KR20090105933A - 모바일 어플리케이션에 사용되는 마이크로 메카니칼 및 마이크로 광학 부품용 하우징 - Google Patents
모바일 어플리케이션에 사용되는 마이크로 메카니칼 및 마이크로 광학 부품용 하우징 Download PDFInfo
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- KR20090105933A KR20090105933A KR1020097015082A KR20097015082A KR20090105933A KR 20090105933 A KR20090105933 A KR 20090105933A KR 1020097015082 A KR1020097015082 A KR 1020097015082A KR 20097015082 A KR20097015082 A KR 20097015082A KR 20090105933 A KR20090105933 A KR 20090105933A
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0032—Packages or encapsulation
- B81B7/0067—Packages or encapsulation for controlling the passage of optical signals through the package
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00317—Packaging optical devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/042—Micromirrors, not used as optical switches
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0109—Bonding an individual cap on the substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0154—Moulding a cap over the MEMS device
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Micromachines (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007002725.9 | 2007-01-18 | ||
| DE102007002725A DE102007002725A1 (de) | 2007-01-18 | 2007-01-18 | Gehäuse für in mobilen Anwendungen eingesetzte mikromechanische und mikrooptische Bauelemente |
| PCT/EP2008/000321 WO2008087022A1 (de) | 2007-01-18 | 2008-01-17 | Gehäuse für in mobilen anwendungen eingesetzte mikromechanische und mikrooptische bauelemente |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20090105933A true KR20090105933A (ko) | 2009-10-07 |
Family
ID=39471629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020097015082A Withdrawn KR20090105933A (ko) | 2007-01-18 | 2008-01-17 | 모바일 어플리케이션에 사용되는 마이크로 메카니칼 및 마이크로 광학 부품용 하우징 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8201452B2 (https=) |
| EP (1) | EP2102096B1 (https=) |
| JP (1) | JP2010517064A (https=) |
| KR (1) | KR20090105933A (https=) |
| CA (1) | CA2675501A1 (https=) |
| DE (1) | DE102007002725A1 (https=) |
| WO (1) | WO2008087022A1 (https=) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007002725A1 (de) | 2007-01-18 | 2008-07-31 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gehäuse für in mobilen Anwendungen eingesetzte mikromechanische und mikrooptische Bauelemente |
| DE102009045541B4 (de) | 2009-10-09 | 2019-03-14 | Robert Bosch Gmbh | Verfahren zur Herstellung einer mikromechanischen Vorrichtung |
| WO2011118786A1 (ja) * | 2010-03-26 | 2011-09-29 | パナソニック電工株式会社 | ガラス埋込シリコン基板の製造方法 |
| CN102261979B (zh) * | 2010-05-26 | 2013-03-27 | 苏州敏芯微电子技术有限公司 | 用于真空测量的低量程压阻式压力传感器的制造方法 |
| JP2014534462A (ja) | 2011-10-07 | 2014-12-18 | シンガポール国立大学National University Of Singapore | Mems型ズームレンズシステム |
| US9512029B2 (en) | 2012-05-31 | 2016-12-06 | Corning Incorporated | Cover glass article |
| EP2859302B1 (en) * | 2012-06-06 | 2020-07-01 | Northrop Grumman Systems Corporation | Optical accelerometer system |
| EP2883242A1 (de) | 2012-08-10 | 2015-06-17 | Gottfried Wilhelm Leibniz Universität Hannover | Verfahren zum herstellen eines hermetisch abgeschlossenen gehäuses |
| US9726862B2 (en) | 2012-11-08 | 2017-08-08 | DynaOptics LTD, A Public Limited CO. | Lens assemblies and actuators for optical systems and methods therefor |
| ITTO20130225A1 (it) | 2013-03-21 | 2014-09-22 | St Microelectronics Srl | Struttura sensibile microelettromeccanica per un trasduttore acustico capacitivo includente un elemento di limitazione delle oscillazioni di una membrana, e relativo processo di fabbricazione |
| ITTO20130540A1 (it) | 2013-06-28 | 2014-12-29 | St Microelectronics Srl | Dispositivo mems dotato di membrana sospesa e relativo procedimento di fabbricazione |
| DE102014202220B3 (de) | 2013-12-03 | 2015-05-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines Deckelsubstrats und gehäustes strahlungsemittierendes Bauelement |
| US9394161B2 (en) * | 2014-11-14 | 2016-07-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | MEMS and CMOS integration with low-temperature bonding |
| CN105776121A (zh) * | 2014-12-22 | 2016-07-20 | 立锜科技股份有限公司 | 微机电系统芯片 |
| JP6511368B2 (ja) * | 2015-09-01 | 2019-05-15 | アズビル株式会社 | 微細機械装置 |
| JP2017053742A (ja) * | 2015-09-10 | 2017-03-16 | セイコーエプソン株式会社 | 電子デバイスの製造方法、電子デバイス、電子機器、および移動体 |
| US9695039B1 (en) | 2016-03-24 | 2017-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multi-pressure MEMS package |
| TWI638419B (zh) * | 2016-04-18 | 2018-10-11 | 村田製作所股份有限公司 | 一種掃描鏡設備與其製造方法 |
| CN108249381B (zh) * | 2016-12-29 | 2020-03-17 | 财团法人工业技术研究院 | 具冲击吸收器的微机电装置 |
| JP6990547B2 (ja) * | 2017-09-25 | 2022-01-12 | スタンレー電気株式会社 | 電子部品 |
| JP6825612B2 (ja) * | 2017-11-13 | 2021-02-03 | 株式会社村田製作所 | 中央支持部を備えたmems反射器 |
| DE102018200371A1 (de) * | 2018-01-11 | 2019-07-11 | Robert Bosch Gmbh | Interposersubstrat, MEMS-Vorrichtung sowie entsprechendes Herstellungsverfahren |
| US10830787B2 (en) * | 2018-02-20 | 2020-11-10 | General Electric Company | Optical accelerometers for use in navigation grade environments |
| US11220423B2 (en) * | 2018-11-01 | 2022-01-11 | Invensense, Inc. | Reduced MEMS cavity gap |
| DE102018219524A1 (de) | 2018-11-15 | 2020-05-20 | Robert Bosch Gmbh | Verfahren zur Herstellung eines mikroelektromechanischen Sensors und mikroelektromechanischer Sensor |
| EP3705451B1 (en) | 2019-03-06 | 2026-04-29 | Murata Manufacturing Co., Ltd. | Mems structure including a cap with a via |
| US11079230B2 (en) | 2019-05-10 | 2021-08-03 | Northrop Grumman Systems Corporation | Fiber-optic gyroscope (FOG) assembly |
| DE102019207073B4 (de) | 2019-05-15 | 2021-02-18 | OQmented GmbH | Bilderzeugungseinrichtung für ein scannendes Projektionsverfahren mit Bessel-ähnlichen Strahlen |
| DE102019208373A1 (de) * | 2019-06-07 | 2020-12-10 | Infineon Technologies Ag | Herstellen eines MEMS-Bauelements mit Glasabdeckung und MEMS-Bauelement |
| IT201900025042A1 (it) * | 2019-12-20 | 2021-06-20 | St Microelectronics Srl | Procedimento di fabbricazione di un dispositivo microelettromeccanico di tipo ottico dotato di una struttura orientabile e una superficie antiriflettente |
| DE102024202157A1 (de) | 2024-03-07 | 2025-09-11 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung eines MEMS-Arrays |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0540815U (ja) * | 1991-11-01 | 1993-06-01 | レーザーテクノ株式会社 | レ−ザ−式墨出し装置 |
| JP2722314B2 (ja) * | 1993-12-20 | 1998-03-04 | 日本信号株式会社 | プレーナー型ガルバノミラー及びその製造方法 |
| US5591679A (en) | 1995-04-12 | 1997-01-07 | Sensonor A/S | Sealed cavity arrangement method |
| US6316796B1 (en) * | 1995-05-24 | 2001-11-13 | Lucas Novasensor | Single crystal silicon sensor with high aspect ratio and curvilinear structures |
| US6146917A (en) | 1997-03-03 | 2000-11-14 | Ford Motor Company | Fabrication method for encapsulated micromachined structures |
| JP2000258721A (ja) * | 1999-03-10 | 2000-09-22 | Miyota Kk | プレーナー型ガルバノミラー |
| US6315423B1 (en) * | 1999-07-13 | 2001-11-13 | Input/Output, Inc. | Micro machined mirror |
| US6452238B1 (en) | 1999-10-04 | 2002-09-17 | Texas Instruments Incorporated | MEMS wafer level package |
| DE19956654B4 (de) | 1999-11-25 | 2005-04-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Strukturierung von Oberflächen von mikromechanischen und/oder mikrooptischen Bauelementen und/oder Funktionselementen aus glasartigen Materialien |
| JP2001242083A (ja) * | 2000-03-01 | 2001-09-07 | Hamamatsu Photonics Kk | 光増強方法、光増強装置、及びそれを用いた蛍光測定方法、蛍光測定装置 |
| EP2136215A3 (en) | 2000-06-21 | 2014-01-01 | ION Geophysical Corporation | Accelerometer with folded beams |
| DE10038099A1 (de) * | 2000-08-04 | 2002-02-21 | Bosch Gmbh Robert | Mikromechanisches Bauelement |
| US7307775B2 (en) * | 2000-12-07 | 2007-12-11 | Texas Instruments Incorporated | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
| EP1371092B2 (de) * | 2001-03-14 | 2010-11-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur strukturierung eines aus glasartigen material bestehenden flächensubstrats |
| US6834154B2 (en) * | 2001-07-24 | 2004-12-21 | 3M Innovative Properties Co. | Tooling fixture for packaged optical micro-mechanical devices |
| US6771859B2 (en) * | 2001-07-24 | 2004-08-03 | 3M Innovative Properties Company | Self-aligning optical micro-mechanical device package |
| US7090787B2 (en) * | 2002-08-30 | 2006-08-15 | Texas Instruments Incorporated | Drying getters |
| ATE489725T1 (de) * | 2002-09-06 | 2010-12-15 | Fraunhofer Ges Forschung | Glasartiges flächensubstrat, seine verwendung und verfahren zu seiner herstellung |
| US6958846B2 (en) * | 2002-11-26 | 2005-10-25 | Reflectivity, Inc | Spatial light modulators with light absorbing areas |
| WO2004068665A2 (en) | 2003-01-24 | 2004-08-12 | The Board Of Trustees Of The University Of Arkansas Research And Sponsored Programs | Wafer scale packaging technique for sealed optical elements and sealed packages produced thereby |
| US7045868B2 (en) * | 2003-07-31 | 2006-05-16 | Motorola, Inc. | Wafer-level sealed microdevice having trench isolation and methods for making the same |
| JP2005055790A (ja) * | 2003-08-07 | 2005-03-03 | Seiko Epson Corp | 波長可変光フィルタ及びその製造方法 |
| US20050184304A1 (en) | 2004-02-25 | 2005-08-25 | Gupta Pavan O. | Large cavity wafer-level package for MEMS |
| WO2005086229A1 (ja) * | 2004-03-05 | 2005-09-15 | Neomax Materials Co., Ltd. | 光透過用窓部材、光透過用窓部材を備えた半導体パッケージおよび光透過用窓部材の製造方法 |
| JP4390194B2 (ja) * | 2004-03-19 | 2009-12-24 | 株式会社リコー | 偏向ミラー、偏向ミラー製造方法、光書込装置及び画像形成装置 |
| WO2006018839A2 (en) * | 2004-08-16 | 2006-02-23 | Bacterioscan | Detection of bacteria in fluids |
| JP2006170856A (ja) * | 2004-12-16 | 2006-06-29 | Fujitsu Media Device Kk | 加速度センサ |
| US7232701B2 (en) | 2005-01-04 | 2007-06-19 | Freescale Semiconductor, Inc. | Microelectromechanical (MEM) device with a protective cap that functions as a motion stop |
| US7318349B2 (en) * | 2005-06-04 | 2008-01-15 | Vladimir Vaganov | Three-axis integrated MEMS accelerometer |
| DE102007002725A1 (de) | 2007-01-18 | 2008-07-31 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gehäuse für in mobilen Anwendungen eingesetzte mikromechanische und mikrooptische Bauelemente |
-
2007
- 2007-01-18 DE DE102007002725A patent/DE102007002725A1/de not_active Ceased
-
2008
- 2008-01-17 WO PCT/EP2008/000321 patent/WO2008087022A1/de not_active Ceased
- 2008-01-17 CA CA002675501A patent/CA2675501A1/en not_active Abandoned
- 2008-01-17 KR KR1020097015082A patent/KR20090105933A/ko not_active Withdrawn
- 2008-01-17 JP JP2009545870A patent/JP2010517064A/ja active Pending
- 2008-01-17 US US12/448,911 patent/US8201452B2/en active Active
- 2008-01-17 EP EP08707087.6A patent/EP2102096B1/de active Active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2008087022A1 (de) | 2008-07-24 |
| US8201452B2 (en) | 2012-06-19 |
| US20100061073A1 (en) | 2010-03-11 |
| WO2008087022A8 (de) | 2009-08-13 |
| EP2102096A1 (de) | 2009-09-23 |
| CA2675501A1 (en) | 2008-07-24 |
| JP2010517064A (ja) | 2010-05-20 |
| DE102007002725A1 (de) | 2008-07-31 |
| EP2102096B1 (de) | 2016-08-24 |
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Patent event date: 20090717 Patent event code: PA01051R01D Comment text: International Patent Application |
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| PC1203 | Withdrawal of no request for examination | ||
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