KR20060088478A - 리빙 자유 라디칼 방법에 의해 제조된 아크릴- 또는메타크릴-계 중합체 수지를 갖는 포토레지스트 중합체 및조성물 - Google Patents

리빙 자유 라디칼 방법에 의해 제조된 아크릴- 또는메타크릴-계 중합체 수지를 갖는 포토레지스트 중합체 및조성물 Download PDF

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Publication number
KR20060088478A
KR20060088478A KR1020057024718A KR20057024718A KR20060088478A KR 20060088478 A KR20060088478 A KR 20060088478A KR 1020057024718 A KR1020057024718 A KR 1020057024718A KR 20057024718 A KR20057024718 A KR 20057024718A KR 20060088478 A KR20060088478 A KR 20060088478A
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KR
South Korea
Prior art keywords
group
optionally substituted
polymer
substituted
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020057024718A
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English (en)
Korean (ko)
Inventor
디디어 베노이트
아담 사피르
한-팅 창
도미니크 차르모트
Original Assignee
시믹스 테크놀러지스 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 시믹스 테크놀러지스 인크. filed Critical 시믹스 테크놀러지스 인크.
Publication of KR20060088478A publication Critical patent/KR20060088478A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
KR1020057024718A 2003-06-26 2004-06-25 리빙 자유 라디칼 방법에 의해 제조된 아크릴- 또는메타크릴-계 중합체 수지를 갖는 포토레지스트 중합체 및조성물 Withdrawn KR20060088478A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US48339003P 2003-06-26 2003-06-26
US48331003P 2003-06-26 2003-06-26
US60/483,390 2003-06-26
US60/483,310 2003-06-26

Publications (1)

Publication Number Publication Date
KR20060088478A true KR20060088478A (ko) 2006-08-04

Family

ID=33555604

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057024718A Withdrawn KR20060088478A (ko) 2003-06-26 2004-06-25 리빙 자유 라디칼 방법에 의해 제조된 아크릴- 또는메타크릴-계 중합체 수지를 갖는 포토레지스트 중합체 및조성물

Country Status (4)

Country Link
EP (1) EP1641849A1 (https=)
JP (1) JP2007526351A (https=)
KR (1) KR20060088478A (https=)
WO (1) WO2005000923A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100073588A (ko) * 2008-12-23 2010-07-01 주식회사 동진쎄미켐 감광성 고분자 및 이를 포함하는 포토레지스트 조성물

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101010757B1 (ko) * 2008-06-09 2011-01-25 주식회사 동부하이텍 사슬 전이제, 이를 이용한 반사방지막 수지의 제조방법
US20130109816A1 (en) 2011-10-28 2013-05-02 E.I. Du Pont De Nemours And Company Processes for removing sulfur-containing end groups from polymers
SG11201404228UA (en) 2012-01-18 2014-10-30 Univ Iowa State Res Found Thermoplastic elastomers via atom transfer radical polymerization of plant oil
EP2970538B1 (en) 2013-03-15 2021-10-20 DuPont Electronics, Inc. Polymerization process protection means
HK1220219A1 (zh) 2013-05-20 2017-04-28 爱荷华州立大学研究基金会有限公司 經由甘油三酯的可逆加成-斷裂鏈轉移聚合的熱塑性彈性體
KR102377565B1 (ko) * 2018-12-13 2022-03-21 주식회사 엘지화학 아크릴계 공중합체, 이의 제조방법 및 이를 포함하는 아크릴계 공중합체 조성물

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2166092T3 (es) * 1996-07-10 2002-04-01 Du Pont Polimerizacion con caracteristicas vivientes.
CA2309279C (en) * 1997-12-18 2009-07-14 E.I. Du Pont De Nemours And Company Polymerization process with living characteristics and polymers made therefrom
US20030180662A1 (en) * 1998-05-25 2003-09-25 Daicel Chemical Industries, Ltd. Acid-sensitive compound and resin composition for photoresist
JP4282185B2 (ja) * 1999-11-02 2009-06-17 株式会社東芝 フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2004220009A (ja) * 2002-12-28 2004-08-05 Jsr Corp 感放射線性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100073588A (ko) * 2008-12-23 2010-07-01 주식회사 동진쎄미켐 감광성 고분자 및 이를 포함하는 포토레지스트 조성물

Also Published As

Publication number Publication date
WO2005000923A1 (en) 2005-01-06
JP2007526351A (ja) 2007-09-13
EP1641849A1 (en) 2006-04-05

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PA0105 International application

Patent event date: 20051223

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid