KR20090046856A - 저굴절률 조성물 - Google Patents

저굴절률 조성물 Download PDF

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Publication number
KR20090046856A
KR20090046856A KR1020097003729A KR20097003729A KR20090046856A KR 20090046856 A KR20090046856 A KR 20090046856A KR 1020097003729 A KR1020097003729 A KR 1020097003729A KR 20097003729 A KR20097003729 A KR 20097003729A KR 20090046856 A KR20090046856 A KR 20090046856A
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KR
South Korea
Prior art keywords
refractive index
low refractive
oxysilane
nanosilica particles
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020097003729A
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English (en)
Korean (ko)
Inventor
코스탄티노스 코우르타키스
마크 알. 맥키버
폴 그레고리 베키아리안
쉐카르 수브라머니
마리아 페트루씨-사미자
Original Assignee
이 아이 듀폰 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이 아이 듀폰 디 네모아 앤드 캄파니 filed Critical 이 아이 듀폰 디 네모아 앤드 캄파니
Publication of KR20090046856A publication Critical patent/KR20090046856A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Polymerisation Methods In General (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
KR1020097003729A 2006-08-04 2007-08-03 저굴절률 조성물 Withdrawn KR20090046856A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83558106P 2006-08-04 2006-08-04
US60/835,581 2006-08-04

Publications (1)

Publication Number Publication Date
KR20090046856A true KR20090046856A (ko) 2009-05-11

Family

ID=38698877

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097003729A Withdrawn KR20090046856A (ko) 2006-08-04 2007-08-03 저굴절률 조성물

Country Status (6)

Country Link
US (1) US20080032052A1 (https=)
JP (1) JP2009545652A (https=)
KR (1) KR20090046856A (https=)
CN (1) CN101501118A (https=)
TW (1) TW200831588A (https=)
WO (1) WO2008019078A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016159664A1 (ko) * 2015-03-31 2016-10-06 삼성에스디아이 주식회사 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치

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JP2011505465A (ja) * 2007-11-30 2011-02-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 低屈折率組成物、耐摩耗性反射防止コーティングおよび耐摩耗性反射防止コーティングを形成する方法
US8092905B2 (en) * 2008-10-10 2012-01-10 E.I Du Pont De Nemours And Company Compositions containing multifunctional nanoparticles
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
CN102713702B (zh) * 2010-01-13 2016-06-08 3M创新有限公司 具有粘弹性光导的照明装置
JP2013539072A (ja) * 2010-09-16 2013-10-17 エルジー・ケム・リミテッド 感光性樹脂組成物、ドライフィルムソルダーレジスト及び回路基板
CN102634277A (zh) * 2011-02-14 2012-08-15 住龙纳米技术材料(深圳)有限公司 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜
KR20140015443A (ko) 2011-03-09 2014-02-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 입자 크기가 큰 건식 실리카를 포함하는 반사 방지 필름
JP6011527B2 (ja) * 2011-04-26 2016-10-19 大日本印刷株式会社 反射防止フィルム、偏光板及び画像表示装置
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3138875B1 (en) * 2011-08-04 2019-11-20 3M Innovative Properties Company Crosslinked fluorinated polymers with manganese or cerium as additives
CN103389530A (zh) * 2012-08-22 2013-11-13 宁波东旭成化学有限公司 一种反射膜
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
CN110914354B (zh) * 2017-07-20 2022-07-19 3M创新有限公司 通过光化辐射固化的氟化弹性体及其方法
CN111601858B (zh) * 2017-12-18 2022-06-21 3M创新有限公司 通过光化辐射固化的氟化弹性体及其方法
WO2019154765A1 (en) 2018-02-09 2019-08-15 Solvay Specialty Polymers Italy S.P.A. Fluoroelastomer curable composition
WO2021064534A2 (en) 2019-10-03 2021-04-08 3M Innovative Properties Company Silicone elastomers by free radical mediated cure
WO2021090111A1 (en) * 2019-11-04 2021-05-14 3M Innovative Properties Company Fluoropolymer compositions comprising a curing agent with ethylenically unsaturated and electron donor groups, and substrates coated therewith
CN119661958A (zh) * 2023-09-21 2025-03-21 北京小米移动软件有限公司 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备

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US4491508A (en) * 1981-06-01 1985-01-01 General Electric Company Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer
DE4114598A1 (de) * 1991-05-04 1992-11-05 Bayer Ag Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung
US5739180A (en) * 1996-05-02 1998-04-14 Lucent Technologies Inc. Flat panel displays and methods and substrates therefor
JP4240716B2 (ja) * 1999-02-01 2009-03-18 ユニマテック株式会社 含フッ素エラストマー組成物
US6238798B1 (en) * 1999-02-22 2001-05-29 3M Innovative Properties Company Ceramer composition and composite comprising free radically curable fluorochemical component
DE60031148T2 (de) * 1999-08-31 2007-10-25 Daikin Industries, Ltd. Uv-vernetzbare polymerzusammensetzung
US20040019176A1 (en) * 2000-08-29 2004-01-29 Takayuki Araki Curable fluoropolymer, curable resin composition containing the same, and antireflection film
US6896958B1 (en) * 2000-11-29 2005-05-24 Nanophase Technologies Corporation Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles
US7351471B2 (en) * 2000-12-06 2008-04-01 3M Innovative Properties Company Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films
US7371786B2 (en) * 2001-09-04 2008-05-13 Dai Nippon Printing Co., Ltd. Coating composition, coating formed therefrom, anti-reflection coating, anti-reflection film, and image display device
JP4404769B2 (ja) * 2002-08-15 2010-01-27 富士フイルム株式会社 反射防止フィルム、偏光板、及び画像表示装置
KR101237822B1 (ko) * 2003-08-28 2013-02-28 니끼 쇼꾸바이 카세이 가부시키가이샤 반사 방지 적층체
TWI388876B (zh) * 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置
JP2005283872A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置
EP1769033A1 (en) * 2004-06-30 2007-04-04 Dow Corning Corporation Fluorocarbon elastomer silicone vulcanizates
JP4895343B2 (ja) * 2004-09-22 2012-03-14 富士フイルム株式会社 反射防止フィルム、その製造方法、偏光板、及び画像表示装置
US20060147177A1 (en) * 2004-12-30 2006-07-06 Naiyong Jing Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films
US7323514B2 (en) * 2004-12-30 2008-01-29 3M Innovative Properties Company Low refractive index fluoropolymer coating compositions for use in antireflective polymer films
US7691459B2 (en) * 2005-03-22 2010-04-06 Fujifilm Corporation Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same
US7553543B2 (en) * 2005-12-16 2009-06-30 E. I. Du Pont De Nemours And Company Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016159664A1 (ko) * 2015-03-31 2016-10-06 삼성에스디아이 주식회사 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치

Also Published As

Publication number Publication date
US20080032052A1 (en) 2008-02-07
JP2009545652A (ja) 2009-12-24
WO2008019078A1 (en) 2008-02-14
TW200831588A (en) 2008-08-01
CN101501118A (zh) 2009-08-05

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20090224

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid