KR20110043529A - 다이아몬드 물질 - Google Patents
다이아몬드 물질 Download PDFInfo
- Publication number
- KR20110043529A KR20110043529A KR1020107027391A KR20107027391A KR20110043529A KR 20110043529 A KR20110043529 A KR 20110043529A KR 1020107027391 A KR1020107027391 A KR 1020107027391A KR 20107027391 A KR20107027391 A KR 20107027391A KR 20110043529 A KR20110043529 A KR 20110043529A
- Authority
- KR
- South Korea
- Prior art keywords
- diamond
- less
- concentration
- layer
- ppb
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 381
- 229910003460 diamond Inorganic materials 0.000 title claims description 374
- 239000000463 material Substances 0.000 title claims description 231
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 202
- 238000000034 method Methods 0.000 claims abstract description 202
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 104
- 239000013078 crystal Substances 0.000 claims abstract description 77
- 239000007787 solid Substances 0.000 claims abstract description 74
- 239000000126 substance Substances 0.000 claims abstract description 40
- 230000007547 defect Effects 0.000 claims description 214
- 239000007789 gas Substances 0.000 claims description 139
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 109
- 229910052799 carbon Inorganic materials 0.000 claims description 107
- 239000000758 substrate Substances 0.000 claims description 102
- 238000005530 etching Methods 0.000 claims description 64
- 239000012535 impurity Substances 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 34
- 229910052739 hydrogen Inorganic materials 0.000 claims description 33
- 239000001257 hydrogen Substances 0.000 claims description 32
- 230000005291 magnetic effect Effects 0.000 claims description 32
- 229910052760 oxygen Inorganic materials 0.000 claims description 30
- 239000001301 oxygen Substances 0.000 claims description 29
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 28
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 28
- 238000012545 processing Methods 0.000 claims description 20
- 230000007704 transition Effects 0.000 claims description 18
- 238000000137 annealing Methods 0.000 claims description 15
- 238000005468 ion implantation Methods 0.000 claims description 15
- 230000003746 surface roughness Effects 0.000 claims description 15
- 150000001722 carbon compounds Chemical class 0.000 claims description 12
- 238000002513 implantation Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 230000005298 paramagnetic effect Effects 0.000 claims description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 7
- 238000005498 polishing Methods 0.000 claims description 6
- 238000010572 single replacement reaction Methods 0.000 claims description 6
- 230000003213 activating effect Effects 0.000 claims description 5
- 238000001069 Raman spectroscopy Methods 0.000 claims description 4
- 230000007935 neutral effect Effects 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 166
- 238000005229 chemical vapour deposition Methods 0.000 description 66
- 238000005259 measurement Methods 0.000 description 46
- 230000008569 process Effects 0.000 description 40
- 230000003287 optical effect Effects 0.000 description 30
- 230000015572 biosynthetic process Effects 0.000 description 23
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 23
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 18
- 238000001994 activation Methods 0.000 description 17
- 230000004913 activation Effects 0.000 description 16
- 238000000151 deposition Methods 0.000 description 15
- 150000002500 ions Chemical class 0.000 description 15
- 238000005424 photoluminescence Methods 0.000 description 15
- 238000004435 EPR spectroscopy Methods 0.000 description 14
- 239000002096 quantum dot Substances 0.000 description 14
- 230000008021 deposition Effects 0.000 description 13
- 238000001020 plasma etching Methods 0.000 description 12
- 230000003595 spectral effect Effects 0.000 description 12
- 229910052786 argon Inorganic materials 0.000 description 11
- 241000894007 species Species 0.000 description 11
- 238000011065 in-situ storage Methods 0.000 description 10
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 9
- 230000005284 excitation Effects 0.000 description 9
- 239000011261 inert gas Substances 0.000 description 9
- 230000003993 interaction Effects 0.000 description 9
- 230000000155 isotopic effect Effects 0.000 description 9
- 229910052750 molybdenum Inorganic materials 0.000 description 9
- 239000011733 molybdenum Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
- 238000012512 characterization method Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 230000005283 ground state Effects 0.000 description 7
- 238000010348 incorporation Methods 0.000 description 7
- 238000003754 machining Methods 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 5
- 238000001218 confocal laser scanning microscopy Methods 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 238000009616 inductively coupled plasma Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000005281 excited state Effects 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000004611 spectroscopical analysis Methods 0.000 description 4
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 3
- 238000000342 Monte Carlo simulation Methods 0.000 description 3
- 238000004854 X-ray topography Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 3
- 229910021398 atomic carbon Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000004624 confocal microscopy Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 229910052754 neon Inorganic materials 0.000 description 3
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 3
- -1 nitrogen ions Chemical class 0.000 description 3
- 238000000387 optically detected magnetic resonance Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 238000001636 atomic emission spectroscopy Methods 0.000 description 2
- 238000004061 bleaching Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009838 combustion analysis Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 229910052805 deuterium Inorganic materials 0.000 description 2
- 238000000804 electron spin resonance spectroscopy Methods 0.000 description 2
- 238000000695 excitation spectrum Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000001036 glow-discharge mass spectrometry Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 238000001307 laser spectroscopy Methods 0.000 description 2
- 238000002595 magnetic resonance imaging Methods 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 238000000844 transformation Methods 0.000 description 2
- 229920001817 Agar Polymers 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 235000014653 Carica parviflora Nutrition 0.000 description 1
- 241000243321 Cnidaria Species 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- 229910008329 Si-V Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910006768 Si—V Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 238000000650 X-ray photoemission electron microscopy Methods 0.000 description 1
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 238000004630 atomic force microscopy Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001826 continuous-wave electron spin resonance spectroscopy Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001362 electron spin resonance spectrum Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000011066 ex-situ storage Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000002189 fluorescence spectrum Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000007619 statistical method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
- C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/20—Doping by irradiation with electromagnetic waves or by particle radiation
- C30B31/22—Doping by irradiation with electromagnetic waves or by particle radiation by ion-implantation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Electromagnetism (AREA)
- Thermal Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0813491.8A GB0813491D0 (en) | 2008-07-23 | 2008-07-23 | Diamond Material |
| GB0813491.8 | 2008-07-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20110043529A true KR20110043529A (ko) | 2011-04-27 |
Family
ID=39737531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020107027391A Withdrawn KR20110043529A (ko) | 2008-07-23 | 2009-07-22 | 다이아몬드 물질 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US9317811B2 (https=) |
| EP (1) | EP2300643A1 (https=) |
| JP (1) | JP5536056B2 (https=) |
| KR (1) | KR20110043529A (https=) |
| CN (1) | CN102076891B (https=) |
| AU (1) | AU2009275284A1 (https=) |
| CA (1) | CA2725084A1 (https=) |
| GB (1) | GB0813491D0 (https=) |
| WO (1) | WO2010010352A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170104479A (ko) * | 2015-01-14 | 2017-09-15 | 아이아이에이 테크놀러지스 피티이. 엘티디. | 전자장치 등급의 단결정 다이아몬드 및 그 제조 방법 |
Families Citing this family (113)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1990313A1 (en) | 2007-05-10 | 2008-11-12 | INSERM (Institut National de la Santé et de la Recherche Médicale) | Method to produce light-emitting nano-particles of diamond |
| US9255009B2 (en) | 2009-06-26 | 2016-02-09 | Element Six Technologies Limited | Diamond material |
| JP5891564B2 (ja) | 2009-06-26 | 2016-03-23 | エレメント シックス リミテッド | ファンシーな淡い青色又はファンシーな淡い青色/緑色の単結晶cvdダイヤモンドの製造方法及び得られた製品 |
| AU2011220332B2 (en) * | 2010-02-24 | 2013-06-27 | Macquarie University | Mid to far infrared diamond Raman laser systems and methods |
| GB201013112D0 (en) | 2010-08-04 | 2010-09-22 | Element Six Ltd | A diamond optical element |
| GB201015260D0 (en) | 2010-09-14 | 2010-10-27 | Element Six Ltd | A microfluidic cell and a spin resonance device for use therewith |
| GB201107552D0 (en) | 2011-05-06 | 2011-06-22 | Element Six Ltd | Diamond sensors, detectors, and quantum devices |
| GB201107730D0 (en) | 2011-05-10 | 2011-06-22 | Element Six Ltd | Diamond sensors, detectors and quantum devices |
| GB201108644D0 (en) * | 2011-05-24 | 2011-07-06 | Element Six Ltd | Diamond sensors, detectors, and quantum devices |
| US9157859B2 (en) | 2011-06-13 | 2015-10-13 | President And Fellows Of Harvard College | Efficient fluorescence detection in solid state spin systems |
| US9658301B2 (en) * | 2011-06-13 | 2017-05-23 | President And Fellows Of Harvard College | Absorbtion-based detection of spin impurities in solid-state spin systems |
| EP2752506B1 (en) * | 2011-09-02 | 2017-04-05 | Sumitomo Electric Industries, Ltd. | Single crystal diamond and method for producing same |
| JP5880200B2 (ja) * | 2012-03-27 | 2016-03-08 | 住友電気工業株式会社 | 単結晶ダイヤモンドおよびその製造方法 |
| GB2495632B (en) | 2011-10-14 | 2016-08-03 | Element Six Ltd | Quantum processing device |
| FR2982405B1 (fr) * | 2011-11-04 | 2013-11-08 | Thales Sa | Support de stockage de donnees et procede de lecture de ce support |
| GB201121642D0 (en) | 2011-12-16 | 2012-01-25 | Element Six Ltd | Single crtstal cvd synthetic diamond material |
| US9361962B2 (en) | 2011-12-23 | 2016-06-07 | President And Fellows Of Harvard College | Solid-state quantum memory based on a nuclear spin coupled to an electronic spin |
| WO2013152446A1 (en) * | 2012-04-13 | 2013-10-17 | Oti Lumionics Inc. | Functionalization of a substrate |
| GB2515226A (en) * | 2012-04-13 | 2014-12-17 | Univ California | Gyroscopes based on nitrogen-vacancy centers in diamond |
| US8853070B2 (en) | 2012-04-13 | 2014-10-07 | Oti Lumionics Inc. | Functionalization of a substrate |
| US9698386B2 (en) * | 2012-04-13 | 2017-07-04 | Oti Lumionics Inc. | Functionalization of a substrate |
| GB201214370D0 (en) | 2012-08-13 | 2012-09-26 | Element Six Ltd | Thick polycrystalline synthetic diamond wafers for heat spreading applications and microwave plasma chemical vapour deposition synthesis techniques |
| US10041971B2 (en) | 2012-08-22 | 2018-08-07 | President And Fellows Of Harvard College | Nanoscale scanning sensors |
| GB201301560D0 (en) | 2013-01-29 | 2013-03-13 | Element Six Ltd | Synthetic Diamond Heat Spreaders |
| GB201301556D0 (en) * | 2013-01-29 | 2013-03-13 | Element Six Ltd | Synthetic diamond materials for quantum and optical applications and methods of making the same |
| JP6037387B2 (ja) * | 2013-03-01 | 2016-12-07 | 国立研究開発法人産業技術総合研究所 | ダイヤモンドnv光学中心を有するダイヤモンド単結晶 |
| US10330750B2 (en) * | 2013-04-05 | 2019-06-25 | Research Foundation Of The City University Of New York | Method and apparatus for polarizing nuclear and electronic spins |
| GB201320302D0 (en) | 2013-11-18 | 2014-01-01 | Element Six Ltd | Diamond components for quantum imaging sensing and information processing devices |
| GB201320304D0 (en) | 2013-11-18 | 2014-01-01 | Element Six Ltd | Methods of fabricating synthetic diamond materials using microwave plasma actived chemical vapour deposition techniques and products obtained using said |
| US10324142B2 (en) | 2014-01-20 | 2019-06-18 | Japan Science And Technology Agency | Diamond crystal, diamond devices, magnetic sensor, magnetic sensor system, and method for manufacturing sensor array |
| US9638821B2 (en) | 2014-03-20 | 2017-05-02 | Lockheed Martin Corporation | Mapping and monitoring of hydraulic fractures using vector magnetometers |
| US9823313B2 (en) | 2016-01-21 | 2017-11-21 | Lockheed Martin Corporation | Diamond nitrogen vacancy sensor with circuitry on diamond |
| US9541610B2 (en) | 2015-02-04 | 2017-01-10 | Lockheed Martin Corporation | Apparatus and method for recovery of three dimensional magnetic field from a magnetic detection system |
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| US10012704B2 (en) | 2015-11-04 | 2018-07-03 | Lockheed Martin Corporation | Magnetic low-pass filter |
| US10168393B2 (en) | 2014-09-25 | 2019-01-01 | Lockheed Martin Corporation | Micro-vacancy center device |
| US9853837B2 (en) | 2014-04-07 | 2017-12-26 | Lockheed Martin Corporation | High bit-rate magnetic communication |
| US9910104B2 (en) | 2015-01-23 | 2018-03-06 | Lockheed Martin Corporation | DNV magnetic field detector |
| US9557391B2 (en) | 2015-01-23 | 2017-01-31 | Lockheed Martin Corporation | Apparatus and method for high sensitivity magnetometry measurement and signal processing in a magnetic detection system |
| US9817081B2 (en) | 2016-01-21 | 2017-11-14 | Lockheed Martin Corporation | Magnetometer with light pipe |
| US9614589B1 (en) | 2015-12-01 | 2017-04-04 | Lockheed Martin Corporation | Communication via a magnio |
| US9835693B2 (en) | 2016-01-21 | 2017-12-05 | Lockheed Martin Corporation | Higher magnetic sensitivity through fluorescence manipulation by phonon spectrum control |
| US20170212046A1 (en) * | 2016-01-21 | 2017-07-27 | Lockheed Martin Corporation | Measurement parameters for qc metrology of synthetically generated diamond with nv centers |
| CA2945016A1 (en) | 2014-04-07 | 2015-10-15 | Lockheed Martin Corporation | Energy efficient controlled magnetic field generator circuit |
| WO2016010028A1 (ja) * | 2014-07-15 | 2016-01-21 | 住友電気工業株式会社 | 単結晶ダイヤモンド、単結晶ダイヤモンドの製造方法及び単結晶ダイヤモンドを用いた工具 |
| PT3045570T (pt) * | 2015-01-14 | 2019-09-27 | Iia Tech Pte Ltd | Diamantes de cristal único de grau de dispositivo eletrónico e respetivo método de produção |
| WO2016190909A2 (en) | 2015-01-28 | 2016-12-01 | Lockheed Martin Corporation | Magnetic navigation methods and systems utilizing power grid and communication network |
| BR112017016261A2 (pt) | 2015-01-28 | 2018-03-27 | Lockheed Martin Corporation | carga de energia in situ |
| GB2550809A (en) | 2015-02-04 | 2017-11-29 | Lockheed Corp | Apparatus and method for estimating absolute axes' orientations for a magnetic detection system |
| US12037703B2 (en) | 2015-02-06 | 2024-07-16 | Ecotricity Group Limited | Method of producing a synthetic diamond |
| GB2535152A (en) * | 2015-02-06 | 2016-08-17 | Ecotricity Group Ltd | A method of producing a synthetic diamond |
| US12065357B2 (en) * | 2015-02-09 | 2024-08-20 | Saeed Alhassan Alkhazraji | Process for manufacturing a pure porous 3D diamond |
| US10529564B2 (en) | 2015-08-07 | 2020-01-07 | North Carolina State University | Synthesis and processing of novel phase of boron nitride (Q-BN) |
| GB201516814D0 (en) | 2015-09-23 | 2015-11-04 | Element Six Technologies Ltd | Method of fabricating a plurality of single crystal CVD synthetic diamonds |
| WO2017087014A1 (en) | 2015-11-20 | 2017-05-26 | Lockheed Martin Corporation | Apparatus and method for hypersensitivity detection of magnetic field |
| GB2560283A (en) | 2015-11-20 | 2018-09-05 | Lockheed Corp | Apparatus and method for closed loop processing for a magnetic detection system |
| GB201522650D0 (en) | 2015-12-22 | 2016-02-03 | Element Six Technologies Ltd | Nitrogen containing single crystal diamond materials optimized for magnetometr applications |
| WO2017123261A1 (en) | 2016-01-12 | 2017-07-20 | Lockheed Martin Corporation | Defect detector for conductive materials |
| WO2017127098A1 (en) | 2016-01-21 | 2017-07-27 | Lockheed Martin Corporation | Diamond nitrogen vacancy sensed ferro-fluid hydrophone |
| GB2562958A (en) | 2016-01-21 | 2018-11-28 | Lockheed Corp | Magnetometer with a light emitting diode |
| WO2017127079A1 (en) | 2016-01-21 | 2017-07-27 | Lockheed Martin Corporation | Ac vector magnetic anomaly detection with diamond nitrogen vacancies |
| WO2017127096A1 (en) | 2016-01-21 | 2017-07-27 | Lockheed Martin Corporation | Diamond nitrogen vacancy sensor with dual rf sources |
| GB2562193B (en) | 2016-01-21 | 2021-12-22 | Lockheed Corp | Diamond nitrogen vacancy sensor with common RF and magnetic fields generator |
| US10338163B2 (en) | 2016-07-11 | 2019-07-02 | Lockheed Martin Corporation | Multi-frequency excitation schemes for high sensitivity magnetometry measurement with drift error compensation |
| US10317279B2 (en) | 2016-05-31 | 2019-06-11 | Lockheed Martin Corporation | Optical filtration system for diamond material with nitrogen vacancy centers |
| US10330744B2 (en) | 2017-03-24 | 2019-06-25 | Lockheed Martin Corporation | Magnetometer with a waveguide |
| US10145910B2 (en) | 2017-03-24 | 2018-12-04 | Lockheed Martin Corporation | Photodetector circuit saturation mitigation for magneto-optical high intensity pulses |
| US10274550B2 (en) | 2017-03-24 | 2019-04-30 | Lockheed Martin Corporation | High speed sequential cancellation for pulsed mode |
| US10281550B2 (en) | 2016-11-14 | 2019-05-07 | Lockheed Martin Corporation | Spin relaxometry based molecular sequencing |
| US10408890B2 (en) | 2017-03-24 | 2019-09-10 | Lockheed Martin Corporation | Pulsed RF methods for optimization of CW measurements |
| US20170343621A1 (en) | 2016-05-31 | 2017-11-30 | Lockheed Martin Corporation | Magneto-optical defect center magnetometer |
| US10527746B2 (en) | 2016-05-31 | 2020-01-07 | Lockheed Martin Corporation | Array of UAVS with magnetometers |
| US10228429B2 (en) | 2017-03-24 | 2019-03-12 | Lockheed Martin Corporation | Apparatus and method for resonance magneto-optical defect center material pulsed mode referencing |
| US10345396B2 (en) | 2016-05-31 | 2019-07-09 | Lockheed Martin Corporation | Selected volume continuous illumination magnetometer |
| US10371765B2 (en) | 2016-07-11 | 2019-08-06 | Lockheed Martin Corporation | Geolocation of magnetic sources using vector magnetometer sensors |
| US10345395B2 (en) | 2016-12-12 | 2019-07-09 | Lockheed Martin Corporation | Vector magnetometry localization of subsurface liquids |
| US10677953B2 (en) | 2016-05-31 | 2020-06-09 | Lockheed Martin Corporation | Magneto-optical detecting apparatus and methods |
| US10571530B2 (en) | 2016-05-31 | 2020-02-25 | Lockheed Martin Corporation | Buoy array of magnetometers |
| US10359479B2 (en) | 2017-02-20 | 2019-07-23 | Lockheed Martin Corporation | Efficient thermal drift compensation in DNV vector magnetometry |
| GB201610053D0 (en) * | 2016-06-09 | 2016-07-27 | Element Six Tech Ltd | Synthetic diamond heat spreaders |
| US10240251B2 (en) | 2016-06-28 | 2019-03-26 | North Carolina State University | Synthesis and processing of pure and NV nanodiamonds and other nanostructures for quantum computing and magnetic sensing applications |
| US9922823B1 (en) * | 2016-09-07 | 2018-03-20 | Euclid Techlabs, Llc | CVD reactor and method for nanometric delta doping of diamond |
| US10338164B2 (en) | 2017-03-24 | 2019-07-02 | Lockheed Martin Corporation | Vacancy center material with highly efficient RF excitation |
| US10379174B2 (en) | 2017-03-24 | 2019-08-13 | Lockheed Martin Corporation | Bias magnet array for magnetometer |
| US10371760B2 (en) | 2017-03-24 | 2019-08-06 | Lockheed Martin Corporation | Standing-wave radio frequency exciter |
| US10459041B2 (en) | 2017-03-24 | 2019-10-29 | Lockheed Martin Corporation | Magnetic detection system with highly integrated diamond nitrogen vacancy sensor |
| WO2019049876A1 (ja) * | 2017-09-05 | 2019-03-14 | 国立大学法人東京工業大学 | エピタキシャルシリコン薄膜の製造に用いられるシリコン基板及びその製造方法 |
| CN107831153B (zh) * | 2017-11-16 | 2023-08-29 | 中北大学 | 一种三维扫描的自旋浓度测量系统及测量方法 |
| GB201801288D0 (en) | 2018-01-26 | 2018-03-14 | Element Six Tech Ltd | Synthetic diamond material |
| JP6795803B2 (ja) * | 2018-03-02 | 2020-12-02 | 国立大学法人京都大学 | センサ素子、測定装置、センサ素子の製造方法、電子回路素子、および量子情報素子 |
| GB201811162D0 (en) | 2018-07-06 | 2018-08-29 | Element Six Tech Ltd | Method of manufacture of single crystal synthetic diamond material |
| WO2020046860A1 (en) * | 2018-08-27 | 2020-03-05 | Massachusetts Institute Of Technology | Microwave resonator readout of an ensemble solid state spin sensor |
| GB201904435D0 (en) | 2019-03-29 | 2019-05-15 | Element Six Tech Ltd | Single crystal synthetic diamond material |
| JP7131474B2 (ja) * | 2019-05-08 | 2022-09-06 | 株式会社デンソー | ダイヤモンド層の製造方法 |
| GB201918883D0 (en) * | 2019-12-19 | 2020-02-05 | Element Six Tech Ltd | Method for producing chemical vapour deposition diamond |
| JP7636737B2 (ja) * | 2020-02-27 | 2025-02-27 | 国立大学法人京都大学 | ダイヤモンドの製造方法 |
| CN111355901B (zh) * | 2020-03-14 | 2025-02-28 | 北京大学深圳研究生院 | 光电传感器、像素电路、图像传感器及光电感测方法 |
| CN111257804A (zh) * | 2020-04-01 | 2020-06-09 | 湖州中芯半导体科技有限公司 | 一种基于cvd钻石的高时间分辨率磁场测量设备 |
| US11713250B2 (en) | 2020-05-06 | 2023-08-01 | Impossible Diamond, Inc. | Diamond composition |
| US11760643B2 (en) | 2020-05-06 | 2023-09-19 | Impossible Diamond, Inc. | Diamond composition |
| CN111652376B (zh) * | 2020-07-03 | 2024-02-27 | 本源量子计算科技(合肥)股份有限公司 | 一种量子比特信号的读取方法及装置 |
| US12384683B2 (en) * | 2020-10-30 | 2025-08-12 | The Regents Of The University Of California | Dopant-vacancy centers in materials and methods of making thereof |
| GB2614218B (en) * | 2021-07-06 | 2024-06-19 | Element Six Tech Ltd | Single crystal diamond component and method for producing |
| WO2023004169A1 (en) * | 2021-07-23 | 2023-01-26 | Impossible Diamond, Inc. | A diamond composition |
| WO2023072384A1 (en) | 2021-10-27 | 2023-05-04 | Universität Ulm | Method of implanting atoms in a substrate and method of forming a quantum register |
| GB2614068B (en) | 2021-12-21 | 2024-05-22 | Element Six Tech Ltd | Sensor device |
| GB2614240B (en) | 2021-12-21 | 2024-08-14 | Element Six Tech Ltd | Sensor device |
| GB2614530B (en) | 2021-12-23 | 2024-12-11 | Element Six Tech Ltd | Diamond sensor |
| GB2620413A (en) * | 2022-07-06 | 2024-01-10 | Univ Warwick | System for quantum information processing |
| DE102023206516B3 (de) * | 2023-07-10 | 2024-10-24 | Diatope GmbH | Diamantelement und Verfahren zur Herstellung eines Diamantelements |
| WO2025182850A1 (ja) * | 2024-02-28 | 2025-09-04 | 住友電気工業株式会社 | ダイヤモンドスピンセンサおよびその製造方法 |
| WO2025182849A1 (ja) * | 2024-02-28 | 2025-09-04 | 住友電気工業株式会社 | ダイヤモンドセンサ |
| WO2025230422A1 (en) * | 2024-05-03 | 2025-11-06 | Technische Universiteit Delft | Method for annealing a diamond substrate that comprises a colour centre |
Family Cites Families (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4859490A (en) | 1986-07-23 | 1989-08-22 | Sumitomo Electric Industries, Ltd. | Method for synthesizing diamond |
| JPS63117995A (ja) * | 1986-11-05 | 1988-05-21 | Kobe Steel Ltd | ダイヤモンドの気相合成法 |
| JP2691219B2 (ja) | 1988-10-17 | 1997-12-17 | 並木精密宝石株式会社 | ダイヤモンドの合成法 |
| JP2730144B2 (ja) | 1989-03-07 | 1998-03-25 | 住友電気工業株式会社 | 単結晶ダイヤモンド層形成法 |
| JP2730145B2 (ja) | 1989-03-07 | 1998-03-25 | 住友電気工業株式会社 | 単結晶ダイヤモンド層の形成法 |
| US6007916A (en) | 1989-04-06 | 1999-12-28 | Sumitomo Electric Industries, Ltd. | Synthetic single crystal diamond for wiring drawing dies and process for producing the same |
| US5127983A (en) | 1989-05-22 | 1992-07-07 | Sumitomo Electric Industries, Ltd. | Method of producing single crystal of high-pressure phase material |
| JP2775903B2 (ja) | 1989-10-04 | 1998-07-16 | 住友電気工業株式会社 | ダイヤモンド半導体素子 |
| AU634601B2 (en) | 1989-12-11 | 1993-02-25 | General Electric Company | Single-crystal diamond of very high thermal conductivity |
| US5360479A (en) | 1990-07-02 | 1994-11-01 | General Electric Company | Isotopically pure single crystal epitaxial diamond films and their preparation |
| US5704976A (en) | 1990-07-06 | 1998-01-06 | The United States Of America As Represented By The Secretary Of The Navy | High temperature, high rate, epitaxial synthesis of diamond in a laminar plasma |
| JPH0497988A (ja) * | 1990-08-09 | 1992-03-30 | Sumitomo Electric Ind Ltd | 高熱伝導性ダイヤモンドの製造方法 |
| US6162412A (en) | 1990-08-03 | 2000-12-19 | Sumitomo Electric Industries, Ltd. | Chemical vapor deposition method of high quality diamond |
| JPH04305096A (ja) | 1991-04-01 | 1992-10-28 | Sumitomo Electric Ind Ltd | 高品質気相合成ダイヤモンドの低温形成法 |
| US5443032A (en) | 1992-06-08 | 1995-08-22 | Air Products And Chemicals, Inc. | Method for the manufacture of large single crystals |
| US5614019A (en) | 1992-06-08 | 1997-03-25 | Air Products And Chemicals, Inc. | Method for the growth of industrial crystals |
| EP0582397A3 (en) | 1992-08-05 | 1995-01-25 | Crystallume | CVD diamond material for radiation detector and method for manufacturing the same. |
| US5334283A (en) | 1992-08-31 | 1994-08-02 | The University Of North Carolina At Chapel Hill | Process for selectively etching diamond |
| US5474021A (en) | 1992-09-24 | 1995-12-12 | Sumitomo Electric Industries, Ltd. | Epitaxial growth of diamond from vapor phase |
| JP3350992B2 (ja) * | 1993-02-05 | 2002-11-25 | 住友電気工業株式会社 | ダイヤモンドの合成方法 |
| US5302331A (en) | 1992-11-30 | 1994-04-12 | Jenkins Robert E | Waste treatment process |
| CA2127832C (en) | 1993-07-20 | 2001-02-20 | Grant Lu | Cvd diamond radiation detector |
| JPH07277899A (ja) * | 1994-04-04 | 1995-10-24 | Kobe Steel Ltd | ダイヤモンド半導体の製造方法 |
| EP0678592A1 (en) * | 1994-04-20 | 1995-10-25 | General Electric Company | Improved CVD diamond |
| EP0688026A1 (en) | 1994-06-17 | 1995-12-20 | General Electric Company | Resistor coated on diamond substrate |
| US5587210A (en) | 1994-06-28 | 1996-12-24 | The United States Of America As Represented By The Secretary Of The Navy | Growing and releasing diamonds |
| JP4032482B2 (ja) | 1997-04-18 | 2008-01-16 | 住友電気工業株式会社 | 単結晶ダイヤモンドの製造方法 |
| JP3125046B2 (ja) | 1997-11-21 | 2001-01-15 | 工業技術院長 | ダイヤモンド単結晶薄膜製造方法 |
| US6582513B1 (en) * | 1998-05-15 | 2003-06-24 | Apollo Diamond, Inc. | System and method for producing synthetic diamond |
| US6858080B2 (en) | 1998-05-15 | 2005-02-22 | Apollo Diamond, Inc. | Tunable CVD diamond structures |
| CZ302228B6 (cs) | 2000-06-15 | 2011-01-05 | Element Six (Pty) Ltd | Monokrystalická diamantová vrstva pripravená chemickým vylucováním z plynné fáze |
| EP1290251B8 (en) | 2000-06-15 | 2006-02-01 | Element Six (PTY) Ltd | Thick single crystal diamond layer method for making it and gemstones produced from the layer |
| GB0130005D0 (en) | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Boron doped diamond |
| GB0130004D0 (en) | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Coloured diamond |
| RU2328563C2 (ru) | 2002-09-06 | 2008-07-10 | Элемент Сикс Лимитед | Цветные алмазы |
| GB0221949D0 (en) | 2002-09-20 | 2002-10-30 | Diamanx Products Ltd | Single crystal diamond |
| GB0227261D0 (en) | 2002-11-21 | 2002-12-31 | Element Six Ltd | Optical quality diamond material |
| GB2441044A (en) | 2003-12-12 | 2008-02-20 | Element Six Ltd | A method of incorporating a mark in CVD diamond. |
| US7829377B2 (en) | 2005-01-11 | 2010-11-09 | Apollo Diamond, Inc | Diamond medical devices |
| US7122837B2 (en) | 2005-01-11 | 2006-10-17 | Apollo Diamond, Inc | Structures formed in diamond |
| US20060163584A1 (en) | 2005-01-26 | 2006-07-27 | Robert Linares | Boron-doped diamond semiconductor |
| AU2006260656A1 (en) | 2005-06-22 | 2006-12-28 | Element Six Limited | High colour diamond layer |
| US8048223B2 (en) | 2005-07-21 | 2011-11-01 | Apollo Diamond, Inc. | Grown diamond mosaic separation |
| US20090297429A1 (en) | 2006-01-04 | 2009-12-03 | Vohra Yogesh K | High growth rate methods of producing high-quality diamonds |
| JP2010517263A (ja) | 2007-01-22 | 2010-05-20 | エレメント シックス リミテッド | ダイヤモンド電子デバイス及びそれらの製造方法 |
-
2008
- 2008-07-23 GB GBGB0813491.8A patent/GB0813491D0/en not_active Ceased
-
2009
- 2009-07-22 EP EP09784778A patent/EP2300643A1/en not_active Withdrawn
- 2009-07-22 CA CA2725084A patent/CA2725084A1/en not_active Abandoned
- 2009-07-22 US US12/995,005 patent/US9317811B2/en active Active
- 2009-07-22 WO PCT/GB2009/001826 patent/WO2010010352A1/en not_active Ceased
- 2009-07-22 CN CN200980123816.0A patent/CN102076891B/zh active Active
- 2009-07-22 KR KR1020107027391A patent/KR20110043529A/ko not_active Withdrawn
- 2009-07-22 AU AU2009275284A patent/AU2009275284A1/en not_active Abandoned
- 2009-07-22 JP JP2011519235A patent/JP5536056B2/ja active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170104479A (ko) * | 2015-01-14 | 2017-09-15 | 아이아이에이 테크놀러지스 피티이. 엘티디. | 전자장치 등급의 단결정 다이아몬드 및 그 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2725084A1 (en) | 2010-01-28 |
| CN102076891A (zh) | 2011-05-25 |
| JP5536056B2 (ja) | 2014-07-02 |
| WO2010010352A1 (en) | 2010-01-28 |
| CN102076891B (zh) | 2016-01-06 |
| US20120051996A1 (en) | 2012-03-01 |
| GB0813491D0 (en) | 2008-08-27 |
| AU2009275284A1 (en) | 2010-01-28 |
| EP2300643A1 (en) | 2011-03-30 |
| US9317811B2 (en) | 2016-04-19 |
| JP2011529018A (ja) | 2011-12-01 |
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