JP2007526351A5 - - Google Patents

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Publication number
JP2007526351A5
JP2007526351A5 JP2006517640A JP2006517640A JP2007526351A5 JP 2007526351 A5 JP2007526351 A5 JP 2007526351A5 JP 2006517640 A JP2006517640 A JP 2006517640A JP 2006517640 A JP2006517640 A JP 2006517640A JP 2007526351 A5 JP2007526351 A5 JP 2007526351A5
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JP
Japan
Prior art keywords
group
optionally substituted
polymer
substituted
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006517640A
Other languages
English (en)
Japanese (ja)
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JP2007526351A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2004/020346 external-priority patent/WO2005000923A1/en
Publication of JP2007526351A publication Critical patent/JP2007526351A/ja
Publication of JP2007526351A5 publication Critical patent/JP2007526351A5/ja
Pending legal-status Critical Current

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JP2006517640A 2003-06-26 2004-06-25 リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物 Pending JP2007526351A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US48339003P 2003-06-26 2003-06-26
US48331003P 2003-06-26 2003-06-26
PCT/US2004/020346 WO2005000923A1 (en) 2003-06-26 2004-06-25 Photoresist polymers and compositions having acrylic- or methacrylic-based polymeric resin prepared by a living free radical process

Publications (2)

Publication Number Publication Date
JP2007526351A JP2007526351A (ja) 2007-09-13
JP2007526351A5 true JP2007526351A5 (https=) 2008-05-08

Family

ID=33555604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006517640A Pending JP2007526351A (ja) 2003-06-26 2004-06-25 リビングフリーラジカルプロセスにより調製した、アクリル酸またはメタクリル酸ベースのポリマー樹脂を有するフォトレジストポリマーおよび組成物

Country Status (4)

Country Link
EP (1) EP1641849A1 (https=)
JP (1) JP2007526351A (https=)
KR (1) KR20060088478A (https=)
WO (1) WO2005000923A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR101010757B1 (ko) * 2008-06-09 2011-01-25 주식회사 동부하이텍 사슬 전이제, 이를 이용한 반사방지막 수지의 제조방법
KR101579730B1 (ko) * 2008-12-23 2015-12-24 주식회사 동진쎄미켐 감광성 고분자 및 이를 포함하는 포토레지스트 조성물
US20130109816A1 (en) 2011-10-28 2013-05-02 E.I. Du Pont De Nemours And Company Processes for removing sulfur-containing end groups from polymers
SG11201404228UA (en) 2012-01-18 2014-10-30 Univ Iowa State Res Found Thermoplastic elastomers via atom transfer radical polymerization of plant oil
EP2970538B1 (en) 2013-03-15 2021-10-20 DuPont Electronics, Inc. Polymerization process protection means
HK1220219A1 (zh) 2013-05-20 2017-04-28 爱荷华州立大学研究基金会有限公司 經由甘油三酯的可逆加成-斷裂鏈轉移聚合的熱塑性彈性體
KR102377565B1 (ko) * 2018-12-13 2022-03-21 주식회사 엘지화학 아크릴계 공중합체, 이의 제조방법 및 이를 포함하는 아크릴계 공중합체 조성물

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2166092T3 (es) * 1996-07-10 2002-04-01 Du Pont Polimerizacion con caracteristicas vivientes.
CA2309279C (en) * 1997-12-18 2009-07-14 E.I. Du Pont De Nemours And Company Polymerization process with living characteristics and polymers made therefrom
US20030180662A1 (en) * 1998-05-25 2003-09-25 Daicel Chemical Industries, Ltd. Acid-sensitive compound and resin composition for photoresist
JP4282185B2 (ja) * 1999-11-02 2009-06-17 株式会社東芝 フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
JP2004220009A (ja) * 2002-12-28 2004-08-05 Jsr Corp 感放射線性樹脂組成物

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