electrophoretic material to all the pixels between the partition wall 180. In this case, the electrophoretic material has a viscosity of 1-100cp, and the black and white particles are included in a ratio of about 15-30% in the dispersion medium.

In this case, the filling speed of the electrophoretic material filled through the mask 220 is the viscosity of the electrophoretic material, the flow rate of the gas (or gas pressure) applied to the housing 230, the moving speed of the housing 230, The area of the outlet 236 of the housing 230, the area of the opening of the mask 220, and the like may vary.

In addition, although the accommodating part 230 proceeds while the mask 220 and the accommodating part 230 are in contact with the substrate 120 in the drawing, the mask 220 and the accommodating part 230 are the substrate 120. It may be possible to fill the electrophoretic material by proceeding at a distance from the set distance.

In the electrophoretic material filling method shown in FIG. 5, the pixel is composed of R, G, and B pixels, and each of R, G, and B pixels is filled with R, G, and B color electrophoretic materials. At this time, Figure 5 is representatively shown to fill the R color electrophoretic material.

As shown in FIG. 5, after the filling device including the mask 220 and the accommodating part 230 containing the electrophoretic material of the R color is placed on the substrate 120 on which the partition wall 180 is formed, the number is The payment part 230 proceeds from one side to the other side to fill the electrophoretic material in all the pixels between the partition walls 180. In this case, the electrophoretic material has a viscosity of 1-100cp, and includes about 15-30% of color particles, black particles, and white particles in the dispersion medium. In addition, since the opening is formed only in the region corresponding to the R pixel of the electrophoretic display device, the R color electrophoretic material is filled only in the R pixel when the housing 230 is moved from one side to the other side. .

Although not shown in the drawing, after removing the filling device consisting of the accommodating part 230 containing the mask 220 and the R color electrophoretic material, the accommodating part accommodating the mask 220 and the G color electrophoretic material. Filling the G-color electrophoretic material into the G pixel using the filling device consisting of 230, and to the B pixel using the filling device consisting of a receiving unit 230 containing the mask 220 and the B-color electrophoretic material. By filling the B-color electrophoretic material, the electrophoretic material is filled in the entire electrophoretic display device.

After filling the electrophoretic material in the pixel between the partition wall 180 as described above, as shown in Figure 2h, by applying a sealing material on the electrophoretic layer 160 as described above to form a sealing layer 168 After sealing the electrophoretic layer 160, the first substrate 120 is bonded to the second substrate 140 to complete the electrophoretic display device.

The sealing layer 168 prevents the electrophoretic layer 160 made of a low viscosity dye from flowing into the pixels adjacent to the outside or the adjacent pixels. In addition, the sealing layer 168 prevents moisture from penetrating into the electrophoretic layer 160 to prevent the electrophoretic layer 160 from being defective.

The sealing layer 168 may be formed on both an upper surface of the electrophoretic layer 160 and an upper end of the sealing layer 168. However, in this case, some of the charged electrophoretic particles may be electrically stuck to the sealing layer 168, causing errors in the initial arrangement of the electrophoretic particles, so that the sealing layer 168 may be electrophoretic layer 160. It may not be formed over the entire upper surface of the partition wall 160 may be formed only on the top.

On the other hand, in order to solve the problem that the electrophoretic particles are electrically stuck to the sealing layer 168, after the electrophoretic layer is filled in each subpixel, an interlayer insulating layer 169 is further formed on the electrophoretic layer to thereby form the electrophoretic particles. Direct contact with the sealing layer can be prevented. In this case, the electrophoretic particles do not stick to the sealing layer, thereby reducing the occurrence of defective pixels.

The interlayer insulating layer 169 may be a photosensitive organic material such as a partition wall, and in particular, may be methyl ethylene ketone. The interlayer insulating layer 169 is formed by coating a thickness of several nanometers on top of the electrophoretic layer and the partition wall. The interlayer insulating layer 169 temporarily seals the electrophoretic layer temporarily to facilitate the formation of a sealing layer, and solves the problem of electrophoretic particles sticking to the sealing layer.

Although the first substrate 120 and the second substrate 140 are bonded together by the sealing layer 168 in order to improve the bonding strength between the first substrate 120 and the second substrate 140, May be formed. The adhesive layer may be formed only on the outer region of the electrophoretic display device, that is, on the sealing layer 168 above the barrier ribs 180, or on the entire sealing layer 168 above the electrophoretic layer 160.

The common electrode 142 is formed on the second substrate 140 made of a transparent material such as glass or plastic. The common electrode 142 is formed by stacking a transparent conductive material such as ITO or IZO.

Although not shown in the drawings, a color filter layer may be formed on the second substrate 140. This color filter layer is composed of R (Red), G (Green), B (Blue) color filter, and the color is realized when the electrophoretic material is composed of black particles and white particles.

The structure of the electrophoretic display device manufactured by the above method will be described in detail with reference to FIG. 2H.

As shown in FIG. 2H, in the electrophoretic display device according to the present invention, the barrier rib 180 is directly formed on the first substrate 120 and the electrophoretic layer 160 is also the barrier rib of the first substrate 120. Filled between 180, the electrophoretic layer 160 is directly formed on the pixel electrode 118 to directly contact the pixel electrode 118. Therefore, unlike the conventional electrophoretic display device, a separate adhesive layer for attaching the electrophoretic layer 160 between the electrophoretic layer 160, the pixel electrode 118, and the protective layer 124 is not required.

The driving of the electrophoretic display device having such a structure will be described below. When the electrophoretic material is composed of the white particles 164 and the black particles 165, since the white particles 164 have a positive charge or negative charge characteristics, a thin film transistor formed on the first substrate 120 by receiving a signal from the outside When a signal is applied to the pixel electrode 118 through the pixel electrode 118, the white particles 164 and the electrophoretic layer 160 are moved by an electric field generated between the pixel electrode 118 and the common electrode 142.

For example, when the white particles 164 have positive (+) electric charges, when a positive voltage is applied to the pixel electrode 118, the common electrode 142 of the second substrate 140 has a relatively negative potential The white particles 164 having positive charge move toward the second substrate 140. Therefore, when light is input from the outside, that is, from the upper portion of the second substrate 140, the inputted light is mostly reflected by the white particles 164, so that white is realized in the electrophoretic display element.

Since the density of the white particles 164 moving toward the second substrate 140 or the interval between the white particles 164 and the second substrate 140 varies depending on the intensity of the voltage applied to the pixel electrode 118, The intensity of the light reflected by the white particles 164 is also changed, so that a desired luminance can be realized.

On the other hand, when a negative voltage is applied to the pixel electrode 118, the common electrode 142 of the second substrate 140 has a (+) potential, and the white particles 164 having (+ When the light is moved from the first substrate 120 to the first substrate 120, the input light is substantially not reflected, thereby realizing black.

On the other hand, in the case where the white particles 164 have a negative charge, when the positive voltage is applied to the pixel electrode 118, the common electrode 142 of the second substrate 140 has a relatively negative potential So that the white particles 164 having a negative charge move toward the first substrate 120. Therefore, when light is input from the outside, that is, from the upper part of the second substrate 140, most of the input light is not reflected, so that black is implemented in the electrophoretic display device.

On the contrary, when a negative voltage is applied to the pixel electrode 118, the common electrode 142 of the second substrate 140 has a (+) potential, and white particles 164 having a negative charge When the light is moved from the second substrate 140 to the second substrate 140, the input light is reflected by the white particles 164, thereby realizing white.

When the electrophoretic material is composed of color particles, R, G, and B color particles or color particles such as cyan, magenta, and yellow are formed in accordance with a signal applied to the pixel electrode 118, The substrate 140 can be moved to implement a color mixed with the corresponding color or other pixels.

When the electrophoretic material is composed of a polymer filled with white particles and a capsule filled with black particles, since the white particles and the black particles included in the electron ink distributed in the capsule have positive and negative charge characteristics, signals from outside When a signal is applied to the pixel electrode 118, the white particles and the black particles are separated in the capsule by an electric field generated between the pixel electrode 118 and the common electrode 142. For example, when a negative (-) voltage is applied to the pixel electrode 118, the common electrode 142 of the second substrate 140 has a (+) potential, so that white particles The black particles moving toward the first substrate 120 and the (-) charged charges move toward the second substrate 140. In this state, when light is input from the outside, that is, from the upper portion of the second substrate 140, since the inputted light is reflected by the black particles, black is realized in the electrophoretic display element.

On the contrary, when a positive voltage is applied to the pixel electrode 118, the common electrode 142 of the second substrate 140 has a negative potential, so that white particles having a positive charge are formed on the second substrate. Moving to 140, the black particles having a negative charge is moved to the first substrate 140.

In this state, when light is input from the outside, that is, from the upper part of the second substrate 140, since the input light is reflected by the white particles, white is realized.

At this time, when the white particles and the black particles in the capsule have negative charge and positive charge characteristics, white and black can be realized by the opposite operation.

As described above, in the present invention, since the electrophoretic layer is directly formed on the first substrate, the electrophoretic layer is formed on the second substrate to protect the adhesive layer or the adhesive layer for attaching the electrophoretic layer to the second substrate. There is no need for a protective film. In addition, in the present invention, since the electrophoretic layer can be formed in a process line such as an existing thin film transistor forming process line, for example, an insulation layer, etc., a separate process line is not required, thereby further reducing manufacturing costs. do.

In addition, compared with the prior art in which an electrophoresis layer is manufactured by a separate factory or a manufacturer, and the electrophoresis layer is transported and attached to the second substrate and the second substrate is bonded to the first substrate again, It is possible to simplify the manufacturing process since the process such as adhesion of layers is not required.

In addition, in the present invention, a low viscosity electrophoretic material is quickly filled in the pixels between the partition walls by the mask and the receiving portion, so that the manufacturing process can be speeded up.

In the above description, the structure of the electrophoretic display device is limited to a specific structure, but the electrophoretic display device of the present invention is not limited to the specific structure. In particular, various electrophoretic layers currently used as electrophoretic layers may be applied. That is, it may be applied to the electrophoretic layer of any structure that can be formed on the first substrate.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments.

Therefore, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concept of the present invention defined in the following claims are also within the scope of the present invention.

120, 140: substrate 111: gate electrode
113: semiconductor layer 115: source electrode
116: drain electrode 118: pixel electrode
124: protective layer 142: common electrode
160: electrophoretic layer 220: mask
224: opening 230: housing
236: outlet

Claims (18)

Mask; And
A fluid filling apparatus comprising an accommodating portion disposed above the mask and having a discharge hole formed at a lower portion thereof, and accommodating a fluid therein, and discharging the stored fluid to the mask through the discharge hole as the fluid flows from one side of the mask to the other side. The fluid filling apparatus according to claim 1, wherein the fluid has a viscosity of 1-100 cps. The method of claim 1,
Gas supply unit;
A gas supply pipe configured to supply a gas to the storage part by supplying gas to the storage part; And
And a flow meter installed in the gas supply pipe to adjust a flow rate of the gas supplied to the receiving unit. The method of claim 1, wherein the filling speed of the fluid filled through the mask is determined by the viscosity of the fluid, the pressure of the gas applied to the housing, the width of the opening formed in the housing, the speed of the housing to move the mask Fluid filling apparatus, characterized in that. The fluid filling apparatus according to claim 1, wherein the mask is made of a metal having a plurality of openings. The fluid filling apparatus of claim 1, wherein the mask is a mesh. A first substrate including a display region in which a plurality of pixels are arranged and a non display region outside the image display region, and a second substrate corresponding to the first substrate are provided. step;
Forming a thin film transistor for each pixel on the first substrate;
Forming a protective layer on the first substrate on which the thin film transistor is formed;
Forming a pixel electrode for each pixel on the passivation layer;
Forming a partition between each pixel on the passivation layer;
Disposing an accommodating part in which a discharge hole is formed in a mask and a lower portion of the first substrate on which the partition wall is formed, and accommodates electrophoretic material therein;
Advancing the housing from one side to the other side and discharging the electrophoretic material stored in the housing to a pixel between the partition walls through a discharge port and a mask;
Forming a common electrode on the second substrate; And
Bonding the first substrate and the second substrate to each other;
The viscosity of the electrophoretic material is an electrophoretic display device manufacturing method characterized in that 1-100cp. The method of claim 7, further comprising forming a sealing layer for sealing the electrophoretic layer. The method of claim 8, wherein the sealing layer is formed over the entire image display area. The method of claim 8, wherein the sealing layer is formed at an upper end of the partition wall. The method of claim 7, wherein the bonding of the first substrate to the second substrate comprises forming an adhesive layer on at least one of the first substrate and the second substrate. The method of claim 7, wherein the electrophoretic material comprises charged white particles and black particles. The method of claim 7, wherein the electrophoretic material comprises charged color particles. The method of claim 12, wherein the electrophoretic material further comprises a dispersion medium. The method of claim 7, wherein forming the partition wall,
Forming an insulating layer on the protective layer on which the first pixel electrode is formed; And
And removing a portion of the insulating layer by one of a photolithography process, a mold process, and an imprint process. The method of claim 7, wherein the step of discharging the electrophoretic material,
Supplying gas to the housing; And
And controlling the flow rate of the gas supplied to the receiving portion by the flowmeter. 8. The method of claim 7, wherein the filling speed of the electrophoretic material filled in the pixel between the partition wall is the viscosity of the electrophoretic material, the pressure of the gas applied to the housing, the width of the opening formed in the housing, the housing for moving the mask Electrophoretic display device manufacturing method characterized in that it is determined by the speed of. The method of claim 7, wherein the forming of the thin film transistor,
Forming a gate electrode on the first substrate;
Forming a semiconductor layer on the gate electrode;
Forming a source electrode and a drain electrode on the semiconductor layer.


KR1020110071685A 2011-07-19 2011-07-19 Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof KR20130010806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020110071685A KR20130010806A (en) 2011-07-19 2011-07-19 Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110071685A KR20130010806A (en) 2011-07-19 2011-07-19 Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof

Publications (1)

Publication Number Publication Date
KR20130010806A true KR20130010806A (en) 2013-01-29

Family

ID=47839947

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110071685A KR20130010806A (en) 2011-07-19 2011-07-19 Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof

Country Status (1)

Country Link
KR (1) KR20130010806A (en)

Similar Documents

Publication Publication Date Title
KR101687720B1 (en) Electrophoretic display device and method of fabrication thereof
US8861069B2 (en) Electrophoretic display device and method of fabrication thereof
US8681415B2 (en) Electrophoretic display device and fabrication method thereof
US20110090143A1 (en) Electrophoretic display device and fabrication method thereof
KR20120022253A (en) Electrophoretic display deivce and method of fabrication thereof
KR101338999B1 (en) Electrophoretic display device and method of fabricating thereof
KR101748699B1 (en) Electrophoretic display device and method of fabricating thereof
KR101738452B1 (en) Electrophoretic display deivce and method of fabrication thereof
KR101742124B1 (en) Electrophoretic display deivce and method of fabrication thereof
KR101857292B1 (en) Electrophoretic display device and method of fabricating thereof
KR20130010806A (en) Apparatus for containing electrophoretic material and method of fabricaing electrophoretic display device using thereof
KR102047231B1 (en) Electrophoretic display device and method of fabricating thereof
KR101742125B1 (en) Method of fabrication electrophoretic display deivce
KR101364632B1 (en) Electrophoretic display deivce and method of fabrication thereof
KR101352907B1 (en) Electrophoretic display deivce and method of fabrication thereof
KR101730903B1 (en) Electrophoretic display device
KR101748702B1 (en) Composite of partition, electrophoretic display deivce and method of fabrication thereof
KR20120064534A (en) Electrophoretic display device and method of fabricating thereof
KR101730904B1 (en) Electrophoretic display deivce and method of fabrication thereof
KR20120064537A (en) Method of fabrication electrophoretic display device
KR20140074779A (en) Electrophoretic display device and method of fabricating thereof
KR20120064533A (en) Electrophoretic display device and method of fabrication thereof
KR20130010805A (en) Electrophoretic display device and method of fabricating thereof
KR20120042179A (en) Seleant, electrophoretic display deivce and method of fabrication thereof
KR20120064535A (en) Electrophoretic display device and method of fabrication thereof

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination