KR20040002971A - 공진기 디바이스 및 공진 주파수 조절 방법 - Google Patents
공진기 디바이스 및 공진 주파수 조절 방법 Download PDFInfo
- Publication number
- KR20040002971A KR20040002971A KR10-2003-7014998A KR20037014998A KR20040002971A KR 20040002971 A KR20040002971 A KR 20040002971A KR 20037014998 A KR20037014998 A KR 20037014998A KR 20040002971 A KR20040002971 A KR 20040002971A
- Authority
- KR
- South Korea
- Prior art keywords
- resonator
- layer
- piezoelectric
- detuning
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/564—Monolithic crystal filters implemented with thin-film techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/0421—Modification of the thickness of an element
- H03H2003/0428—Modification of the thickness of an element of an electrode
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10124349A DE10124349A1 (de) | 2001-05-18 | 2001-05-18 | Piezoelektrische Resonatorvorrichtung mit Verstimmungsschichtfolge |
| DE10124349.9 | 2001-05-18 | ||
| PCT/EP2002/004717 WO2002095939A1 (de) | 2001-05-18 | 2002-04-29 | Piezoelektrische resonatorvorrichtung mit verstimmungsschichtfolge |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20040002971A true KR20040002971A (ko) | 2004-01-07 |
Family
ID=7685342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2003-7014998A Abandoned KR20040002971A (ko) | 2001-05-18 | 2002-04-29 | 공진기 디바이스 및 공진 주파수 조절 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6864619B2 (enExample) |
| EP (1) | EP1393440B1 (enExample) |
| JP (1) | JP4455817B2 (enExample) |
| KR (1) | KR20040002971A (enExample) |
| DE (2) | DE10124349A1 (enExample) |
| WO (1) | WO2002095939A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100691153B1 (ko) * | 2005-03-15 | 2007-03-09 | 삼성전기주식회사 | 박막 벌크 음향 공진기 |
| KR101312222B1 (ko) * | 2007-08-14 | 2013-09-27 | 아바고 테크놀로지스 제너럴 아이피 (싱가포르) 피티이 리미티드 | 다층 전극 제조 방법, baw 공진기 및 그 제조 방법 |
Families Citing this family (80)
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| DE10162580A1 (de) * | 2001-12-19 | 2003-07-17 | Infineon Technologies Ag | Piezoelektrischer Schwingkreis, Verfahren zu dessen Herstellung und Filteranordnung |
| FR2853473B1 (fr) * | 2003-04-01 | 2005-07-01 | St Microelectronics Sa | Composant electronique comprenant un resonateur et procede de fabrication |
| US7038355B2 (en) | 2003-04-03 | 2006-05-02 | Stmicroelectronics Sa | Tunable microresonator on an insulating beam deformable by the difference in thermal expansion coefficients |
| JP4321754B2 (ja) * | 2003-07-31 | 2009-08-26 | Tdk株式会社 | 圧電共振器およびそれを用いたフィルタ |
| EP1575165B1 (en) | 2004-03-09 | 2008-05-07 | Infineon Technologies AG | Bulk acoustic wave filter and method for eliminating unwanted side passands |
| EP1730839A1 (en) * | 2004-03-31 | 2006-12-13 | Matsushita Electric Industries Co., Ltd. | Acoustic mirror type thin film bulk acoustic resonator, and filter, duplexer and communication apparatus comprising the same |
| US20060006965A1 (en) * | 2004-07-06 | 2006-01-12 | Matsushita Electric Industrial Co., Ltd. | RF filter and method for fabricating the same |
| WO2006018788A1 (en) * | 2004-08-20 | 2006-02-23 | Philips Intellectual Property & Standards Gmbh | Narrow band bulk acoustic wave filter |
| US20060087039A1 (en) * | 2004-10-22 | 2006-04-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Ubm structure for improving reliability and performance |
| DE102004054895B4 (de) | 2004-11-12 | 2007-04-19 | Infineon Technologies Ag | Dünnschicht-BAW-Filter sowie Verfahren zur Herstellung eines Dünnschicht-BAW-Filters |
| JP4884134B2 (ja) * | 2006-05-30 | 2012-02-29 | 京セラ株式会社 | 音響波共振子およびフィルタならびに通信装置 |
| JP2008172494A (ja) * | 2007-01-11 | 2008-07-24 | Fujitsu Media Device Kk | 圧電薄膜共振器、弾性波デバイスおよび弾性波デバイスの製造方法。 |
| US7834720B2 (en) * | 2008-07-01 | 2010-11-16 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic wave filter device and a method for trimming a bulk acoustic wave filter device |
| EP2299593A1 (en) | 2009-09-18 | 2011-03-23 | Nxp B.V. | Laterally coupled bulk acoustic wave device |
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| US9246473B2 (en) | 2011-03-29 | 2016-01-26 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator comprising collar, frame and perimeter distributed bragg reflector |
| US9571061B2 (en) | 2014-06-06 | 2017-02-14 | Akoustis, Inc. | Integrated circuit configured with two or more single crystal acoustic resonator devices |
| US9673384B2 (en) | 2014-06-06 | 2017-06-06 | Akoustis, Inc. | Resonance circuit with a single crystal capacitor dielectric material |
| US9537465B1 (en) | 2014-06-06 | 2017-01-03 | Akoustis, Inc. | Acoustic resonator device with single crystal piezo material and capacitor on a bulk substrate |
| US9912314B2 (en) | 2014-07-25 | 2018-03-06 | Akoustics, Inc. | Single crystal acoustic resonator and bulk acoustic wave filter |
| US9805966B2 (en) | 2014-07-25 | 2017-10-31 | Akoustis, Inc. | Wafer scale packaging |
| US9716581B2 (en) | 2014-07-31 | 2017-07-25 | Akoustis, Inc. | Mobile communication device configured with a single crystal piezo resonator structure |
| US9917568B2 (en) | 2014-08-26 | 2018-03-13 | Akoustis, Inc. | Membrane substrate structure for single crystal acoustic resonator device |
| EP3365669B8 (en) | 2015-10-21 | 2024-03-13 | Qorvo Us, Inc. | Resonator structure with enhanced reflection of shear and longitudinal modes of acoustic vibrations |
| KR102588798B1 (ko) * | 2016-02-17 | 2023-10-13 | 삼성전기주식회사 | 음향파 필터 장치 및 그 제조방법 |
| US10581398B2 (en) | 2016-03-11 | 2020-03-03 | Akoustis, Inc. | Method of manufacture for single crystal acoustic resonator devices using micro-vias |
| US11316496B2 (en) | 2016-03-11 | 2022-04-26 | Akoustis, Inc. | Method and structure for high performance resonance circuit with single crystal piezoelectric capacitor dielectric material |
| US10523180B2 (en) | 2016-03-11 | 2019-12-31 | Akoustis, Inc. | Method and structure for single crystal acoustic resonator devices using thermal recrystallization |
| US11476825B2 (en) | 2016-03-11 | 2022-10-18 | Akoustis, Inc. | 5.5 GHz Wi-Fi coexistence acoustic wave resonator RF filter circuit |
| US10979022B2 (en) | 2016-03-11 | 2021-04-13 | Akoustis, Inc. | 5.2 GHz Wi-Fi acoustic wave resonator RF filter circuit |
| US11424728B2 (en) | 2016-03-11 | 2022-08-23 | Akoustis, Inc. | Piezoelectric acoustic resonator manufactured with piezoelectric thin film transfer process |
| US10979024B2 (en) | 2016-03-11 | 2021-04-13 | Akoustis, Inc. | 5.2 GHz Wi-Fi coexistence acoustic wave resonator RF filter circuit |
| US11736177B2 (en) | 2016-03-11 | 2023-08-22 | Akoustis Inc. | Front end modules for 5.6 GHz and 6.6 GHz Wi-Fi acoustic wave resonator RF filter circuits |
| US11411168B2 (en) | 2017-10-16 | 2022-08-09 | Akoustis, Inc. | Methods of forming group III piezoelectric thin films via sputtering |
| US11177868B2 (en) | 2016-03-11 | 2021-11-16 | Akoustis, Inc. | Front end module for 6.5 GHz Wi-Fi acoustic wave resonator RF filter circuit |
| US10355659B2 (en) | 2016-03-11 | 2019-07-16 | Akoustis, Inc. | Piezoelectric acoustic resonator manufactured with piezoelectric thin film transfer process |
| US11356071B2 (en) | 2016-03-11 | 2022-06-07 | Akoustis, Inc. | Piezoelectric acoustic resonator with improved TCF manufactured with piezoelectric thin film transfer process |
| US10217930B1 (en) | 2016-03-11 | 2019-02-26 | Akoustis, Inc. | Method of manufacture for single crystal acoustic resonator devices using micro-vias |
| US11451213B2 (en) | 2016-03-11 | 2022-09-20 | Akoustis, Inc. | 5G n79 Wi-Fi acoustic triplexer circuit |
| US20210257993A1 (en) | 2016-03-11 | 2021-08-19 | Akoustis, Inc. | Acoustic wave resonator rf filter circuit device |
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| US11856858B2 (en) | 2017-10-16 | 2023-12-26 | Akoustis, Inc. | Methods of forming doped crystalline piezoelectric thin films via MOCVD and related doped crystalline piezoelectric thin films |
| US11557716B2 (en) | 2018-02-20 | 2023-01-17 | Akoustis, Inc. | Method and structure of single crystal electronic devices with enhanced strain interface regions by impurity introduction |
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| US12102010B2 (en) | 2020-03-05 | 2024-09-24 | Akoustis, Inc. | Methods of forming films including scandium at low temperatures using chemical vapor deposition to provide piezoelectric resonator devices and/or high electron mobility transistor devices |
| US11496108B2 (en) | 2020-08-17 | 2022-11-08 | Akoustis, Inc. | RF BAW resonator filter architecture for 6.5GHz Wi-Fi 6E coexistence and other ultra-wideband applications |
| US11901880B2 (en) | 2021-01-18 | 2024-02-13 | Akoustis, Inc. | 5 and 6 GHz Wi-Fi coexistence acoustic wave resonator RF diplexer circuit |
| US12255637B2 (en) | 2021-01-18 | 2025-03-18 | Akoustis, Inc. | 5.1-7.1GHz Wi-Fi6E coexistence acoustic wave resonator RF diplexer circuit |
| US20250141430A1 (en) * | 2023-10-30 | 2025-05-01 | Avago Technologies International Sales Pte. Limited | Systems and methods for acoustic filters operating at high frequencies |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2551611B1 (fr) * | 1983-08-31 | 1986-10-24 | Labo Electronique Physique | Nouvelle structure de transducteur ultrasonore et appareil d'examen de milieux par echographie ultrasonore comprenant une telle structure |
| JPS60206315A (ja) * | 1984-03-30 | 1985-10-17 | Toshiba Corp | 圧電薄膜共振器 |
| US5646583A (en) * | 1996-01-04 | 1997-07-08 | Rockwell International Corporation | Acoustic isolator having a high impedance layer of hafnium oxide |
| US5910756A (en) * | 1997-05-21 | 1999-06-08 | Nokia Mobile Phones Limited | Filters and duplexers utilizing thin film stacked crystal filter structures and thin film bulk acoustic wave resonators |
| US5894647A (en) * | 1997-06-30 | 1999-04-20 | Tfr Technologies, Inc. | Method for fabricating piezoelectric resonators and product |
| US6249074B1 (en) * | 1997-08-22 | 2001-06-19 | Cts Corporation | Piezoelectric resonator using sacrificial layer and method of tuning same |
| JP4326151B2 (ja) * | 1998-05-08 | 2009-09-02 | アバゴ・テクノロジーズ・ワイヤレス・アイピー(シンガポール)プライベート・リミテッド | 薄膜圧電振動子 |
| DE19931297A1 (de) * | 1999-07-07 | 2001-01-11 | Philips Corp Intellectual Pty | Volumenwellen-Filter |
| US6441703B1 (en) * | 2000-01-18 | 2002-08-27 | Texas Instruments Incorporated | Multiple frequency acoustic reflector array and monolithic cover for resonators and method |
| US6515558B1 (en) * | 2000-11-06 | 2003-02-04 | Nokia Mobile Phones Ltd | Thin-film bulk acoustic resonator with enhanced power handling capacity |
| US6566979B2 (en) * | 2001-03-05 | 2003-05-20 | Agilent Technologies, Inc. | Method of providing differential frequency adjusts in a thin film bulk acoustic resonator (FBAR) filter and apparatus embodying the method |
| US6469597B2 (en) * | 2001-03-05 | 2002-10-22 | Agilent Technologies, Inc. | Method of mass loading of thin film bulk acoustic resonators (FBAR) for creating resonators of different frequencies and apparatus embodying the method |
| US6601276B2 (en) * | 2001-05-11 | 2003-08-05 | Agere Systems Inc. | Method for self alignment of patterned layers in thin film acoustic devices |
-
2001
- 2001-05-18 DE DE10124349A patent/DE10124349A1/de not_active Withdrawn
-
2002
- 2002-04-29 EP EP02771632A patent/EP1393440B1/de not_active Expired - Lifetime
- 2002-04-29 KR KR10-2003-7014998A patent/KR20040002971A/ko not_active Abandoned
- 2002-04-29 JP JP2002592284A patent/JP4455817B2/ja not_active Expired - Fee Related
- 2002-04-29 DE DE50213637T patent/DE50213637D1/de not_active Expired - Lifetime
- 2002-04-29 WO PCT/EP2002/004717 patent/WO2002095939A1/de not_active Ceased
-
2003
- 2003-11-18 US US10/716,327 patent/US6864619B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100691153B1 (ko) * | 2005-03-15 | 2007-03-09 | 삼성전기주식회사 | 박막 벌크 음향 공진기 |
| KR101312222B1 (ko) * | 2007-08-14 | 2013-09-27 | 아바고 테크놀로지스 제너럴 아이피 (싱가포르) 피티이 리미티드 | 다층 전극 제조 방법, baw 공진기 및 그 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| US6864619B2 (en) | 2005-03-08 |
| US20040130847A1 (en) | 2004-07-08 |
| JP4455817B2 (ja) | 2010-04-21 |
| EP1393440A1 (de) | 2004-03-03 |
| EP1393440B1 (de) | 2009-06-24 |
| JP2004534445A (ja) | 2004-11-11 |
| DE10124349A1 (de) | 2002-12-05 |
| DE50213637D1 (de) | 2009-08-06 |
| WO2002095939A1 (de) | 2002-11-28 |
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