KR20070037607A - A surface disposal reservoir - Google Patents

A surface disposal reservoir Download PDF

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Publication number
KR20070037607A
KR20070037607A KR1020070026442A KR20070026442A KR20070037607A KR 20070037607 A KR20070037607 A KR 20070037607A KR 1020070026442 A KR1020070026442 A KR 1020070026442A KR 20070026442 A KR20070026442 A KR 20070026442A KR 20070037607 A KR20070037607 A KR 20070037607A
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South Korea
Prior art keywords
surface treatment
inlet
outlet
workpiece
treatment tank
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KR1020070026442A
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Korean (ko)
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KR100867301B1 (en
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김남성
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(주)포인텍
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Priority to KR1020070026442A priority Critical patent/KR100867301B1/en
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/02—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C25D17/04—External supporting frames or structures

Abstract

본 발명은 복수의 표면처리조를 경유하여 피처리물의 표면에 도금을 수행하는 경우 피처리물을 수평이동만으로도 각 표면처리조를 경유할 수 있도록 구조가 개량된 표면처리조에 관한 것이다.The present invention relates to a surface treatment tank whose structure is improved to pass through each surface treatment tank only by horizontal movement of the object when plating the surface of the object through the plurality of surface treatment tanks.

본 발명 표면처리조(30)는 상면이 개방되고 마주하는 양측면에 각각 피처리물(10)이 진입되는 입구(31)와 배출되는 출구(32)가 형성되며, 입구(31)측에 회전가능하게 구비되어 피처리물(10)을 압착이송시키며 쿠션을 가지는 한쌍의 공급롤러(36)와, 출구(32)측에 회전가능하게 구비되어 피처리물(10)을 압착이송시키며 쿠션을 가지는 한쌍의 배출롤러(37)를 구비한다.The surface treatment tank 30 of the present invention has an inlet 31 through which the workpiece 10 enters and an outlet 32 through which the top surface is opened and facing each other, and is rotatable on the inlet 31 side. And a pair of feed rollers 36 which have a cushion to transfer the workpiece 10 and have a cushion, and a pair of rollers rotatably provided at the outlet 32 to compress and transfer the workpiece 10 to have a cushion. Discharge roller 37 is provided.

이와 같은 표면처리조는 좌/우측에 피처리물(10)이 출입되는 입구(31)와 출구(32)를 형성시킴으로써, 복수의 표면처리조(30)(40)들이 연속적으로 배치되어 피처리물(10)이 각각 경유하여야 되는 경우 수평이동만으로도 가능하게 하여 표면처리시간을 단축시킬 수 있도록 한다.Such a surface treatment tank forms an inlet 31 and an outlet 32 through which the object 10 enters and exits on the left and right sides thereof, whereby a plurality of surface treatment tanks 30 and 40 are continuously disposed to be treated. In the case where (10) is to pass through each other, it is possible to shorten the surface treatment time by horizontal movement alone.

표면처리, 피처리물, 처리액, 롤러, 도금 Surface treatment, workpiece, treatment liquid, roller, plating

Description

표면처리조{A surface disposal reservoir}A surface disposal reservoir

도 1 종래 복수의 표면처리조를 경유하여 피처리물을 표면처리하는 상태를 설명하는 개략도,1 is a schematic diagram illustrating a state in which a target object is surface treated via a plurality of conventional surface treatment tanks;

도 2는 본 발명 실시예의 표면처리조를 경유하여 피처리물을 표면처리하는 상태를 설명하는 개략도,2 is a schematic view for explaining a state of surface treatment of a workpiece through a surface treatment tank of an embodiment of the present invention;

도 3은 본 발명 실시예의 표면처리조를 나타낸 사시도,3 is a perspective view showing a surface treatment tank of an embodiment of the present invention;

도 4는 도 3의 평면도,4 is a plan view of FIG.

도 5는 도 3의 단면도이다.5 is a cross-sectional view of FIG. 3.

〈도면의 주요부분에 대한 부호의 설명〉<Explanation of symbols for main parts of drawing>

10...피처리물 20...레일10.Treatment 20 ... Rail

30,40...표면처리조 31...입구30, 40 Surface treatment tank 31

32...출구 33...수용공간부32.Exit 33 ... Accommodation space

34...이동통로 35...회수저장조34.Moving passage 35 ... Recovery reservoir

50...표면처리액50 Surface Treatment

본 발명은 피처리물의 연속 수평이동을 가능하게 한 표면처리조에 관한 것으로써, 더 상세하게는 복수의 표면처리조를 경유하여 피처리물의 표면에 도금을 수행하는 경우 피처리물을 수평이동만으로도 각 표면처리조를 경유할 수 있도록 구조가 개량된 표면처리조에 관한 것이다.The present invention relates to a surface treatment tank which enables continuous horizontal movement of a workpiece. More particularly, when plating the surface of a workpiece through a plurality of surface treatment tanks, the workpiece is horizontally moved. The present invention relates to a surface treatment tank whose structure is improved to pass through the surface treatment tank.

표면처리의 일예로서, 피처리물의 표면에 도금하는 공정에는 피처리물의 표면에 존재하는 기름, 얼룩을 제거하는 전처리 단계와, 피처리물을 1차 세척하는 단계와, 1차 세척된 표면에 세척물로 인한 얼룩을 방지하도록 황산 또는 질산으로 표면처리하는 단계와, 표면처리 후 2차 세척하는 단계와, 피처리물의 표면에 도금하는 단계와, 상기 도금된 피처리물의 표면을 3차 세척하는 단계를 포함한다.As an example of the surface treatment, the plating process on the surface of the workpiece includes a pretreatment step of removing oil and stains present on the surface of the workpiece, a step of first washing the workpiece, and a first washed surface. Surface treatment with sulfuric acid or nitric acid to prevent staining due to water, second cleaning after the surface treatment, plating on the surface of the workpiece, and third cleaning of the surface of the plated workpiece It includes.

이와 같이 도금을 위하여는 전처리공정, 도금공정 및 후처리공정이 이어지며, 각 공정에서는 피처리물을 클램프(clamp)로 클램핑하고 행거(hanger)로 현수(懸垂)지지하여 각 공정의 표면처리조로 이동시킬 수 있도록 수평이동 및 수직이동시키는 안내수단에 의해 안내되고 있다.The plating process is followed by a pretreatment process, a plating process, and a post-treatment process. In each process, the workpiece is clamped by a clamp and suspended by a hanger to be used as a surface treatment tank of each process. It is guided by guide means for moving horizontally and vertically so as to move.

이와 같은 표면처리장치는 도 1에서와 같이, 세척조 및 도금조와 같은 복수의 표면처리조(1)(2)(3)들이 일정간격으로 복수 구비되어 있고, 피처리물(10)들은 행거에 클램핑된 상태에서 레일(20)을 따라 수평이동되어 각 표면처리조(1)(2)(3) 상부로 이동될 수 있게 되어 있고, 각 표면처리조(1)(2)(3) 상부에 위치한 상태에서는 하강(수직이동)되어 피처리물(10)이 각 표면처리조(1)(2)(3)내로 침수될 수 있도록 되어 있다.Such a surface treatment apparatus is provided with a plurality of surface treatment tanks (1) (2) (3), such as a washing tank and a plating bath at regular intervals, as shown in Figure 1, the workpiece 10 is clamped to the hanger In the state of being moved horizontally along the rail 20 to be able to move to the upper surface of each surface treatment tank (1) (2) (3), located on each surface treatment tank (1) (2) (3) In the state, it is lowered (moved vertically) and the to-be-processed object 10 can be submerged in each surface treatment tank 1, 2, and 3. As shown in FIG.

그러나 상기와 같은 통상의 표면처리장치에 있어서는 피처리물(10)이 수평 및 수직이동되면서 각 표면처리조(1)(2)(3)내로 공급 및 배출됨으로써 표면처리 시간이 과다 소요되는 문제점이 있다.However, in the conventional surface treatment apparatus as described above, the object 10 is moved horizontally and vertically, and is supplied and discharged into each of the surface treatment tanks 1, 2, and 3, thereby causing excessive surface treatment time. have.

또한, 피처리물(10)이 상부로부터 하강되면서 표면처리조(1)(2)(3)의 처리액(전해액)에 유입될때 기포가 발생됨으로써, 이로인하여 기포와 맞닿은 부분이 처리액과의 화학적작용이 불균일하게 이루어지는 등 표면처리 효율이 낮아 지고 불량이 발생되는 문제점이 있다.In addition, air bubbles are generated when the object 10 flows into the treatment liquid (electrolyte solution) of the surface treatment tanks 1, 2, and 3 while descending from the upper portion thereof, whereby the portion contacted with the bubbles is separated from the treatment liquid. There is a problem that the surface treatment efficiency is lowered, such as a non-uniform chemical action and defects occur.

본 발명은 상기와 같은 문제점을 해결하기 위하여 창출된 것으로써, 다음과 같은 기술적 과제를 갖는다.The present invention was created to solve the above problems, and has the following technical problems.

첫째, 피처리물들이 복수의 표면처리조를 경유해야 하는 표면처리장치에서 수평이동만으로도 각 표면처리조를 경유할 수 있도록 하여 표면처리시간을 단축시킬 수 있도록 한 피처리물의 연속 수평이동을 가능하게 한 표면처리조를 제공하는 데 있다.First, it is possible to continuously move the workpieces to reduce the surface treatment time by allowing the workpieces to pass through each surface treatment tank only by horizontal movement in the surface treatment apparatus that must pass through a plurality of surface treatment tanks. It is to provide a surface treatment tank.

둘째, 피처리물이 표면처리조 내로 유입시 기포발생을 억제하여 표면처리의 품질을 높일 수 있도록 한 피처리물의 연속 수평이동을 가능하게 한 표면처리조를 제공하는 데 있다.Second, it is to provide a surface treatment tank that enables the continuous horizontal movement of the treated object to increase the quality of the surface treatment by inhibiting the generation of bubbles when the workpiece is introduced into the surface treatment tank.

상기 목적을 달성하는 본 발명은 표면처리액이 수용되며 피처리물이 진입되어 피처리물의 표면을 처리하는 표면처리조에 있어서,In the present invention to achieve the above object is a surface treatment tank that the surface treatment liquid is accommodated and the treatment object enters to treat the surface of the treatment object,

상기 표면처리조는 상면이 개방되고 마주하는 양측면에 각각 상기 피처리물 이 진입되는 입구와 배출되는 출구가 형성되며,The surface treatment tank is formed with an inlet and an outlet exiting the workpiece, respectively, on both sides of which the upper surface is opened and faces each other.

상기 입구측에 회전가능하게 구비되어 상기 피처리물을 압착이송시키며 쿠션을 가지는 한쌍의 공급롤러와,A pair of feed rollers rotatably provided at the inlet side and having a cushion for transferring the object to be treated;

상기 출구측에 회전가능하게 구비되어 상기 피처리물을 압착이송시키며 쿠션을 가지는 한쌍의 배출롤러를 구비한 것을 특징으로 한다.It is rotatably provided on the outlet side, characterized in that it comprises a pair of discharge rollers having a cushioning and conveying the workpiece.

본 발명 표면처리조는 상기 입구와 출구측에 각각 입구와 출구를 통하여 누출되는 표면처리액을 저장시키는 회수저장조가 구비된 것을 특징으로 한다.The surface treatment tank of the present invention is characterized in that the recovery and storage tank for storing the surface treatment liquid leaks through the inlet and the outlet side, respectively.

또한, 본 발명 표면처리조는 상기 입구와 출구를 연결하고 상기 피처리물이 통과되며 표면처리액이 수용되는 이동통로가 한쌍의 격벽에 의해서 형성되고, 상기 이동통로의 양측에 형성되고 표면처리액이 수용되어 상기 이동통로로 표면처리액이 넘쳐 공급되는 수용공간부가 형성된 것을 특징으로 한다.In addition, the surface treatment tank of the present invention connects the inlet and the outlet, passes through the object to be processed and is formed by a pair of partition walls for receiving the surface treatment liquid, formed on both sides of the movement passage and the surface treatment liquid is It is characterized in that the receiving space is formed to receive the surface treatment liquid is supplied to the moving passage overflow.

또한, 본 발명 표면처리조는 상기 입구측에 상기 피처리물의 진입을 안내하는 안내대가 구비된 것을 특징으로 한다.In addition, the surface treatment tank of the present invention is characterized in that the guide is provided to guide the entry of the object to the inlet side.

이하 첨부된 도면을 참조하면서 본 발명에 따른 바람직한 실시예를 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

본 발명 실시예의 표면처리조는 예컨대, 인쇄회로기판 또는 모니터류의 평면기판등을 에칭 또는 도금등의 표면처리를 수평이동만으로 연속적으로 수행할 수 있도록 한다.The surface treatment tank of the embodiment of the present invention allows a surface substrate such as a printed circuit board or a monitor, etc. to be continuously performed by only horizontal movement of etching or plating.

이들 기판들의 표면처리는 세정, 에칭, 도금, 세정등의 공정을 거치게 되며, 각 공정에 적당한 표면처리액을 표면처리조에 수용시키고 기판을 디핑(deeping)하 여 표면처리를 행한다.Surface treatment of these substrates is performed through a process such as cleaning, etching, plating, and cleaning, and the surface treatment liquid suitable for each process is accommodated in the surface treatment tank, and the substrate is subjected to the surface treatment by deepening.

즉, 도 2를 참조하면, 본 발명 실시예의 표면처리조(30)(40)는 피처리물(10)을 행거에 지지시킨 상태에서 레일(20)을 따라 수평이동시키는 동작만으로 각 표면처리조(30)(40)를 경유할 수 있도록 한다.That is, referring to FIG. 2, the surface treatment tanks 30 and 40 according to the embodiment of the present invention are each surface treatment tank only by horizontally moving along the rails 20 while supporting the workpiece 10 on the hanger. (30) (40) can be routed.

이와 같은 실시예의 표면처리조(30)는 도 3 내지 도 5를 참조하면, 상면이 개방되고 마주하는 양측면에 각각 상기 피처리물(10)이 진입되는 입구(31)와 배출되는 출구(32)가 형성되며, 상기 입구(31)측에 회전가능하게 구비되어 상기 피처리물(10)을 압착이송시키며 쿠션을 가지는 한쌍의 공급롤러(36)와, 상기 출구(32)측에 회전가능하게 구비되어 상기 피처리물(10)을 압착이송시키며 쿠션을 가지는 한쌍의 배출롤러(37)를 구비한다.3 to 5, the surface treatment tank 30 according to this embodiment has an inlet 31 through which the object 10 enters and an outlet 32 through which the object 10 enters into both sides of the upper surface facing and facing each other. And a pair of feed rollers 36 rotatably provided at the inlet 31 to compress and transfer the workpiece 10 and having a cushion, and rotatably provided at the outlet 32 side. And a pair of discharge rollers 37 having a cushion for conveying the object 10 by compression.

상기 공급롤러(36)와 배출롤러(37)는 고무, 실리콘과 같은 쿠션기능을 갖는 재질로 형성되며, 각각 입구(31)와 출구(32)에 밀착 회전되어서 표면처리액(50)이 누출되는 것을 방지하였다. 이때 각 공급롤러(36)와 배출롤러(37)는 저속으로 회전되어서 입구(31)와 출구(32)에 밀착회전될때 쿠션변형이 되어 표면처리액(50)의 누출을 방지할 수 있게 하고 공급롤러(36)와 배출롤러(37)의 손상을 방지할 수 있게 한다.The feed roller 36 and the discharge roller 37 is formed of a material having a cushion function, such as rubber, silicon, and rotated in close contact with the inlet 31 and the outlet 32, respectively, so that the surface treatment liquid 50 leaks. To prevent it. At this time, each of the supply roller 36 and the discharge roller 37 is rotated at a low speed to become a cushion deformation when rotated in close contact with the inlet 31 and the outlet 32 to prevent the leakage of the surface treatment liquid 50 and supply It is possible to prevent the damage of the roller 36 and the discharge roller 37.

이와 같은 표면처리액(50)의 누출방지에도 불구하고 누출되는 표면처리액(50)의 회수를 위하여, 상기 입구(31)와 출구(32)측에 각각 입구(31)와 출구(32)를 통하여 누출되는 표면처리액(50)을 저장시키는 회수저장조(35)를 구비하였다.In order to recover the surface treatment liquid 50 that leaks despite the prevention of the surface treatment liquid 50, the inlet 31 and the outlet 32 are respectively provided on the inlet 31 and the outlet 32. It was provided with a recovery storage tank 35 for storing the surface treatment liquid 50 leaked through.

또한, 상기 입구(31)와 출구(32)를 연결하고 상기 피처리물(10)이 통과되며 표면처리액(50)이 수용되는 이동통로(34)를 한쌍의 격벽(34a)에 의해서 형성하였고, 상기 이동통로(34)의 양측에 표면처리액(50)이 수용되는 수용공간부(33)를 형성하여서, 이 수용공간부(33)로부터 넘쳐서 상기 이동통로(34)로 표면처리액(50)이 공급될 수 있도록 하였다.In addition, the inlet 31 and the outlet 32 are connected to each other, and the workpiece 10 is passed through and a moving passage 34 for receiving the surface treatment liquid 50 is formed by a pair of partition walls 34a. Forming a receiving space 33, the surface treatment liquid 50 is accommodated on both sides of the moving passage 34, overflows from the containing space 33 to the surface treatment liquid 50 to the moving passage 34 ) Can be supplied.

상기 격벽(34a)에 의해서 이동통로(34)를 형성시킴으로써, 입구(31)와 출구(32)를 통하여 누출되는 표면처리액(50)은 이동통로(34)내의 표면처리액(50)에 한정되므로 전체 표면처리액(50)의 누출을 방지할 수 있게 한다.By forming the movement passage 34 by the partition 34a, the surface treatment liquid 50 leaking out through the inlet 31 and the outlet 32 is limited to the surface treatment liquid 50 in the movement passage 34. Therefore, it is possible to prevent the leakage of the entire surface treatment solution (50).

한편, 회수저장조(35)에 회수된 표면처리액(50)은 펌프(미도시)를 통하여 상기 수용공간부(33)로 재공급시킬 수 있게 하였다.On the other hand, the surface treatment liquid 50 recovered in the recovery storage tank 35 can be re-supplied to the receiving space 33 through a pump (not shown).

또한, 도 3에서와 같이, 입구(31)측에는 피처리물(10)의 진입을 안내하는 안내대(38)가 구비되어서, 피처리물(10)의 진입이 원할하도록 하였다.In addition, as shown in Figure 3, the entrance 31 is provided with a guide 38 for guiding the entry of the workpiece 10, so that the entry of the workpiece 10 is desired.

상기와 같은 표면처리조(30)의 구성에 있어서, 상기 공급롤러(36)와 배출로러(37)는 레일(20)을 따라 피처리물(10)을 수평이동시키는 메인구동원(미도시)의 수평이동속도와 동일한 속도로 별도의 모터(미도시)에 의해서 구동시킬 수 있고, 또는 상기 메인구동원에 의해서 수평이동되는 피처리물(10)과의 마찰력으로 회전될 수 있도록 공회전가능하게 설치할 수 있다.In the configuration of the surface treatment tank 30 as described above, the supply roller 36 and the discharge roller 37 of the main drive source (not shown) for horizontally moving the object 10 along the rail 20 It may be driven by a separate motor (not shown) at the same speed as the horizontal moving speed, or may be installed to be idling so as to be rotated by a frictional force with the workpiece 10 horizontally moved by the main driving source. .

또한, 공급롤러(36) 및 배출롤러(37)는 입구(31)와 출구(32) 즉, 표면처리조(30) 몸체로부터 틈새(약 1㎜ 정도)를 갖도록 설치하여서, 스며드는 처리액(50)에 의해서 롤러(36)(37)들이 원할하게 회전될 수 있도록 할 수 있다. 이 경우 틈새로 스며들어 누출되는 처리액(50)은 회수저장조(35)로 회수된 다시 상기 펌프에 의해 서 수용공간부(33)로 재공급시킬 수 있다.In addition, the supply roller 36 and the discharge roller 37 are installed to have a gap (about 1 mm) from the inlet 31 and the outlet 32, that is, the body of the surface treatment tank 30, soaking in the treatment liquid 50 ), The rollers 36 and 37 can be rotated smoothly. In this case, the treatment liquid 50 leaked into the gap may be resupplyed to the accommodation space 33 by the pump, which is recovered to the recovery storage 35.

또한, 도 3을 참조하면, 상기 안내대(38)는 피처리물(10)과의 접촉시 피처리물(10)의 흠집등의 손상을 방지할 수 있도록 유연한 재질의 고무, 실리콘으로 형성하였으며, 특히 피처리물(10)의 진입시 안내대(38)가 피처리물(10)에 표면장력에 의해서 부착되는 것을 방지할 수 있도록 가장자리에 도 3에서와 같이 파도모양같이 갈라진홈(38a)을 형성하였다.In addition, referring to Figure 3, the guide 38 is formed of a rubber, silicone of a flexible material so as to prevent damage such as scratches of the workpiece 10 in contact with the workpiece 10 In particular, in order to prevent the guide 38 from being attached to the workpiece 10 by surface tension when entering the workpiece 10, the groove 38a having a wave-like groove 38a is formed at the edge thereof as shown in FIG. 3. Formed.

상기와 같은 표면처리조는 첫째, 좌/우측에 피처리물(10)이 출입되는 입구(31)와 출구(32)를 형성시킴으로써, 복수의 표면처리조(30)(40)들이 연속적으로 배치되어 피처리물(10)이 각각 경유하여야 되는 경우 도 2에서와 같이 수평이동만으로도 가능하게 하여 표면처리시간을 단축시킬 수 있도록 한다.In the surface treatment tank as described above, first, by forming the inlet 31 and the outlet 32 into and out of the object 10 to be processed, the plurality of surface treatment tanks 30 and 40 are continuously disposed. In the case where the to-be-processed object 10 has to pass through each other, the surface treatment time can be shortened by only horizontal movement as shown in FIG. 2.

둘째, 피처리물(10)이 공급롤러(36)와 배출롤러(37)에 압착되어 출입되므로 표면처리조(30) 내로 유입시 기포발생을 억제하여 표면처리의 품질을 높일 수 있게 한다.Second, since the object to be treated 10 is pressed into the supply roller 36 and the discharge roller 37, the quality of the surface treatment can be improved by suppressing the occurrence of bubbles when entering the surface treatment tank 30.

세째, 표면처리조(30)내에 격벽(34a)에 의해서 표면처리액(50)이 수용되고 피처리물(10)이 통과되는 이동통로(34)를 형성시킴으로써, 롤러(36)(37)들이 손상되어 표면처리액(50)이 누출되더라도 전체 표면처리액(50)의 누출을 방지할 수 있게 한다.Third, the rollers 36 and 37 are formed by forming the movement passage 34 through which the surface treatment liquid 50 is received by the partition 34a in the surface treatment tank 30 and the object 10 to be passed through. Even if the surface treatment solution 50 is damaged and leaks, it is possible to prevent the leakage of the entire surface treatment solution 50.

Claims (4)

표면처리액이 수용되며 피처리물이 진입되어 피처리물의 표면을 처리하는 표면처리조에 있어서,In the surface treatment tank that the surface treatment liquid is accommodated and the object to be processed enters and treats the surface of the object, 상기 표면처리조(30)는 상면이 개방되고 마주하는 양측면에 각각 상기 피처리물(10)이 진입되는 입구(31)와 배출되는 출구(32)가 형성되며,The surface treatment tank 30 has an inlet 31 through which the object 10 enters and an outlet 32 through which upper surfaces are opened and face each other, respectively. 상기 입구(31)측에 회전가능하게 구비되어 상기 피처리물(10)을 압착이송시키며 쿠션을 가지는 한쌍의 공급롤러(36)와,A pair of feed rollers 36 rotatably provided at the inlet 31 side to compress and transfer the object 10 to have a cushion; 상기 출구(32)측에 회전가능하게 구비되어 상기 피처리물(10)을 압착이송시키며 쿠션을 가지는 한쌍의 배출롤러(37)를 구비한 것을 특징으로 하는 표면처리조.Surface treatment tank characterized in that it is rotatably provided on the outlet (32) side and a pair of discharge rollers (37) having a cushion to convey the workpiece (10) by compression. 제 1 항에 있어서, 상기 입구(31)와 출구(32)측에 각각 입구(31)와 출구(32)를 통하여 누출되는 표면처리액(50)을 저장시키는 회수저장조(35)가 구비된 것을 특징으로 하는 표면처리조.According to claim 1, wherein the inlet 31 and the outlet 32 is provided with a recovery storage tank 35 for storing the surface treatment liquid 50 leaked through the inlet 31 and the outlet 32, respectively Surface treatment tank characterized by. 제 1 항 또는 제 2 항에 있어서, 상기 입구(31)와 출구(32)를 연결하고 상기 피처리물(10)이 통과되며 표면처리액(50)이 수용되는 이동통로(34)가 한쌍의 격벽(34a)에 의해서 형성되고,According to claim 1 or claim 2, wherein the inlet 31 and the outlet 32, the pair of moving passages 34 through which the object 10 is passed and the surface treatment liquid 50 is accommodated Formed by the partition wall 34a, 상기 이동통로(34)의 양측에 형성되고 표면처리액(50)이 수용되어 상기 이동 통로(34)로 표면처리액이 넘쳐 공급되는 수용공간부(33)가 형성된 것을 특징으로 하는 표면처리조.Surface treatment tanks are formed on both sides of the movement passage (34) and the surface treatment liquid (50) is accommodated to receive the surface treatment liquid overflowed to the movement passage (34). 제 3 항에 있어서, 상기 입구(31)측에 상기 피처리물(10)의 진입을 안내하는 안내대(38)가 구비된 것을 특징으로 하는 표면처리조.4. The surface treatment tank according to claim 3, wherein a guide table (38) is provided at the inlet (31) side to guide the entry of the object (10).
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100914488B1 (en) * 2008-12-09 2009-08-27 (주)포인텍 A apparatus for guiding a base plate
KR102327038B1 (en) * 2021-07-12 2021-11-16 주식회사 지씨이 A liquid isolator for vertical continuous plating apparatus

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Publication number Priority date Publication date Assignee Title
DK0760023T3 (en) * 1994-05-11 1998-04-27 Siemens Sa Device for processing plate-shaped items, especially of printed circuit boards
JP2003342788A (en) * 2002-05-23 2003-12-03 Chuo Seisakusho Ltd Liquid leakage preventing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100914488B1 (en) * 2008-12-09 2009-08-27 (주)포인텍 A apparatus for guiding a base plate
KR102327038B1 (en) * 2021-07-12 2021-11-16 주식회사 지씨이 A liquid isolator for vertical continuous plating apparatus

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