CN101243359B - 成像系统、特别是显微光刻投影曝光设备的投影物镜 - Google Patents

成像系统、特别是显微光刻投影曝光设备的投影物镜 Download PDF

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Publication number
CN101243359B
CN101243359B CN2006800296095A CN200680029609A CN101243359B CN 101243359 B CN101243359 B CN 101243359B CN 2006800296095 A CN2006800296095 A CN 2006800296095A CN 200680029609 A CN200680029609 A CN 200680029609A CN 101243359 B CN101243359 B CN 101243359B
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CN
China
Prior art keywords
imaging system
refractive index
sub
numerical aperture
crystal
Prior art date
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Expired - Fee Related
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CN2006800296095A
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English (en)
Chinese (zh)
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CN101243359A (zh
Inventor
K·-H·舒斯特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN101243359A publication Critical patent/CN101243359A/zh
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Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
CN2006800296095A 2005-08-10 2006-08-04 成像系统、特别是显微光刻投影曝光设备的投影物镜 Expired - Fee Related CN101243359B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70690305P 2005-08-10 2005-08-10
US60/706,903 2005-08-10
PCT/EP2006/065070 WO2007017473A1 (de) 2005-08-10 2006-08-04 Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
CN101243359A CN101243359A (zh) 2008-08-13
CN101243359B true CN101243359B (zh) 2011-04-06

Family

ID=37188852

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800296095A Expired - Fee Related CN101243359B (zh) 2005-08-10 2006-08-04 成像系统、特别是显微光刻投影曝光设备的投影物镜

Country Status (7)

Country Link
US (1) US20080182210A1 (https=)
EP (1) EP1913445B1 (https=)
JP (1) JP2009505124A (https=)
KR (1) KR20080028429A (https=)
CN (1) CN101243359B (https=)
AT (1) ATE511124T1 (https=)
WO (1) WO2007017473A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008001800A1 (de) 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
CN114326075B (zh) * 2021-12-10 2023-12-19 肯维捷斯（武汉）科技有限公司 一种生物样品的数字显微成像系统及镜检方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
KR20040015251A (ko) * 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 불화물 결정 렌즈들을 포함하는 렌즈 시스템
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
WO2003009015A1 (en) * 2001-07-18 2003-01-30 Nikon Corporation Optical element having lanthanum fluoride film
US7092069B2 (en) * 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
WO2004023184A1 (en) * 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Objective with birefringent lenses
EP1646074A4 (en) * 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
JP5106858B2 (ja) * 2003-12-15 2012-12-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 高開口数と平面状端面とを有する投影対物レンズ
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
EP1913445B1 (de) 2011-05-25
ATE511124T1 (de) 2011-06-15
EP1913445A1 (de) 2008-04-23
CN101243359A (zh) 2008-08-13
US20080182210A1 (en) 2008-07-31
KR20080028429A (ko) 2008-03-31
WO2007017473A1 (de) 2007-02-15
JP2009505124A (ja) 2009-02-05

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Granted publication date: 20110406

Termination date: 20180804