KR20100052403A - Proximity exposure apparatus, method of delivering a mask of a proximity exposure apparatus and method of manufacturing a display panel substrate - Google Patents

Abstract

PURPOSE: A proximity exposure apparatus, a method for transferring the mask of the same and a method for manufacturing a display panel substrate are provided to improve the quality of the display panel substrate by precisely performing the mask location determining process and a pattern transferring process. CONSTITUTION: A first control unit controls the transfer of a stage. A mask is loaded on a chuck(10) by a mask transfer unit. A plurality of push-up units includes a motor(11) in order to elevate push-up pins. A first image pick-up unit takes an image of a mark on a mask and outputs image signal. A transferring unit transfers the first image pick-up unit. An image process unit processes the image signal and detects the location of the mask.

Description

PROCIMITY EXPOSURE APPARATUS, METHOD OF DELIVERING A MASK OF A PROXIMITY EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE}

INDUSTRIAL APPLICABILITY In the manufacture of display panel substrates such as a liquid crystal monitor device, the present invention provides a proximity exposure apparatus that performs exposure of a substrate using a proximity method, a mask conveyance method of a proximity exposure apparatus, and a display panel using the same. It relates to a method for producing a substrate. In particular, the present invention relates to a proximity exposure apparatus suitable for positioning a large size mask and mounting it on a mask holder, a mask conveyance method of a proximity exposure apparatus, and a manufacturing method of a display panel substrate using the same.

Production of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, and the like, of liquid crystal monitor devices used as display panels is performed using photolithography. It is performed by forming a pattern on a substrate by a technique. As an exposure apparatus, a projection method for projecting a pattern of a mask onto a substrate using a lens or a mirror, and a small gap (proxy millimeter gap) are provided between the mask and the substrate to transfer the pattern of the mask to the substrate. There is a Proximity approach. Although the proximity resolution is inferior in pattern resolution performance compared with the projection method, the configuration of the irradiation optical system is simple and the processing capability is high, and thus it is suitable for mass production.

The proximity exposure apparatus includes a chuck for mounting a substrate and a mask holder for holding a mask, and performs exposure by bringing the mask supported on the mask holder and the substrate mounted on the chuck very close. Usually, the chuck is mounted on a stage for moving and positioning the substrate, and vacuum-adsorbs the substrate to fix it. The mask holder is provided above the chuck on which the substrate is mounted, and vacuum-fixes and fixes the peripheral portion of the mask. The loading of the substrate into the chuck, and the removal of the substrate from the chuck, is generally performed by the handling arm of the substrate transfer robot, but loaded / unloaded away from the exposure position under the mask to avoid contact with the mask and the substrate. Is performed in position. After mounting the substrate on the chuck at the load / unload position, the stage moves to an exposure position under the mask to perform positioning of the substrate at the exposure position.

The carrying of the mask to the mask holder and the carrying of the mask from the mask holder have also been conventionally performed by a handling arm of the mask transfer robot. However, since the handling arm of the mask transfer robot is a cantilever type, when the mask becomes large and its weight increases, the handling arm becomes bent and the mask cannot be supported horizontally, and the shaking of the handling arm becomes large. It was difficult to secure a stroke to move downward. In contrast, Japanese Laid-Open Patent Publication No. 2003-186199 discloses a temporary support member of a mask at an outer circumferential edge of a chuck, a mask is provided on a temporary support member, and corrects a transfer misalignment of the mask by a stage, and the lower surface side of the chuck. The technique of pressing the mask to the bottom surface of the mask holder by means of a Z-axis driving mechanism connected thereto is disclosed.

In recent years, in the manufacture of various substrates for display panels, in order to cope with the increase in size and the diversification of sizes, a relatively large substrate is prepared, and from one substrate to one or multiple display panel substrates depending on the size of the display panel. To manufacture. In this case, in the proximity system, when one surface of the substrate is to be exposed collectively, a mask having the same size as the substrate is required, and the cost of the expensive mask is further increased. There has been a mainstream method in which one surface of the substrate is divided into a plurality of shots and exposed while stepping the substrate in the XY direction by a stage using a mask that is relatively smaller than the substrate. In this system, since the mask is smaller than the substrate mounted on the chuck, the technique described in Japanese Laid-Open Patent Publication No. 2003-186199 cannot be applied.

When the mask and the substrate are brought close to each other, or when the mask and the substrate are separated, the mask held by the mask holder is pushed or pulled by the air between the mask and the substrate. And when a fin mask returns to the original, there exists a possibility that the position shift of a mask may arise. Conventionally, when conveying a mask using the handling arm of a mask transfer robot, after attaching a large number of positioning pins to a mask holder and attaching a mask to a mask holder, the side surface of a mask is moved by a positioning pin. Press to adjust the position of the mask. The positioning pin also plays a role of preventing the positional shift of the mask when the mask and the substrate are brought close to each other, or when the mask and the substrate are separated. However, when the mask is positioned before the mask is mounted, if the mask is to be prevented from shifting with the conventional positioning pin, the position of the positioned mask is shifted when the positioning pin is aligned with the side of the mask. There was a problem throwing away.

An object of the present invention is to accurately position a mask smaller than a substrate and attach it to a mask holder. Moreover, the subject of this invention is preventing the position shift of the mask at the time of approaching a mask and a board | substrate, or when separating a mask and a board | substrate, without moving the position of the positioned mask. Moreover, the subject of this invention is manufacturing a high quality display panel board | substrate.

Proximity exposure apparatus which concerns on this invention is equipped with the chuck which mounts a board | substrate, the mask holder which supports a mask, and the stage which moves the said chuck, and provides a small gap between a mask and a board | substrate, and forms a pattern of a mask. A proximity exposure apparatus for transferring a light to a substrate, comprising: first control means for controlling movement of a stage; A mask conveying apparatus which carries in a mask to a chuck; A plurality of push pin units attached to the chuck, the push pins rising from the inside of the chuck and a motor moving the push pins up and down; A first image acquisition device for acquiring an image of a position detection mark provided in the mask and outputting an image signal; Moving means for moving the first image acquisition device; An image processing device which processes the image signal output by the first image acquisition device and detects the position of the mask, and the plurality of pushing pin units receive the mask from the mask conveying device by the pushing pin; 1 control means moves a chuck by a stage based on the position of the mask which the image processing apparatus processed and detected the image signal of the 1st image acquisition apparatus, performs positioning of a mask, and a number of pushing pins The unit attaches the mask to the mask holder by a pushing pin.

Moreover, the mask conveyance method of the proximity exposure apparatus which concerns on this invention is equipped with the chuck which mounts a board | substrate, the mask holder which supports a mask, and the stage which moves a chuck, and provides a micro gap between a mask and a board | substrate. In the mask conveyance method of the proximity exposure apparatus which transfers the pattern of a mask to a board | substrate, many chuck pin units which have the push pin which raises from the inside of a chuck and the motor which moves a push pin up and down are installed in a chuck. And a first image acquisition device for acquiring an image of a position detection mark provided on the mask and outputting an image signal, and a moving means for moving the first image acquisition device, and placing the mask on the chuck by the mask transfer device. It loads in, it receives a mask from a mask conveyance apparatus with a pushing pin, moves a 1st image acquisition apparatus by a moving means, and a 1st The image acquisition device acquires an image of the mark for position detection of the mask, processes the image signal of the first image acquisition device, detects the position of the mask, and performs chucking by the stage based on the detected position of the mask. Move, perform positioning of the mask, and mount the mask to the mask holder by pushing pins.

Since the chuck is provided with a plurality of push pin units having a push pin that rises from the inside of the chuck and a motor that moves the push pin up and down, and receives the mask from the mask transfer device by the push pin, the mask is placed on the chuck. Even if it is smaller than a board | substrate to be mixed, a mask can be carried in to a chuck. Then, the chuck is moved by the stage to position the mask, and the mask is mounted on the mask holder by the pushing pin, so that the mask brought into the chuck is accurately positioned by the stage and mounted on the mask holder. do.

In order to accurately perform positioning of the mask, it is necessary to accurately detect the position of the mask. The detection of the position of the mask is performed by acquiring an image of the mark for position detection of the mask. However, the higher the resolution, the higher the detection accuracy is. However, the high resolution image acquisition device has a narrow field of view, and there is a fear that the mark for position detection of the mask may not enter the field of view when the position of the mask is shifted. There, the 1st image acquisition apparatus which acquires the image of the position detection mark provided in the mask, and the moving means for moving a 1st image acquisition apparatus are provided, The 1st image acquisition apparatus is moved by a movement means, and a 1st image acquisition apparatus is provided. An image of a mark for detecting position of a mask is acquired by the image acquisition device. Then, the image signal of the first image acquisition device is processed, the position of the mask is detected, the chuck is moved by the stage based on the detected position of the mask, and the position of the mask is performed. Even if the position of the mask is shifted, the position of the mask is detected with high accuracy by using a high resolution image acquisition device, and the positioning of the mask is performed with high accuracy.

The proximity exposure apparatus according to the present invention is further provided with a second image acquisition device that is fixed above the mask holder, acquires an image of the position detection mark of the mask, and outputs an image signal. And process the image signal output by the second image acquisition device to detect the position of the mask, and the first control means based on the position of the mask detected by the image processing device by processing the image signal of the second image acquisition device. The chuck is moved by the stage to correct the position of the positioned mask.

Moreover, the mask conveyance method of the proximity exposure apparatus which concerns on this invention is fixed above the mask holder, acquires the image of the mark for position detection of a mask, and installs the 2nd image acquisition apparatus which outputs an image signal, The stage acquires an image of a mark for position detection of the mask by the second image acquisition apparatus, processes the image signal of the second image acquisition apparatus, detects the position of the mask, and performs the stage based on the detected position of the mask. The chuck is moved to correct the position of the positioned mask.

When the first image acquisition device is moved, the detection error of the position of the mask includes the movement error of the first image acquisition device. There, a second image acquisition device is fixed above the mask holder to acquire an image of the position detection mark of the mask and outputs an image signal, and the second image acquisition device Acquire an image. Then, the image signal of the second image acquisition device is processed to detect the position of the mask, and the chuck is moved by the stage based on the detected position of the mask to correct the position of the positioned mask. Using the second image acquisition device fixed above the mask holder, the position of the mask is detected with higher accuracy, and the position of the positioned mask is corrected with accuracy.

In addition, the proximity exposure apparatus according to the present invention has a wider field of view with a lower resolution than the first image acquisition apparatus and has a wider field of view over the mask receiving position that receives the mask from the mask conveying apparatus by the pushing pin. A third image acquisition device for acquiring an image of the mark for use and outputting an image signal; the image processing device processes the image signal output by the third image acquisition device, detects the position of the mask, The control means moves the chuck by the stage based on the position of the mask detected by the image processing apparatus by processing the third image acquisition device image signal, and moves the mask from the mask receiving position to the mask mounting position under the mask holder. To move.

Moreover, in the mask conveyance method of the proximity exposure apparatus which concerns on this invention, a mask is received from a mask conveyance apparatus by a pushing pin at the mask receiving position provided separately from the mask mounting position under a mask holder, and 1st image acquisition is carried out. A third image acquisition device that has a lower resolution than the device and has a wider field of view, acquires an image of the position detection mark of the mask, and outputs an image signal, is provided above the mask receiving position, and the mask is moved by the third image acquisition device. Acquires an image of the position detecting mark of the image, processes the image signal of the third image acquisition device to detect the position of the mask, moves the chuck by the stage based on the detected position of the mask, and masks the mask. From the position to the mask mounting position.

The position of the mask at the mask receiving position when the mask is received from the mask conveying device by the push pin at the mask receiving position installed separately from the mask mounting position under the mask holder and the mask is moved from the mask receiving position to the mask mounting position. And the chuck is moved by the stage based on the detected position of the mask, and the mask is moved from the mask receiving position to the mask mounting position, so that the mask received from the mask conveying device by the pushing pin at the mask receiving position is Even if the position is shifted, the mask is accurately moved to the mask mounting position.

The detection of the position of the mask at the mask receiving position is performed by acquiring an image of the mark for position detection of the mask, but when the position of the mask received from the mask conveying device by the pushing pin is greatly shifted, the first image is acquired. When using a high resolution image acquisition device similarly to the device, there is a fear that a long time is required to put the mark for position detection of the mask into the field of view. The third image acquisition device having a lower resolution than the first image acquisition device and possessing a wide field of view is provided above the mask receiving position, and the image of the mark for position detection of the mask is acquired by the third image acquisition device. Even if the position of the mask which the pushing pin received from the mask conveyance apparatus is largely shifted | deviated, the image of the position detection mark of a mask is acquired in a short time, and a position of a mask is detected in a short time from a mask receiving position.

Moreover, the proximity exposure apparatus which concerns on this invention is equipped with the several spacer which is provided in the surface of the chuck, and contacts the peripheral part of the pattern surface of a mask when the pushing pin which carried the mask descends. Moreover, in the mask conveyance method of the proximity exposure apparatus which concerns on this invention, when the pushing pin which loads the mask descends, many spacers which contact the peripheral part of the pattern surface of a mask are provided in the surface of a chuck. If the pushing pin is lowered for some reason after the pushing pin receives the substrate from the mask conveying apparatus, the pattern surface of the mask is in contact with the surface of the chuck, and the pattern may be damaged. Thereby, many spacers which contact the periphery of the pattern surface of the mask when the pushing pin carrying the mask descends are provided on the surface of the chuck to prevent the pattern surface of the mask from contacting the surface of the chuck.

Further, the proximity exposure apparatus according to the present invention includes a position shift prevention pin for contacting the side surface of the mask supported by the mask holder to prevent position shift of the mask, a motor for moving the position shift prevention pin to contact the side surface of the mask; And a sensor for detecting that the misalignment prevention pin contacts the side of the mask, a plurality of misalignment prevention pin units attached to the mask holder, and second control means for controlling the motor of each misalignment prevention pin unit. The second control means controls the motor of each position shift prevention pin unit, moves the position shift prevention pin toward the side of the mask, and stops the movement of the position shift prevention pin based on the detection result of the sensor. will be.

Moreover, in the mask conveyance method of the proximity exposure apparatus which concerns on this invention, the position shift prevention pin and position shift prevention pin which contact a side surface of the mask supported by the mask holder and prevent a position shift of a mask are moved to the side surface of a mask. A plurality of misalignment prevention pin units having a motor to be brought into contact and a sensor for detecting that the misalignment prevention pin is in contact with the side surface of the mask are provided in the mask holder to control the motor of each misalignment prevention pin unit to prevent misalignment. The prevention pin is moved toward the side of the mask to stop the movement of the position shift prevention pin based on the detection result of the sensor.

Control the motor of each position shift prevention pin unit, move a position shift prevention pin toward the side surface of a mask, and prevent a position shift based on the detection result of the sensor which detects that a position shift prevention pin contacted the side surface of a mask. Since the pin stops moving, the position shift prevention pin contacts the side surface of the mask without shifting the position of the positioned mask so that the mask shifts when the mask approaches the substrate or when the mask and the substrate are separated. Is prevented.

The manufacturing method of the display panel board | substrate of this invention exposes a board | substrate using any of said proximity exposure apparatuses, or uses the mask conveyance method of any of said proximity exposure apparatuses, and a mask is applied to a mask holder. It mounts and performs exposure of a board | substrate. Since the positioning of the mask is performed with high precision, the transfer of the pattern is performed with high precision, and a high quality display panel substrate is manufactured.

According to the mask conveyance method of the proximity exposure apparatus and the proximity exposure apparatus of this invention, a mask is carried in to a chuck by a mask conveyance apparatus, a mask is received from a mask conveyance apparatus by a pushing pin, and a 1st movement is performed by a moving means. The image acquisition apparatus is moved, the image of the position detection mark of the mask is acquired by the first image acquisition apparatus, the image signal of the first image acquisition apparatus is processed, the position of the mask is detected, and the detected mask Based on the position, as the chuck is moved by the stage, positioning of the mask is performed, and the mask is mounted on the mask holder by a pushing pin, a mask smaller than the substrate is accurately positioned and the mask holder Can be mounted on

According to the mask conveyance method of the proximity exposure apparatus and the proximity exposure apparatus of this invention, the image of the mark for position detection of a mask is acquired by the 2nd image acquisition apparatus fixed to the mask holder upper part, and the 2nd image acquisition apparatus The second image fixed above the mask holder by processing the image signal, detecting the position of the mask, moving the chuck by the stage and correcting the position of the positioned mask based on the detected position of the mask. By using the acquisition apparatus, the position of the mask can be detected more accurately, and the position of the positioned mask can be corrected with high accuracy.

Moreover, according to the mask conveyance method of the proximity exposure apparatus and the proximity exposure apparatus of this invention, a mask is received from a mask conveyance apparatus by a pushing pin at the mask receiving position provided separately from the mask mounting position under a mask holder. The image of the position detection mark of the mask is acquired by a third image acquisition device having a lower resolution than the first image acquisition device and having a wide field of view, and the image signal of the third image acquisition device is processed to detect the position of the mask. And based on the position of the mask detected, the chuck is moved by the stage and the mask is moved from the mask receiving position to the mask mounting position, even if the position of the mask received by the lifting pin from the mask conveying device is greatly shifted. The position of the mask is detected in a short time from the mask receiving position, Can be moved to the mask mounting position with high precision.

In addition, according to the mask conveyance method of the proximity exposure apparatus and the proximity exposure apparatus of the present invention, a plurality of spacers in contact with the periphery of the pattern surface of the mask when the lifting pin is lowered is provided on the surface of the chuck. Even if the raising pin is lowered as a cause, it is possible to prevent the pattern surface of the mask from contacting the surface of the chuck to damage the pattern.

Moreover, according to the mask conveyance method of the proximity exposure apparatus and the proximity exposure apparatus of this invention, a position shift prevention pin and a position shift prevention pin which contact the side surface of the mask supported by the mask holder, and prevent a position shift of a mask are moved. A plurality of misalignment prevention pin units having a motor for contacting the side surfaces of the mask and a sensor for detecting that the misalignment prevention pins are in contact with the side surfaces of the mask, are attached to the mask holder, and the motors of the respective misalignment prevention pin units By controlling the movement and shifting the misalignment prevention pin toward the side of the mask, and stopping the movement of the misalignment prevention pin based on the detection result of the sensor, the mask and the substrate can be moved without moving the position of the positioned mask. When the mask or the substrate is separated from the mask, the positional shift of the mask can be prevented.

According to the manufacturing method of the display panel substrate of the present invention, since the positioning of the mask can be performed with high accuracy, the pattern transfer can be performed with high precision to produce a high quality display panel substrate.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows schematic structure of the proximity exposure apparatus which concerns on one Embodiment of this invention. 2 is a top view of the proximity exposure apparatus which concerns on one Embodiment of this invention. The proximity exposure apparatus includes a base 3, an X guide 4, an X stage 5, a Y guide 6, a Y stage 7, a θ stage 8, a chuck support 9, and a chuck 10. ), Push pin unit, control system of push pin unit, mask holder 20, mask protective spacer 30, spacer mounting device 31, mask transfer robot 40, mask stocker 42, wide view camera (51), high resolution movable camera (52), camera moving mechanism (53), high resolution fixed camera (54), image processing apparatus (55), X stage driving circuit (71), Y stage driving circuit (72), θ stage The drive circuit 73 and the main control apparatus 80 are comprised.

In addition, in FIG. 1, the control system of the pushing pin unit, the mask protective spacer 30, the spacer mounting apparatus 31, the mask transfer robot 40, the mask stocker 42, and the camera movement mechanism 53 are omitted. have. 2, the control system of the pushing pin unit, the image processing apparatus 55, the X stage driving circuit 71, the Y stage driving circuit 72, the θ stage driving circuit 73, and the main control apparatus 80. ) Is omitted. In addition to these, the proximity exposure apparatus includes an irradiation optical system for irradiating exposure light, a gap sensor, an alignment sensor, and a temperature control unit for performing temperature management in the apparatus.

In addition, the XY direction in embodiment described below is an illustration, You may replace the X direction and Y direction.

In FIG. 2, the chuck 10 is in a mask receiving position for receiving the mask 2. The mask conveyance robot 40 takes out the mask 2 from the mask stocker 42, carries it in to the chuck 10 in a mask receiving position, and the chuck 10 in the mask receiving position. ) Is taken out and stored in the mask stocker 42. The handling arm 41 of the mask transfer robot 40 is provided with a mask support part 41a in contact with a peripheral portion where the pattern of the pattern surface (lower surface) of the mask 2 is not formed, and the handling arm 41 is provided. Silver supports the peripheral part of the pattern surface (lower surface) of the mask 2 by the mask support part 41a. The pushing pin of the pushing pin unit, which will be described later, receives the mask 2 from the handling arm 41 of the mask transfer robot 40 when bringing the mask 2 into the chuck 10, and thus the mask 2. When carrying out from the chuck 10, the mask 2 is delivered to the handling arm 41 of the mask transfer robot 40. As described later, the mask 2 carried in the chuck 10 is moved to the mask mounting position under the mask holder 20, and is attached to the mask holder 20 at the mask mounting position.

When performing exposure of the substrate, the chuck 10 is first moved to a load / unload position that performs load / unload of the substrate. In the load / unload position, the substrate is loaded into the chuck 10 and the substrate is unloaded from the chuck 10. The chuck 10 loaded with the substrate is moved from the load / unload position to the exposure position where the substrate is exposed.

Above the exposure position, a mask holder 20 that supports the mask 2 is provided. The mask holder 20 vacuum-absorbs and supports the peripheral part of the mask 2. An irradiation optical system (not shown) is disposed above the mask 2 supported by the mask holder 20. At the time of exposure, as the exposure light from the irradiation optical system passes through the mask 2 and is irradiated to the substrate, the pattern of the mask 2 is transferred to the surface of the substrate 1, so that the pattern on the substrate 1 is transferred. Is formed.

In FIG. 1, the chuck 10 is mounted on the θ stage 8 via the chuck support 9, and a Y stage 7 and an X stage 5 are provided below the θ stage 8. have. The X stage 5 is mounted on the X guide 4 provided in the base 3, and moves to the X direction (FIG. 1 horizontal direction of FIG. 1) according to the X guide 4. As shown in FIG. The Y stage 7 is mounted on the Y guide 6 provided in the X stage 5, and moves in the Y direction (inner direction of the figure in FIG. 1) along the Y guide 6. The θ stage 8 is mounted on the Y stage 7 and rotates in the θ direction. The chuck support 9 is mounted on the θ stage 8 to support the rear surface of the chuck 10 at a plurality of points. The X stage driving circuit 71, the Y stage driving circuit 72, and the θ stage driving circuit 73 are controlled by the main control device 80, and the X stage 5, the Y stage 7, and the θ stage. Each of (8) is driven.

The chuck 10 moves between the load / unload position and the exposure position by the movement in the X direction of the X stage 5 and the movement in the Y direction of the Y stage 7. In the loaded / unloaded position, the chuck 10 is moved by the movement of the X stage 5 in the X direction, the movement of the Y stage 7 in the Y direction, and the rotation of the θ stage 8 in the θ direction. Pre-alignment of the substrate mounted on the substrate is performed. At the exposure position, step movement in the XY direction of the substrate mounted on the chuck 10 is performed by the movement in the X direction of the X stage 5 and the movement in the Y direction of the Y stage 7. Then, the substrate is aligned by the movement of the X stage 5 in the X direction, the movement of the Y stage 7 in the Y direction, and the rotation of the θ stage 8 in the θ direction. In addition, as the mask holder 20 is moved and tilted in the Z direction (up and down direction in the drawing of FIG. 1) by a Z-tilt mechanism (not shown), gap alignment between the mask 2 and the substrate is performed.

In the present embodiment, while the mask holder 20 is moved and tilted in the Z direction, the gap between the mask 2 and the substrate is performed, but the Z-tilt mechanism is provided on the chuck support 9. As the chuck 10 is moved and tilted in the Z direction, the gap between the mask 2 and the substrate may be performed.

3 is a top view of the chuck. On the surface of the chuck 10, protrusions, banks, and suction holes (not shown) are provided. The protruding portion has a pin shape having a diameter of several mm and is provided on the surface of the chuck 10 at a plurality of predetermined intervals. When the substrate is mounted on the chuck 10, the protrusion supports the substrate at a plurality of points. At this time, a space is formed between the board | substrate and parts other than the said protrusion part of the surface of the chuck 10. The levee is a continuous wall of a predetermined width and divides the space formed between the substrate and the portion other than the protruding portion of the surface of the chuck 10 into a plurality of vacuum sections. The embankment is composed of irregular lines rather than straight lines, such that it is difficult to be recognized by the human eye when the surface transfer of the surface shape of the chuck 10 is printed on the surface of the substrate. The suction hole is provided in a plurality of predetermined intervals at portions other than the protruding portion and the dike on the surface of the chuck 10, and performs vacuum of each vacuum section divided by the dike.

Moreover, the chuck | zipper 10 is provided with the many board | substrate uptake pins for not accepting / noting. The push-up pin for substrate acceptance / flip rises from the surface of the chuck 10 and, when loading the substrate into the chuck 10, receives the substrate from a substrate transfer robot (not shown) and unloads the substrate from the chuck. When doing so, the substrate is transferred to a substrate transfer robot (not shown).

In FIG. 3, many openings in which the pushing pin unit described later are inserted are provided near the central portion of the chuck 10, and a lid 13 is fitted in the opening. The lid 13 is provided with a through hole, and a pushing pin 12 is inserted into the through hole from the lower side of the lid 13. In addition, although 16 openings are provided in the vicinity of the center part of the chuck 10 in this embodiment, the position and number of openings are not limited to this.

4A is a top view of the opening provided in the chuck, and FIG. 4B is a sectional view of the A-A portion of FIG. 4A. 5A is a top view of the opening provided in the chuck, and FIG. 5B is a sectional view of the B-B portion of FIG. 5A. The pushing pin unit comprises the motor 11, the pushing pin 12, the lid 13, the flange 14, the bolts 15 and 17, and the stop screw 16. As shown in FIG.

The motor 11 includes a pulse motor, a ball screw connected to the pulse motor, and a rod. As the ball screw is driven by the pulse motor, the rod accommodated in the rod housing 11a rises and rises. Descend. A pushing pin 12 is attached to the tip of the rod of the motor 11.

In FIG. 4B, a flange 14 is attached to an upper surface of the rod housing portion 11a of the motor 11, and the flange 14 is fixed to the rear surface of the lid 13 by a bolt 15. . On the other hand, a ring-shaped support plate 18 for supporting the lid 13 is attached to the periphery of the opening on the rear surface of the chuck 10. The support plate 18 is fixed to the back surface of the chuck 10 by the bolts 19.

In FIG. 4A and FIG. 5A, the screw hole which turns the stop screw 16, and the stepped hole through the bolt 17 are provided in the peripheral part of the lid | cover 13 in many parts. In FIG. 4B, the lid 13 is fixed to the support plate 18 by a bolt 17 passed through a stepped hole in the periphery of the lid 13. In FIG. 5B, the stop screw 16 is screwed into the screw hole of the periphery of the lid 13, is drilled out of the bottom surface of the lid 13, and is in contact with the upper surface of the support plate 18.

In this embodiment, when attaching the pushing pin unit to the chuck 10, first, the pushing pin unit is inserted into the opening from above the chuck 10, and the amount of twist of the stop screw 16 is adjusted. , Adjust the installation height of the push-up pin unit. And the lid 13 is fixed to the support plate 18 by the bolt 17, and a lifting pin unit is attached to the chuck 10. As shown in FIG. Since the pushing pin unit is inserted into the opening from the upper side of the chuck 10, the mounting height is adjusted by the stop screw 16 and attached to the chuck 10, so that the outer hand or jig of the chuck 10 Even in the vicinity of the central portion of the chuck that is hard to reach, adjustment of the installation height of the pushing pin unit is easily performed from above the chuck 10. Therefore, even if the chuck | zipper 10 enlarges with the enlargement of a board | substrate, the height of the pushing pin 12 is adjusted easily.

6 is a diagram illustrating a control system of a pushing pin unit. The push pin drive control circuit 50 designates the move destination of the push pin 12 with respect to the motor 11 of each push pin unit under the control of the main control device 80, and pushes it up. The movement of the pin 12 to the moving destination is instructed. The motor 11 has an encoder therein, and the encoder raises an end signal indicating that the movement is completed when the pushing pin 12 reaches a predetermined range from the designated movement destination (the pushing pin driving control circuit ( 50).

Hereinafter, the mask conveyance method of the proximity exposure apparatus which concerns on one Embodiment of this invention is demonstrated. In FIG. 2, the spacer mounting apparatus 31 and the wide field camera 51 are arrange | positioned above the chuck 10 in a mask receiving position. 7 is a diagram illustrating the arrangement of a spacer mounting device and a wide field of view camera. In FIG. 7, the mask 2 carried in by the mask conveyance robot 40 is shown with the broken line. The spacer attaching device 31 is disposed above the periphery of the mask 2, and the mask protective spacer 30 is provided on the surface of the chuck 10 from above the chuck 10, as will be described later. . The wide field of view camera 51 is arrange | positioned above the position detection mark provided in the mask 2, and acquires the image of the position detection mark of the mask 2.

8A is a top view of the mask protective spacer, FIG. 8B is a side view of the mask protective spacer seen in the direction of arrow C of FIG. 8A, and FIG. 8C is a side view of the mask protective spacer seen in the direction of arrow D of FIG. 8A. The mask protective spacer 30 has a flat surface 30a, a stepped surface 30b higher than the flat surface 30a, and an inclined surface 30c provided between the flat surface 30a and the stepped surface 30b. Have The side surface of the mask protective spacer 30 is provided with the groove | channel 30d extended in a horizontal direction, as shown to FIG. 8B and FIG. 8C. When the pushing pin 12 carrying the mask 2 is lowered, the edge of the pattern surface (lower surface) of the mask 2 is guided by the inclined surface 30c, and the flat surface 30a is the pattern surface of the mask ( The mask 2 is supported by contacting the peripheral portion where the pattern of the lower surface) is not formed.

9A is a side view of the spacer mounting device, and FIG. 9B is a front view of the spacer mounting device. The spacer attaching device 31 includes an air cylinder table 32, a chuck base 33, an air chuck 34, a bracket 35, a clamp 36, and a hook 37. The air cylinder table 32 drives an air cylinder by the pressure of the air supplied from the air pressure circuit which is not shown in figure, and moves the table 32a to the downward direction of drawing. An L-shaped chuck base 33 is attached to the table 32a of the air cylinder table 32, and an air chuck 34 is attached to the lower end of the chuck base 33. As shown in FIG. 9B, the clamps 36 are respectively attached to the two brackets 35 connected to the air chuck 34, and the two clamps 36 are driven by the air chuck 34. 9B is moved in the horizontal direction of the drawing to open and close. Each clamp 36 is provided with a hook 37 for catching a groove 30d provided on the side surface of the mask protective spacer 30, and the two clamps 36 are hooks (closed in Fig. 9B). 37 is held in the groove 30d of the mask protective spacer 30 to support the mask protective spacer 30.

10 is a diagram illustrating an operation of the spacer attaching device. The spacer attaching device 31 installs the mask protective spacer 30 on the surface of the chuck 10 before the mask 2 is carried into the chuck 10. Before installing the mask protective spacer 30, as shown in FIG. 10A, the table 32a of the air cylinder table 32 is in the raised state, and the clamp 36 has chucked the mask protective spacer 30. I support it from). When installing the mask protective spacer 30, the spacer mounting apparatus 31 lowers the table 32a of the air cylinder table 32, and as shown in FIG. 10B, the mask protection supported by the clamp 36 is carried out. Move the spacer 30 to the surface of the chuck 10. Then, the clamp 36 is opened to place the mask protective spacer 30 on the surface of the chuck 10. Thereafter, as shown in FIG. 10C, the spacer attaching device 31 raises the table 32a of the air cylinder table 32 again and waits. When the mask protective spacer 30 is recovered from the chuck 10, the reverse operation is performed.

In addition, in this embodiment, although the spacer installation apparatus 31 is arrange | positioned above the chuck 10 and the mask protective spacer 30 is provided in the surface of the chuck 10 from the upper side of the chuck 10, the mask The protective spacer 30 may be incorporated in the chuck 10, and the mask protective spacer 30 may be raised from the surface of the chuck 10.

11 is a top view of the chuck provided with a mask protective spacer. The mask protective spacer 30 provided on the surface of the chuck 10 has a pattern on the pattern surface (lower surface) of the mask 2 when the push pin 12 loaded with the mask 2 indicated by broken lines is lowered. The mask 2 is supported in contact with the peripheral portion that is not. As a result, the pattern surface (lower surface) of the mask 2 is in contact with the surface of the chuck 10, thereby preventing the pattern from being damaged.

It is a figure explaining the operation | movement of a pushing pin unit and a mask conveyance robot. When carrying in the mask 2 to the chuck 10, first, the motor 11 of each pushing pin unit raises the pushing pin 12 (Fig. 12 (a)). The mask transfer robot 40 moves the handling arm 41 which accommodated the mask 2 above the chuck 10 (FIG. 12A). Subsequently, the mask transfer robot 40 lowers the handling arm 41, loads the mask 2 onto the push pin 12 (FIG. 12B), and further lowers the handling arm 41, thereby handling the handling arm 41. The mask support part 41a of 41 is separated from the mask 2 (FIG. 12C). As a result, each of the pushing pins 12 receives the mask 2 from the mask transfer robot 40. Next, the mask transfer robot 40 evacuates the handling arm 41 from above the chuck 10 (FIG. 8 (d)).

A plurality of push pin units having a push pin 12 rising inside the chuck 10 and a pulse motor 11 moving the push pin up and down are installed in the chuck 10, and a push pin ( Since the mask 1 is received from the mask transfer robot 40 by 12, even if the mask 2 is smaller than the board | substrate with which the chuck 10 is mounted, the mask 2 can be carried in to the chuck 10.

When the chuck 10 is moved from the mask receiving position to the mask mounting position, the motor 11 of each pushing pin unit lowers the pushing pin 12 and moves the mask 2 to the mask protective spacer 30. Load. When the mask 2 is taken out from the chuck 10, the reverse operation is performed.

It is a figure which shows the state which the mask carried in to the chuck in the mask receiving position. The wide field of view camera 51 disposed above the chuck 10 at the mask receiving position has a wider field of view with a lower resolution than the high resolution movable camera 52 and the high resolution fixed camera 54 described later. An image of the position detection mark of the mask 2 loaded in 12 is obtained, and an image signal is output to the image processing apparatus 55 of FIG. 1. The image processing apparatus 55 processes the image signal output by the wide field camera 51, and detects the position of the mask 2. Even if the position of the mask 2 which the pushing pin 12 received from the mask conveyance robot 40 is largely shifted | deviated, the image of the mark for position detection of the mask 2 is short-lived using the wide field camera 51 for a short time. The position of the mask 2 is detected in a short time from the mask receiving position.

In FIG. 1, the main control device 80 inputs the detection result of the position of the mask 2 detected by the image processing device 55 by processing the image signal of the wide-field camera 51, and stored in advance. The deviation amount of the position of the mask 2 is detected compared with the reference position of the mask 2 at the mask receiving position. Subsequently, the main controller 80 controls the X stage driving circuit 71, the Y stage driving circuit 72, and the θ stage driving circuit 73, and the X stage 5 and the Y stage 7. And the chuck 10 are moved by the θ stage 8, and the mask 2 is moved from the mask receiving position to the mask mounting position below the mask holder 20. At that time, the main controller 80 determines the X stage 5, the Y stage 7, and the θ stage 8 from the coordinates of the reference position of the mask 2 stored in advance and the coordinates of the mask mounting position. The movement amount is determined, and the determined movement amount is corrected based on the detected shift amount of the position of the mask 2.

The position of the mask 2 is detected at the mask receiving position, and the chuck 10 is formed by the X stage 5, the Y stage 7, and the θ stage 8 based on the detected position of the mask 2. Even if the mask 2 is moved from the mask receiving position to the mask mounting position and the position of the mask 2 received from the mask transfer robot 40 by the pushing pin 12 at the mask receiving position is shifted. The mask 2 is accurately moved to the mask mounting position.

14 is a top view of the mask holder. The mask holder 20 is provided with an opening slightly larger than the opening 20a through which the exposure light passes, and an opening 20a through which the exposure light passes through the holder portions 21a and 2lb is formed inside the opening. It is. The holder parts 21a and 2lb are attached to the lower surface of the mask holder 20, and the part below the mask holder 20 of the holder parts 21a and 2lb is shown with the broken line. The holder portions 21a and 2lb are vacuum-adsorbed and supported at the periphery of the mask 2 indicated by broken lines. The holder part 21a is provided with the mask position detection window mentioned later at the position of the position detection mark of the mask 2, and the high resolution movable camera 52 and the high resolution fixed camera 54 above the mask position detection window. Is arranged. The high resolution movable camera 52 is attached to the camera moving mechanism 53, and is moved in the X and Y directions above the mask holder 20 by the camera moving mechanism 53 and rotated in the θ direction. . The high resolution fixed camera 54 is fixed above the mask holder 20.

15 is a diagram illustrating an operation of attaching a mask to a mask holder. In the mask mounting position, when attaching the mask to the mask holder, first, the motor 11 of each pushing pin unit has a height at which the mark for position detection of the mask 2 is in focus with the focus of the high-resolution movable camera 52. The lifting pin 12 is raised until then (FIG. 15A). The high resolution movable camera 52 acquires the image of the position detection mark of the mask 2 through the mask position detection window 22 provided in the holder part 21a. At this time, when the position of the mask 2 moved to the mask mounting position is slightly shifted, and the mark for position detection of the mask 2 is out of the field of view of the high-resolution movable camera 52, by the camera movement mechanism 53 The high resolution movable camera 52 is moved and the mark for position detection of the mask 2 is placed in the visual field of the high resolution movable camera 52. The high resolution movable camera 52 outputs the image signal of the acquired image to the image processing apparatus 55 of FIG. The image processing apparatus 55 processes the image signal output from the high resolution movable camera 52 and detects the position of the mask 2.

1, the main control device 80 inputs the detection result of the position of the mask 2 which the image processing apparatus 55 processed and detected the image signal of the high-resolution movable camera 52, and previously memorize | stored. The shift amount of the position of the mask 2 is detected as compared with the reference position of the mask 2 at the mask mounting position. Then, the main control device 80 uses the X stage driving circuit 71, the Y stage driving circuit 72, and the θ stage driving circuit 73 based on the detected difference amount of the position of the mask 2. After control, the chuck 10 is moved by the X stage 5, the Y stage 7, and the θ stage 8 to perform positioning of the mask 2. Even if the position of the mask 2 is shifted in the mask mounting position, the position of the mask 2 is accurately detected using the high-resolution movable camera 52, and the positioning of the mask 2 is performed with high accuracy.

In Fig. 15, after completion of positioning of the mask 2, the motor 11 of each push pin unit further raises the push pin 12, thereby moving the mask 2 to the holder portions 21a and 2lb. Pressure is applied (FIG. 15b). A negative pressure glass 23 is provided above the mask 2 to which the pressure is applied to the holder portions 21a and 2lb, and a negative pressure seal is formed between the negative pressure glass 23 and the mask 2. Suction grooves (not shown) are provided in the holder portions 21a and 2lb, and after the pressure in the negative pressure chamber is controlled, the holder portions 21a and 2lb connect the peripheral portions of the mask 2 by the suction grooves not shown. Vacuum suction.

The chuck 10 is moved by the X stage 5, the Y stage 7, and the θ stage 8 to position the mask 2, and the mask 2 is moved by the pushing pin 12. Is mounted on the mask holder 20, the mask 2 carried into the chuck 10 is accurately positioned by the X stage 5, the Y stage 7 and the θ stage 8, and the mask It is mounted to the holder 20.

After the holder portions 21a and 2lb vacuum suck the mask 2, the high resolution fixed camera 54 detects the position of the mask 2 through the mask position detection window 22 provided in the holder portion 21a. The image of the dragon mark is acquired, and an image signal is output to the image processing apparatus 55 of FIG. The image processing apparatus 55 processes the image signal output from the high resolution fixed camera 54 and detects the position of the mask 2.

In FIG. 1, the main control device 80 inputs the detection result of the position of the mask 2 which the image processing device 55 processed and detected the image signal of the high resolution fixed camera 54, and previously memorize | stored. Compared with the reference position of the mask 2 at the mask mounting position, the shift amount of the position of the mask 2 is detected, and it is determined whether or not the position of the mask 2 is corrected. In this embodiment, when the high resolution movable camera 52 is moved and the position of the mask 2 is detected, the movement error of the high resolution movable camera 52 is contained in the detection result of the position of the mask 2. Therefore, the position of the mask 2 positioned based on the position of the mask 2 detected by the image processing apparatus 55 processing the image signal of the high resolution movable camera 52 is the reference position of the mask 2. There is a risk of escape.

When the position of the mask 2 needs to be corrected, the vacuum suction of the mask 2 is released, the pressure in the negative pressure chamber is returned to atmospheric pressure, and then the pushing pin 12 is lowered to hold the mask 2. It is separated from the portions 21a and 2lb. Then, the main control device 80 performs the X stage driving circuit 71, the Y stage driving circuit 72, and the θ stage driving circuit 73 based on the detected shift amount of the position of the mask 2. The chuck 10 is moved by the X stage 5, the Y stage 7, and the θ stage 8 to correct the position of the mask 2. By using the high resolution fixed camera 54 fixed upward of the mask holder 20, the position of the mask 2 is detected more accurately, and the position of the positioned mask 2 is corrected with high precision.

After correcting the position of the mask 2, the motor 11 of each pushing pin unit raises the pushing pin 12 again, and presses the mask 2 to the holder portions 21a and 2lb. Add. After controlling the pressure in the negative pressure chamber, the holder portions 21a and 2lb vacuum suction the mask 2 by an adsorption groove (not shown). After the mounting of the mask 2 is finished, the motor 11 of each pushing pin unit lowers the pushing pin 12 (FIG. 15C). Then, the chuck 10 is returned to the mask receiving position, and the mask protective spacer 30 is recovered from the chuck 10 by the spacer mounting device 31.

In the exposure of the substrate, when the gap between the mask 2 and the substrate is matched or when the mask 2 and the substrate are removed, the mask holder is pushed or pulled by the air between the mask 2 and the substrate. The mask 2 supported by 20 was closed. And when the fin mask 2 returns to the original state, there exists a possibility that the position shift of the mask 2 may arise. In this embodiment, when the position shift prevention pin unit is provided in the lower surface of the mask holder, and the mask 2 and a board | substrate approach, or when the mask 2 and a board | substrate are removed, Prevent misalignment.

It is a figure which shows the position shift prevention pin unit provided in the lower surface of the mask holder. In this embodiment, two types of pins, a reference pin and a pressure pin, are used as the position shift prevention pin. The misalignment prevention pin unit of the reference pin includes a reference pin 61, a pulse motor 62, a ball screw 63, and a contact sensor 64, and one of two sides of the mask 2 facing each other. It is installed on the side. The position shift prevention pin unit of a press pin is comprised including the press pin 66 and the air cylinder 67, and is provided in the other side of the two sides which the mask 2 opposes.

In addition, in this embodiment, although the position shift prevention pin unit of a reference pin and the position shift prevention pin unit of a pressure pin are provided, the position shift prevention pin unit of a reference pin is provided instead of the position shift prevention pin unit of a pressure pin, All of them may be used as a pin shift preventing pin unit. In addition, in this embodiment, although two position shift prevention pin units are provided in the long side and one short side of the mask 2, the number and position of a position shift prevention pin unit are the It is decided appropriately according to the dimension.

It is a figure explaining the operation | movement of the position shift prevention pin unit of a reference pin. A ball screw 63 is connected to the pulse motor 62, and a reference pin 61 and a contact sensor 64 are attached to the nut of the ball screw 63. As the pulse motor 62 drives the ball screw 63, the reference pin 61 and the contact sensor 64 are moved toward the side of the mask 2. As shown in Fig. 17A, the tip end of the contact sensor 64 is drilled by the distance D from the tip end of the reference pin 61.

The reference pin drive control circuit 65 in FIG. 16 controls the pulse motor 62 to move the reference pin 61 and the contact sensor 64 toward the side of the mask 2. The tip portion of the contact sensor 64 is displaced when it strikes the side surface of the mask 2, and the contact sensor 64 detects the displacement amount and outputs a detection signal to the reference pin drive control circuit 65. As shown in FIG. 17 (a), in the state where the tip portion of the contact sensor 64 does not contact the side surface of the mask 2, the amount of displacement of the tip portion of the contact sensor 64 is zero. As shown in FIG. 17B, when the tip portion of the contact sensor 64 contacts the side surface of the mask 2, the amount of displacement of the tip portion of the contact sensor 64 thereafter is the reference pin 61 and the contact sensor 64. Is equal to the amount of movement.

When the amount of displacement of the tip portion of the contact sensor 64 is equal to the amount of movement of the reference pin 61 and the contact sensor 64, the reference pin drive control circuit 65 includes the reference pin 61 and the contact sensor 64. Slow down the movement. The reference pin 61 and the contact sensor 64 are further moved at low speed, and as shown in FIG. 17C, when the tip of the reference pin 61 contacts the side of the mask 2, the reference pin 61 thereafter. ) And the contact sensor 64 do not change the displacement amount of the tip portion of the contact sensor 64. The reference pin drive control circuit 65 contacts the reference pin 61 and the contact when the tip of the reference pin 61 is in contact with the side surface of the mask 2 and the displacement amount of the tip of the contact sensor 64 does not change. The movement of the sensor 64 is stopped. When the reference pin 61 comes into contact with the side surface of the mask 2, the movement of the reference pin 61 is stopped. Thus, the mask 2 is pushed by the reference pin 61 to shift the position of the mask 2 positioned. There is no

In FIG. 16, after the tip of the reference pin 61 is brought into contact with the side surface of the mask 2, the pressure pin drive control circuit 68 supplies air to the air cylinder 67, and the air cylinder 67. Pressurizes the pressing pin 66 to the side surface of the mask 2; When the mask 2 supported by the mask holder 20 is bent when the mask 2 and the substrate are brought close to each other, or when the mask 2 and the substrate are separated, the side surface of the mask 2 is in the center direction of the mask. Go to. The reference pin 61 does not follow the movement of the side surface of the mask 2, and the side surface of the mask 2 is far from the tip of the reference pin 61. The pressing pin 66 moves in accordance with the movement of the side surface of the mask 2. When the mask 2 is returned to its original state, the side surface of the mask 2 on the reference pin 61 side is positioned in contact with the reference pin 61 and positioned on the pressing pin 66 side of the mask 2. The side overcomes the pressing force of the pressing pin 66 and returns to its original position. Therefore, the position shift of the mask when the mask 2 and the substrate are approached or when the mask 2 and the substrate are dropped is prevented.

According to the embodiment described above, the mask 2 is carried into the chuck 10 by the mask transfer robot 40, the mask 2 is received from the mask transfer robot 40 by the pushing pin 12, The high resolution movable camera 52 is moved by the camera moving mechanism 53, the image of the position detection mark of the mask 2 is acquired by the high resolution movable camera 52, and the image signal of the high resolution movable camera 52 is obtained. To detect the position of the mask 2, and based on the detected position of the mask 2, the chuck 10 by the X stage 5, the Y stage 7 and the θ stage 8 The position of the mask 2 smaller than the substrate can be precisely positioned by moving, moving the mask 2, positioning the mask 2, and attaching the mask 2 to the mask holder 20 by the pushing pin 12. Can be attached to the mask holder 20.

Furthermore, the image of the position detection mark of the mask 2 is acquired by the high resolution fixed camera 54 fixed above the mask holder 20, the image signal of the high resolution fixed camera 54 is processed, and the mask ( The position of 2) is detected, and the chuck 10 is moved and positioned by the X stage 5, the Y stage 7, and the θ stage 8 based on the detected position of the mask 2. As the position of the mask 2 is corrected, the position of the mask 2 is detected and positioned more accurately by using the high resolution fixed camera 54 fixed above the mask holder 20. The position of can be corrected with high accuracy.

Moreover, the mask 2 is received from the mask transfer robot 40 by the pushing pin 12 at the mask receiving position provided separately from the mask mounting position under the mask holder 20, and is compared with the high resolution movable camera 52. An image of the position detection mark of the mask 2 is acquired by the wide-field camera 51 having a low resolution and possessing a wide field of view, and the image signal of the wide-field camera 2 is processed to adjust the position of the mask 2. Based on the detected position of the mask 2, the chuck is moved by the X stage 5, the Y stage 7, and the θ stage 8, and the mask 2 is masked from the mask receiving position. By moving to the mounting position, even if the position of the mask 2 which the pushing pin 12 received from the mask conveyance robot 40 is largely shifted, the position of the mask 2 is detected in a short time from the mask receiving position, On the mask mounting mask (2) It can move with good precision.

Further, when the pushing pin 12 is lowered, a plurality of mask protection spacers 30 which contact the periphery of the pattern surface of the mask 2 are raised on the surface of the chuck 10 for some reason. Even if the pin 12 is lowered, it is possible to prevent the pattern surface of the mask 2 in contact with the surface of the chuck 10 and to damage the pattern.

In addition, the reference pin 61 and the reference pin 61 which are in contact with the side surface of the mask 2 supported by the mask holder 20 to prevent the positional shift of the mask 2 are moved to the side surface of the mask 2. The mask holder 20 is provided with a plurality of misalignment prevention pin units having a pulse motor 62 for contacting and a contact sensor 64 for detecting that the reference pin 61 contacts the side of the mask 2. And control the pulse motor 62 of each position shift prevention pin unit, move the reference pin 61 toward the side surface of the mask 2, and based on the detection result of the contact sensor 40, the reference pin 61 The position shift of the mask 2 when the mask 2 and the substrate are brought close to each other or the mask 2 and the substrate are separated without moving the position of the positioned mask 2 by stopping the movement of the? Can be prevented.

The exposure of the substrate is performed using the proximity exposure apparatus of the present invention, or the mask is mounted on the mask holder using the mask conveying method of the proximity exposure apparatus of the present invention, and the position of the mask is exposed as the substrate is exposed. Since the crystal can be precisely performed, the pattern transfer can be performed with high precision, and a high quality display panel substrate can be manufactured.

For example, FIG. 18 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal monitor device. In the thin film formation step (step 101), a thin film such as a conductor film or insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on a substrate by a sputtering method, a plasma chemical vapor deposition (CVD) method, or the like. In a resist coating process (step 102), the photosensitive resin material (photoresist) is apply | coated by a roll coating method etc., and a photoresist film is formed on the thin film formed in the thin film formation process (step 101). In an exposure process (step 103), the pattern of a mask is transferred to a photoresist film using a proximity exposure apparatus, a projection exposure apparatus, etc. In the developing step (step 104), the developer is supplied onto the photoresist film by a shower developing method or the like to remove unnecessary portions of the photoresist film. In the etching step (step 105), the portion of the thin film formed in the thin film forming step (step 101) that is not masked by the photoresist film is removed by wet etching. In a peeling process (step 106), the photoresist film which completed the role of the mask in an etching process (step 105) is peeled with a peeling liquid. Before or after these processes, the board | substrate washing | cleaning / drying process is performed as needed. These processes are repeated several times to form a TFT array on a substrate.

19 is a flowchart which shows an example of the manufacturing process of the color filter substrate of a liquid crystal monitor device. In the black matrix forming step (step 201), a black matrix is formed on the substrate by processing such as resist coating, exposure, development, etching, and peeling. In a coloring pattern formation process (step 202), a coloring pattern is formed on a board | substrate by a dyeing method, a pigment dispersion method, the printing method, an electrodeposition method, etc. This process is repeated with respect to the coloring patterns of R, G, and B. In a protective film formation process (step 203), a protective film is formed on a coloring pattern, and in a transparent electrode film formation process (step 204), a transparent electrode film is formed on a protective film. In front of, during, or after each of these steps, a substrate washing / drying step is performed as necessary.

In the manufacturing process of the TFT substrate shown in FIG. 18, in the exposure process (step 103), in the manufacturing process of the color filter substrate shown in FIG. 19, the black matrix forming process (step 201) and the coloring pattern forming process (step 202) are performed. In an exposure process, the mask conveyance method of the proximity exposure apparatus of this invention or the proximity exposure apparatus of this invention can be applied.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows schematic structure of the proximity exposure apparatus which concerns on one Embodiment of this invention.

2 is a plan view of a proximity exposure apparatus according to one embodiment of the invention.

3 is a top view of the chuck.

4A is a top view of the opening provided in the chuck.

4B is a cross-sectional view of the A-A portion of FIG. 4A.

5A is a top view of the opening provided in the chuck.

5B is a cross-sectional view of the B-B portion of FIG. 5A.

6 is a diagram illustrating a control system of a pushing pin unit.

It is a figure which shows arrangement | positioning of a spacer installation apparatus and a wide field camera.

8A is a top view of the mask protective spacer.

FIG. 8B is a side view of the mask protective spacer viewed in the direction of arrow C of FIG. 8A.

FIG. 8C is a side view of the mask protective spacer viewed in the direction of arrow D of FIG. 8A.

9A is a side view of the spacer mounting device.

9B is a front view of the spacer mounting apparatus.

It is a figure explaining the operation | movement of a spacer installation apparatus.

11 is a top view of the chuck with mask protection spacers installed.

It is a figure explaining the operation | movement of a pushing pin unit and a mask conveyance robot.

It is a figure which shows the state which the mask carried in to the chuck in the mask receiving position.

14 is a top view of the mask holder.

It is a figure explaining the operation | movement which attaches a mask to a mask holder.

It is a figure which shows the position shift prevention pin unit provided in the lower surface of the mask holder.

It is a figure explaining the operation | movement of the position shift prevention pin unit of a reference pin.

18 is a flowchart illustrating an example of a process of manufacturing a TFT substrate of a liquid crystal monitor device.

19 is a flowchart illustrating an example of a manufacturing process of a color filter substrate of a liquid crystal monitor device.

<Description of main parts of drawing>

1: substrate 2: mask

3: Base 4: X Guide

5: X stage 6: Y guide

7: Y stage 8: θ stage

9: Chuck Support 10: Chuck

11: motor 12: push-up pin

13: lid 14: flange

15, 17, 19: bolt 16: set screw

18: support plate 20: mask holder

21a, 2lb: Holder 22: Mask position detection window

23: negative pressure glass 30: mask protective spacer

31: spacer mounting device 32: air cylinder table

33: chuck base 34: air chuck

35: bracket 36: clamp

37: Hook 40: Mask Bounce Robot

41: handling arm 41a: mask support

42: mask stocker 50: lift pin drive control circuit

51: wide-field camera 52: high-resolution camera

53: camera moving mechanism 54: high resolution fixed camera

55: image processing device 61: reference pin (position shift prevention pin)

62: pulse motor 63: ball screw

64: touch sensor 65: reference pin drive control circuit

66: Pressurized pin (position misalignment pin) 67: Air cylinder

68: pressure pin drive control circuit 71: X stage drive circuit

72: Y stage driving circuit 73: θ stage driving circuit

80: main control unit

Claims (12)

In the proximity exposure apparatus which has a chuck which mounts a board | substrate, the mask holder which supports a mask, and the stage which moves the said chuck, provides a small gap between a mask and a board | substrate, and transfers the pattern of a mask to a board | substrate. In First control means for controlling the movement of the stage; A mask conveying apparatus for carrying a mask into the chuck; A plurality of pushing pin units attached to the chuck with a pushing pin rising from the inside of the chuck and a motor moving the pushing pin up and down; A first image acquisition device for acquiring an image of a position detection mark provided in the mask and outputting an image signal; Moving means for moving the first image acquisition device; And An image processing device for processing the image signal output by the first image acquisition device to detect the position of the mask; The plurality of push pin units receive a mask from a mask conveyance device by the push pins, The first control means moves the chuck by the stage on the basis of the position of the mask detected by the image processing apparatus by processing the image signal of the first image acquisition device to determine the position of the mask. Doing, And said plurality of pushing pin units attach said mask to said mask holder by said pushing pins. The method of claim 1, A second image acquisition device fixed to an upper side of the mask holder, for acquiring an image of a position detection mark of a mask and outputting an image signal; The image processing apparatus processes the image signal output by the second image acquisition apparatus, detects the position of the mask, The first control means corrects the position of the positioned mask by moving the chuck by the stage based on the position of the mask detected by the image processing apparatus processing the image signal of the second image acquisition device. Proximity exposure apparatus characterized by the above-mentioned. The method of claim 2, The image having the lower resolution and wider field of view than the first image acquisition device is obtained over the mask receiving position that receives the mask from the mask conveying device by the pushing pin, and the image of the mark for position detection of the mask is acquired And a third image acquisition device for outputting a signal, The image processing apparatus processes the image signal output by the third image acquisition apparatus, detects the position of the mask, The first control means moves the chuck by the stage based on the position of the mask detected by the image processing apparatus by processing the third image acquisition device image signal, and the mask is moved from the mask receiving position. A proximity exposure apparatus characterized by moving to a mask mounting position under the mask holder. The method according to any one of claims 1 to 3, And a plurality of spacers provided on the surface of the chuck and contacting the periphery of the pattern surface of the mask when the pushing pin carrying the mask descends. The method according to any one of claims 1 to 4, The position shift prevention pin which contacts the side surface of the mask supported by the said mask holder and prevents position shift of a mask, the motor which moves the position shift prevention pin and contacts the side surface of a mask, and the said position shift prevention pin is a side surface of a mask. A plurality of misalignment prevention pin units, each sensor having a sensor for detecting contact with the light source and attached to the mask holder; And Second control means for controlling the motor of each position shift prevention pin unit, The second control means controls the motor of each position shift prevention pin unit to move the position shift prevention pin toward the side surface of the mask, and moves the position shift prevention pin based on the detection result of the sensor. Proximity exposure apparatus characterized in that the stop. A mask of a proximity exposure apparatus having a chuck for mounting a substrate, a mask holder for supporting a mask, and a stage for moving the chuck, and providing a small gap between the mask and the substrate and transferring the pattern of the mask to the substrate. By the return method, A plurality of push pin units having a push pin rising from the inside of the chuck and a motor moving the push pin up and down are installed in the chuck, A first image acquisition device for acquiring an image of the position detection mark provided in the mask and outputting an image signal, and moving means for moving the first image acquisition device, The mask is brought into the chuck by the mask conveying device, The mask is received from the mask conveying device by the pushing pin, The first image acquisition device is moved by the moving means, the image of the mark for position detection of the mask is acquired by the first image acquisition device, Process the image signal of the first image acquisition device to detect the position of the mask, Based on the detected position of the mask, the chuck is moved by the stage to position the mask, The mask conveyance method of a proximity exposure apparatus characterized by attaching a mask to a mask holder by a pushing pin. The method of claim 6, A second image acquisition device fixed to the mask holder and acquiring an image of the position detection mark of the mask and outputting an image signal, The image of the position detection mark of a mask is acquired by a 2nd image acquisition apparatus, Process the image signal of the second image acquisition device to detect the position of the mask, The mask conveyance method of a proximity exposure apparatus characterized by correct | amending the position of the positioned mask by moving a chuck by a stage based on the detected position of the mask. The method of claim 7, wherein The mask is received from the mask conveying device by a push pin at a mask receiving position provided separately from the mask mounting position under the mask holder, A third image acquisition device which has a lower resolution than the first image acquisition device and has a wider field of view, acquires an image of the position detection mark of the mask and outputs an image signal, is provided above the mask receiving position, The image of the position detection mark of a mask is acquired by a 3rd image acquisition apparatus, Process the image signal of the third image acquisition device to detect the position of the mask, The mask conveyance method of a proximity exposure apparatus characterized by moving a chuck by a stage based on the detected position of the mask, and moving a mask from a mask receiving position to a mask mounting position. The method according to any one of claims 6 to 8, The mask conveyance method of a proximity exposure apparatus characterized by providing the spacer of the chuck surface in contact with the peripheral part of the pattern surface of a mask when the pushing pin which loaded the mask descends. The method according to any one of claims 6 to 9, The position shift prevention pin which contacts the side surface of the mask supported by the mask holder and prevents the position shift of the mask, the motor which moves a position shift prevention pin to contact the side surface of a mask, and the position shift prevention pin which contacted the side surface of a mask. A plurality of misalignment prevention pin units having sensors for detecting the Proximity exposure apparatus characterized by controlling the motor of each position shift prevention pin unit, moving a position shift prevention pin toward the side surface of a mask, and stopping movement of a position shift prevention pin based on the detection result of a sensor. Mask conveying method. Exposure of a board | substrate is performed using the proximity exposure apparatus in any one of Claims 1-5. The manufacturing method of the display panel board | substrate characterized by the above-mentioned. The manufacturing method of the display panel substrate which mounts a mask to a mask holder and performs exposure of a board | substrate using the mask conveyance method of the proximity exposure apparatus in any one of Claims 6-10.

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