KR20080006836A - 다층박막 증착에 의한 광학소자 제조방법 - Google Patents
다층박막 증착에 의한 광학소자 제조방법 Download PDFInfo
- Publication number
- KR20080006836A KR20080006836A KR1020060066071A KR20060066071A KR20080006836A KR 20080006836 A KR20080006836 A KR 20080006836A KR 1020060066071 A KR1020060066071 A KR 1020060066071A KR 20060066071 A KR20060066071 A KR 20060066071A KR 20080006836 A KR20080006836 A KR 20080006836A
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- refractive index
- optical
- low refractive
- manufacturing
- Prior art date
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- 230000003287 optical effect Effects 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title claims abstract description 17
- 239000011248 coating agent Substances 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 12
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 229910019142 PO4 Inorganic materials 0.000 claims description 10
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 10
- 239000010452 phosphate Substances 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 7
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 claims description 3
- 239000005297 pyrex Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000005336 cracking Methods 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 229910052810 boron oxide Inorganic materials 0.000 description 3
- 238000000427 thin-film deposition Methods 0.000 description 3
- 239000005380 borophosphosilicate glass Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000005360 phosphosilicate glass Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims (6)
- 순수 실리카 기판에 저굴절률 및 고굴절률 광학박막을 교대로 다층으로 증착하여 광학소자를 제조하는 방법에 있어서,상기 저굴절률 광학박막은 SiO2에 붕소산화물(B2O3) 또는 인산화물(P2O5)이 첨가된 것을 특징으로 하는 광학소자 제조방법.
- 제1항에 있어서,상기 저굴절률 광학박막은 SiO2에 붕소산화물(B2O3)과 인산화물(P2O5)이 동시에 첨가된 것을 특징으로 하는 광학소자 제조방법.
- 제1항에 있어서,상기 고굴절률 광학박막은 TiO2, Ta2O5, Nb2O5 중 적어도 어느 하나를 증착하는 것을 특징으로 하는 광학소자 제조방법.
- 제2항에 있어서,상기 SiO2에 붕소산화물(B2O3) 또는 인산화물(P2O5)은 0.2∼20mol% 첨가된 것을 특징으로 하는 광학소자 제조방법.
- 제1항에 있어서,상기 다층으로 증착은 4∼200층인 것을 특징으로 하는 광학소자 제조방법.
- 제1항에 있어서,상기 기판은 파이렉스계 글라스 또는 BK7계 글라스인 것을 특징으로 하는 광학소자 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060066071A KR100813460B1 (ko) | 2006-07-14 | 2006-07-14 | 다층박막 증착에 의한 광학소자 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060066071A KR100813460B1 (ko) | 2006-07-14 | 2006-07-14 | 다층박막 증착에 의한 광학소자 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080006836A true KR20080006836A (ko) | 2008-01-17 |
KR100813460B1 KR100813460B1 (ko) | 2008-03-13 |
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Family Applications (1)
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KR1020060066071A KR100813460B1 (ko) | 2006-07-14 | 2006-07-14 | 다층박막 증착에 의한 광학소자 제조방법 |
Country Status (1)
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KR (1) | KR100813460B1 (ko) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0911821A4 (en) * | 1996-07-11 | 2001-05-23 | Toyota Motor Co Ltd | MAGNETO-OPTICAL RECORDING MEDIUM AND MAGNETO-OPTICAL RECORDING DEVICE USING THE SAME |
AU741691C (en) * | 1997-05-16 | 2004-08-12 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
JP3975242B2 (ja) | 1997-05-16 | 2007-09-12 | Hoya株式会社 | 反射防止膜を有するプラスチック光学部品 |
KR20020076847A (ko) * | 2001-03-30 | 2002-10-11 | 전영국 | 박막형 전계발광표시소자 제조방법과 그 제조장치 및 이로인하여 얻어진 박막형 전계발광표시소자 |
KR100329578B1 (ko) * | 2001-04-12 | 2002-03-23 | 김순택 | 기능성 필름을 채용하는 음극선관 |
KR20030061704A (ko) * | 2003-04-08 | 2003-07-22 | (주) 알파큐브 | 갈륨나이트라이드 포토다이오드의 감도특성과 자외선필터를 조합하여 자외선에 대한 피부의 홍반반응 특성을얻기 위한 센서 |
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KR100813460B1 (ko) | 2008-03-13 |
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