KR20040013209A - 박막트랜지스터 액정표시장치의 제조방법 - Google Patents
박막트랜지스터 액정표시장치의 제조방법 Download PDFInfo
- Publication number
- KR20040013209A KR20040013209A KR1020020046038A KR20020046038A KR20040013209A KR 20040013209 A KR20040013209 A KR 20040013209A KR 1020020046038 A KR1020020046038 A KR 1020020046038A KR 20020046038 A KR20020046038 A KR 20020046038A KR 20040013209 A KR20040013209 A KR 20040013209A
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- South Korea
- Prior art keywords
- film
- gate
- transparent
- forming
- metal film
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 43
- 239000010409 thin film Substances 0.000 title claims abstract description 22
- 239000004973 liquid crystal related substance Substances 0.000 title abstract description 14
- 238000004519 manufacturing process Methods 0.000 title abstract description 14
- 239000010408 film Substances 0.000 claims abstract description 93
- 229910052751 metal Inorganic materials 0.000 claims abstract description 60
- 239000002184 metal Substances 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 22
- 238000002161 passivation Methods 0.000 claims abstract description 9
- 238000000059 patterning Methods 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims description 10
- 238000009713 electroplating Methods 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13625—Patterning using multi-mask exposure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Nonlinear Science (AREA)
- Ceramic Engineering (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (3)
- 투명성 절연기판 상에 게이트용 금속막을 형성하는 단계;상기 게이트용 금속막을 패터닝하여 게이트 전극을 포함한 게이트 라인을 형성하는 단계;상기 게이트 전극을 덮도록 상기 기판 상에 게이트 절연막을 증착하는 단계;상기 게이트 절연막 상에 a-Si막과 n+ a-si막을 차례로 증착하는 단계;상기 n+ a-si막과 a-si막을 패터닝하여 채널층을 형성하는 단계;상기 채널층을 포함한 게이트 절연막 상에 투명 금속막을 증착하는 단계;상기 투명 금속막을 패터닝하여 화소전극을 형성함과 동시에 소오소/드레인 전극을 형성하면서 채널 영역 상의 n+ a-Si막 부분을 식각하여 박막트랜지스터를 형성하고, 데이터 라인 형성 영역 상에 투명 금속막 패턴을 형성하는 단계;상기 단계까지의 기판 결과물 상에 보호막을 증착하는 단계;상기 보호막을 식각하여 박막트랜지스터의 소오스 전극 및 투명 금속막 패턴을 노출시키는 트렌치를 형성하는 단계; 및상기 트렌치에 의해 노출된 박막트랜지스터의 소오스 전극 및 투명 금속막 패턴 상에 저저항 금속을 전기도금하여 데이터 라인을 형성하는 단계를 포함하는 것을 특징으로 하는 박막트랜지스터 액정표시장치의 제조방법.
- 제 1 항에 있어서, 상기 저저항 금속은 구리, 은, 크롬, 몰리브덴으로 이루어진 그룹중 하나를 선택하는 것을 특징으로 하는 박막트랜지스터 액정표시장치의 제조방법.
- 제 1 항에 있어서, 상기 데이터 라인을 형성하는 단계 후,상기 저저항 금속으로 이루어진 데이터 라인 표면 상에 전기도금으로 금속 보호막을 형성하는 단계를 더 포함하는 것을 특징으로 하는 박막트랜지스터 액정표시장치의 제조방법.
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KR1020020046038A KR100867471B1 (ko) | 2002-08-05 | 2002-08-05 | 박막트랜지스터 액정표시장치의 제조방법 |
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KR1020020046038A KR100867471B1 (ko) | 2002-08-05 | 2002-08-05 | 박막트랜지스터 액정표시장치의 제조방법 |
Publications (2)
Publication Number | Publication Date |
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KR20040013209A true KR20040013209A (ko) | 2004-02-14 |
KR100867471B1 KR100867471B1 (ko) | 2008-11-06 |
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KR1020020046038A KR100867471B1 (ko) | 2002-08-05 | 2002-08-05 | 박막트랜지스터 액정표시장치의 제조방법 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100789090B1 (ko) * | 2002-12-30 | 2007-12-26 | 엘지.필립스 엘시디 주식회사 | 액정표시장치 제조방법 |
KR101011503B1 (ko) * | 2008-05-15 | 2011-01-31 | 유인상 | 컨테이너 백 제조방법 및 컨테이너 백 구조 |
KR20130020546A (ko) * | 2011-08-19 | 2013-02-27 | 엘지디스플레이 주식회사 | 표시장치용 어레이 기판 및 그의 제조방법 |
CN107658228A (zh) * | 2017-10-11 | 2018-02-02 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及制备方法、阵列基板和显示面板 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100690001B1 (ko) * | 2000-02-21 | 2007-03-08 | 엘지.필립스 엘시디 주식회사 | 액정표시소자 및 그 제조방법 |
KR100674236B1 (ko) * | 2000-12-28 | 2007-01-25 | 비오이 하이디스 테크놀로지 주식회사 | 프린지필드구동 액정표시장치의 제조방법 |
-
2002
- 2002-08-05 KR KR1020020046038A patent/KR100867471B1/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100789090B1 (ko) * | 2002-12-30 | 2007-12-26 | 엘지.필립스 엘시디 주식회사 | 액정표시장치 제조방법 |
KR101011503B1 (ko) * | 2008-05-15 | 2011-01-31 | 유인상 | 컨테이너 백 제조방법 및 컨테이너 백 구조 |
KR20130020546A (ko) * | 2011-08-19 | 2013-02-27 | 엘지디스플레이 주식회사 | 표시장치용 어레이 기판 및 그의 제조방법 |
CN107658228A (zh) * | 2017-10-11 | 2018-02-02 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及制备方法、阵列基板和显示面板 |
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KR100867471B1 (ko) | 2008-11-06 |
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