CN105957800A - Substrate surface treatment process - Google Patents

Substrate surface treatment process Download PDF

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Publication number
CN105957800A
CN105957800A CN201610301332.2A CN201610301332A CN105957800A CN 105957800 A CN105957800 A CN 105957800A CN 201610301332 A CN201610301332 A CN 201610301332A CN 105957800 A CN105957800 A CN 105957800A
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China
Prior art keywords
substrate
surface treatment
adhesive force
liquid
organic solvent
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
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CN201610301332.2A
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Chinese (zh)
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CN105957800B (en
Inventor
余璇
于晓明
陈立桥
潘洪军
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Zhejiang Ocean University ZJOU
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Zhejiang Ocean University ZJOU
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Priority to CN201610301332.2A priority Critical patent/CN105957800B/en
Publication of CN105957800A publication Critical patent/CN105957800A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052Wet cleaning only
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075Cleaning of glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/31Pre-treatment

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Detergent Compositions (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The invention relates to a substrate surface treatment process comprising the following steps: immersing a substrate into a glass detergent, and cleaning the substrate with de-ionized water after washing; immersing the substrate into an adhesion promoting solution, carrying out ultrasonic treatment and taking the substrate out, adding acetone, carrying out ultrasonic treatment and taking the substrate out, cleaning the substrate with de-ionized water, and drying the substrate using nitrogen; and soaking the substrate in an organic solvent, and storing the substrate away from light. According to the invention, a substrate material which is cleaned, ultrasonically processed, washed, dried and soaked is used, oil residue on the surface can be removed to the greatest extent through slow reaction between the organic solvent and the surface of the substrate, the wetting property of the substrate surface can be improved, and the adhesion and uniformity of follow-up coating of the substrate can be enhanced. The method is simple in operation. No other processing equipment is needed. Preparation can be carried out at room temperature and in the air. The substrate surface treatment process is compatible with a large-area commercial production preparation process.

Description

A kind of process of surface treatment of substrate
Technical field
The present invention relates to field of surface treatment, be specifically related to one and improve substrate surface wellability, strengthen substrate film coating adhesive force And the process of surface treatment of the substrate of uniformity.
Background technology
In recent years, baseplate material is widely used in electronic product, the field such as semiconductor device.
Generally for manufacturing solaode, semiconductor device and flat-panel display device, need to be formed predetermined on the surface of substrate Thin layer, thin flm circuit pattern or optics group.Hidden thorn, needs to carry out semiconductor fabrication process, such as, deposits on substrate The thin film deposition processes of the thin film of predetermined material, uses the optical technology that thin film is optionally exposed by light-sensitive material, and By optionally go out this thin film exposed portion formed pattern etch process.
Baseplate material needs to use ultrasonic cleaning mode to remove surface and oil contaminant before use.Ultrasonic cleaning has the problem that short Time ultrasonic cleaning cannot remove all greasy dirts of substrate, improves inconspicuous, if ultrasonic metacoxal plate is the most at once to substrate surface wellability Using the secondary pollution that then can cause substrate, therefore, the cleaning performance of substrate is affected and limits.
Summary of the invention
After the invention aims to solve existing substrate ultrasonic cleaning, substrate surface wellability is improved inconspicuous, adhesive force The defect of difference and provide a kind of improve substrate surface wellability, the surface of the substrate that strengthens substrate film coating adhesive force and uniformity processes Technique.
To achieve these goals, the present invention is by the following technical solutions:
The process of surface treatment of a kind of substrate, comprises the following steps:
A) clean: substrate is immersed in glass detergent, clean with deionized water after cleaning;
B) supersound process: the substrate obtained by step a) immerses adhesive force and promotes in liquid, supersound process 45-60min;Then take out and add Enter acetone supersound process 15-30min, after taking-up, use deionized water rinsing, then use nitrogen to be dried up by substrate;
C) preservation is soaked: be immersed in organic solvent by the substrate that step b) obtains, keep in Dark Place.In the technical program, first With adhesive force, the materials such as the oil stain dirt by glass detergent cleaning base plate surface, then promote that liquid promotes the attachment of substrate surface Power and wellability, in order to substrate film coating adhesive force during the follow-up plated film of follow-up raising and uniformity, for a long time immersed with helping substrate Surface slowly reacts with organic solvent, thoroughly removes substrate surface greasy residues and improves substrate surface wellability.
As preferably, in step b), adhesive force promotes that liquid is made up of the raw material of following weight portion: hydroxyethyl cellulose 10-15 Part, methyl silicate 20-35 part, algae clay 5-10 part, ethyl acetate 80-100 part, silane coupler 15-25 part and hydrogen fluorine Acid 1-5 part.
As preferably, adhesive force promotes that the preparation method of liquid is: by hydroxyethyl cellulose, methyl silicate, silane coupler Joining in ethyl acetate with algae clay, add Fluohydric acid. after stirring and dissolving is complete, ultrasonic 60KHz obtains after processing 35-50min.
As preferably, in step b), adhesive force promotes that the temperature of liquid is 65-80 DEG C.
As preferably, supersonic frequency 85-100KHz in step b).
As preferably, in step c), organic solvent is ethanol, isopropanol, acetone, methanol, ethylene glycol or propylene glycol One in methyl ether.
As preferably, described substrate is PET, glass, quartz, silicon chip, ITO electro-conductive glass, FTO electro-conductive glass, ZnO One in electro-conductive glass.
Beneficial effects of the present invention: the present invention uses cleaning, ultrasonic, rinsing, drying, the substrate of immersion treatment PROCESS FOR TREATMENT Material, it is possible to utilize the slow reaction of organic solvent and substrate surface to remove surface and oil contaminant residual to greatest extent, and improve substrate Surface wettability, it is possible to strengthening adhesive force and the uniformity of the follow-up plated film of substrate, the method is simple to operate, it is not necessary to other process set Standby, can at room temperature prepare by air, to commercially produce preparation technology mutually compatible with large area.
Detailed description of the invention
Technical scheme in the embodiment of the present invention will be carried out clear, complete description below, it is clear that described embodiment It is only a part of embodiment of the present invention rather than whole embodiments.Based on the embodiment in the present invention, the common skill in this area All other embodiments that art personnel are obtained under not making creative work premise, broadly fall into the scope of protection of the invention.
Embodiment 1
The process of surface treatment of a kind of substrate, comprises the following steps:
A) clean: substrate (substrate selects ITO electro-conductive glass) is immersed in glass detergent, cleans with deionized water after cleaning;
B) supersound process: the substrate obtained by step a) immerses the adhesive force that temperature is 65 DEG C and promotes in liquid, supersonic frequency 85KHz Process 45min;Then take out addition acetone supersonic frequency 85KHz and process 15min, use deionized water rinsing after taking-up, so Substrate is dried up by rear use nitrogen;Wherein adhesive force promotes that liquid is made up of the raw material of following weight portion: hydroxyethyl cellulose 10 parts, Methyl silicate 20 parts, algae clay 5 parts, ethyl acetate 80 parts, silane coupler 15 parts and Fluohydric acid. 1 part;Attachment is made every effort to promote The preparation method of feed liquor is: join in ethyl acetate by hydroxyethyl cellulose, methyl silicate, silane coupler with algae clay, Adding Fluohydric acid. after stirring and dissolving is complete, ultrasonic 60KHz obtains after processing 35min;;
C) preservation is soaked: be immersed in ethanol by the substrate that step b) obtains, screwed by seal bottle cap, and be put at lucifuge cool place. Place more than 24 hours, stand-by.
Embodiment 2
The process of surface treatment of a kind of substrate, comprises the following steps:
A) clean: substrate (substrate selects ZnO electro-conductive glass) is immersed in glass detergent, cleans with deionized water after cleaning;
B) supersound process: the substrate obtained by step a) immerses the adhesive force that temperature is 70 DEG C and promotes in liquid, supersonic frequency 90KHz Process 50min;Then take out addition acetone supersonic frequency 90KHz and process 20min, use deionized water rinsing after taking-up, so Substrate is dried up by rear use nitrogen;Wherein adhesive force promotes that liquid is made up of the raw material of following weight portion: hydroxyethyl cellulose 12 parts, Methyl silicate 25 parts, algae clay 5 parts, ethyl acetate 95 parts, silane coupler 20 parts and Fluohydric acid. 3 parts;Attachment is made every effort to promote The preparation method of feed liquor is: join in ethyl acetate by hydroxyethyl cellulose, methyl silicate, silane coupler with algae clay, Adding Fluohydric acid. after stirring and dissolving is complete, ultrasonic 60KHz obtains after processing 40min;;
C) soak preservation: be immersed in propylene glycol monomethyl ether by the substrate that step b) obtains, screwed by seal bottle cap, and it is cloudy to be put in lucifuge Liang Chu.Place more than 24 hours, stand-by.
Embodiment 3
The process of surface treatment of a kind of substrate, comprises the following steps:
A) clean: substrate (substrate selects FTO electro-conductive glass) is immersed in glass detergent, cleans with deionized water after cleaning;
B) supersound process: the substrate obtained by step a) immerses the adhesive force that temperature is 80 DEG C and promotes in liquid, supersonic frequency 100KHz Process 60min;Then take out addition acetone supersonic frequency 100KHz and process 30min, use deionized water rinsing after taking-up, so Substrate is dried up by rear use nitrogen;Wherein adhesive force promotes that liquid is made up of the raw material of following weight portion: hydroxyethyl cellulose 15 parts, Methyl silicate 35 parts, algae clay 10 parts, ethyl acetate 100 parts, silane coupler 25 parts and Fluohydric acid. 5 parts;Adhesive force The preparation method of promotion liquid is: with algae clay, hydroxyethyl cellulose, methyl silicate, silane coupler are joined ethyl acetate In, adding Fluohydric acid. after stirring and dissolving is complete, ultrasonic 60KHz obtains after processing 50min;;
C) soak preservation: be immersed in organic solvent by the substrate that step b) obtains, screwed by seal bottle cap, and it is shady and cool to be put in lucifuge Place.Place more than 24 hours, stand-by.
Embodiment described above is the one preferably scheme of the present invention, and the present invention not makees any pro forma limit System, also has other variant and remodeling on the premise of without departing from the technical scheme described in claim.

Claims (7)

1. the process of surface treatment of a substrate, it is characterised in that comprise the following steps:
A) clean: substrate is immersed in glass detergent, clean with deionized water after cleaning;
B) supersound process: the substrate obtained by step a) immerses adhesive force and promotes in liquid, supersound process 45-60min;Then take out and add Enter acetone supersound process 15-30min, after taking-up, use deionized water rinsing, then use nitrogen to be dried up by substrate;
C) preservation is soaked: be immersed in organic solvent by the substrate that step b) obtains, keep in Dark Place.
The process of surface treatment of a kind of substrate the most according to claim 1, it is characterised in that in step b), adhesive force promotes liquid Be made up of the raw material of following weight portion: hydroxyethyl cellulose 10-15 part, methyl silicate 20-35 part, algae clay 5-10 part, Ethyl acetate 80-100 part, silane coupler 15-25 part and Fluohydric acid. 1-5 part.
The process of surface treatment of a kind of substrate the most according to claim 2, it is characterised in that adhesive force promotes the preparation method of liquid For: hydroxyethyl cellulose, methyl silicate, silane coupler are joined in ethyl acetate, after stirring and dissolving is complete with algae clay Adding Fluohydric acid., ultrasonic 60KHz obtains after processing 35-50min.
The process of surface treatment of a kind of substrate the most according to claim 1, it is characterised in that in step b), adhesive force promotes liquid Temperature be 65-80 DEG C.
The process of surface treatment of a kind of substrate the most according to claim 1, it is characterised in that supersonic frequency in step b) 85-100KHz。
The process of surface treatment of a kind of substrate the most according to claim 1, it is characterised in that in step c), organic solvent is second One in alcohol, isopropanol, acetone, methanol, ethylene glycol or propylene glycol monomethyl ether.
The process of surface treatment of a kind of substrate the most according to claim 1, it is characterised in that described substrate is PET, glass, Quartz, silicon chip, ITO electro-conductive glass, FTO electro-conductive glass, the one in ZnO electro-conductive glass.
CN201610301332.2A 2016-05-09 2016-05-09 A kind of process of surface treatment of substrate Active CN105957800B (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109267057A (en) * 2018-08-15 2019-01-25 天长市京发铝业有限公司 Substrate corrosion resistant surfaces method for oxidation
CN109267050A (en) * 2018-08-15 2019-01-25 天长市京发铝业有限公司 Substrate surface process technique
CN113083818A (en) * 2021-03-30 2021-07-09 东阳久泰科技有限公司 Processing method for cleaning and recycling polytetrafluoroethylene reaction kettle
CN115093903A (en) * 2022-07-19 2022-09-23 广州天极电子科技股份有限公司 Cleaning agent and application thereof, cleaning method of thin film circuit board substrate and preparation method of thin film circuit board

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103509420A (en) * 2012-06-21 2014-01-15 南京工业大学 NiO-doped AZO glass heat insulation paint and preparation method thereof
CN105038397A (en) * 2015-07-08 2015-11-11 合肥旭阳铝颜料有限公司 Ultrasonic cleaning resistant mirror ink for mobile phone lens

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103509420A (en) * 2012-06-21 2014-01-15 南京工业大学 NiO-doped AZO glass heat insulation paint and preparation method thereof
CN105038397A (en) * 2015-07-08 2015-11-11 合肥旭阳铝颜料有限公司 Ultrasonic cleaning resistant mirror ink for mobile phone lens

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109267057A (en) * 2018-08-15 2019-01-25 天长市京发铝业有限公司 Substrate corrosion resistant surfaces method for oxidation
CN109267050A (en) * 2018-08-15 2019-01-25 天长市京发铝业有限公司 Substrate surface process technique
CN113083818A (en) * 2021-03-30 2021-07-09 东阳久泰科技有限公司 Processing method for cleaning and recycling polytetrafluoroethylene reaction kettle
CN115093903A (en) * 2022-07-19 2022-09-23 广州天极电子科技股份有限公司 Cleaning agent and application thereof, cleaning method of thin film circuit board substrate and preparation method of thin film circuit board

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