KR20120037496A - 이오노머를 함유하는 폴리아미드 조성물 - Google Patents

이오노머를 함유하는 폴리아미드 조성물 Download PDF

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Publication number
KR20120037496A
KR20120037496A KR1020127004473A KR20127004473A KR20120037496A KR 20120037496 A KR20120037496 A KR 20120037496A KR 1020127004473 A KR1020127004473 A KR 1020127004473A KR 20127004473 A KR20127004473 A KR 20127004473A KR 20120037496 A KR20120037496 A KR 20120037496A
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KR
South Korea
Prior art keywords
composition
acid
nylon
copolymer
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020127004473A
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English (en)
Korean (ko)
Inventor
리차드 티. 초우
허버트 버논 벤들러
Original Assignee
이 아이 듀폰 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 이 아이 듀폰 디 네모아 앤드 캄파니 filed Critical 이 아이 듀폰 디 네모아 앤드 캄파니
Publication of KR20120037496A publication Critical patent/KR20120037496A/ko
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/04—Homopolymers or copolymers of ethene
    • C08L23/08—Copolymers of ethene
    • C08L23/0846—Copolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen
    • C08L23/0869—Copolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen with unsaturated acids, e.g. [meth]acrylic acid; with unsaturated esters, e.g. [meth]acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/04—Homopolymers or copolymers of ethene
    • C08L23/08—Copolymers of ethene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/04—Homopolymers or copolymers of ethene
    • C08L23/08—Copolymers of ethene
    • C08L23/0846—Copolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen
    • C08L23/0869—Copolymers of ethene with unsaturated hydrocarbons containing atoms other than carbon or hydrogen with unsaturated acids, e.g. [meth]acrylic acid; with unsaturated esters, e.g. [meth]acrylic acid esters
    • C08L23/0876—Salts thereof, i.e. ionomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/02—Polyamides derived from omega-amino carboxylic acids or from lactams thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/06—Polyamides derived from polyamines and polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/43—Compounds containing sulfur bound to nitrogen
    • C08K5/435—Sulfonamides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352—Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1362—Textile, fabric, cloth, or pile containing [e.g., web, net, woven, knitted, mesh, nonwoven, matted, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
KR1020127004473A 2009-07-22 2010-07-22 이오노머를 함유하는 폴리아미드 조성물 Withdrawn KR20120037496A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/507,758 2009-07-22
US12/507,758 US20110020573A1 (en) 2009-07-22 2009-07-22 Polyamide composition containing ionomer

Publications (1)

Publication Number Publication Date
KR20120037496A true KR20120037496A (ko) 2012-04-19

Family

ID=42562486

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127004473A Withdrawn KR20120037496A (ko) 2009-07-22 2010-07-22 이오노머를 함유하는 폴리아미드 조성물

Country Status (7)

Country Link
US (1) US20110020573A1 (enExample)
EP (1) EP2456821A1 (enExample)
JP (1) JP2013500356A (enExample)
KR (1) KR20120037496A (enExample)
CN (1) CN102471573B (enExample)
IN (1) IN2012DN00479A (enExample)
WO (1) WO2011011577A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11142628B2 (en) 2014-02-24 2021-10-12 E I Du Pont De Nemours And Company Plasticizers polyamide compositions

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US8586663B2 (en) * 2011-02-08 2013-11-19 E I Du Pont De Nemours And Company Polymer composition comprising polyamide and ionomer
WO2012174204A2 (en) 2011-06-17 2012-12-20 Fiberweb, Inc. Vapor permeable, substantially water impermeable multilayer article
EP2723568B1 (en) 2011-06-23 2017-09-27 Fiberweb, LLC Vapor permeable, substantially water impermeable multilayer article
US10369769B2 (en) 2011-06-23 2019-08-06 Fiberweb, Inc. Vapor-permeable, substantially water-impermeable multilayer article
US9765459B2 (en) 2011-06-24 2017-09-19 Fiberweb, Llc Vapor-permeable, substantially water-impermeable multilayer article
FI123464B (fi) * 2011-06-30 2013-05-31 Ionphase Oy Halogeeniton polymeeriseos
US20130171394A1 (en) 2011-12-30 2013-07-04 E. I. Du Pont De Nemours And Company Polyamide Composition Containing Ionomer
US8906479B2 (en) 2011-12-30 2014-12-09 E I Du Pont De Nemours And Company Compositions of polyamide and ionomer
EP2911877B1 (en) * 2012-10-25 2017-06-07 E. I. du Pont de Nemours and Company Printable protective layer
BR112015022110A2 (pt) * 2013-03-13 2017-07-18 Basf Se composição de poliamida, revestimento interno, e, método para formação de um revestimento interno
WO2015168068A1 (en) 2014-04-29 2015-11-05 E. I. Du Pont De Nemours And Company Photovoltaic cells with improved multilayer backsheet
WO2015168073A1 (en) 2014-04-29 2015-11-05 E. I. Du Pont De Nemours And Company Solar cell modules with improved backsheet
WO2015168075A1 (en) 2014-04-29 2015-11-05 E. I. Du Pont De Nemours And Company Photovoltaic cells with improved backsheet
JP6706495B2 (ja) * 2015-12-21 2020-06-10 住友電気工業株式会社 接着剤組成物及び多層熱回復物品
EP3830187B1 (en) 2018-07-31 2022-11-02 Dow Global Technologies LLC Ionomers of ethylene acid copolymers with enhanced creep resistance
JP7766488B2 (ja) * 2018-07-31 2025-11-10 ダウ グローバル テクノロジーズ エルエルシー 耐クリープ性が向上したエチレン酸コポリマーのアイオノマー
CN112888731A (zh) 2018-09-28 2021-06-01 性能材料北美股份有限公司 聚酰胺泡沫的制备
CN110760184A (zh) * 2019-09-27 2020-02-07 金旸(厦门)新材料科技有限公司 一种改善涂料附着效果的聚酰胺材料及其制备方法和应用
CN112143218B (zh) * 2020-09-03 2022-07-01 金旸(厦门)新材料科技有限公司 一种高热变形温度增强增韧ppa材料
CN114656778B (zh) * 2020-12-24 2025-03-21 金发科技股份有限公司 一种透明尼龙/沙林合金材料及其制备方法和应用
CN119173583A (zh) * 2022-05-13 2024-12-20 Ube株式会社 单层中空成型体用聚酰胺树脂组合物

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US5652326A (en) * 1993-03-03 1997-07-29 Sanyo Chemical Industries, Ltd. Polyetheresteramide and antistatic resin composition
US5648423A (en) * 1993-08-05 1997-07-15 Mitsui Petrochemical Industries, Ltd. Polyamide resin composition
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Publication number Priority date Publication date Assignee Title
US11142628B2 (en) 2014-02-24 2021-10-12 E I Du Pont De Nemours And Company Plasticizers polyamide compositions

Also Published As

Publication number Publication date
JP2013500356A (ja) 2013-01-07
CN102471573B (zh) 2014-10-15
IN2012DN00479A (enExample) 2015-06-05
US20110020573A1 (en) 2011-01-27
EP2456821A1 (en) 2012-05-30
CN102471573A (zh) 2012-05-23
WO2011011577A1 (en) 2011-01-27

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Date Code Title Description
PA0105 International application

Patent event date: 20120221

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid