KR20070029157A - 리소그래피 적용을 위한 열경화된 언더코트 - Google Patents

리소그래피 적용을 위한 열경화된 언더코트 Download PDF

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Publication number
KR20070029157A
KR20070029157A KR1020067021214A KR20067021214A KR20070029157A KR 20070029157 A KR20070029157 A KR 20070029157A KR 1020067021214 A KR1020067021214 A KR 1020067021214A KR 20067021214 A KR20067021214 A KR 20067021214A KR 20070029157 A KR20070029157 A KR 20070029157A
Authority
KR
South Korea
Prior art keywords
group
undercoat
unsubstituted
carbon atoms
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020067021214A
Other languages
English (en)
Korean (ko)
Inventor
비노드 비. 드
산제이 말리크
토마스 제이. 코갑
토마스 사루비
Original Assignee
후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. filed Critical 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨.
Publication of KR20070029157A publication Critical patent/KR20070029157A/ko
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020067021214A 2004-03-12 2005-03-09 리소그래피 적용을 위한 열경화된 언더코트 Ceased KR20070029157A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55248904P 2004-03-12 2004-03-12
US60/552,489 2004-03-12

Publications (1)

Publication Number Publication Date
KR20070029157A true KR20070029157A (ko) 2007-03-13

Family

ID=34994171

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067021214A Ceased KR20070029157A (ko) 2004-03-12 2005-03-09 리소그래피 적용을 위한 열경화된 언더코트

Country Status (6)

Country Link
US (1) US7416821B2 (https=)
EP (1) EP1743363A4 (https=)
JP (1) JP4612672B2 (https=)
KR (1) KR20070029157A (https=)
TW (1) TWI396942B (https=)
WO (1) WO2005089150A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8628698B2 (en) 2009-12-28 2014-01-14 Cheil Industries Inc. Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same

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EP1600814A3 (en) * 2004-05-18 2008-12-17 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
EP1845416A3 (en) 2006-04-11 2009-05-20 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for photolithography
US7754414B2 (en) * 2006-07-12 2010-07-13 Az Electronic Materials Usa Corp. Antireflective coating compositions
US7666575B2 (en) * 2006-10-18 2010-02-23 Az Electronic Materials Usa Corp Antireflective coating compositions
US8153346B2 (en) * 2007-02-23 2012-04-10 Fujifilm Electronic Materials, U.S.A., Inc. Thermally cured underlayer for lithographic application
US7727705B2 (en) * 2007-02-23 2010-06-01 Fujifilm Electronic Materials, U.S.A., Inc. High etch resistant underlayer compositions for multilayer lithographic processes
JP5106911B2 (ja) * 2007-04-13 2012-12-26 株式会社ダイセル 重合体及びそれを用いた反射防止膜形成組成物
EP2387735B1 (en) * 2009-01-16 2019-03-13 FujiFilm Electronic Materials USA, Inc. Nonpolymeric binders for semiconductor substrate coatings
CN105324720B (zh) * 2013-06-26 2020-01-03 日产化学工业株式会社 包含被置换的交联性化合物的抗蚀剂下层膜形成用组合物
JP6209103B2 (ja) * 2014-02-25 2017-10-04 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
KR101982103B1 (ko) 2015-08-31 2019-05-27 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 오버코팅된 포토레지스트와 함께 사용하기 위한 코팅 조성물
US12590232B2 (en) 2019-12-10 2026-03-31 Xinmei Fontana Holding (Hong Kong) Limited Multi-region foldable adhesive film and fabrication method therefor

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US4251665A (en) * 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US5187019A (en) * 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
US6472128B2 (en) * 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
EP0632003B1 (en) * 1993-06-30 1998-01-14 Fuji Photo Film Co., Ltd. Novel phenol compounds containing methoxymethyl group or hydroxymethyl group
GB9406815D0 (en) * 1994-04-06 1994-05-25 Ici Plc Polymer
US6808869B1 (en) * 1996-12-24 2004-10-26 Fuji Photo Film Co., Ltd. Bottom anti-reflective coating material composition and method for forming resist pattern using the same
JP4053631B2 (ja) 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
TW457403B (en) * 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
US6410209B1 (en) * 1998-09-15 2002-06-25 Shipley Company, L.L.C. Methods utilizing antireflective coating compositions with exposure under 200 nm
JP3852889B2 (ja) * 1998-09-24 2006-12-06 富士写真フイルム株式会社 フォトレジスト用反射防止膜材料組成物
US6316165B1 (en) * 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
US6323287B1 (en) * 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
US6610808B2 (en) * 1999-03-12 2003-08-26 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
US6054248A (en) * 1999-03-12 2000-04-25 Arch Specialty Chemicals, Inc. Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography
US6924339B2 (en) * 1999-03-12 2005-08-02 Arch Specialty Chemicals, Inc. Thermally cured underlayer for lithographic application
DE50015750D1 (de) * 1999-04-28 2009-11-12 Qimonda Ag Bottomresist
JP4253423B2 (ja) * 2000-06-14 2009-04-15 富士フイルム株式会社 ポジ型レジスト積層物
EP1172695A1 (en) 2000-07-14 2002-01-16 Shipley Company LLC Barrier layer
EP1373331A4 (en) 2001-03-13 2007-01-17 Fujifilm Electronic Materials THERMALLY HARDENED LITHOGRAPH LAYER
JP4139575B2 (ja) * 2001-04-13 2008-08-27 富士フイルム株式会社 シリコン含有２層レジスト用下層レジスト組成物
TW576859B (en) * 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
JP4181791B2 (ja) * 2002-04-08 2008-11-19 本州化学工業株式会社 ヒドロキシメチル置換多官能フェノール類

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8628698B2 (en) 2009-12-28 2014-01-14 Cheil Industries Inc. Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same

Also Published As

Publication number Publication date
WO2005089150A2 (en) 2005-09-29
TWI396942B (zh) 2013-05-21
JP4612672B2 (ja) 2011-01-12
EP1743363A2 (en) 2007-01-17
WO2005089150A3 (en) 2006-11-23
JP2007529037A (ja) 2007-10-18
TW200604742A (en) 2006-02-01
EP1743363A4 (en) 2010-08-11
US7416821B2 (en) 2008-08-26
US20050238997A1 (en) 2005-10-27

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