KR20070096669A - Load-lock chamber - Google Patents

Load-lock chamber Download PDF

Info

Publication number
KR20070096669A
KR20070096669A KR1020060027574A KR20060027574A KR20070096669A KR 20070096669 A KR20070096669 A KR 20070096669A KR 1020060027574 A KR1020060027574 A KR 1020060027574A KR 20060027574 A KR20060027574 A KR 20060027574A KR 20070096669 A KR20070096669 A KR 20070096669A
Authority
KR
South Korea
Prior art keywords
lock chamber
load lock
chamber
bottom plate
load
Prior art date
Application number
KR1020060027574A
Other languages
Korean (ko)
Inventor
노태우
Original Assignee
브룩스오토메이션아시아(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 브룩스오토메이션아시아(주) filed Critical 브룩스오토메이션아시아(주)
Priority to KR1020060027574A priority Critical patent/KR20070096669A/en
Publication of KR20070096669A publication Critical patent/KR20070096669A/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber

Abstract

A load lock chamber is provided to mend a first layer chamber without lifting chambers of two and more layers by forming a multi-layer structure with multiple layers. A load lock chamber has a separable structure in order to couple or decouple an entire part or a part of a bottom plate(11) thereof. A lower part of the load lock chamber is opened by using the separable structure of the load lock chamber. The load lock chamber is formed with multiple layers. A substrate loading part(12) is formed on an upper surface of the bottom plate of the load lock chamber. The substrate loading part and the bottom plate of the load lock chamber are formed with an integrated structure.

Description

로드락 챔버{Load-lock chamber}Load-lock chamber

도 1은 종래 로드락 챔버의 구조를 나타내는 분리사시도이다. 1 is an exploded perspective view showing the structure of a conventional load lock chamber.

도 2는 본 발명에 의한 로드락 챔버의 단면도이다. 2 is a cross-sectional view of the load lock chamber according to the present invention.

도 3은 본 발명에 따른 로드락 챔버의 구조를 나타내는 분리사시도이다. 3 is an exploded perspective view showing the structure of the load lock chamber according to the present invention.

도 4는 본 발명에 의한 로드락 챔버의 사용상태 단면도이다. Figure 4 is a cross-sectional view of the use state of the load lock chamber according to the present invention.

**도면의 주요부분에 대한 부호의 설명**** Description of the symbols for the main parts of the drawings **

10: 1층본체 11: 저판 10: first floor main body 11: bottom plate

12: 기판 적재부 20: 2층본체 12: substrate loading portion 20: two-layer body

21: 기판적재부 30: 덮개21: substrate loading part 30: cover

40: 프레임 50: 구동수단40: frame 50: drive means

본 발명은 로드락 챔버에 관한 것으로서, 보다 상세하게는 유지, 보수 작업이 용이하도록 챔버의 하부를 개방할 수 있는 로드락 챔버에 관한 것이다. The present invention relates to a load lock chamber, and more particularly, to a load lock chamber that can open the lower portion of the chamber to facilitate maintenance and repair work.

최근 정보 통신 기술의 비약적인 발전과 시장의 팽창에 따라 디스플레이 소 자로 평판표시소자(Flat Panel Display)가 각광받고 있다. 이러한 평판표시소자로는 액정 표시소자(Liquid Crystal Display), 플라즈마 디스플레이 소자(Plasma Display Panel), 유기 발광 소자(Organic Light Emitting Diodes) 등이 대표적이다. Recently, with the rapid development of information and communication technology and the expansion of the market, flat panel displays have been spotlighted as display devices. Such flat panel displays include liquid crystal displays, plasma display panels, organic light emitting diodes, and the like.

일반적으로 로드락 챔버는 진공과 대기압 분위기가 반복되도록 제어되고, 기판이 반입 또는 반출된다. In general, the load lock chamber is controlled such that the vacuum and atmospheric pressure are repeated, and the substrate is loaded or unloaded.

종래 로드락 챔버의 구성을 설명하면, 측벽과 저판으로 구성되는 본체와, 그의 상면에 장착되는 덮개로 이루어진다. 상기 덮개는 챔버의 본체에 착탈가능하도록 결합되어 구성되므로, 필요한 경우에 상기 덮개를 분리하여 챔버의 상면을 개방할 수 있다. 상기 덮개와 본체는 볼팅 등의 방법으로 결합되며, 그 사이에는 실링부재가 개재된다. 예를 들어 챔버 내부의 유지 보수시에는 상기 볼팅을 해제하여 덮개를 들어 올린 다음에 작업을 수행하는 것이다. The configuration of the conventional load lock chamber includes a main body composed of side walls and a bottom plate, and a cover mounted on an upper surface thereof. Since the cover is configured to be detachably coupled to the body of the chamber, the cover can be removed if necessary to open the upper surface of the chamber. The cover and the main body are coupled by a method such as bolting, and a sealing member is interposed therebetween. For example, in the maintenance of the inside of the chamber, the bolt is released to lift the cover and then perform the work.

또한 로드락 챔버의 내부에는 기판을 적재하는 기판적재부가 구비된다. 또한 측벽에는 게이트가 형성되는데, 이를 통해 기판이 반입 또는 반출된다. In addition, a substrate loading part for loading a substrate is provided in the load lock chamber. In addition, a gate is formed on the sidewall, through which the substrate is brought in or taken out.

도 1을 참조하면, 다수개의 본체(110,120)들을 상하로 적층하고, 최상부에 위치하는 본체(120)의 상면에 덮개(130)를 적층함으로써 다층구조의 로드락 챔버를 구성하였다. Referring to FIG. 1, a plurality of main bodies 110 and 120 are stacked up and down, and a cover 130 is stacked on an upper surface of the main body 120 positioned at the top to configure a load lock chamber having a multilayer structure.

도 2를 참조하면, 2층 본체(120)의 유지 보수가 필요한 경우에는 상기 덮개(130)를 크레인 등으로 들어올려 상부를 개방한 후 수행할 수 있었다. 그러나 1층본체(110)의 유지 보수가 필요한 경우에는 덮개(130)와 2층 본체(120)를 순차적으 로 들어 올린 후에야 가능한 것이었다. Referring to FIG. 2, when maintenance of the two-layer body 120 is required, the cover 130 may be lifted by a crane or the like to open the upper portion thereof. However, when the maintenance of the first floor main body 110 is necessary, the cover 130 and the second floor main body 120 were lifted sequentially.

따라서 유지 보수를 위한 노력과 비용이 많이 소요되는 문제점이 있었다. Therefore, there was a problem that requires a lot of effort and cost for maintenance.

본 발명은 상술한 문제점을 해결하기 위하여 안출된 것으로서, 본 발명의 목적은 유지, 보수 작업이 용이하도록 챔버의 하부를 개방할 수 있는 로드락 챔버를 제공함에 있다. The present invention has been made to solve the above problems, an object of the present invention is to provide a load lock chamber that can open the lower portion of the chamber to facilitate maintenance and repair work.

위와 같은 기술적 과제를 해결하기 위하여 본 발명에 의한 로드락 챔버는 상기 챔버의 저판의 전부 또는 일부가 착탈가능하게 결합되어 이루어짐으로써, 하부가 개방될 수 있다. In order to solve the above technical problem, the load lock chamber according to the present invention is formed by detachably combining all or part of the bottom plate of the chamber, the lower portion of which can be opened.

또한 상기 챔버는 다층으로 이루어질 수 있다. 이 경우에, 적층되는 모든 챔버의 저판을 착탈가능하게 구성할 수도 있고, 또는 최하층 챔버의 저판만을 착탈가능하게 구성할 수도 있다. In addition, the chamber may be made of a multilayer. In this case, the bottom plates of all the chambers to be stacked may be detachably configured, or only the bottom plates of the lowermost chamber may be detachably mounted.

또한 상기 저판의 상면에는 기판 적재부가 일체 형성되는 것이 바람직하다. In addition, it is preferable that the substrate mounting portion is integrally formed on the upper surface of the bottom plate.

이하, 첨부된 도면을 참조하여 본 발명의 구성 및 작용을 구체적으로 설명한다. Hereinafter, with reference to the accompanying drawings will be described in detail the configuration and operation of the present invention.

도 3을 참조하면, 본 실시예는 2층 구조를 가지는 로드락 챔버로서, 2개의 본체(10,20)를 순차적으로 적층한 다음, 2층본체(20)의 상부에 덮개(30)를 착탈가능하게 결합하여 구성된다. 각 본체(10,20)는 측벽과 저판으로 구성되는데, 특히, 1층 본체(10)의 저판(11)의 일부를 분리형성한 후, 착탈가능하게 결합한다. Referring to FIG. 3, the present embodiment is a load lock chamber having a two-layer structure, in which two main bodies 10 and 20 are sequentially stacked, and then the cover 30 is attached to and detached from the upper portion of the two-layer main body 20. Possibly combined. Each of the main bodies 10 and 20 is composed of sidewalls and a bottom plate, and in particular, a part of the bottom plate 11 of the one-layer main body 10 is separated and then detachably coupled.

또한 상기 저판(11)의 상면에는 기판 적재부(12)가 일체형성되어 있는 것을 알 수 있다. In addition, it can be seen that the substrate mounting portion 12 is integrally formed on the upper surface of the bottom plate 11.

물론 이와 달리 단층구조의 로드락 챔버도 가능한 것은 당연하다. Of course, a single-layer load lock chamber is of course possible.

도 4를 참조하여 본 발명의 작용을 설명한다. The operation of the present invention will be described with reference to FIG.

상기 2층구조의 로드락 챔버는 프레임(40)의 상면에 설치되어 지지된다. 이 상태에서 1층 본체(10)의 내부를 유지 보수할 필요가 있는 경우에는, 1층 본체(10)의 저판(11)을 분리한 다음, 이를 구동수단(50)에 의해 하강시킨다. 이와 같은 방법으로 1층 본체(10)의 하부를 개방하여 유지 보수작업 등을 수행할 수 있다. The load lock chamber of the two-layer structure is installed and supported on the upper surface of the frame (40). In the case where it is necessary to maintain the inside of the first floor main body 10 in this state, the bottom plate 11 of the first floor main body 10 is separated and then lowered by the driving means 50. In this way, the lower part of the first floor main body 10 may be opened to perform maintenance and the like.

물론 2층 본체(20)의 유지 보수를 위하여는 덮개(30)를 크레인 등으로 들어 올려 상부를 개방하여 수행한다. Of course, for the maintenance of the two-layer body 20 is carried out by lifting the cover 30 by a crane or the like to open the top.

본 발명에 따르면, 로드락 챔버의 하부를 개방할 수 있기 때문에 이를 통해 챔버 내부의 유지, 보수가 용이하다는 효과가 있다. According to the present invention, since the lower portion of the load lock chamber can be opened, there is an effect of easy maintenance and repair inside the chamber.

특히, 로드락 챔버가 다층구조일 경우에 1층 챔버의 유지보수가 필요할 경우에 2층 이상의 챔버를 들어 올리지 않고도 수행할 수 있기 때문에 더욱 효과가 크다. In particular, when the load lock chamber is a multi-layer structure, it is more effective because it can be performed without lifting the two or more chambers when maintenance of the one-layer chamber is required.

Claims (3)

로드락 챔버에 있어서,In the load lock chamber, 상기 챔버의 저판의 전부 또는 일부가 분리가능하게 결합되어 이루어짐으로써, 하부가 개방될 수 있는 것을 특징으로 하는 로드락 챔버. All or a portion of the bottom plate of the chamber is detachably coupled, the load lock chamber, characterized in that the lower portion can be opened. 제 1 항에 있어서,The method of claim 1, 상기 챔버는 다층으로 이루어지는 것을 특징으로 하는 로드락 챔버. The chamber is a load lock chamber, characterized in that the multilayer. 제 1 항에 있어서,The method of claim 1, 상기 저판의 상면에는 기판 적재부가 일체 형성되는 것을 특징으로 하는 로드락 챔버.The load lock chamber, characterized in that the substrate mounting portion is integrally formed on the upper surface of the bottom plate.
KR1020060027574A 2006-03-27 2006-03-27 Load-lock chamber KR20070096669A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020060027574A KR20070096669A (en) 2006-03-27 2006-03-27 Load-lock chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060027574A KR20070096669A (en) 2006-03-27 2006-03-27 Load-lock chamber

Publications (1)

Publication Number Publication Date
KR20070096669A true KR20070096669A (en) 2007-10-02

Family

ID=38803478

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060027574A KR20070096669A (en) 2006-03-27 2006-03-27 Load-lock chamber

Country Status (1)

Country Link
KR (1) KR20070096669A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5793050A (en) * 1996-02-16 1998-08-11 Eaton Corporation Ion implantation system for implanting workpieces
JPH11217670A (en) * 1997-11-25 1999-08-10 Japan Steel Works Ltd:The Single-wafer load locking device and substrate cleaning method
US6254328B1 (en) * 1996-10-02 2001-07-03 Applied Materials, Inc. High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock
JP2003168712A (en) * 2001-11-30 2003-06-13 Japan Steel Works Ltd:The Method and device for transporting substrate in load- lock device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5793050A (en) * 1996-02-16 1998-08-11 Eaton Corporation Ion implantation system for implanting workpieces
US6254328B1 (en) * 1996-10-02 2001-07-03 Applied Materials, Inc. High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock
JPH11217670A (en) * 1997-11-25 1999-08-10 Japan Steel Works Ltd:The Single-wafer load locking device and substrate cleaning method
JP2003168712A (en) * 2001-11-30 2003-06-13 Japan Steel Works Ltd:The Method and device for transporting substrate in load- lock device

Similar Documents

Publication Publication Date Title
US8506711B2 (en) Apparatus for manufacturing flat-panel display
CN100536070C (en) Vacuum processing device
KR101335302B1 (en) Apparatus driving lift pins and device having it for manufacturing FPD
US8499430B2 (en) Assembly method of transfer mechanism and transfer chamber
US20050183665A1 (en) Apparatus for manufacturing flat-panel display
KR20070096669A (en) Load-lock chamber
KR20090014956A (en) Vacuum drying device
KR101358742B1 (en) Apparatus for going up and coming down baffle, and manufacturing machine FPD having the same
KR100980448B1 (en) Lift pin module of fpd manufacturing machine
KR101468388B1 (en) Gate valve and FPD manufacturing machine having the same
JP2020107725A (en) Substrate processing apparatus
CN100539012C (en) Be used to make the equipment of flat-panel monitor
KR100606567B1 (en) Apparatus for manufacturing flat panel display
KR20080076570A (en) Load lock chamber structure for device manufacturing fpd
KR100965523B1 (en) Flat panel display manufacturing machine
KR101019532B1 (en) Plasma processing apparatus
KR100965515B1 (en) Flat panel display manufacturing machine
KR101362455B1 (en) Apparatus driving lift pins and device having it for manufacturing FPD
KR101079332B1 (en) Apparatus for attaching substrates having structure of metallic debris blocking
TWI533371B (en) Processing device
KR20110079241A (en) Device manufacturing flat display device with substrate align apparatus
KR100740453B1 (en) Apparatus for vacuum processing
KR100553102B1 (en) Lift pin module and apparatus for manufacturing fpd that use thereof
KR101117119B1 (en) Chemical vapor deposition apparatus
KR101123670B1 (en) Gate valve

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E90F Notification of reason for final refusal
E601 Decision to refuse application