KR20080099818A - 처리액 재생 방법 및 처리액에 포함되는 금속의 회수 방법 - Google Patents

처리액 재생 방법 및 처리액에 포함되는 금속의 회수 방법 Download PDF

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Publication number
KR20080099818A
KR20080099818A KR1020080043374A KR20080043374A KR20080099818A KR 20080099818 A KR20080099818 A KR 20080099818A KR 1020080043374 A KR1020080043374 A KR 1020080043374A KR 20080043374 A KR20080043374 A KR 20080043374A KR 20080099818 A KR20080099818 A KR 20080099818A
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KR
South Korea
Prior art keywords
liquid
eluent
supply
container
processing liquid
Prior art date
Application number
KR1020080043374A
Other languages
English (en)
Korean (ko)
Inventor
가츠토시 나카타
유키오 다나카
도시히코 가시와이
Original Assignee
스미토모 세이미츠 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미토모 세이미츠 고교 가부시키가이샤 filed Critical 스미토모 세이미츠 고교 가부시키가이샤
Publication of KR20080099818A publication Critical patent/KR20080099818A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Water Treatment By Sorption (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • ing And Chemical Polishing (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
KR1020080043374A 2007-05-10 2008-05-09 처리액 재생 방법 및 처리액에 포함되는 금속의 회수 방법 KR20080099818A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007125980A JP2008280580A (ja) 2007-05-10 2007-05-10 処理液再生方法及び処理液に含まれる金属の回収方法
JPJP-P-2007-00125980 2007-05-10

Publications (1)

Publication Number Publication Date
KR20080099818A true KR20080099818A (ko) 2008-11-13

Family

ID=40112680

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080043374A KR20080099818A (ko) 2007-05-10 2008-05-09 처리액 재생 방법 및 처리액에 포함되는 금속의 회수 방법

Country Status (4)

Country Link
JP (1) JP2008280580A (zh)
KR (1) KR20080099818A (zh)
CN (1) CN101302581A (zh)
TW (1) TW200912041A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013051305A (ja) * 2011-08-31 2013-03-14 Sumitomo Precision Prod Co Ltd キレート材再生方法及び基板処理装置
TWI418657B (zh) * 2011-09-16 2013-12-11 Grand Plastic Technology Co Ltd 玻璃蝕刻液回收分配裝置
JP6247968B2 (ja) * 2014-03-17 2017-12-13 株式会社三進製作所 イオン交換樹脂再生装置、および、イオン交換樹脂再生システム
JP5913512B2 (ja) * 2014-09-30 2016-04-27 芝浦メカトロニクス株式会社 基板処理装置

Also Published As

Publication number Publication date
JP2008280580A (ja) 2008-11-20
TW200912041A (en) 2009-03-16
CN101302581A (zh) 2008-11-12

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