KR20120139544A - 리페어 장치 및 리페어 방법, 디바이스의 제조 방법 - Google Patents
리페어 장치 및 리페어 방법, 디바이스의 제조 방법 Download PDFInfo
- Publication number
- KR20120139544A KR20120139544A KR1020120057434A KR20120057434A KR20120139544A KR 20120139544 A KR20120139544 A KR 20120139544A KR 1020120057434 A KR1020120057434 A KR 1020120057434A KR 20120057434 A KR20120057434 A KR 20120057434A KR 20120139544 A KR20120139544 A KR 20120139544A
- Authority
- KR
- South Korea
- Prior art keywords
- voltage
- repair
- determination
- current
- devices
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76868—Forming or treating discontinuous thin films, e.g. repair, enhancement or reinforcement of discontinuous thin films
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/12—Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing
- G01R31/1227—Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing of components, parts or materials
- G01R31/1263—Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing of components, parts or materials of solid or fluid materials, e.g. insulation films, bulk material; of semiconductors or LV electronic components or parts; of cable, line or wire insulation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2011-135794 | 2011-06-17 | ||
JPJP-P-2011-135796 | 2011-06-17 | ||
JP2011135794A JP5351214B2 (ja) | 2011-06-17 | 2011-06-17 | リペア装置およびリペア方法、デバイスの製造方法 |
JP2011135796A JP5496952B2 (ja) | 2011-06-17 | 2011-06-17 | リペア装置およびリペア方法、デバイスの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20120139544A true KR20120139544A (ko) | 2012-12-27 |
Family
ID=47335226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020120057434A KR20120139544A (ko) | 2011-06-17 | 2012-05-30 | 리페어 장치 및 리페어 방법, 디바이스의 제조 방법 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20120139544A (zh) |
CN (1) | CN102832155A (zh) |
TW (1) | TW201304035A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160089993A (ko) * | 2015-01-21 | 2016-07-29 | 엘지디스플레이 주식회사 | 유기전계 발광표시장치 및 이의 구동 방법 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103646878B (zh) * | 2013-12-25 | 2017-01-25 | 鲁东大学 | 一种利用电场清除薄膜电致发光器件发光层中缺陷的方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62145170U (zh) * | 1986-03-07 | 1987-09-12 | ||
JPS6341081A (ja) * | 1986-08-07 | 1988-02-22 | Fuji Electric Co Ltd | 薄膜半導体装置の製造方法 |
JPH05249180A (ja) * | 1992-03-06 | 1993-09-28 | Nec Corp | 静電破壊試験装置 |
-
2012
- 2012-05-09 TW TW101116558A patent/TW201304035A/zh unknown
- 2012-05-30 KR KR1020120057434A patent/KR20120139544A/ko not_active Application Discontinuation
- 2012-06-18 CN CN2012102059462A patent/CN102832155A/zh active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160089993A (ko) * | 2015-01-21 | 2016-07-29 | 엘지디스플레이 주식회사 | 유기전계 발광표시장치 및 이의 구동 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN102832155A (zh) | 2012-12-19 |
TW201304035A (zh) | 2013-01-16 |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |