KR20080028429A - 이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈 - Google Patents

이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈 Download PDF

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Publication number
KR20080028429A
KR20080028429A KR1020087001045A KR20087001045A KR20080028429A KR 20080028429 A KR20080028429 A KR 20080028429A KR 1020087001045 A KR1020087001045 A KR 1020087001045A KR 20087001045 A KR20087001045 A KR 20087001045A KR 20080028429 A KR20080028429 A KR 20080028429A
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KR
South Korea
Prior art keywords
projection system
image
refractive index
image projection
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020087001045A
Other languages
English (en)
Korean (ko)
Inventor
칼-하인쯔 슈스터
Original Assignee
칼 짜이스 에스엠테 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠테 아게 filed Critical 칼 짜이스 에스엠테 아게
Publication of KR20080028429A publication Critical patent/KR20080028429A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
KR1020087001045A 2005-08-10 2006-08-04 이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈 Ceased KR20080028429A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70690305P 2005-08-10 2005-08-10
US60/706,903 2005-08-10

Publications (1)

Publication Number Publication Date
KR20080028429A true KR20080028429A (ko) 2008-03-31

Family

ID=37188852

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087001045A Ceased KR20080028429A (ko) 2005-08-10 2006-08-04 이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈

Country Status (7)

Country Link
US (1) US20080182210A1 (https=)
EP (1) EP1913445B1 (https=)
JP (1) JP2009505124A (https=)
KR (1) KR20080028429A (https=)
CN (1) CN101243359B (https=)
AT (1) ATE511124T1 (https=)
WO (1) WO2007017473A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
CN114326075B (zh) * 2021-12-10 2023-12-19 肯维捷斯（武汉）科技有限公司 一种生物样品的数字显微成像系统及镜检方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
EP1411375A4 (en) * 2001-07-18 2007-03-21 Nikon Corp OPTICAL ELEMENT COMPRISING A LANTHANE FLUORIDE FILM
US7092069B2 (en) * 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
KR20050057110A (ko) * 2002-09-03 2005-06-16 칼 짜이스 에스엠테 아게 복굴절 렌즈를 구비한 대물렌즈
EP1646074A4 (en) * 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
WO2005059617A2 (en) 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
CN101243359B (zh) 2011-04-06
JP2009505124A (ja) 2009-02-05
EP1913445A1 (de) 2008-04-23
US20080182210A1 (en) 2008-07-31
ATE511124T1 (de) 2011-06-15
CN101243359A (zh) 2008-08-13
EP1913445B1 (de) 2011-05-25
WO2007017473A1 (de) 2007-02-15

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