TW200912041A - Regenerative method of processing fluid and reclaiming method of metals contained therein - Google Patents

Abstract

The invention provides treating fluid reproducing method which is able to effectively remove the metal component contained in treating fluid for treating substrate by low cost. The method comprises: a treating fluid reproducing procedure: in the treating area for treating the substrate, the treating liquid passing through the movable container (1) filled with absorbing material inside for absorbing metallic ion; absorbing the metal component in the treating liquid in the absorbing material to separate and remove; a first transferring procedure of transferring the movable container (1) for the treating liquid to pass through to the area separated from the treating area that is absorbing material reproducing area of the reproducing absorbing material; an absorbing material reproducing procedure of in the absorbing material reproducing area, the eluant passing through the movable container (1) transferred from the treating area, eluting the metal absorbed in the absorbing material and reproducing the absorbing material; a second transferring procedure of returning the movable container (1) reproduced with absorbing material from the absorbing material reproducing area to the treating area; in the treating liquid reproducing procedure, using the movable container (1) after reproducing the absorbing material.

Description

200912041 IX. The invention relates to a method for regenerating a treatment liquid, which comprises using a movable container filled with an adsorption material for adsorbing metal ions, and containing a metal component due to substrate treatment. The treatment liquid is regenerated, and a method for recovering the metal component contained in the treatment liquid by the substrate treatment. [Prior Art]

For example, in the steps of manufacturing various substrates such as a semiconductor, a liquid crystal glass substrate, a photomask glass substrate, and a disk substrate, various processing liquids such as an etching liquid, a developing solution, and a cleaning liquid are supplied thereto. The substrate is a step of processing the edge substrate. As an example of the etching treatment (etching treatment), the silver engraving apparatus that performs the etching process can be used, and the storage processing tank that stores the residual liquid, the substrate processing mechanism of the substrate, and the storage will be used. The etching liquid in the tank is supplied to the substrate processing mechanism, and the supplied I insect liquid is recovered from the substrate=the rational mechanism. The liquid is circulated between the storage tank and the substrate processing mechanism. Q丄 is a U.S. Patent No. 2000-96264. The substrate processing machine .&<a> includes a processing chamber having a closed space, a plurality of conveying rollers disposed in the processing chamber, and a plurality of carrying rollers a plurality of nozzle bodies disposed in the processing chamber and ejecting an etchant toward the upper surface of the substrate by the GL φ φ. The etchant is followed by Yao Dexiong 4 k. ± 味_%机构包#•Connecting the storage tank nozzle body For

The supply pipe, the supply pump through which the γ γ is supplied with m etching liquid to each nozzle body, and the recovery pipe connecting the bottom of the processing chamber and the storage tank are provided. According to the remnant device, it is known that the substrate is transported in a predetermined direction by the transport roller, and the etching liquid supplied to the storage tank of each nozzle body by the supply pump through the supply pipe is ejected from the respective nozzle bodies to The upper surface of the substrate is etched with the etching solution. Then, the etching liquid sprayed on the surface of the substrate is recovered from the processing chamber into the storage tank through the recovery tube. For example, when an indium tin oxide film or the like formed on the upper surface of the substrate is etched, a metal such as indium or tin constituting the metal film is etched; in the residual liquid, therefore, In the above (4) device which circulates the button engraving liquid between the storage tank and the counter-processing mechanism, the metal component contained in the (IV) liquid in the storage tank gradually increases, resulting in the problem that the surname treatment cannot be effectively performed, or occurs. There is no problem with an etched shape with good precision. In the above-mentioned surname engraving device, the etching liquid in the storage tank has to be periodically replaced, and the cost of replacing the etching liquid (the disposal cost of the replaced etching liquid or the replacement of the surname engraving) Cost) resulting in increased processing costs.

Therefore, as described in the Japanese Patent Publication No. 20-325-82, it is proposed to separate the metal component from the (iv) liquid in the storage tank using the ion-parent resin, remove the metal component, and then use the (four) liquid. method. Patent Document 1: Japanese Patent Publication No. 2000-96264 Patent Document 2: Japanese Patent Laid-Open Publication No. Hei No. Hei. No. Hei. No. Hei. No. 2 _ _ 〇 〇 公报 沾 ' ' ' ' ' ' ' ' ' ' ' ' ' ' S is caused by not recovering the separated metal component, and the metal film is made of a very expensive metal such as indium, and % of the metal dissolved in the etching liquid is recovered. 200912041 In addition, the process of etching from Pan 8 & etching to liquid separation and removal of metal components requires corresponding equipment, and therefore, the manufacturer of the substrate can not be easily implemented. On the other hand, in the case where the waste liquid treatment is carried out, it is necessary to transport the silver engraving liquid of 〜1 from the substrate manufacturer side to the waste liquid processing shell 2 through the oil w and pass it through the tank truck. The waste liquid (the money engraving that can be reused) is handled by the waste liquid handling personnel side 5 1... _ and 彳 are transported to the side of the substrate manufacturer, which causes problems in transportation costs or is not effective enough. Mainly, 1 external waste liquid processing personnel recovers the metal dissolved in the etching liquid. % & In addition to the above problems, since the concentration of the metal contained in the etching liquid is low, the metal in the surname is recovered. The ingredients are not easy, resulting in a very labor intensive problem. [Summary of the Invention]

The present invention has been made in view of the above circumstances, and it is an object of the invention to provide a method for regenerating a treatment liquid which can efficiently remove a metal component contained in a treatment liquid for substrate processing at a low cost and regenerate the treatment liquid to the environment. A method of recovering the metal contained in the treatment liquid and contributing to the recovery of the metal component contained in the treatment liquid for substrate processing at a low cost. In order to achieve the above object, the present invention relates to a treatment liquid regeneration method or a method for recovering a metal contained in a treatment liquid, which uses a movable container which is internally filled with an adsorption material for adsorbing metal ions; and is subjected to substrate treatment. The treatment area is transported between the treatment area and the recovery area of the 200912041 attached material regeneration area or the recovery area of the metal adsorbed to the adsorption material by reclaiming the adsorption material of the metal component in the treatment liquid. Further, the treatment liquid regeneration method includes the following steps: a treatment liquid regeneration step in which the treatment liquid containing a metal component is treated in the treatment area, and the treatment liquid containing the metal component is passed through the movable container. The metal component in the liquid is adsorbed to the adsorbent material to be separated and removed; ^ The first transport step is a movable container that passes through the treatment liquid (the removable container after use is a metal adsorbed on the adsorbent material) Transfer container) transported from the treatment area to the adsorbent regeneration zone; adsorbent material regeneration step ' In the adsorbent regeneration zone, the eluent is subjected to washing the metal adsorbed to the DH adsorbent material through the movable container θ transported from the treatment zone, and the adsorbent is regenerated; a removable container of the adsorbent material (a removable movable container, that is, a removable container in which the adsorbent material does not adsorb metal) is returned from the adsorbent material regeneration region to the treatment region; σ — In the treatment liquid regeneration step, the removable metal after regeneration using the adsorbent material may be used, and the eluted metal may be recovered from the eluent in the transferable container as needed. In the treatment liquid regeneration method of the present invention, it is understood that the metal component in the treatment liquid is adsorbed to the adsorption material in the movable container in the treatment region, and the movable container after use is transported to the adsorption material regeneration region to be regenerated. Regenerating the adsorbent material, returning the regenerated transportable container to the treatment area for reuse, therefore, only the treatment liquid is placed in the movable container on the treatment area side, and The metal component in the treatment liquid can be adsorbed to the equipment of the adsorbent material of 200912041, and the liquid can be formed into a state that can be reused. * The equipment is regenerated in an inexpensive manner, and the object to be transported is not the phase liquid itself, but is therefore light in weight. It is easy to transfer, and it is very low. It can be transported in a normal truck. It can be transported to the processing area using a removable container. Repeatedly (and attached materials). For these reasons, the treatment liquid containing a metal component due to the substrate treatment is effectively regenerated. Further, by repeating the acoustic torsion y disk, the replacement cycle can be extended: The life extension is m ^ The cost of purchasing the new treatment liquid or the disposal waste of the used treatment liquid 荨, the cost of suppressing the treatment liquid, or the need to stop the replacement of the virtual κ change treatment liquid, continuous The substrate processing is performed to reduce the cost of the substrate processing to a low cost. In addition, it is possible to reduce the amount of processing to be disposed of, or to treat the new processing liquid, which can reduce the amount of substrate processing, and therefore contribute to environmental protection. On the other hand, in the method for recovering the metal contained in the treatment liquid, in the treatment region, the treatment liquid containing the metal component due to the substrate treatment adsorbs the metal component of the treatment liquid through the removable volume In the adsorbent material, the movable container (the movable container after adsorption, that is, the movable container in which the adsorbent is adsorbed with metal) is transported to the recovery area, and then, in the recovery area, the washing is performed. The liquid is passed through the movable container (the movable container carried from the processing area), the treatment of eluting the adsorbed material, and the treatment of recovering the eluted metal from the passed eluate, and then, 200912041 The portable container (removed removable container, that is, a removable container in which the adsorbent material does not adsorb metal) is returned to the processing area for reuse. Therefore, according to the method for recovering metal contained in the treatment liquid of the present invention, it is known that 'the metal component in the treatment liquid is adsorbed on the adsorption material in the movable container in the treatment zone', and the adsorbed movable container is transported to The recovery area 'recovers the metal adsorbed on the adsorbent material, and the removable capacity after the recovery

The device is returned to the processing area* for reuse, and m is effective for recovering the metal dissolved in the treatment liquid by the substrate treatment. Further, the treatment liquid can be passed through the movable container only on the processing area side, and the metal component in the treatment liquid can be adsorbed on the adsorption material. Therefore, it can be handled by a simple and inexpensive apparatus. Further, by adsorbing the metal component in the treatment liquid to the adsorbent in the movable container, the metal element can be collected in the movable state (4), and the transfer to the treatment liquid can be easily recovered. metal. Further, the object to be transported is not the processing liquid itself, but the portable container is therefore light in weight and easy to operate, and the transportation cost is extremely low compared to the tank truck, and can be carried by a normal truck. Further, the movable container after the time is returned to the processing area for reuse, so that the movable container (adsorbing material) can be repeatedly used in multiple sentences. Since: All: It is possible to efficiently regenerate the liquid to be treated by the substrate treatment at a low cost. Further, in the method for regenerating the treatment liquid or the method for recovering the treatment liquid, in the adsorption material regeneration step or the recovery region: after the leaching solution is passed, the cleaning liquid is passed through the aging device The interior of the depleted portable container is also available. ^ 10 200912041 If the eluent remains in the interior of the removable container, the treatment liquid and the eluent may be mixed when the treatment liquid is passed through the treatment area, which may adversely affect the substrate treatment using the treatment liquid, but By passing the eluent and then passing the cleaning liquid, it is possible to prevent the eluent remaining in the portable container from flowing out to cause the above-described problem. Further, in the treatment liquid regeneration method or the method for recovering metal contained in the treatment liquid, when the adsorption material regeneration step or the recovery region cleaning liquid does not pass through the movable container, the movable container may be: Forming a supply unit for supplying the treatment liquid and the eluent to the inside, and a discharge unit for discharging the treatment liquid and the eluent supplied from the supply unit to the outside; and regenerating the treatment liquid In the step or the processing area, the first liquid-passing device of the first liquid-passing device is provided with a processing liquid supply pipe that is detachably connected to the movable container supply unit and supplies the processing liquid, and a processing liquid recovery pipe that is connected to the movable container discharge unit and collects the treatment liquid; and connects the S-processing liquid supply pipe to the supply unit, and connects the sturdy liquid recovery pipe to the discharge unit Thereafter, the treatment liquid is passed through the supply unit; the inside of the portable container is discharged from the discharge unit, and then the treatment liquid supply tube is known from the supply unit. Next a treatment liquid recovery pipe; in the adsorption material regeneration step or the recovery region, the second liquid supply=two-liquid device is provided to be detachably connected to the 〇> The eluent supply pipe of the eluent is connected to the liquid-repellent eluent recovery pipe in a detachable manner in 200912041; and the eluent is recovered and the eluent supply pipe and the liquid are recovered. After the tube is connected to the discharge portion, the connection is made, and after the elution is performed, the eluent extract is discharged from the discharge portion from the inside of the transfer container, and then, The eluent supply pipe is removed from the supply unit, and then the eluent recovery pipe is removed, and the eluent is removed for f, port & The dispenser discharge unit removes the eluent recovery tube. Thereby, it is possible to efficiently perform the eluent by using the second liquid-coating method by performing the treatment of the metal-containing treatment liquid into the 'transfer type trough by the third-pass liquid-repellent treatment using the third-pass liquid-passing device. The removable container adsorbent material is adsorbed with metal by a removable volumetric treatment. On the other hand, in the method of recovering the metal contained in the treatment liquid* method or the treatment liquid, in the case where the adsorption material regeneration step or the recovery region cleaning liquid does not pass through the movable container, the The movable container is formed by supplying the treatment liquid, the eluent and the cleaning liquid to the supply unit of (4), and discharging the treatment liquid, the eluent and the cleaning liquid supplied from the supply unit to the outside a discharge unit, wherein the second liquid passage device includes: detachably connected to the transfer container supply unit and supplies the elution a supply pipe for the liquid and the cleaning liquid, and a recovery pipe that is detachably connected to the removable container discharge unit and collects the eluent and the cleaning liquid; and the supply pipe is connected to the supply unit to The recovery pipe and the 12 200912041 = next, the eluent is discharged from the supply portion from the supply portion, and the liquid is discharged from the supply portion to flow from the supply portion to the movable ... night cleaning Discharge method through the liquid, lack of The collection pipe is detached from the discharge portion of the discharge portion, and the supply pipe is detached from the discharge portion, and the second liquid transfer device is connected from the row or the "second liquid supply device" In the movable container, the eluent supply tube of the second and second liquids, and the sputum-washing k-container discharge portion and the recovery of the eluent and the eluent m are attached to the movable portion. a supply pipe, and a cleaning liquid recovery pipe that is detachably connected to the cleaning liquid of the washing liquid and recovers the cleaning liquid, and the discharge container discharge portion first "connects the eluent supply pipe to the supply portion" After the liquid recovery pipe is connected to the discharge portion, the liquid is removed, and the liquid is transferred to the liquid from the supply portion to be discharged from the supply portion, and then discharged from the supply portion. The eluent supply pipe was removed, and the eluent recovery pipe was then taken out. ΡRemove the cleaning liquid supply pipe: The second::::reporting pipe is connected to the row (4), and the cleaning supply unit removes the cleaning liquid supply pipe and then recovers the pipe. Thereby, it is possible to efficiently utilize the inside of the movable container after the first cleaning liquid is passed through. In addition, as the treatment liquid, for example, _ liquid, (d) 13 200912041 liquid, washing liquid, etc. are mentioned, but it is not limited to these. Further, examples of the metal adsorbing the adsorbent in the movable container include indium or the like, and are not limited thereto. Further, the adsorbent material may, for example, be a chelate material or an ion exchange resin, but is not limited thereto. Further, when a chelating material is used as the adsorbent, the eluent may be hydrochloric acid, sulfuric acid or sodium hydroxide, and the cleaning solution may be pure water or the like. When an ion exchange resin is used as the adsorbent, the eluent may be used. The hydrochloric acid or sodium hydroxide or the like may be used, and the cleaning liquid may be pure water or the like. As described above, according to the processing liquid regeneration method of the present invention, it is known that the movable container is transported between the recovery region and the adsorbent material regeneration region by using a movable container filled with an adsorbent material, thereby enabling low cost. The metal component contained in the processing liquid for substrate processing can be effectively removed, and the treatment liquid can be regenerated to contribute to environmental protection. Further, according to the method for recovering metal contained in the treatment liquid of the present invention, it is understood that the movable container is transported between the recovery region and the adsorbent recovery region by using a movable container in which the adsorbent is filled. The metal component contained in the processing liquid for substrate processing is efficiently recovered at low cost. [Embodiment] (First Embodiment) First, an etching liquid regeneration method according to a first embodiment of the present invention will be described based on the drawings. In the first embodiment, a mode in which an etching liquid containing a metal component by etching a substrate is reproduced will be described. 1 is a flowchart for explaining an etching solution regeneration method according to a first embodiment of the present invention, and FIG. 2 is a flowchart for explaining an etching solution regeneration method according to a first embodiment, and FIG. 3 14 200912041 shows a first embodiment. FIG. 4 is a schematic view showing a schematic configuration of a substrate processing apparatus and the like in the first embodiment. First, the movable container 1 for adsorbing the metal component in the etching liquid will be described based on FIG. 1, FIG. 3 and FIG. The portable container is internally filled with a chelating material (not shown) as an adsorbent for adsorbing metal ions (indium ions or tin ions, which will be described later), and has mobility. Further, the portable container 1 is configured to be attachable and detachable to the substrate processing apparatus (the substrate K is treated with the etching liquid L) and the adsorbent regenerating device 40 for regenerating the chelating material (not shown). Further, a supply unit (not shown) for supplying the etching liquid L or an eluent or a cleaning liquid to be described later to the inside is formed at the upper end portion of the movable container cassette, and the supply unit (not shown) The discharge portion (not shown) that is supplied to the inside of the etching liquid L or the eluent and the cleaning liquid is discharged to the outside. > The chelating material (not shown) is generally a general term for an organic aminocarboxylic acid salt, and has a property of adsorbing metal ions and eluting the adsorbed metal with a specific solution. Specifically, as an example, 丨 edta (ethylenediaminetetraacetic acid), NTA (nitrilotriacetic acid), DTPA (diethylenetriamine pentaacetic acid), glda (l-glutamic acid diacetic acid) ), HEDTA (hydroxyethyl ethylenediamine triacetic acid), GEDTA (glycol ether diamine tetraacetic acid), TTHA (triethylenetetramine hexaacetic acid), HIDA (hydroxyethyl iminodiacetic acid), and DHEG (transethylethylglycine) or the like, but is not limited thereto. Next, the substrate processing apparatus 1A will be described based on FIG. As shown in FIG. 3, the substrate processing apparatus 10 includes, for example, a oxalic acid rich 15 200912041 degrees (% by weight) of about 3% of the etching liquid L. (4) Substrate processing substrate 12 of the substrate κ, and (4) liquid L. σ « # ϊ¥ ,. , 蚀刻 etching liquid L in storage tank i; [ = liquid circulation mechanism 20 circulating between substrate processing mechanisms 12, passing etchant L stored in storage tank 11 through '1 ^ Μ on shifting The etching solution 30 in the combination 15 , the control substrate processing mechanism 12 and the (4) liquid circulation mechanism plus the control of the operation of the etching liquid through mechanism 30 ^ ^ S 1 Λ the clothes 25 and the like and the substrate processing device 10 It is placed in the processing area (see Figure 丨). The substrate processing mechanism 12 includes a processing chamber I3 having a closed space, and a lower chamber disposed in the processing chamber 13, and the 拗t ^ ding direction (arrow pointing) is transported to the table and is formed in the predetermined | surface 1 The plurality of conveyance rollers 14 of the substrate K of the antimony oxide film (metal film) are disposed on the upper portion of the processing chamber 13, and the etching liquid 1 supplied from the etching liquid circulation mechanism 20 is fixedly disposed in the flow tube. And a plurality of nozzle bodies 16 and the like for ejecting the etching liquid L to the upper surface of the substrate K conveyed by the conveyance roller 14, and the (four) night L in the processing chamber u is discharged from the bottom of the processing chamber 13 to the outside. . β % ua The etching liquid circulation mechanism 2 includes: a supply pipe 21 connected to the storage tank u at one end side, and a supply pipe 21 connected to the flow f 15 on the other end side, and a silver engraving liquid is supplied through the supply pipe The supply pump 22 of L, the end side is connected to the discharge port 13a of the processing chamber 13, and the other end side is connected to the recovery pipe 23 of the storage tank or the like. * °Haiyin liquid-liquid-passing mechanism 30 includes: the first mounting portion 31 and the second mounting portion 32, which are detachably mounted to the movable container 1, and the end side is connected to the storage tank U, and the other end The side can be branched and connected to the supply unit (not shown) of each of the movable containers 16 (not shown), and the end can be branched and connected to each other. Removable container, 1 == not shown) Connected money engraving recovery f 34, via money engraving, B to removable trough! The supply pump 内部 of the internal supply etching liquid, the first supply switching valve 36 and the second supply side switching valve 37 provided on the other end side of the etchant supply pipe 33, and the knives are placed in the The first discharge side switching valve 38 and the second discharge side switching "two = helium container 1 are attached to the respective mounting portions 31, and FIG. 2: the supply portion of each of the movable containers 1 (not The other discharge unit (not shown) connected to the 'button engraving tube 34 is connected. The shifting type of the valleys = the switching rooms 36, 37, 38, 39 are controlled by the control device 25 as follows: the first supply side switching valve 36 and the first discharge side switching valve 1 are connected to the supply side switching valve 37 and the second The discharge side switching valve 39: The 仏 supply side switching valve 37 and the second discharge side switching valve 39 close the first supply side switching valve 36 and the first discharge side switching valve 38. In the etching liquid passage mechanism 3, the silver-filled liquid L is ejected to the portable container by the supply of the final liquid supply pipe 33. That is, the first supply side switching room 36 is hit. When the side switching valve 37 in the door sump 11 is closed, the first supply unit 2 and the second supply are supplied, 峨L, and the first supply side is switched: the shift container! When the side switching is ON, the second mounting portion 32: and the second supply is supplied with the residual liquid L. The movable container 丨 on the 2 side is then supplied to any side of the movable container 1, and the etching liquid L circulating in the movable type 17 200912041 is supplied through the etching liquid recovery tank. Thus, the (iv) liquid L is circulated between the storage 34 and the storage. And the movable container 1 The control device 25 performs the following processing: The engraving liquid L is stored in the thumb, 4^ 仏 栗 栗 栗 22 ‘ eclipse * Storage tank 11 and substrate processing mechanism! In the case of the operation supply (4), the process of supplying n, 37, 38, and 39 is controlled, and the movable container 1 (four) of the material is inferred at the time interval between the box and each of the switching valves 36 and ρ(4)Γ1 (not The figure shows that the movable container i with the surname engraving is provided, the same as the interval, and the alternately cut (4) "passing the portable capacity...: - time::: storage tank 11 1). Processing (refer to the substrate processing apparatus i of the figure::), it can be seen that the surname of the deposit in the storage tank u is via the supply pipe 21

^ Each of the nozzle bodies 16 is supplied, and from the respective S-surfaces, the array of the first object 16 is directed to the upper surface of the substrate K, and the liquid (4) on the upper surface of the substrate K is circulated from the processing chamber 13 opening 13a. It is collected into the recovery tank 23 and recovered in the storage tank. The nozzle = substrate κ is conveyed in a predetermined direction by the conveyance roller 14, and is embossed by the money L which is ejected from each of the chambers. Further, since the indium tin oxide film of the earth plate K is dissolved in the etching liquid L, indium ions or tin ions are contained in the etching liquid L·. In addition, the switch can be alternately switched at a preset time interval. „ ^Working effort, at the same time, the etching liquid L· stored in the storage tank 11 is selected: via the supply & 35, each switching valve 36, 37, 38, 39, etching liquid 仏, s 33 and etching liquid recovery tube 34 passes through either of the movable container workers, 200912041: The chelating material (not shown) in the movable container 1 is used to adsorb the indium ions or tin ions as the metal component in the etching attack. It is to be noted that the adsorbent material regenerating device 40 is attached to the material regenerating device 40 as shown in the same figure and r, λ„^ J a includes a removable container i/mountable mounting portion 41, and the eluting material barter 1 The eluent liquid passing mechanism 42 is arranged to pass the cleaning liquid through the movable type Rongqin 2: the cleaning liquid through mechanism 52, and the movable container! In-line washing: = indium or tin to recover metal recovery unit (not shown), control elution q liquid mechanism 42 and cleaning liquid through mechanism 52 and metal recovery unit (not shown) 65, etc.; and the adsorbent material regeneration device is configured to separate the adsorbent material from the occupational area (see 胄...

In addition, the mounting #41, the eluent liquid-passing mechanism 42, the cleaning liquid-passing mechanism U, and the control device i 65 function as the second in the scope of the patent application. ☆ f eluent liquid passage mechanism 42 is provided with an eluent supply mechanism 43 for supplying an eluent for eluting indium or tin adsorbed to a removable chelating material (not shown) The eluent recovery mechanism/8 for recovering the eluent in the removable container i. Further, the eluent is composed of, for example, hydrochloric acid or sulfuric acid or steel hydroxide. The eluent supply mechanism 43 includes: an eluent storage bucket 44 for storing the eluent, a side connected to the eluent storage tank 44, and the other end side capable of being connected to the portable container 丨 supply unit ( (not shown) the connected eluent supply tube 45, the supply pump 46 that supplies the eluent to the inside of the removable container via the eluent supply tube 45, and the supply pump that is provided at one end of the eluent supply tube 45. The eluent supply valve 47 and the like on the downstream side of 46; and wherein, in the movable type 200912041, the trough 1 is mounted on the other end side of the mounting adjacent 4± disc removable eluent supply tube 45. A supply unit (not shown) is connected. The eluent recovery mechanism extracting liquid 49 is connected to the eluent recovery tank 49 of the eluent at the time of storage, and the other end side can be connected with the movable container 1 and the other end The eluent recovery s 50, 5, which is connected to the effluent 0P (not shown), is placed in the eluent to recover the Pushan, 51 ^ . θ # ^ to receive the s 50 - the eluent recovery valve 51 4 on the 鳊 side, And, in the case of the six-shift type 1 state in the mounting portion 41, the other end side of the washing tube 50 and the movable container! The discharge section (not shown) is transported. In the eluent supply mechanism 43 and the eluent recovery mechanism 48, the pump is fed by the pump (4) _ 44 (four), and the sputum supply tube 4 5 is supplied to the portable crying & J moves in the valley 3 1 inside. Further, the eluent recovery pipe 50 is supplied to the eluate recovery tank (4) by the eluent recovery pipe (4) which is supplied into the movable earth quaternary granulator 1 and circulated in the detachable container 1. Further, at this time, the eluent supply valve 47 and the washing liquid ray recovery valve 51 are controlled to be in an open state, and the cleaning liquid supply valve 57 and the cleaning liquid return (four), which will be described later, are controlled to be in a closed state. The cleaning liquid passage mechanism 52 is provided with a cleaning liquid supply mechanism 53 for supplying the cleaning liquid for cleaning the inside of the portable container 1, and a cleaning liquid recovery machine 58 for recovering the cleaning liquid from the movable container. Among them, the cleaning liquid is composed of, for example, pure water. The eluent supply mechanism 53 includes a cleaning liquid storage tank 54 that stores the cleaning liquid, one end side connected to the cleaning liquid storage tank 54, and the other end side on the downstream side of the eluent supply valve 47 and the eluent supply. The tube 45 is connected, and the eluent supply tube 4 5 ' can be connected to the supply unit (the ash-connected cleaning liquid supply tube 5S, the Mt. The liquid supply pipe 55 supplies the supply of the cleaning liquid to the inside of the container*, and the supply of the pump 55 to the downstream side of the pump 56, and the supply of the liquid to the π lotion supply valve 57. And 1 when the portable container i is "on the mounting portion 41, the cleaning liquid supply, the k-end side is connected to the movable container (illustrated) via the eluent supply tube 45). ,,~# (The cleaning liquid recovery mechanism 5 8 does not include .p six & ^ L牯. The cleaning liquid washing liquid recovery tank 59, the end side is connected with the cleaning liquid recovery tank, and ^ The upstream side of the eluent recovery valve 51 and the eluent recovery pipe 5 are connected to the eluent recovery pipe 50 via the eluent recovery pipe 50, and the cleaning liquid recovery pipe 6 can be connected to the movable container i. The cleaning fluid recovery valve 61 of the cleaning liquid recovery pipe, etc., can be clarified in six... The other part of the cleaning liquid recovery pipe 60, which is attached to the mounting portion*, is broken, and the force-receiving side is connected to the discharge portion (not shown) of the instructable container 1 via the eluent recovery pipe 50. The cleaning liquid stored in the cleaning liquid storage tank 54 in the cleaning liquid supply mechanism 53 and the cleaning liquid recovery mechanism 藉 is supplied to the movable container by the supply pump % washing liquid supply pipe 55 and the eluent supply pipe 45. Inside. Further, the cleaning liquid which is supplied to the movable container by the eluent recovery tube 5 and the cleaning liquid recovery tube and which flows through the portable container 1 is recovered in the cleaning liquid recovery tank 59. Further, at this time, the cleaning liquid valve 57 and the cleaning liquid recovery valve 61 are controlled to be in an open state, and the eluent supply valve 47 and the eluent recovery valve 51 are controlled to be in a closed state. The metal recovery unit (not shown) is configured to take out indium or tin from the eluate stored in the eluent recovery tank 21 200912041 49 and collect it. The control device 65 performs the following processes: controlling the supply system μ, the eluent supply valve 47, and the eluent recovery chamber 51, and passing the eluent storage tank eluent to the movable volume B! After the liquid-repellent treatment of the eluent, the control supply pump 56, the cleaning liquid supply valve 57, and the main washing liquid recovery valve 61 are controlled to pass the cleaning liquid in the cleaning liquid storage tank 54 to the movable container 1 for a predetermined period of time. Treatment and utilization of metal recycling department (not shown)

The indium or tin is taken out from the eluent in the eluent recovery _49 and returned to the treatment. According to the adsorbent recovery device 4 configured as described above, first, the supply pump 46, the eluent supply valve 47, the eluent recovery valve 51, and the eluent supply pipe 45A eluent recovery pipe 5〇 are used for storage. The eluent in the eluent storage tank material passes through the movable container i, and the indium or tin adsorbed on the chelating material (not shown) is eluted by the eluent, and contains the eluted indium ion or tin. The ion eluate is recovered in the eluent recovery tank 49. One

After that, the eluent stored in the cleaning liquid storage tank 54 passes through the supply pump 56, the J# washing liquid supply valve 57, the cleaning liquid recovery valve 6] [, the cleaning liquid supply pipe, the eluent supply pipe 45, and the cleaning liquid. The recovery pipe 6〇 and the eluent recovery pipe 5〇 pass through the movable container 1. Thereby, the eluent remaining in the inside of the transfer type 1 is washed by the cleaning liquid, and the cleaning liquid containing the residual eluent is recovered in the cleaning liquid recovery tank 59. Further, indium or tin is taken out from the eluent containing indium ions or tin ions stored in the eluent recovery tank 49 by a metal recovery unit (not shown), and is recovered. Thereby, indium or tin adsorbed to the chelating material of the movable container 1 (not shown in Fig. 22 200912041) is recovered, that is, indium or tin engraved in the etching liquid L by the button in the substrate processing mechanism 12. Yang/Combination Also, after taking, based on the map! Fig. 4 shows a method of regenerating the etching liquid 1 which dissolves and contains a metal such as copper or tin. In the substrate processing mechanism 12, during the (four) processing of the substrate K by the rhyme liquid in the rotary groove u, the movable container 作为, which is the liquid-passing target, is switched at the time interval of the predetermined time. At the same time, the storage (4) money (4) L is selectively passed through the 曰 removable container i attached to the first wire portion 31 or the movable container side mounted to the second mounting portion 32 (step S1). The chelating material in the container (not shown) is removed by the metal component (indium ion or tin ion) of (4), and L is regenerated. Further, the first mounting portion 31 and the second mounting portion 32 are preliminarily mounted. Unfilled filled container 丨 (removable container for chelated indium or tin.) 〆"not) unadsorbed if switched to transferable volume H 1 (in chelating material (not shown) ; 卜 will be used after the OV does not) the adsorption of the marriage or tin removable m replaced with no material transferable capacity less S2).卽, 弟—The removable container i of the mounting portion 31 is cut in the detachable container, and the unloadable capacity and the detachable device are removed from the first installation and the second installation. The movable removable type m (four) after use is a first-amp; V3, the removable second container 32 is detached from the second mounting portion 32; the second movable type is a movable container 1. In addition, the above-mentioned step-by-step Gu Yi 1' textbook does not use the treatment liquid regeneration step in the range of use. 1 and S2 are related to Application No. 23 200912041. Then, the movable container 1 after being used, which is detached from the first mounting portion 31 or the second mounting portion 32, is adsorbed from the processing region side by the transport mechanism such as the truck 2 The material regeneration area side is conveyed (step s 3). Then, after the movable type hopper 1 that has been transported to the side of the adsorbent recovery area is placed in the mounting portion 41, the eluent is passed through the movable container 1 (step S4). Thereby, the indium ruthenium adsorbed to the chelating material (not shown) is first regenerated to regenerate the chelating material (not shown), and will contain the washed f

The elution solution of indium ion or tin ion is recovered in the eluent recovery barrel. Then, indium or tin is taken out from the eluent in the eluent recovery tank 49 to be recovered (step S5). Thereby, indium or tin which is adsorbed on the removable container i chelating material (not shown) (which is dissolved in the surname L in the (four) treatment in the substrate processing mechanism 12) is recovered. Further, after the eluent is passed, the cleaning liquid is removed from the mounting portion 41 through the inside of the portable container i (step S6). Thereby, the eluent remaining in the transferable volume H! is washed with the cleaning liquid, and the cleaning liquid containing the remaining eluent is recovered in the cleaning liquid recovery tank 59. In the above-mentioned step "and the treatment phase of S6, the adsorption material regeneration step in the scope of the towel application. In addition, the transportable container K after the regeneration of steps S4 and S6 is sequestered by a transport mechanism such as a truck 2, for example. The movable container (not shown) in which the indium is not adsorbed is returned to the processing region side from the side of the adsorbent material regeneration region (step S7), and stored in the processing region side (step S8). The rear (unused) removable container! is exchanged with the disposable container 1 after use in step S2. ' As described in detail above, according to the method of reclaiming the liquid in this example, it is known in the processing area of 24 200912041 The chelating material in the etching & L is adsorbed to the internal chelating material (not shown) and removed, and the movable device after use is transported to the adsorbent material regeneration region to regenerate the material (not As shown in the figure, the removable container 1 is returned to the treatment area for reuse. Therefore, only the surname L is passed through the treatment area side, and the indium or tin in the insect engraving liquid L is adsorbed to the integrated material. (not shown) equipment: = simple and cheap The equipment can be reused again - the other object is not the silver engraving liquid L itself, but is movable. Therefore, it is light and easy to operate, and the handling cost is very low compared to the tank. The truck is transported. In addition, because the feed container 1 is returned to the treatment area for reuse, it is sufficient to use the removable container 螯 (chelating material (not shown)). Efficiently regenerate the etching solution L with inscriptions or tins due to the button engraving. There is a marriage. People = by regenerating the K in such a way, the remaining moments can be achieved... ::Γ: and the replacement cycle is extended', therefore, Save new residual engraving [Liquid L is used for the second time, the waste cost of the engraving L, etc.]

Engraving 'the cost of being able to process the substrate is low. Further, it is possible to reduce the amount of the etching liquid to be etched, and it is only necessary to perform etching treatment because: L ' or new contributes to environmental protection. Further, the engraving: the etching liquid L can always be moved into the movable device 1 by the movable type, and therefore, the indium ions contained in the I and the insects in the tank 12 of the 200912041 can be stored. The concentration or the concentration of tin ions is always maintained at a level below -^ y ^ ,, and the etching liquid L can be kept in the same state as the new product. In the case of passing the eluent, the washing liquid is passed, and the residue is washed out: the eluent inside the shifting trough state 1, so that it can effectively prevent the next two months and the liquid in the substrate processing apparatus 1 When there is an etchant L, the etching (L and the eluent are mixed to cause a change in the composition of the liquid (4), which adversely affects the residual processing. The inaccuracy is caused by the adsorption of indium or tin in the engraving liquid L to the movable type. Container = chelating material (not shown) 'The indium or tin can be concentrated to be concentrated in a movable type: crying, 1 A, ° state, and can be easily recovered and dissolved in the surname L · (second implementation) EMBODIMENT] Next, the metal recovery method according to the second embodiment of the present invention will be described based on the attached item. In the method of etching the soil, the soil is etched by the etching solution, and the engraving liquid is recovered. Fig. 6 is a view for explaining the metal recovery method according to the second embodiment of the present invention, and θ 7 is a flowchart for explaining the metal recovery method of the second embodiment. 3. As shown in FIG. 4, FIG. 6 and FIG. 7, the movable type test 1 constitutes In addition, the substrate processing apparatus 1G and the metal recovery apparatus 7 (for recovering the metal dissolved in the etching liquid L) are attached and detached, and the structure is the same as that described above. The same structure of the adsorbent recovery device 4 as shown in FIG. 4 is different in that it is disposed in a recovery area separated from the treatment area (refer to 26 200912041 for the base: 12, the storage tank 11 is engraved) The liquid cloth alternately switches the time interval of the movable container as the liquid-passing object, and the engraving liquid 1 in the 11 is selectively installed by the storage tank to be mounted on the first container * (the illustration of the mounting portion 31) - the metal component in the engraving liquid L (indium separation: chelation = (not in the first Anthony X kick ion). Further, the filling material m mounting portion 32 is preliminarily mounted without adsorption. Filled in 1) 〇 ( (not shown) a removable container that does not adsorb indium or tin can be moved to a removable volume of the liquid object 11 will be adsorbed =)::; composite material (not shown) The first-amplitude portable container 1 (step S12). That is, the switch from the transfer type two-two: type: two-one to the second mounting part 32 The device i is mounted, the h-shaped portion 31 is removed, and the movable removable container ☆ can be removed, and the attached movable container 1 is switched from 1 of the second mounting portion 32 to the first mounting portion 31. In the case of the movable container 1, the younger-mounting portion 32 removes the movable container 吸附 of the detachable movable container. The women's clothing is not adsorbed, and the profit mechanism (such as the truck 2) will be removed from the _attack unit. H— The transportable container 1 that has been removed after the document loading unit 32 is removed is transported from the side of the processing or the side of the collection area (step S13). ^ 壮 Then, the adsorbed movable container that is transported to the side of the recovery area 1 After the female garment is in the female split 41, the eluent is passed through the removable container 1 (step 27 200912041 S14). In this way, the indium or tin adsorbed on the material of the sputum, the yttrium material (not shown) is washed, and the eluent containing the eluted indium ion or tin ion is recovered in the eluent recovery. Inside the bucket 49. Then, indium or tin is taken out from the eluent in the eluent recovery tank 49 to be recovered (step S15). Thereby, recycling and adsorbing in the movable container

=) "Steel processing in the plate processing mechanism 12 - steel or tin dissolved in the silver engraving liquid L". Further, after the eluent has passed, the cleaning liquid is removed by the detachable portion 41 (step SI6). Thereby, the eluent remaining in the inside of the portable container i is washed by the cleaning, and the washing liquid containing the remaining eluent is recovered in the washing liquid recovery tank 59.丨 and = outside 'Using a transport mechanism such as a truck 2, the recovered removable capacity ii 1 (chelating material (not shown) == or tin removable capacity _ υ from the step S14 The recovery area side processing area side step S17) is stored in the processing area side (step: :::::: stored in the returning coffee v step 2 and exchanged with the adsorbed movable container 1 as described above. According to the gold-based region of the present example, the (four) liquid...indium or tin is adsorbed to the movable chelating material (not shown), and the adsorbed movable container is transported to the oral region. The transferable capacity of the indium or tin after the integration of the material (unintentional) n 1 is returned to the treatment area due to - (4) processing and dissolved in (4) liquid km. In addition, only the treatment area side makes the (four) liquid [through the movable type In the container 1 28 200912041, indium or tin in the "etching" night L can be adsorbed to a chelating material (not shown). Therefore, it can be handled by a simple and inexpensive device. Indium or tin adsorbed to the chelating material in the movable container i (not shown, capable of collecting oil or tin into the concentrated container i The state 'can easily recover indium or tin dissolved in the etching & L. In addition, the object to be transported is not the imprinting liquid L itself, but the movable container i, and therefore, is light in weight and easy to handle, and the handling cost and the oil tank The car is very low in comparison and can be transported by ordinary trucks. In addition, since the recovered removable H丨 is returned to the processing area for re-production, the movable type can be reused. (chelating material (not shown)). For these reasons, it is possible to efficiently reproduce the insoluble matter of the (iv) liquid 1 by the treatment at a low cost, and to adsorb indium or tin in the etching liquid L. The chelating material (not shown) in the shift container 1 can concentrate the indium or tin in a state of being concentrated in the "shift barn 1, and can easily collect indium or tin dissolved in the etching liquid. In addition, since the washing liquid is passed after the eluent is passed, and the eluent that is trapped inside the movable container 1 is washed, the squeaking of the squeezing container can be effectively prevented. Etching with etchant l

The mixture of the liquid L and the eluent causes a change in the composition of the etching liquid L, which adversely affects the etching. X During the etching process, the etching liquid L is always passed through the movable type, so that the concentration of indium ions or the concentration of tin ions contained in the etching liquid L in the storage tank 11 can be constantly maintained. Below a certain level, 29 200912041, the etching liquid L can be kept in the same state as the new product. Although an example of the present invention has been described above, the specific embodiment that can be employed in the present invention is not limited to these. In the above example, after the eluent is passed, the washing liquid is passed through the portable container 1, but the treatment may be omitted. However, the eluent remaining in the inside of the portable container 1 in this case may cause a change in the composition of the money in the storage tank u. Further, when the transferable container is transported in the above-described step S3 or step S13, if the etching liquid L in the movable container is appropriately taken out, the weight of the movable type container 1 can be reduced and the conveyance can be easily performed. Further, the adsorbent recovery device 40 and the metal recovery device 7 may be configured as an adsorbent recovery device 66 and a metal recovery device 71 as shown in FIG. 5, and the adsorbent recovery device 66 and the metal recovery device 7I are provided: When the liquid is passed, the movable container 丨 is detachably attached to the mounting portion 67, and when the eluent passes, the detachable container i is detachably attached to the mounting portion 68. In this case, the eluent supply means 43 and the eluent recovery means 48 are attached to the mounting portion 67, the other end side of the eluent supply tube ^ and the eluent recovery tube 50. The other end side is connected to a supply unit (not shown) and a discharge unit (not shown) of the movable container 1 respectively. Further, when the eluent supply unit 53 and the cleaning liquid recovery unit 58 are attached to the mounting unit 68, the other end side of the cleaning liquid supply tube 55 and the other end side of the cleaning liquid recovery tube 60 are separately movable. A supply unit (not shown) of the container hopper is connected to a discharge unit (not shown). Further, the eluent supply chamber 30 200912041 47, the eluent recovery valve 51, and the cleaning liquid supply port 61 may be omitted. In addition, the ampoule 67, the elution, the nightingale: and the cleaning liquid recovery valve/ignorance liquid-passing mechanism 42 are used as the second-input device 65 of the patent-supplied towel, the cleaning liquid-passing mechanism 52 and the control device. It acts as the third device of the mounting unit 68. In the above-mentioned step S4 or step Sm, after the movable container i that has been transported in the domain is installed, the eluent is passed into the inside, from the mounting portion. 67 removed. Further, in the above step S6 or step S16, after the portable type W i through which the washing liquid passes is installed, the eluent is passed through the movable container and is removed from the mounting. Further, in the above example, the (iv) mounting i 25 may be constructed as follows: The movable capacity _ i is alternately replaced at a predetermined time interval, and at the same time, the etching liquid L in the storage tank 11 is passed through the movable container 丨The present invention is not limited thereto, and may be based on, for example, the number of substrates K etched in the substrate processing mechanism 12 or the concentration of indium ions or tin ions contained in the etching liquid L in the storage tank n. To switch the movable container 1 through which the etching liquid L is to pass. When switching control is performed based on the number of etching sheets of the substrate K, the substrate processing mechanism 12 further includes, for example, a sensor (not shown) disposed at an appropriate position such as outside or inside the processing chamber 13. And detecting the substrate K transported into the processing chamber 13 or the substrate K transported from the processing chamber 13; the control device 25 carries the output signal to the processing chamber based on the output signal obtained from the sensor (not shown) The number of substrates K in the chamber 13 or from the processing 31 200912041

The number of pieces of the peach in the I-mechanism 12 in the chamber 13 is counted, that is, the number of sheets of the substrate K etched in the substrate processing structure 12 is counted, and when the number of sheets counted is j: the number of sheets set in advance Alternately switch as the liquid-passing object II = device 1, and at the same time, make the left-side of her tJ"-shift valley. The second rhyme liquid Lit over the movable container 1 ^ The number of pieces counted by the control device 25 reaches the pre-#: number: resets the 4 value, and counts again to the preset number of pieces. In the right (four) setting, when the number of counted pieces reaches the number of pieces in advance, that is, when the number of etched pieces reaches the middle y rainbow, the number of etched pieces reaches a predetermined number of sheets and is inferred to be a chelating material (when the number of pieces is not Switching each of the switching valves 36, 3 / ; the number of sheets in the saturated state passes through the movable container 丨 39. The cutting (four) etched liquid L is to be passed, so that even if it is, it will be constant, and the immersion liquid L contains two: adsorption. The ability to maintain is below -the level. The concentration of indium or tin ions is suppressed. 'When switching based on indium ion concentration or tin ion concentration: the substrate processing device 1〇 also has a detection sensor ( Go to mm

In the middle, a has Η π ', W detects the etching liquid L in the storage tank 11 by: Ϊ concentration and/or tin ion concentration; the control device 25 is touched by the Meng ion concentration detecting sensor ν V diagram does not detect the concentration of the ion and/or the tin ion concentration ratio of the movable container previously set as the liquid-passing object, and at the same time::= for the switching liquid L through the movable container i -square. The etched state in the sub-slot η is set to reduce the adsorption capacity of the chelating material (not shown) to substantially contain ions or tin ions, and the indium ions contained in the storage tank " 32 200912041 _Liquid L Or the tin ion concentration on the detection sensor (not shown) detects the concentration of indium ions. Gold: When the sub-wavelength is greater than the predetermined reference value, the switching chambers 36, 37, 38 39 are switched, and the etching liquid L is switched. Removable container 1. :2 Even if this is the case, the concentration of steel ions or tin ions contained in the removable energy solution can be suppressed. In addition, in the case of switching control using the elapsed time or the number of button-cuts in the container type, the substrate processing mechanism is dissolved in the liquid solution by the condition of the substrate 2 or the type of the substrate κ which is a pure object. The amount of steel or tin dissolved will be different. Therefore, it is difficult to set the chelating material (not shown) of the movable gluten to reach a substantially saturated or money-sliced number but by the storage tank u (four) = In the etching liquid L of the door, the steel ion concentration and/or the tin ion concentration are switched, and the switching control can be performed with high precision. , Fang Tongyu 2 engraved liquid / removable capacity to be passed ~ not only - square liquid, and the crucible can be installed in the first mounting portion 31 of the removable capacity and the second mounting portion 32 In the above example, the substrate K is 1 in the substrate processing mechanism 12, and the (4) liquid L is continuously passed through the movable container H, and may be For example, after the etching process is started, the P-rug main 113 reaches a predetermined 0#2, or the number of the remaining sheets of the substrate 成为 becomes indium ions or kicks contained in the surface engraving liquid L in the predetermined sheet. When the Ding Slot is at 11 degrees, the brewing L is passed through the fine ion to be adsorbed by the second concentrator. In addition, the substrate processing device 41. The transferable structure constituting the ion is enough to install more than three. 33 200912041 In the above example, the portable container 1 is detachably attached to the substrate processing apparatus 10, but the present invention is not limited thereto, and the portable container 1 is detachably mounted. The etching liquid processing apparatus installed in the storage tank 11, the etching liquid liquid passage mechanism 3, the control device 25, and the like may be In the button engraving device, the etching liquid L used in the etching process is collected from the plurality of appropriate tanks in the storage tank 11, and then the metal component in the etching liquid L in the storage tank n is adsorbed. The etching liquid L after the adsorption of the metal component is returned to the respective grooves. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view for explaining an etching liquid regeneration method according to a first embodiment of the present invention. Fig. 2 is a view for explaining the first embodiment. Fig. 3 is a schematic view showing a configuration of a substrate processing apparatus and the like in the first embodiment. Fig. 4 is a view showing a schematic configuration of an adsorbent regenerating apparatus and the like in the first embodiment. Fig. 6 is a view for explaining a metal recovery method according to a second embodiment of the present invention. Fig. 7 is a view for explaining metal recovery according to a second embodiment of the present invention. Flow chart of the method 0 34 200912041 [Explanation of main component symbols] I Removable container 10 Substrate processing apparatus II Storage tank 12 Substrate processing mechanism 13 Processing chamber 14 Transport roller 15 Flow Pipe 16 nozzle body 20 etching liquid circulation mechanism 21 supply pipe 22 supply pump 23 recovery pipe 25 control device 30 etching liquid liquid passage mechanism 31 first mounting portion 32 second mounting portion 33 etching liquid supply pipe 34 etching liquid recovery pipe 40 adsorption Material regeneration device 41 Mounting portion 42 Eluent liquid supply mechanism 43 Eluent supply mechanism 44 Eluent storage tank 35 200912041 45 Eluent supply pipe 46 Supply pump 48 Eluent recovery mechanism 49 Eluent recovery tank 50 Wash Liquid recovery pipe 52 cleaning liquid liquid supply mechanism 53 cleaning liquid supply mechanism 54 cleaning liquid storage tank 55 cleaning liquid supply pipe 56 supply pump 58 cleaning liquid recovery mechanism 59 cleaning liquid recovery tank 60 cleaning liquid recovery pipe 65 control device K substrate L name Insect fluid 36

Claims (1)

200912041 X. Patent application: The method for regenerating a human right treatment liquid is used to regenerate a treatment liquid having a metal component due to substrate processing, and is characterized in that: the treatment liquid regeneration step is performed on the substrate In the treated treatment zone, the treatment liquid is passed through a movable container 1' filled with an adsorption material for adsorbing metal ions, and the metal component in the treatment liquid is adsorbed to the suction to be separated and removed; The first transporting step is carried out by transporting the transportable container through the treatment liquid to a region separated from the treatment region, that is, regenerating the adsorbent material material regeneration region; 'the adsorbent material regeneration step is in the adsorbent material regeneration region The eluent is eluted from the metal adsorbed on the adsorbent by a removable container transported from the treatment zone to regenerate the adsorbent; and the second transport step regenerates the adsorbent The material-transportable container k S meta-adsorbed material regeneration region is returned to the treatment region, and in the treatment liquid regeneration step, the movable container after regeneration using the adsorbent material is used. 2. The treatment liquid regeneration method according to claim 1, wherein in the adsorption material regeneration step, after the eluent is passed, the cleaning liquid is passed through the movable container to clean the inside. 3. The treatment liquid regeneration method according to the first aspect of the invention, wherein the movable type tank is formed with: a supply unit for supplying the treatment liquid and the eluent to the inside, and for supplying from the supply The processing liquid and the eluent supplied to the inside are discharged to the external discharge unit; and 37 200912041 In the process liquid regeneration, the material 1 is passed through the liquid, and the first! The liquid-passing device includes a processing liquid supply pipe that is detachably connected to the movable container supply unit and supplies the processing liquid, and is detachably connected to the movable container row (four) and returned to the (four) processing liquid. Further, after the processing liquid supply pipe is connected to the supply unit and the processing liquid recovery pipe is connected to the discharge material, the processing liquid flows from the supply unit to the inside of the remotely movable container. The discharge portion is discharged to discharge the liquid, and then the treatment liquid supply pipe is removed from the supply portion, and the treatment liquid recovery pipe is scraped from the discharge portion. 2 = the adsorbent material regeneration step is used, and the 2 liquid supply device is used. The first u & is provided with an eluent that can be connected to the portable container supply unit and can be supplied to the removable container supply unit, and is attached to and detachable from the eluent Disposing the container discharge portion and collecting the tube; "^ the eluent of the eluate eluate and connecting the eluent supply tube and the supply portion connection liquid recovery tube to the discharge portion, and then eluent After the discharge from the discharge section In the absence of the ",", the eluent supply pipe is removed, and the eluent recovery pipe is removed from the discharge port. The clock® is removed. The process liquid regeneration method according to item 2 of the patent application scope is Forming in the movable container: for supplying the treatment liquid to the inner qi # A 冼 k liquid, clearing, giving, and processing liquid for the supply from the supply portion, % D 4 is supplied to the inner night washing edge and the discharge portion discharged to the outside by the cleaning liquid; and 38 200912041 in the processing liquid regeneration step, the first liquid passing device is used, and the [liquid discharging device is provided in a detachable manner a treatment liquid supply pipe connected to the movable container supply unit and supplying the treatment liquid, and a tube that can be attached to the movable container discharge unit and collect the treatment liquid; The treatment liquid supply pipe is connected to the supply unit, and after the treatment is connected to the money discharge unit, the treatment liquid is passed through the supply unit to be discharged from the discharge unit, and the treatment liquid supply tube is processed. 'Removal from the discharge section==Regeneration step, use the second The liquid is cleaved, the third feeding portion is connected to the pipe and supplied to the pipe, and the discharge pipe removable container discharge portion is capable of loading and unloading the liquid, and the eluent and the cleaning v row are taken over. (4) the supply unit is connected, and the collection pipe and the inside of the collection pipe are flowed in from the :: the liquid is supplied to the movable container from the supply portion to be discharged from the supply portion, and then the liquid is discharged. In the method of discharging the portion, the liquid is discharged from the supply portion by the internal inflow of the transfer type, and the supply tube is removed from the supply portion, and is formed in the movable container as in the patent application scope: The U-deficiency method, which supplies the treatment liquid, the eluent, and the cleaning liquid to the inside, and supplies the treatment liquid, the eluent, and the cleaning liquid for supplying the liquid to the inside from the supply unit. In the process liquid regeneration step, the first liquid supply device is used, and the liquid supply device is provided with a detachable connection to the donor unit and the supply unit. For the removable capacity, discharge, and for loading and unloading "Receiving the pipe; and collecting the treatment liquid of the treatment liquid, and connecting the treatment liquid supply pipe and the supply portion liquid recovery pipe to the discharge portion, and then making the treatment liquid The inside of the container flows in and is discharged from the discharge portion; = to the treatment liquid recovery pipe; ", e is removed from the discharge portion, and the third liquid supply device is used in the adsorbent regeneration step" The second liquid passing device includes a tube that can be placed in the movable container supply unit and supplied to the removable container supply unit, and is detachably connected to the movable container row: : an eluent recovery pipe for receiving the eluent; and the third liquid transfer device is provided with: a cleaning liquid capable of loading the transfer container supply unit and supplying the cleaning liquid: The cleaning liquid recovery pipe is connected to the movable container discharge portion and the cleaning liquid recovery pipe; the h washing liquid is firstly connected, and the eluent supply pipe and the supply liquid recovery pipe are connected to the discharge portion. , allowing the elution U to flow from the interior of the eluting portable container After the discharge portion is discharged::: After that, the eluent supply unit 7 is removed from the a-hai supply unit, and the 200912041 eluent recovery unit is then removed from the 4 discharge unit. The supply unit is connected to the discharge unit, and the cleaning liquid is connected to the discharge material, and the cleaning liquid is discharged from the supply unit to be discharged from the discharge unit, and then the cleaning unit is detached from the supply unit. The liquid supply pipe removes the cleaning liquid recovery pipe from the discharge portion. 6. A method for recovering a metal contained in a treatment liquid for recovering a metal component contained in a treatment liquid by a substrate treatment, characterized in that: a movable type using an adsorption material internally filled with adsorbed metal ions Having the metal component in the remote treatment liquid adsorbed to the adsorption material in the treatment region where the substrate treatment is performed, and then transferring the metal component in the remote treatment liquid to the adsorption material; The treatment area separates the recovery area of the metal component; and then 'in the recovery area, the eluent is passed through the movable trough and the metal adsorbed to the adsorbent is eluted, and The treatment of the eluted metal is recovered from the passed eluate, and then the removable container is returned from the recovery area to the treatment area for reuse. XI. Schema: as the next page 41