KR20060125905A - Ｌｐｐ ｅｕｖ 광원 - Google Patents
Ｌｐｐ ｅｕｖ 광원 Download PDFInfo
- Publication number
- KR20060125905A KR20060125905A KR1020067019063A KR20067019063A KR20060125905A KR 20060125905 A KR20060125905 A KR 20060125905A KR 1020067019063 A KR1020067019063 A KR 1020067019063A KR 20067019063 A KR20067019063 A KR 20067019063A KR 20060125905 A KR20060125905 A KR 20060125905A
- Authority
- KR
- South Korea
- Prior art keywords
- laser
- euv
- light source
- pulse
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/20—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1645—Solid materials characterised by a crystal matrix halide
- H01S3/1653—YLiF4(YLF, LYF)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2255—XeF, i.e. xenon fluoride is comprised for lasing around 351 nm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2375—Hybrid lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- X-Ray Techniques (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/803,526 US7087914B2 (en) | 2004-03-17 | 2004-03-17 | High repetition rate laser produced plasma EUV light source |
| US10/803,526 | 2004-03-17 | ||
| US10/979,919 | 2004-11-01 | ||
| US10/979,919 US7317196B2 (en) | 2004-03-17 | 2004-11-01 | LPP EUV light source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20060125905A true KR20060125905A (ko) | 2006-12-06 |
Family
ID=34994164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020067019063A Ceased KR20060125905A (ko) | 2004-03-17 | 2005-03-03 | Ｌｐｐ ｅｕｖ 광원 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1730764A4 (enExample) |
| JP (1) | JP2007529903A (enExample) |
| KR (1) | KR20060125905A (enExample) |
| WO (1) | WO2005089131A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210148361A (ko) * | 2019-05-22 | 2021-12-07 | 사이머 엘엘씨 | 다수의 레이저 빔을 생성하는 장치 및 방법 |
| KR20210148360A (ko) * | 2019-05-22 | 2021-12-07 | 사이머 엘엘씨 | 복수의 심자외 광학 발진기를 위한 제어 시스템 |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7928416B2 (en) * | 2006-12-22 | 2011-04-19 | Cymer, Inc. | Laser produced plasma EUV light source |
| US20060146906A1 (en) * | 2004-02-18 | 2006-07-06 | Cymer, Inc. | LLP EUV drive laser |
| JP4574211B2 (ja) * | 2004-04-19 | 2010-11-04 | キヤノン株式会社 | 光源装置、当該光源装置を有する露光装置 |
| US7329884B2 (en) * | 2004-11-08 | 2008-02-12 | Nikon Corporation | Exposure apparatus and exposure method |
| JP5156192B2 (ja) * | 2006-01-24 | 2013-03-06 | ギガフォトン株式会社 | 極端紫外光源装置 |
| CN101479667B (zh) * | 2006-07-03 | 2011-12-07 | 卡尔蔡司Smt有限责任公司 | 修正/修复光刻投影物镜的方法 |
| JP5086677B2 (ja) * | 2006-08-29 | 2012-11-28 | ギガフォトン株式会社 | 極端紫外光源装置用ドライバーレーザ |
| JP5551722B2 (ja) * | 2006-08-29 | 2014-07-16 | ギガフォトン株式会社 | 極端紫外光源装置用ドライバーレーザ |
| JP5179793B2 (ja) * | 2007-07-18 | 2013-04-10 | ギガフォトン株式会社 | 極端紫外光源用ドライバレーザ |
| JP5758569B2 (ja) * | 2008-06-12 | 2015-08-05 | ギガフォトン株式会社 | スラブ型レーザ装置 |
| JP5833806B2 (ja) * | 2008-09-19 | 2015-12-16 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置用レーザ光源装置及び極端紫外光源装置用レーザ光源の調整方法 |
| JP5587578B2 (ja) * | 2008-09-26 | 2014-09-10 | ギガフォトン株式会社 | 極端紫外光源装置およびパルスレーザ装置 |
| JP5536401B2 (ja) | 2008-10-16 | 2014-07-02 | ギガフォトン株式会社 | レーザ装置および極端紫外光光源装置 |
| JP5608173B2 (ja) * | 2008-12-16 | 2014-10-15 | コーニンクレッカ フィリップス エヌ ヴェ | 向上された効率によってｅｕｖ放射又は軟ｘ線を生成する方法及び装置 |
| WO2010093903A2 (en) * | 2009-02-13 | 2010-08-19 | Kla-Tencor Corporation | Optical pumping to sustain hot plasma |
| JP6021454B2 (ja) * | 2011-10-05 | 2016-11-09 | ギガフォトン株式会社 | 極端紫外光生成装置および極端紫外光生成方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3715800B2 (ja) * | 1998-10-02 | 2005-11-16 | 三菱電機株式会社 | レーザ照射装置 |
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| ATE331424T1 (de) * | 2002-05-13 | 2006-07-15 | Jettec Ab | Verfahren zur strahlungserzeugung |
| DE10305701B4 (de) * | 2003-02-07 | 2005-10-06 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von EUV-Strahlung mit hohen Repetitionsraten |
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- 2005-03-03 JP JP2007503940A patent/JP2007529903A/ja active Pending
- 2005-03-03 KR KR1020067019063A patent/KR20060125905A/ko not_active Ceased
- 2005-03-03 EP EP05724577A patent/EP1730764A4/en not_active Withdrawn
- 2005-03-03 WO PCT/US2005/007063 patent/WO2005089131A2/en not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210148361A (ko) * | 2019-05-22 | 2021-12-07 | 사이머 엘엘씨 | 다수의 레이저 빔을 생성하는 장치 및 방법 |
| KR20210148360A (ko) * | 2019-05-22 | 2021-12-07 | 사이머 엘엘씨 | 복수의 심자외 광학 발진기를 위한 제어 시스템 |
| US12374853B2 (en) | 2019-05-22 | 2025-07-29 | Cymer, Llc | Control system for a plurality of deep ultraviolet optical oscillators |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1730764A4 (en) | 2010-08-18 |
| WO2005089131A3 (en) | 2006-06-08 |
| JP2007529903A (ja) | 2007-10-25 |
| EP1730764A2 (en) | 2006-12-13 |
| WO2005089131A2 (en) | 2005-09-29 |
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