CN105750266A - ITO glass cleaning method - Google Patents

ITO glass cleaning method Download PDF

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Publication number
CN105750266A
CN105750266A CN201610268495.5A CN201610268495A CN105750266A CN 105750266 A CN105750266 A CN 105750266A CN 201610268495 A CN201610268495 A CN 201610268495A CN 105750266 A CN105750266 A CN 105750266A
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CN
China
Prior art keywords
ito glass
cleaning
container
percent
volume
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610268495.5A
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Chinese (zh)
Inventor
金海涛
薛辉
昌江
任俊春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WUHU VACUUM TECHNOLOGY Co Ltd
Original Assignee
WUHU VACUUM TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WUHU VACUUM TECHNOLOGY Co Ltd filed Critical WUHU VACUUM TECHNOLOGY Co Ltd
Priority to CN201610268495.5A priority Critical patent/CN105750266A/en
Publication of CN105750266A publication Critical patent/CN105750266A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Detergent Compositions (AREA)

Abstract

The invention discloses an ITO glass cleaning method.The method includes the steps that an ITO glass piece is placed into a container containing cleaning liquid, and the container is placed into an ultrasonic cleaner for ultrasonic cleaning; then, the ITO glass piece is taken out of the container and washed thoroughly with distilled water; the ITO glass piece is placed into an ethanol solution to be soaked; the ITO glass piece is blown to be dry for use after being taken out, wherein the cleaning liquid is composed of glycerine, sodium benzoate, ethyl alcohol, sodium polyphosphate and water.The cleaning method is simple in step and good in cleaning effect, components of the cleaning liquid are free of pollution, and raw materials are easy to obtain.

Description

The cleaning method of ito glass
Technical field
The present invention relates to glass cleaning procedure, in particular it relates to the cleaning method of ito glass.
Background technology
In sputter coating process, the purity requirements of substrate is significantly high, the whether clean growth directly affecting thin film and adhesion condition.The thin film of the unholiness growth of substrate surface can be uneven, has obvious defect, and adhesion of thin film reduces, and can easily come off because of the surface of its pollution, directly affect the quality of substrate membrane.Therefore before plated film, substrate must be carried out the strict cleaning of necessity, to reach the demand of technique.
Therefore it provides a kind of cleaning performance is good, ensure substrate at the cleaning method of the high ito glass of plated film front surface cleanliness factor is the problem that the present invention needs solution badly.
Summary of the invention
It is an object of the invention to provide the cleaning method of a kind of ito glass, the method cleaning performance is good, ensure that substrate has higher surface cleanliness before plated film.
To achieve these goals, the invention provides the cleaning method of a kind of ito glass, wherein, described cleaning method includes:
(1) ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning;
(2) after, described ito glass sheet is taken out from described container, clean with distilled water flushing;
(3) described ito glass sheet is put in alcoholic solution and soak;
(4) drying up with nitrogen after taking out, standby, wherein, the component of described cleanout fluid is: glycerol, sodium benzoate, ethanol, sodium polyphosphate and water.
By technique scheme, the invention provides the cleaning method of a kind of ito glass, wherein, described cleaning method includes: put into by ito glass sheet equipped with, in the container of cleanout fluid, being put into by container and carry out ultrasonic cleaning in ultrasonic cleaner;Afterwards described ito glass sheet is taken out from described container, clean with distilled water flushing;Described ito glass sheet is put in alcoholic solution and soak, dry up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: glycerol, sodium benzoate, ethanol, sodium polyphosphate and water, cleaning method provided by the invention, step is simple, cleaning performance is good, and the component of cleanout fluid is pollution-free, and raw material is easy to get.
Other features and advantages of the present invention will be described in detail in detailed description of the invention part subsequently.
Detailed description of the invention
Hereinafter the specific embodiment of the present invention is described in detail.It should be appreciated that detailed description of the invention described herein is merely to illustrate and explains the present invention, it is not limited to the present invention.
The invention provides the cleaning method of a kind of ito glass, wherein, described cleaning method includes: put into by ito glass sheet equipped with, in the container of cleanout fluid, being put into by container and carry out ultrasonic cleaning in ultrasonic cleaner;Afterwards described ito glass sheet is taken out from described container, clean with distilled water flushing;Described ito glass sheet is put in alcoholic solution and soak;Drying up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: glycerol, sodium benzoate, ethanol, sodium polyphosphate and water.Cleaning method provided by the invention, step is simple, and cleaning performance is good, and the component of cleanout fluid is pollution-free, and raw material is easy to get.
The present invention one preferred embodiment in, so that cleaning performance is more excellent, in described cleanout fluid, the percent by volume of glycerol is 10-30%, the percent by volume of described sodium benzoate is 5-15%, the percent by volume of described ethanol is 5-15%, and the percent by volume of described sodium polyphosphate is 5-10%, excess water.
In order to the effect making ultrasonic cleaning is more excellent, preventing glass substrate from broken phenomenon occurring when ultrasonic cleaning, the frequency of described ultrasonic cleaning is 20-30KHz, it is preferred that the time of ultrasonic cleaning is 20-30min simultaneously.
In order to improve cleaning performance, the volumetric concentration of described alcoholic solution is 95-98%.
In order to rinse the cleanout fluid of glass surface residual well, the water temperature of described distilled water is 25-35 DEG C.
Hereinafter will be described the present invention by embodiment.
Embodiment 1
Ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning (supersonic frequency is 20KHz, and ultrasonic time is 20min);Afterwards described ito glass sheet is taken out from described container, rinse well with distilled water (water temperature is 25 DEG C);Described ito glass sheet is put in the alcoholic solution that volumetric concentration is 95% and soak;Drying up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: the percent by volume of glycerol is 10%, the percent by volume of sodium benzoate is 5%, ethanol percent by volume is 5%, the percent by volume of sodium polyphosphate is 5% and excess water.
Embodiment 2
Ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning (supersonic frequency is 30KHz, and ultrasonic time is 30min);Afterwards described ito glass sheet is taken out from described container, rinse well with distilled water (water temperature is 35 DEG C);Described ito glass sheet is put in the alcoholic solution that volumetric concentration is 98% and soak;Drying up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: the percent by volume of glycerol is 30%, the percent by volume of sodium benzoate is 15%, ethanol percent by volume is 15%, the percent by volume of sodium polyphosphate is 10% and excess water.
Embodiment 3
Ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning (supersonic frequency is 25KHz, and ultrasonic time is 25min);Afterwards described ito glass sheet is taken out from described container, rinse well with distilled water (water temperature is 30 DEG C);Described ito glass sheet is put in the alcoholic solution that volumetric concentration is 97% and soak;Drying up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: the percent by volume of glycerol is 20%, the percent by volume of sodium benzoate is 10%, ethanol percent by volume is 10%, the percent by volume of sodium polyphosphate is 8% and excess water.
Comparative example 1
Ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning (supersonic frequency is 10KHz, and ultrasonic time is 10min);Afterwards described ito glass sheet is taken out from described container, rinse well with distilled water (water temperature is 15 DEG C);Described ito glass sheet is put in the alcoholic solution that volumetric concentration is 90% and soak;Drying up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: the percent by volume of glycerol is 5%, the percent by volume of sodium benzoate is 1%, ethanol percent by volume is 1%, the percent by volume of sodium polyphosphate is 1% and excess water.
Comparative example 2
Ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning (supersonic frequency is 35KHz, and ultrasonic time is 35min);Afterwards described ito glass sheet is taken out from described container, rinse well with distilled water (water temperature is 40 DEG C);Described ito glass sheet is put in the alcoholic solution that volumetric concentration is 99% and soak;Drying up with nitrogen after taking-up, standby, wherein, the component of described cleanout fluid is: the percent by volume of glycerol is 40%, the percent by volume of sodium benzoate is 20%, ethanol percent by volume is 20%, the percent by volume of sodium polyphosphate is 15% and excess water.
Table 1
Embodiment is numbered Sight glass clean surface degree
Embodiment 1 Cleanliness factor is high
Embodiment 2 Cleanliness factor is high
Embodiment 3 Cleanliness factor is high
Comparative example 1 Remained on surface has cleanout fluid, and cleanliness factor is low
Comparative example 2 Remained on surface has cleanout fluid, and cleanliness factor is low
Be can be seen that by above table data, the cleaning carried out within the scope of the present invention, the clean level of the glass substrate surface in embodiment 1-3 is high, and the cleaning carried out outside the scope of the invention, the clean surface degree of the glass substrate in its comparative example 1 and comparative example 2 is low.
The preferred embodiment of the present invention described in detail above; but, the present invention is not limited to the detail in above-mentioned embodiment, in the technology concept of the present invention; technical scheme can being carried out multiple simple variant, these simple variant belong to protection scope of the present invention.
It is further to note that, each concrete technical characteristic described in above-mentioned detailed description of the invention, in reconcilable situation, it is possible to be combined by any suitable mode, in order to avoid unnecessary repetition, various possible compound modes are no longer illustrated by the present invention separately.
Additionally, can also carry out combination in any between the various different embodiment of the present invention, as long as it is without prejudice to the thought of the present invention, it should be considered as content disclosed in this invention equally.

Claims (6)

1. the cleaning method of an ito glass, it is characterised in that described cleaning method includes:
(1) ito glass sheet is put into equipped with, in the container of cleanout fluid, container being put into ultrasonic cleaner carries out ultrasonic cleaning;
(2) after, described ito glass sheet is taken out from described container, clean with distilled water flushing;
(3) described ito glass sheet is put in alcoholic solution and soak;
(4) drying up with nitrogen after taking out, standby, wherein, the component of described cleanout fluid is: glycerol, sodium benzoate, ethanol, sodium polyphosphate and water.
2. glass cleaning procedure according to claim 1, it is characterized in that, in described cleanout fluid, the percent by volume of glycerol is 10-30%, the percent by volume of described sodium benzoate is 5-15%, the percent by volume of described ethanol is 5-15%, and the percent by volume of described sodium polyphosphate is 5-10%, excess water.
3. glass cleaning procedure according to claim 2, it is characterised in that the frequency of described ultrasonic cleaning is 20-30KHz.
4. glass cleaning procedure according to claim 3, it is characterised in that the time of described ultrasonic cleaning is 20-30min.
5. glass cleaning procedure according to claim 1, it is characterised in that the volumetric concentration of described alcoholic solution is 95-98%.
6. glass cleaning procedure according to claim 1, it is characterised in that the water temperature of described distilled water is 25-35 DEG C.
CN201610268495.5A 2016-04-27 2016-04-27 ITO glass cleaning method Pending CN105750266A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610268495.5A CN105750266A (en) 2016-04-27 2016-04-27 ITO glass cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610268495.5A CN105750266A (en) 2016-04-27 2016-04-27 ITO glass cleaning method

Publications (1)

Publication Number Publication Date
CN105750266A true CN105750266A (en) 2016-07-13

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106391571A (en) * 2016-12-09 2017-02-15 曾周 Cleaning technology for ITO glass
CN106583322A (en) * 2016-11-28 2017-04-26 莱特巴斯光学仪器(镇江)有限公司 Optical glass surface cleaning method
CN110142271A (en) * 2019-05-31 2019-08-20 苏州五方光电材料有限公司 The cleaning method of piece in a kind of optical mirror slip
CN111438133A (en) * 2020-04-30 2020-07-24 深圳市路维光电股份有限公司 Chromium plate cleaning jig and cleaning method
CN112139147A (en) * 2020-10-23 2020-12-29 苏州航菱微精密组件有限公司 Material cleaning method for machining of semiconductor chip grinding equipment rack

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050005784A (en) * 2003-06-30 2005-01-14 도쿄 오카 고교 가부시키가이샤 Apparatus and method for cleaning substrate
CN1872973A (en) * 2006-06-28 2006-12-06 天津晶岭电子材料科技有限公司 Half water based cleaning liquor in use before coating IT0 glass
CN101665910A (en) * 2008-09-04 2010-03-10 浙江师范大学 Method for cleaning SiO* substrate used in alloy films made by vacuum evaporation
CN102649625A (en) * 2012-05-03 2012-08-29 北京鼎臣超导科技有限公司 Method for cleaning glass substrate for coating
CN104277944A (en) * 2013-09-29 2015-01-14 东旭集团有限公司 TFT (thin film transistor) liquid crystal glass substrate cleaning fluid and cleaning method thereof
CN104593166A (en) * 2014-12-31 2015-05-06 苏州禾川化学技术服务有限公司 Efficient dust-removal optical glass cleaning agent

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050005784A (en) * 2003-06-30 2005-01-14 도쿄 오카 고교 가부시키가이샤 Apparatus and method for cleaning substrate
CN1872973A (en) * 2006-06-28 2006-12-06 天津晶岭电子材料科技有限公司 Half water based cleaning liquor in use before coating IT0 glass
CN101665910A (en) * 2008-09-04 2010-03-10 浙江师范大学 Method for cleaning SiO* substrate used in alloy films made by vacuum evaporation
CN102649625A (en) * 2012-05-03 2012-08-29 北京鼎臣超导科技有限公司 Method for cleaning glass substrate for coating
CN104277944A (en) * 2013-09-29 2015-01-14 东旭集团有限公司 TFT (thin film transistor) liquid crystal glass substrate cleaning fluid and cleaning method thereof
CN104593166A (en) * 2014-12-31 2015-05-06 苏州禾川化学技术服务有限公司 Efficient dust-removal optical glass cleaning agent

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106583322A (en) * 2016-11-28 2017-04-26 莱特巴斯光学仪器(镇江)有限公司 Optical glass surface cleaning method
CN106391571A (en) * 2016-12-09 2017-02-15 曾周 Cleaning technology for ITO glass
CN110142271A (en) * 2019-05-31 2019-08-20 苏州五方光电材料有限公司 The cleaning method of piece in a kind of optical mirror slip
CN111438133A (en) * 2020-04-30 2020-07-24 深圳市路维光电股份有限公司 Chromium plate cleaning jig and cleaning method
CN112139147A (en) * 2020-10-23 2020-12-29 苏州航菱微精密组件有限公司 Material cleaning method for machining of semiconductor chip grinding equipment rack

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Application publication date: 20160713