KR20040080628A - Manufacturing process of tile and manufacture - Google Patents

Abstract

PURPOSE: Provided is a production method of tiles having colors, no chemical pollution, durability and no discoloration by plasma coating crystal-formed tiles with titanium. CONSTITUTION: The production method of tiles comprises the steps of: producing green tiles by conventional processes, including mixing raw materials, forming and cutting; applying a glaze that forms crystals when heated to tiles; sintering at 1200-1350deg.C for 8-13hrs; putting sintered tiles into a plasma coating machine equipped with titanium electrodes and applying vacuum to the inside of the plasma coating machine until the vacuum is 10¬-4 - 10¬-5 torr; applying high voltage to titanium electrodes for vaporization of titanium and ionizing supplied gases such as O2, Ar and N2 for coloring of the surfaces of tiles and crystals, and reacting ionized gas and evaporated titanium for 10-35min for forming a coating layer on the surface of crystals. The color of the coated layer of tiles and crystals is pearl when 250-700sccm of Ar and(or) 280-800sccm of O2 are supplied, and the reaction time between ionized gas and evaporated titanium is 15-35min. Also, the color of the coated layer of tiles and crystals is transparent rainbow when 250-700sccm of Ar and 280-800sccm of O2 are supplied, and the reaction time between ionized gas and evaporated titanium is 12-18min.

Description

Manufacturing process of the tiles and articles thereof {Manufacturing process of tile and manufacture}

The present invention relates to a method for producing a tile used for finishing a wall of a building, and to a tile manufactured by the method. More specifically, when heat is applied to a surface of a tile manufactured by a conventional method, crystals of various forms are formed. After applying the glaze and firing it, it is intended to provide a tile formed by forming a plasma coating layer of titanium on the surface of crystals and tiles formed by heat generated during firing.

As a general tile manufacturing method, a dry tile production method using a press die and a wet tile production method using a vacuum drill machine are generally known.

The method of manufacturing dry tiles is a method of producing a tile by putting a powdery raw material mixture containing less than about 10% of water into a press mold having a predetermined cavity and pressure firing, which is mainly used for producing flat tiles.

This will be described in detail with reference to a manufacturing process diagram of the tile illustrated in FIG. 1.

As shown in Figure 1, the general dry tile manufacturing method, a raw material mixing step (S10), a raw material mixing step (S11), a raw material grinding step (S12), a raw material drying step (S13), a product forming step using a press mold (S16), the product drying step (S17), the product firing step (S18), the product selection / inspection step (S19) and the product packaging step (S20).

In addition, after the product drying step (S17), before the product firing step (S18) may be added a milking step (S21) for applying a glaze on the surface of the product.

Kaolin, feldspar, pottery stone, clay, and feldspar are used as raw materials in the manufacturing method of the dry tile. Each raw material is metered in an amount suitable for the manufacture of the tile, and the metered raw material, water and the corner are combined in a predetermined ratio (S10). The blended raw materials are mixed by a mixer (S11), and then crushed and discharged by a ball mill (Bollmill) (S12). The pulverized raw material mixture is stored in a slip tank (S13), and again transferred to a spray dryer, dried (S14), and then stored in a powder silo (S15). After that, the raw material mixture is transferred to a press powder silo and press-molded (S16). Powder moisture in press molding is on the order of 7-8%.

The press mold has a cavity corresponding to the shape of the tile to be manufactured, and the cavity is filled with a raw material mixture. The press mold is composed of upper and lower molds, and is usually opened and molded by hydraulic pressure. As the upper and lower molds are molded together, the internal raw material mixture is pressed and molded into a product having a cavity shape.

The molded product taken out from the press die is put into a drying chamber and dried (S17), and then put into a firing furnace and fired (S18). Firing proceeds at a temperature in the range of approximately 1100 to 1200 ° C. to increase the strength of the molded article. This firing condition may vary depending on the product.

Here, prior to firing the dried molded product may further proceed with the oiling step (S21) for applying the glaze on the surface of the product. A dairy product has a smoother and cleaner surface than non-dairy products. Thereafter, the sorting and inspection work for the finished product discharged from the kiln is carried out (S19) to determine the quality of the product, and packaging (S20).

In the dry tile manufacturing method as described above, the movement of the raw material to each step is made by a conveyor belt, and in the product firing step (S18), the product is mounted on a trolley and moved.

Meanwhile, the wet tile manufacturing method is a method of forming a tile while continuously extruding a raw material mixture having a predetermined viscosity containing about 20% of moisture into a tile strap by using a device called a vacuum grinder. Not only flat tiles without teeth, but also tiles with rough regular patterns can be formed. This will be described in detail with reference to the process diagram shown in FIG. 2.

As shown in Figure 2, the wet tile manufacturing method is a raw material mixing step (S30), raw material mixing step (S31), raw material grinding step (S32), raw material ripening step (S33), secondary raw material grinding step (S34), Coma / kneading step (S35), product forming step (S36), vacuum cutting machine (S36), product cutting step (S37), product drying step (S38), product firing step (S39), product sorting / inspection step (S40) and Product packaging step (S41) is made.

In addition, after the product drying step (S38), before the product firing step (S39) may be added a milking step (S42) for applying a glaze on the surface of the product.

Raw material mixing step (S30), raw material mixing step (S31), raw material grinding step (S32), two-dimensional material grinding step (S34), product drying step (S38), product firing step (S39), product selection in the manufacturing process , Inspection step (S40), product packaging step (S41) and oiling step (S42) is made much the same as the process of the dry tile manufacturing method described above. Therefore, the overlapping description is omitted here, and only the features of the wet tile manufacturing method will be described.

The raw material ripening step (S33) is to make the moisture of the mixed raw material constant, it is made by stacking the ground raw material mixture to a predetermined place by a forklift for about one day. If the moisture of the mixed raw materials is not constant, it is difficult to control the warpage of the injection molded product.

Therefore, it is necessary to keep the moisture of the mixed raw materials constant.

The mixing / kneading step (S35) is a step of mixing while supplying moisture to the pulverized raw material mixture in order to make the raw material mixture into a moldable state having a predetermined viscosity, and is usually performed by an apparatus called a mixing / kneading machine. .

The raw material mixture mixed / mixed by the coma / kneader is fed to the vacuum grinder by the conveyor belt or the like. The vacuum drill molding machine removes the air present in the kneaded raw material mixture while continuously extruding the raw material mixture in the form of a tile strap through a nozzle (S36). According to the shape of the nozzle, various types of tile straps may be formed, In addition, if a pair of rollers having a predetermined pattern is provided at the rear end of the nozzle, the pattern may be formed on the surface of the tile strap to be extruded.

The product cutting step (S37) is a process of automatically cutting the tile strap discharged through the nozzle of the vacuum grinder to the required standard.

The product cut in this step is manufactured into tiles of the finished product by sequentially going through the drying, milking, firing, sorting / inspection and packaging steps.

However, the conventional tile manufacturing method as described above, that is, a dry tile manufacturing method using a press die, or a wet tile manufacturing method using a vacuum drill machine has a plain pattern or a rough pattern without a pattern. Although effective in the production of pattern tiles, there is a problem that tiles having fine and delicate patterns, such as natural stone patterns, which are recently spotlighted, cannot be manufactured.

In other words, in the conventional dry tile manufacturing method, a fine pattern tile may be manufactured by pressing and firing powdered mixed raw materials using a press mold having a fine pattern, but in this case, very large pressure is required. Therefore, it is difficult to construct the system in terms of cost and space. Moreover, even if the mold is pressurized by a large hydraulic pressure, there is a problem in that the defective rate is increased because the mixed raw material remains in the pattern part where the fine irregularities of the mold are severely formed and the molding is not completed. .

In addition, there may be a method of forming by increasing the moisture content of the mixed raw material in order to prevent such incomplete molding and to use less hydraulic pressure, but in this case, the mixed raw material is agglomerated by a large amount of moisture does not make accurate weighing Another problem arises that causes mold failure.

On the other hand, the method of manufacturing the wet tile, as mentioned above, by installing a pair of rollers having a predetermined pattern on the rear end of the nozzle of the vacuum drill machine can produce a tile having a regular and rough pattern, natural stone pattern There is a limit in producing a tile having a fine and delicate pattern such as.

That is, it is difficult to manufacture a roller having a delicate pattern, and there is a problem of high cost, and moreover, due to the problem that raw material mixture residue remains on the surface of the roller, the complete pattern cannot be formed by lamination. It is impossible to produce a tile having a fine and delicate pattern such as.

Accordingly, in recent years, a tile manufacturing method capable of producing a tile having a fine and delicate three-dimensional pattern such as natural stone pattern in view of the above problems is provided, and its composition is measured by measuring the amount of each raw material in an amount suitable for tile production. Compounding; Mixing the blended raw materials; Constantly grinding the particles of the mixed raw material; Storing the aged mixed raw material for a predetermined time to mature; Coma / kneading step for controlling and mixing the moisture of the mature mixed raw material; A primary product molding step of continuously exposing the mixed or kneaded mixed raw material into a vacuum porcelain molding machine in the form of a tile strap; Cutting the product in the form of tile straps discharged from the vacuum drill machine into a predetermined size; Forming a product having a fine pattern by inserting the cut at least one product into a press mold having a cavity having a fine pattern; Drying the molded article; Firing step to increase the strength of the dried product; Product screening / inspection step: and packaging step.

However, the tiles produced by the above-described method for producing a tile have problems of weak corrosion resistance, heat resistance, and wear resistance, and discoloration when used for a long time, and the appearance of the tiles is monotonous.

According to the present invention, plasma coating of titanium on the surface of the crystal is formed, thereby avoiding chemical pollution, durability, hydrophobicity, and anti-toxicity, as well as discoloration, and improving the appearance aesthetic of the tile by colorizing the surface. To provide a tile manufacturing method and an article thereof.

1 is a process chart for explaining a conventional method for producing a tile.

Figure 2 is a process chart for explaining a conventional method of manufacturing a tile in a state different from that of FIG.

Figure 3 is a process chart for explaining a method for producing a tile according to the present invention.

In the tile manufacturing method of the present invention for achieving the above object, in a conventional tile made of clay as a main material, the glaze layer is formed on its surface, when a predetermined heat is received on the surface of the glaze layer to form crystals Applying glaze and calcining it at 1200 to 1350 ° C. for 8 to 13 hours;

Injecting the calcined tile into a plasma coater equipped with a titanium electrode and evacuating the inside of the plasma coater until a vacuum degree of 10 ⁻⁴ to 10 ⁻⁷ Torr is achieved;

Applying a high voltage to the titanium electrode of the plasma coater vacuumed to 10 ^-4 to 10 ^-7 Torr to allow the titanium to be melt evaporated, and at the same time in oxygen, argon, nitrogen Supplying a mixture of one or two gases and ionizing them to react the ionized gas with melt-evaporated titanium for 10 to 35 minutes to form a coating layer on the surface of the tile and the surface of the crystal. .

In addition, in order to make the color of the coating layer on the surface of the tile and the crystal surface pearl color, 250 to 700 sccm of argon and 280 to 800 sccm of oxygen are simultaneously supplied or only one of the ionized gas and the molten evaporated titanium is used. In order to make the reaction time for 15 to 35 minutes, and to make the color of the coating layer of the surface of the tile and the crystal surface transparent and non-colored, the plasma coating machine was supplied with argon in the range of 250 to 700 sccm and oxygen 280 to 800 sccm. The reaction time of the melt evaporated titanium is carried out for 12-18 minutes.

In the tile of the present invention, which is made of clay as a main material and has a glaze layer formed on the surface thereof, the glaze that forms crystals is applied to the surface of the glaze layer when a predetermined heat is applied thereto, and the resultant is 1200 ° C. After firing for 8 to 13 hours at -1350 ° C, the calcined tile was put into a plasma coating machine equipped with a titanium electrode, and the inside of the plasma coating machine was evacuated until the vacuum degree was 10 ^-4 to 10 ^-7 Torr. Next, by applying a high voltage to the titanium electrode of the plasma coating machine evacuated to 10 ^-4 to 10 ^-7 Torr to cause the titanium to melt evaporate, at the same time supplying 250 to 700 sccm of argon, 280 to 800 sccm of oxygen at the same time or While supplying and ionizing only one, the ionized gas is reacted with molten evaporated titanium for 10 to 35 minutes to provide a pearly coating layer on the surface of the tile and the surface of the crystal. That generated that,

In a conventional tile made of clay as a main material and having a glaze layer formed on the surface thereof, a glaze that forms crystals is applied to a surface of the glaze layer when subjected to a predetermined heat, and the coating is carried out at 1200 ° C to 1350 ° C for 8 hours to 13 hours. after a predetermined time, baking was completed, the input tile to the plasma coating a titanium electrode is provided, and the vacuum inside of the plasma coating machine until the degree of vacuum of 10 ^-4 to 10 ^-7 Torr, and then screen the 10 ^-4 to 10 Titanium is melt-evaporated by applying a high voltage to the titanium electrode of the plasma coater vacuumized to ^-7 Torr, and ionized by supplying argon in the range of 250-700 sccm and oxygen 280-800 sccm and melt-evaporating the ionized gas. Titanium was reacted for 12 to 18 minutes to form a transparent rainbow colored coating layer on the surface of the tile and the surface of the crystal.

Referring to the method of manufacturing a tile according to the present invention having the above characteristics in more detail as follows.

The plasma coating (hereinafter referred to as "vacuum deposition") is a conventional activated reactive vacuum deposition method that ionizes a reaction gas in order to improve the reaction probability of the evaporated metal particles and the reaction gas in vacuum deposition, thereby allowing the deposition of chemicals. The vacuum evaporator (chamber) used in the present invention collides the electron beam deflected to the rod-shaped titanium target so that the target is melted and evaporated.

At this time, when the reaction gas is injected into the vacuum evaporator, the reaction gas is ionized by a discharge probe to which a voltage is applied, thereby generating a glow discharge, and the reacted compound is deposited on the coating.

The vacuum deposition method in this manner enables the formation of a thin film having characteristics such as corrosion resistance, heat resistance, and abrasion resistance, and can form a coating layer freely of an oxide film, a nitride film, a carbide film, etc. as well as a pure metal film.

Hereinafter, the method of manufacturing a tile of the present invention will be described in detail by dividing each step as follows.

(Step 1)

The first step is to measure clay (white clay, celadon clay, powdered clay, onggi soil, acid blue soil, heat resistant soil, molding soil, white clay, super white and wheat soil), which are subsidiary materials used to make tiles. Compounding; Mixing the blended raw materials; Constantly grinding the particles of the mixed raw material; Storing the aged mixed raw material for a predetermined time to mature; Coma / kneading step for controlling and mixing the moisture of the mature mixed raw material; A primary product molding step of continuously extruding a mixed or kneaded mixed raw material into a tile molding machine in a tile strap form; Cutting the product in the form of tile straps discharged from the mold making machine to a predetermined size; Drying the cut product; The surface of the dried product is glazed and dried to make tiles. The above method is a conventional method of making a tile.

(Step 2)

In the second step of the present invention, when a predetermined heat is applied to the surface of the tile prepared in the first step, that is, the surface on which the glaze layer is formed, a glaze that forms crystals is applied, and then, it is put into a firing furnace at 1200 ° C to 1350 ° C. It bakes for 8 to 13 hours.

The base material of the glaze is shown in Table 1 below, the oxide is shown in Table 2 below, and the degree of solidification crystal glaze is shown in Table 3 below.

Material name standard feldspar 25 kg burr 25 kg Limestone 25 kg Kaolin 25 kg dolomite 30 kg talc 20 kg Feldspar 25 kg Pottery 25 kg fluorite 30 kg Chamotte 40 kg Mullite 40 kg Bentonite 25 kg The subject 25 kg Gypsum (A) 25 kg Gypsum (B) 25 kg Gypsum (H, CH) 25 kg

name name name name Nickel oxide Manganese dioxide Magnesium carbonate platform Copper oxide Magnesium oxide Boric acid white lead Chromium oxide Manganese Carbonate borax Silicate Silicate Cobalt oxide Sodium carbonate Rutile oatmeal Iron oxide Titanium oxide - - Alumina Lithium carbonate ashes - Zincification Barium carbonate Bone

Glaze name Firing temperature Firing conditions Use product no White Snow Crystal 1280 ℃ Acid / Reduction White porcelain sshbgl1 Azure sky 1280 ℃ Oxidation White porcelain sshbgl2 Cobalt crystal 1280 ℃ Oxidation White porcelain sshbgl3 True Decision 1280 ℃ Oxidation White porcelain sshbgl4 Oriental 1280 ℃ Oxidation White porcelain sshbgl5 Pre-determination 1280 ℃ Oxidation White porcelain sshbgl6 Large zinc crystal 1280 ℃ Oxidation White porcelain sshbgl7 Large blue zinc 1280 ℃ Oxidation White porcelain sshbgl8 Peanut Cream 1250-70 ℃ Oxidation White porcelain sshbgl9 Coconut Crystal 1250-70 ℃ Oxidation White porcelain sshbgl10 Mung bean crystal 1250-70 ℃ Oxidation White porcelain sshbgl11 White Purple Crystal 1250-70 ℃ Oxidation White porcelain sshbgl12 Application 1250-70 ℃ Oxidation White porcelain sshbgl13 Late autumn leaves 1250-70 ℃ Oxidation White porcelain sshbgl14 Gold crystal 1250-70 ℃ Oxidation White porcelain sshbgl15 White cloud crystal 1250-70 ℃ Oxidation White porcelain sshbgl16 Research 1250-70 ℃ Oxidation White porcelain sshbgl17 Teal Flower Crystal 1250-70 ℃ Oxidation White porcelain sshbgl18 Yellow Crystal 1250-70 ℃ Oxidation White porcelain sshbgl19 Green dream 1250-70 ℃ Oxidation White porcelain sshbgl20

-. White snow crystal oil: firing temperature 1280-1290 degrees. The presence of white point crystals in polished oil.

Jade sky crystals; firing temperature 1280-1290 degrees. Glossy crystalline Whiteish crystals / high degree of whiteness.

-. Dark blue crystals and cobalt crystals: firing temperature 1280-1290 degrees. Polish oil. Dark navy blue background with white point crystal / high degree of whiteness.

-. Oriental crystal: firing temperature 1280-1290 degrees. Polish oil. Yellowish brown ground with dark navy blue point crystal / high degree of dew.

-. Myriad crystals: firing temperature 1280-1290 degrees. Polish oil. Jinguncheongtang Yellow point crystal / High degree of dew.

-. Large zinc crystalline oil: firing time 1260-1280 degrees. Polish oil. Large white crystals are formed on the transparent background, and the size of the crystals can vary depending on the retention time.

-. Large blue zinc crystalline oil: firing temperature 1260-1280 degrees. Polish oil. Large silver gray crystals are formed on the bright green background, and the size of the crystals can vary depending on the retention time.

-. Peanut cream crystal oil: Baking temperature 1250-1270 degrees. Polish oil. It can flow if thick / colored flower spots are created / thick on coffee grounds, and the crystals can be adjusted according to the maintenance time.

-. Coconut crystalline oil: firing temperature 1250-1270 degrees. Polish oil. White or silvery flower spot crystals on coffee beans, adjustable crystal size / May flow when thick oil is thick

-. Mung bean crystalline oil: firing temperature 1250-1270 degrees. Glossy oil, light green color, coarse white flower spots / Crystal size can be adjusted according to retention time / Seed oil and flower can flow if too thick or too high / Significant point.

-. White purple crystalline oil: Baking temperature 1250-1270 degrees. Polish oil. Light purple bata with white thick flower spots / Adjustable crystal size according to retention time / May flow if thick oil is thick / Significant point.

White cloud crystal oil: firing temperature 1250-1260 degrees Polish oil. Coarse white flower spot crystals form on a white background. May flow when the oil is thick or the temperature is high.

-. Research oil crystalline oil: Firing temperature 1250-1270 degrees. Polished oil. White or silvery crystals can be formed and the size of the crystals can be adjusted on the light pink background.

-. Yellow-green crystalline oil: firing temperature 1250-1270 degrees. Polish oil. Lime green white White flower spots / Edge edges appear orange.

-. Green dream crystal oil: firing temperature 1250-1270 degrees. Polish oil. There are gray and pink large flower spot crystals on the green background.

In addition, the glaze to form the crystals is applied, and when it is put in a kiln and fired at 1200 ° C to 1350 ° C, the glaze melts and fuses to the surface. The reason for the firing at 1200 DEG C. to 1350 DEG C. in the firing furnace is that if it is less than this, the firing interval takes too long. Therefore, it is preferable to make baking temperature into 1200 degreeC-1350 degreeC.

(Step 3)

The third step of the present invention is a step of washing and drying the surface of the crystals and tiles formed in the second step, the washing liquid is a volatile material such as alcohol, acetone, drying is put into a dryer to 150 ~ 250 ℃ Heat for 20 to 40 minutes to completely remove the moisture of the tile itself. The temperature of the dryer is to remove only the water of the tile itself, it is suitable if 20 to 40 minutes at 150 to 250 ℃.

(Step 4)

The fourth step of the present invention is a step of injecting the dried tile in the third step into a plasma coater equipped with a titanium electrode, and vacuuming the interior of the plasma coater until the vacuum degree 10 ^-4 ~ 10 ^-7 Torr , This is vacuumed until the vacuum degree is 10-4 to 10-7 Torr by injecting and evacuating argon gas into the vacuum evaporator provided with the crystals and the titanium electrode.

At this time, if the vacuum degree inside the vacuum evaporator is lower than the 10-4 Torr, the adsorption force between the coating film and the crystal formed tile is weak, there is a fear that the coating film is peeled off, on the contrary, if the vacuum degree inside the vacuum evaporator is higher than the 10-7 Torr is necessary As a result, the time required for evacuating the inside of the vacuum evaporator becomes long, resulting in a delay in coating time. Therefore, the vacuum degree inside the vacuum evaporator is preferably 10-4 to 10-7 Torr.

(Step 5)

In the fifth step according to the present invention, a high voltage is applied to the titanium electrode of the vacuum vaporizer vacuumed to 10-4 to 10-7 Torr to allow the titanium to be melt evaporated and at the same time to color the tile on which crystals are formed, oxygen, It is a step of forming a coating layer on the surface of the crystal-formed tile by reacting the ionized gas and the melt-evaporated titanium for 10 to 35 minutes while supplying and ionizing a mixed gas mixed with argon or nitrogen. .

In the fifth step of the coating method, the coating layer formed on the tile on which crystals are formed is supplied with oxygen in a vacuum vaporizer in the range of 280 to 800 sccm in order to make the color of titanium pearly, and the reaction time of the ionized gas and the molten evaporated titanium For 15 to 35 minutes.

The reason for securing a predetermined oxygen supply and reaction time in forming the coating layer on the crystal formed tile is necessary to color the titanium coating, especially for pearl-colored titanium coating, the oxygen supply is in the range of 280 to 800 sccm. The reaction time should be 15 to 35 minutes.

The reason why the oxygen supply amount is in the range of 280 to 800 sccm and the reaction time is 15 to 35 minutes is that if the amount is kept below or above, the color of the titanium coating does not maintain the pearl color, as well as the thickness of the coating. This is because it does not maintain the desired thickness.

In addition, in order to make the color of the coating of the crystal-coated tile transparent transparent color, a vacuum evaporator was supplied in the range of 250 to 700 sccm of argon and 280 to 800 sccm of oxygen, and the reaction time of the ionized gas and molten evaporated titanium was 12 to 18 minutes. While. The reason for supplying the argon 250 to 700 sccm is to adjust the degree of vacuum of the vacuum evaporator to the desired degree.

The reason why the oxygen supply amount is in the range of 280 to 800 sccm and the reaction time is 12 to 18 minutes is as described above. If the amount is kept below or above, the color of the titanium coating does not maintain the transparent rainbow color. Of course, because the thickness of the coating does not maintain the desired thickness.

In addition, in order to make the coating color of the crystal-formed tile pearl color, a vacuum evaporator was supplied in the range of 250 to 700 sccm of argon and 280 to 800 sccm of oxygen, and the reaction time of the ionized gas and the molten evaporated titanium for 20 to 35 minutes. However, the reason for supplying 250 to 700 sccm of argon is to adjust the degree of vacuum of the vacuum evaporator to the desired degree as described above.

In addition, the oxygen supply amount is in the range of 280 to 800 sccm and the reaction time is 20 to 35, as described above. This is because the thickness of the coating does not maintain the desired thickness.

However, in the titanium coating of the crystal formed tile, the temperature of the vacuum evaporator may be maintained at room temperature, and the crystal formed tile may be made of synthetic resin, carbon rod, or stainless steel, and the surface of acrylic or urethane may be Titanium may be coated on either of them.

In addition to the above description, the titanium coating color of the crystal-formed tiles may be adjusted to gold or silver, and the gas supply and coating time for the coating are shown in Table 4 below.

Table 4 below shows the gas used, the degree of vacuum, the temperature of the vacuum evaporator, the coating time, and the like, which are selected to produce each color while the titanium is coated on the tile on which the crystals are formed.

The present invention as described above, by plasma coating titanium on the surface of the crystal formed tile, chemical pollution does not occur, corrosion resistance, heat resistance, wear resistance, as well as harmless to the body and does not change color, due to the color of the surface There exists an effect of improving the appearance aesthetics of a tile.

In addition, when the tile according to the present invention is used as a finishing material for a bathroom, a shower room, etc. of a general house or an apartment or various buildings, the conventional water is not buried, so that the water droplets do not occur, and the water drops flow down the bathroom or the shower. The inner walls of the thread are effective in preventing the discomfort caused by blurred vision.

Claims (5)

In a conventional tile made of clay as a main material and having a glaze layer formed on the surface thereof, a glaze that forms crystals is applied to a surface of the glaze layer when subjected to a predetermined heat, and the coating is carried out at 1200 ° C to 1350 ° C for 8 hours to 13 hours. Time firing; Washing the calcined tile using a washing solution and putting it in a drier to heat 20 to 40 minutes at 150 to 250 ° C. to dry moisture of the tile itself; Injecting the dried tile into a plasma coater equipped with a titanium electrode and evacuating the inside of the plasma coater until a vacuum degree of 10 ⁻⁴ to 10 ⁻⁷ Torr is achieved; Applying a high voltage to the titanium electrode of the plasma coater vacuumed to 10 ^-4 to 10 ^-7 Torr to allow the titanium to be melt evaporated, and at the same time in oxygen, argon, nitrogen Supplying and ionizing a gas in which one or two are mixed and reacting the ionized gas with molten evaporated titanium for 10 to 35 minutes to form a coating layer on the surface of the tile and the surface of the crystal; Method of making tiles. The method according to claim 1, wherein argon 250 to 700 sccm and oxygen 280 to 800 sccm are simultaneously supplied to the plasma coater or only one of them in order to make the color of the coating layer on the surface of the tile and the crystal surface pearl color. Method for producing a tile, characterized in that for 15 to 35 minutes of the reaction time of the titanium. According to claim 1, In order to make the color of the coating layer of the surface of the tile and the crystal surface transparent rainbow color Argon 250 to 700 sccm and oxygen in the range of 280 to 800 sccm, and the ionized gas and molten evaporated titanium Method for producing a tile, characterized in that the reaction time for 12 to 18 minutes. In a conventional tile made of clay as a main material and having a glaze layer formed on the surface thereof, a glaze that forms crystals is applied to a surface of the glaze layer when subjected to a predetermined heat, and the coating is carried out at 1200 ° C to 1350 ° C for 8 hours to 13 hours. After calcining for a time, the calcined tile was washed with a washing liquid, and then, the calcined tile was put into a drier and heated at 150 to 250 ° C. for 20 to 40 minutes to dry the moisture of the tile itself. The plasma coating machine was placed in a plasma coating machine, and the inside of the plasma coating machine was evacuated until a vacuum degree of 10 ^-4 to 10 ^-7 Torr was obtained. Then, the titanium electrode of the plasma coating machine was evacuated to 10 ^-4 to 10 ^-7 Torr. Titanium is melt-evaporated by applying a high voltage to it, and 250-700 sccm of argon and 280-800 sccm of oxygen are supplied together or ionized by supplying only one of them. The gas to the melt reaction of the evaporated titanium 10-35 minutes tile, characterized in that the causes of the pearl gray coating layer formed on the surface of the crystal surface and the tile. In a conventional tile made of clay as a main material and having a glaze layer formed on the surface thereof, a glaze that forms crystals is applied to a surface of the glaze layer when subjected to a predetermined heat, and the coating is carried out at 1200 ° C to 1350 ° C for 8 hours to 13 hours. After calcining for a time, the calcined tile was washed with a washing liquid, and then, the calcined tile was put into a drier and heated at 150 to 250 ° C. for 20 to 40 minutes to dry the moisture of the tile itself. The plasma coating machine was placed in a plasma coating machine, and the inside of the plasma coating machine was evacuated until a vacuum degree of 10 ^-4 to 10 ^-7 Torr was obtained. Then, the titanium electrode of the plasma coating machine was evacuated to 10 ^-4 to 10 ^-7 Torr. Titanium was melt evaporated while supplying a high voltage to the titanium to melt evaporate and supply ionized by argon 250 ~ 700sccm and oxygen 280 ~ 800sccm. The tile, characterized in that the reacted for 12-18 minutes to be formed a coating layer of a transparent rainbow colors on the surface of the crystal surface and the tile.