KR20050005784A - Apparatus and method for cleaning substrate - Google Patents

Abstract

PURPOSE: An apparatus and a method of cleaning a substrate are provided to transfer ultrasonic waves only to cleaning water on a substrate by arranging an ultrasonic oscillation member under the substrate. CONSTITUTION: A cleaning water supply unit(8) is arranged at an upper part of a substrate in order to supply cleaning water to a surface of a substrate. An ultrasonic oscillation member(12) is installed under the substrate in order to apply vibration to the cleaning water on the surface of the substrate. A carrier unit is formed with a plurality of carrier rollers(6). An ultrasonic oscillation nozzle(14) of the ultrasonic oscillation member is connected between the carrier nozzles.

Description

Substrate cleaning apparatus and substrate cleaning method {Apparatus and method for cleaning substrate}

The present invention relates to an apparatus and a cleaning method for cleaning substrate surfaces such as glass substrates and semiconductor wafers.

A TFT array or the like is formed on a glass substrate inserted into a liquid crystal display device. This TFT array is formed on the glass substrate in the same manner as the process of forming a semiconductor integrated circuit. In the process of forming a semiconductor integrated circuit, a resist film is formed, and the resist film is formed by applying a resist liquid to the surface of a glass substrate using a spin coater or the like and then baking. Then, before applying the resist liquid, garbage and foreign substances must be removed from the surface of the glass substrate.

As a cleaning method, a method of inserting an ultrasonic element into a cleaning liquid supply nozzle and applying ultrasonic waves to the washing water to spray the surface of the substrate (Patent Document 1), a method of jetting ionized water at a high pressure toward the substrate surface (Patent Document 2), A method (Patent Document 3) or the like has been proposed for pressing a rotating disk brush onto a substrate surface to remove dirt.

[Patent Documents]

Patent Document 1: Japanese Patent Application Laid-Open No. 2001-179196

Patent Document 2: Japanese Patent Application Laid-Open No. 11-333387

Patent Document 3: Japanese Patent Application Laid-Open No. 2002-233829

In the method of inserting the ultrasonic element into the cleaning liquid supply nozzle, since the vibration from the ultrasonic element is not transmitted to all the washing waters involved in the cleaning, the effect of the ultrasonic wave cannot be utilized at an efficiency of 100%, and the output of the ultrasonic element is also achieved. If too high, the ultrasonic element may be destroyed as a result of the cleaning liquid being taken out.

Moreover, in the method of jet-jetting ionized water at high pressure toward the surface of a board | substrate, the ratio which a cleaning liquid scatters is high and it cannot perform efficient washing | cleaning.

Moreover, the cleaning method of pressing the disc brush onto the substrate surface may damage the substrate surface.

1 is a side view of the substrate cleaning apparatus of the present invention.

2 is a plan view of the substrate cleaning apparatus of the present invention.

3 is an enlarged cross-sectional view taken along the line A-A of FIG.

4 is a cross-sectional view taken along the line B-B in FIG.

5 is an enlarged view of a main part of FIG. 1.

6 is a view seen from the C-C direction of FIG.

Explanation of the sign

One… 2. conveyance path of substrate; Wall of conveying path, 3... Top plate of conveying path; Bottom plate of conveying path; Drain hole, 6.. Conveying roller, 7... Motor, 8... Washing liquid supply means, 9... Cleaning liquid supply means box, 10,11... Cleaning liquid supply nozzle, 12.. Ultrasonic wave oscillation member, 13... Box-shaped body of ultrasonic wave oscillating member, 14... Ultrasonic Oscillating Nozzle, W… Board.

In order to solve the above problems, the substrate cleaning apparatus of the present invention arranges the cleaning liquid supplying means for supplying the washing water flowing in a predetermined direction to the substrate surface to be conveyed above the conveying path constituted by rollers or the like, and is also supplied to the substrate surface. In order to impart vibration to the washed water, an ultrasonic oscillation member was disposed under the substrate.

The ultrasonic oscillating nozzle of the ultrasonic oscillating member oscillates ultrasonic waves toward the lower surface of the substrate between the conveying rollers, and applies ultrasonic waves to the washing water supplied to the substrate surface to vibrate the washing water to clean the substrate surface.

According to the cleaning apparatus (method) described above, ultrasonic waves can be delivered to the washing water on the substrate surface without waste, and the cleaning can be performed efficiently.

EMBODIMENT OF THE INVENTION Below, embodiment of this invention is described based on an accompanying drawing. 1 is a side view of the substrate cleaning apparatus of the present invention, FIG. 2 is a plan view of the substrate cleaning apparatus of the present invention, FIG. 3 is an enlarged sectional view taken along the line AA of FIG. 1, FIG. 4 is a sectional view taken along the line BB of FIG. 6 is an enlarged view of a main part of FIG. 6, which is seen from the CC direction of FIG. 5.

The substrate cleaning apparatus is provided with a conveyance path 1 forming a tunnel shape. The conveying path 1 is composed of left and right walls 2 and 2, left and right top plates 3 and 3 and bottom plates 4 installed obliquely upward from the upper ends of the walls 2 and 2, The left and right top plates 3 and 3 are opened, and the bottom plate 4 is provided with a drain hole 5.

The conveying roller 6... Between the walls 2, 2. These conveying rollers 6... The glass substrate W is conveyed by rotating the motor by the motor 7.

Moreover, the washing | cleaning liquid supply means 8 is arrange | positioned at the upper part in the conveyance path 1. The washing | cleaning liquid supply means 8 is provided in connection with the three boxes 9 which opened the lower side in the direction orthogonal to a conveyance direction, and arrange | positions four washing | cleaning liquid supply nozzles 10 in each box 9. . The number of the cleaning liquid supply nozzles 10 is arbitrary and can be increased or decreased depending on the size of the glass substrate W. FIG. If necessary, the auxiliary cleaning nozzle 11 may be arranged before and after the cleaning liquid supply nozzle 10, as shown in FIG.

On the other hand, the ultrasonic wave oscillation member 12 is arrange | positioned in the lower part in the conveyance path 1. The ultrasonic oscillation member 12 is formed of a box-shaped body 13 and an ultrasonic oscillation nozzle 14 mounted on the body 13, and the ultrasonic oscillation nozzle 14 is transferred to the conveying roller 6... In between.

Three ultrasonic oscillation members 12 are provided in the direction orthogonal to the conveying direction in the same manner as the cleaning liquid supply means 8. In this way, the plural cleaning liquid supply means 8 and the ultrasonic wave oscillation member 12 are arranged in the width direction for easy maintenance and failure, and can be increased or decreased in accordance with the dimensions of the substrate, making production simple. Follow.

The cleaning solution is preferably hydrogen water, ozone water, alkali ion water, etc. Moreover, when the temperature is set at 40 to 50 ° C., the movement of molecules is accelerated and activated to improve the cleaning efficiency. Ultrasonic power is 28 kHz to 1 MHz (preferably 45 kHz to 100 kHz).

The upper end of the ultrasonic oscillation nozzle 14 is set slightly lower than the upper end of the conveying roller 6. In this way, the upper end of the ultrasonic wave oscillation nozzle 14 approaches the lower surface of the glass substrate W to be conveyed, thereby efficiently transmitting ultrasonic waves to the glass substrate.

In the above, the cleaning liquid is supplied from the cleaning liquid supply nozzle 10 to the glass substrate surface in a predetermined direction, that is, in a direction opposite to the conveying direction of the glass substrate W. The cleaning liquid then flows through the surface of the glass substrate W and spreads evenly over the entire surface of the substrate. On the other hand, when ultrasonic waves are oscillated to the glass substrate W from the ultrasonic oscillation nozzle 14 disposed below the conveyed glass substrate W, the ultrasonic waves are delivered to the cleaning liquid supplied to the glass substrate surface, and the cleaning liquid vibrates to vibrate the glass substrate. The surface of (W) is uniformly and efficiently cleaned.

As described above, according to the present invention, since the ultrasonic oscillation member is disposed below the substrate such as the glass substrate to be conveyed, the ultrasonic vibration is transmitted to the cleaning water supplied to the substrate surface. Since ultrasonic waves are not transmitted to the washing water which is vibrated by the ultrasonic waves and is not on the substrate surface, the cleaning efficiency is greatly improved.

Claims (3)

The cleaning path supplying means disposed above the substrate for supplying the cleaning water flowing in a predetermined direction to the substrate surface to be transported, and the ultrasonic oscillating member disposed below the substrate for imparting vibration to the cleaning water supplied to the substrate surface. Substrate cleaning apparatus comprising a. The substrate cleaning apparatus according to claim 1, wherein the conveying path is composed of a plurality of conveying rollers, and an ultrasonic oscillating nozzle of the ultrasonic oscillating member faces between predetermined conveying rollers. The washing water flowing toward the upstream side in the conveying direction is supplied to the surface of the substrate to be conveyed, and ultrasonic waves are applied to the cleaning water supplied to the surface of the substrate using an ultrasonic wave oscillation member from the lower surface of the substrate to be conveyed to vibrate the washing water. A substrate cleaning method comprising cleaning the surface.