KR20030059746A - 산화방지 처리가 된 웨이퍼 서셉터 - Google Patents
산화방지 처리가 된 웨이퍼 서셉터 Download PDFInfo
- Publication number
- KR20030059746A KR20030059746A KR1020020000495A KR20020000495A KR20030059746A KR 20030059746 A KR20030059746 A KR 20030059746A KR 1020020000495 A KR1020020000495 A KR 1020020000495A KR 20020000495 A KR20020000495 A KR 20020000495A KR 20030059746 A KR20030059746 A KR 20030059746A
- Authority
- KR
- South Korea
- Prior art keywords
- susceptor
- wafer
- sio2
- oxidation
- wafer susceptor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
Abstract
Description
Claims (3)
- 반응챔버 내에 설치되며 그 윗면에는 웨이퍼가 수평안착 되어지는 흑연재질의 웨이퍼 서셉터에 있어서,표면이 SiO2또는 다결정 실리콘으로 코팅되는 것을 특징으로 하는 웨이퍼 서셉터.
- 제1항에 있어서, 상기 SiO2또는 다결정 실리콘이 코팅된 부위는 산화분위기에 노출되는 부분인 것을 특징으로 하는 웨이퍼 서셉터.
- 제1항에 있어서, 상기 SiO2또는 다결정 실리콘의 코팅은 CVD법에 의해 이루어진 것임을 특징으로 하는 웨이퍼 서셉터.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0000495A KR100480182B1 (ko) | 2002-01-04 | 2002-01-04 | 산화방지 처리가 된 웨이퍼 서셉터 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0000495A KR100480182B1 (ko) | 2002-01-04 | 2002-01-04 | 산화방지 처리가 된 웨이퍼 서셉터 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030059746A true KR20030059746A (ko) | 2003-07-10 |
KR100480182B1 KR100480182B1 (ko) | 2005-03-31 |
Family
ID=32216994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0000495A KR100480182B1 (ko) | 2002-01-04 | 2002-01-04 | 산화방지 처리가 된 웨이퍼 서셉터 |
Country Status (1)
Country | Link |
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KR (1) | KR100480182B1 (ko) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0686662B2 (ja) * | 1989-11-02 | 1994-11-02 | イビデン株式会社 | Cvd用サセプター |
JPH0693453A (ja) * | 1991-10-17 | 1994-04-05 | Denki Kagaku Kogyo Kk | サセプタ |
KR19990009773A (ko) * | 1997-07-11 | 1999-02-05 | 윤종용 | 플로팅 상태를 갖는 플라즈마 챔버의 서셉터 |
KR19990027893A (ko) * | 1997-09-30 | 1999-04-15 | 윤종용 | 서셉터를 구비한 반도체 제조 장치 |
KR100605097B1 (ko) * | 1999-04-15 | 2006-07-26 | 삼성전자주식회사 | 반도체 제조 장치의 서셉터 |
-
2002
- 2002-01-04 KR KR10-2002-0000495A patent/KR100480182B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR100480182B1 (ko) | 2005-03-31 |
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