KR20020089204A - 반사굴절 축소 렌즈 - Google Patents

반사굴절 축소 렌즈 Download PDF

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Publication number
KR20020089204A
KR20020089204A KR1020020028486A KR20020028486A KR20020089204A KR 20020089204 A KR20020089204 A KR 20020089204A KR 1020020028486 A KR1020020028486 A KR 1020020028486A KR 20020028486 A KR20020028486 A KR 20020028486A KR 20020089204 A KR20020089204 A KR 20020089204A
Authority
KR
South Korea
Prior art keywords
lens
image
intermediate image
zone
refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020020028486A
Other languages
English (en)
Korean (ko)
Inventor
에플레알렉산더
바이얼헬무트
Original Assignee
칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트 filed Critical 칼 짜이스 세미컨덕터 매뉴팩츄어링 테크놀로지즈 악티엔게젤샤프트
Publication of KR20020089204A publication Critical patent/KR20020089204A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020020028486A 2001-05-22 2002-05-22 반사굴절 축소 렌즈 Withdrawn KR20020089204A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10127227A DE10127227A1 (de) 2001-05-22 2001-05-22 Katadioptrisches Reduktionsobjektiv
DE10127227.8 2001-05-22

Publications (1)

Publication Number Publication Date
KR20020089204A true KR20020089204A (ko) 2002-11-29

Family

ID=7687230

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020028486A Withdrawn KR20020089204A (ko) 2001-05-22 2002-05-22 반사굴절 축소 렌즈

Country Status (5)

Country Link
US (2) US6717746B2 (enExample)
EP (1) EP1260845A3 (enExample)
JP (1) JP2003043362A (enExample)
KR (1) KR20020089204A (enExample)
DE (1) DE10127227A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110780514A (zh) * 2018-07-27 2020-02-11 精工爱普生株式会社 透镜和投射型图像显示装置

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US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
US20050190446A1 (en) * 2002-06-25 2005-09-01 Carl Zeiss Amt Ag Catadioptric reduction objective
TWI242691B (en) * 2002-08-23 2005-11-01 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
DE10316428A1 (de) * 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP3728301B2 (ja) * 2003-05-30 2005-12-21 株式会社オーク製作所 投影光学系
DE10338983A1 (de) * 2003-08-20 2005-03-17 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithografie
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101150037B1 (ko) 2004-01-14 2012-07-02 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
EP1564594A1 (de) * 2004-02-17 2005-08-17 Carl Zeiss SMT AG Projektionsobjektiv für die Mikrolithographie
US7712905B2 (en) * 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
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JP2006119490A (ja) 2004-10-25 2006-05-11 Canon Inc 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
JP2006138940A (ja) * 2004-11-10 2006-06-01 Canon Inc 反射屈折型投影光学系及び投影反射屈折型投影光学系を有する露光装置、デバイス製造方法
US20060158615A1 (en) * 2005-01-18 2006-07-20 Williamson David M Catadioptric 1x projection system and method
KR101483791B1 (ko) 2005-06-02 2015-01-16 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US20070091452A1 (en) * 2005-10-25 2007-04-26 Scott Lerner Projection system and method
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US20070247729A1 (en) * 2006-04-25 2007-10-25 Rudolph Technologies, Inc. Reflective objective
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
DE102006045075A1 (de) * 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
WO2009026970A1 (en) * 2007-08-24 2009-03-05 Carl Zeiss Smt Ag Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
JP5498385B2 (ja) * 2007-10-02 2014-05-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影対物系
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
CN102428408B (zh) 2009-05-16 2014-11-05 卡尔蔡司Smt有限责任公司 包括光学校正布置的用于半导体光刻的投射曝光设备
DE102010021539B4 (de) 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden
US8830590B2 (en) * 2012-05-30 2014-09-09 Ultratech, Inc. Unit magnification large-format catadioptric lens for microlithography
DE102015207154A1 (de) 2014-05-09 2015-11-12 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator
DE102017204619A1 (de) 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie
CN117031695B (zh) * 2023-08-21 2024-02-09 东莞锐视光电科技有限公司 光刻镜头装置

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110780514A (zh) * 2018-07-27 2020-02-11 精工爱普生株式会社 透镜和投射型图像显示装置
CN110780514B (zh) * 2018-07-27 2021-08-24 精工爱普生株式会社 透镜和投射型图像显示装置

Also Published As

Publication number Publication date
US7006304B2 (en) 2006-02-28
JP2003043362A (ja) 2003-02-13
DE10127227A1 (de) 2002-12-05
US6717746B2 (en) 2004-04-06
EP1260845A2 (de) 2002-11-27
US20040160677A1 (en) 2004-08-19
US20030021040A1 (en) 2003-01-30
EP1260845A3 (de) 2004-01-02

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20020522

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid