KR20020089201A - 자외선용 감쇠 필터 - Google Patents
자외선용 감쇠 필터 Download PDFInfo
- Publication number
- KR20020089201A KR20020089201A KR1020020028424A KR20020028424A KR20020089201A KR 20020089201 A KR20020089201 A KR 20020089201A KR 1020020028424 A KR1020020028424 A KR 1020020028424A KR 20020028424 A KR20020028424 A KR 20020028424A KR 20020089201 A KR20020089201 A KR 20020089201A
- Authority
- KR
- South Korea
- Prior art keywords
- filter
- coating
- thickness
- attenuation
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000576 coating method Methods 0.000 claims abstract description 100
- 239000011248 coating agent Substances 0.000 claims abstract description 88
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 238000010521 absorption reaction Methods 0.000 claims abstract description 19
- 238000009826 distribution Methods 0.000 claims abstract description 16
- 239000006117 anti-reflective coating Substances 0.000 claims description 50
- 230000005540 biological transmission Effects 0.000 claims description 26
- 239000003989 dielectric material Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 9
- 230000003595 spectral effect Effects 0.000 claims description 9
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 8
- 238000013016 damping Methods 0.000 claims description 7
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 29
- 239000000463 material Substances 0.000 abstract description 12
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 abstract description 5
- 229910001634 calcium fluoride Inorganic materials 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000010453 quartz Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 20
- 229910052715 tantalum Inorganic materials 0.000 description 17
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 17
- 229910000449 hafnium oxide Chemical group 0.000 description 13
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical group [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 13
- 239000010410 layer Substances 0.000 description 13
- 238000005286 illumination Methods 0.000 description 11
- 230000003667 anti-reflective effect Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 230000002745 absorbent Effects 0.000 description 6
- 239000002250 absorbent Substances 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical group [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10127225.1 | 2001-05-22 | ||
| DE10127225A DE10127225A1 (de) | 2001-05-22 | 2001-05-22 | Ultraviolettlicht-Abschwächungsfilter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20020089201A true KR20020089201A (ko) | 2002-11-29 |
Family
ID=7687229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020020028424A Ceased KR20020089201A (ko) | 2001-05-22 | 2002-05-22 | 자외선용 감쇠 필터 |
Country Status (5)
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW557368B (en) * | 2001-06-29 | 2003-10-11 | Jsr Corp | Anti-reflection film laminated body and method of manufacturing the laminated body |
| JP4052457B2 (ja) * | 2003-01-29 | 2008-02-27 | 三菱重工業株式会社 | マイクロ波励起水素紫外光ランプ及び該紫外光ランプを用いた光学装置の使用方法 |
| US8241905B2 (en) | 2004-02-24 | 2012-08-14 | The Curators Of The University Of Missouri | Self-assembling cell aggregates and methods of making engineered tissue using the same |
| DE102004011733A1 (de) | 2004-03-04 | 2005-09-22 | Carl Zeiss Smt Ag | Transmissionsfiltervorrichtung |
| US7621646B2 (en) * | 2006-07-05 | 2009-11-24 | Hewlett-Packard Development Company | Curved band-pass filter |
| US10690823B2 (en) | 2007-08-12 | 2020-06-23 | Toyota Motor Corporation | Omnidirectional structural color made from metal and dielectric layers |
| NL1036152A1 (nl) * | 2007-11-13 | 2009-07-01 | Asml Holding Nv | Thin film continuous spatially modulated grey attenuators and filters. |
| NL2002968A1 (nl) * | 2008-06-30 | 2009-12-31 | Asml Netherlands Bv | Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby. |
| US8421995B2 (en) * | 2008-10-24 | 2013-04-16 | Asml Holding N.V. | Anti-reflective coating for optical elements |
| JP5515723B2 (ja) | 2009-02-02 | 2014-06-11 | 株式会社リコー | 光走査装置、画像形成装置および光通信システム |
| RU2560393C2 (ru) | 2010-10-21 | 2015-08-20 | Органово, Инк. | Устройства, системы и способы изготовления ткани |
| JP2014505996A (ja) * | 2010-11-30 | 2014-03-06 | アプライド マテリアルズ インコーポレイテッド | Uvチャンバ内におけるウエハ処理プロファイルを調節する方法および装置 |
| JP5870540B2 (ja) * | 2011-08-15 | 2016-03-01 | セイコーエプソン株式会社 | 画像記録装置、及び、照射器 |
| HK1200483A1 (en) | 2011-09-12 | 2015-08-07 | 奥加诺沃公司 | Engineered tissues for in vitro research uses, arrays thereof, and methods of making the same |
| DE102011054837A1 (de) | 2011-10-26 | 2013-05-02 | Carl Zeiss Laser Optics Gmbh | Optisches Element |
| WO2013124131A2 (en) * | 2012-02-21 | 2013-08-29 | Asml Netherlands B.V. | Inspection apparatus and method |
| US9499779B2 (en) | 2012-04-20 | 2016-11-22 | Organovo, Inc. | Devices, systems, and methods for the fabrication of tissue utilizing UV cross-linking |
| US9442105B2 (en) | 2013-03-15 | 2016-09-13 | Organovo, Inc. | Engineered liver tissues, arrays thereof, and methods of making the same |
| SG11201600770RA (en) | 2013-07-31 | 2016-02-26 | Organovo Inc | Automated devices, systems, and methods for the fabrication of tissue |
| DE102013021513B4 (de) * | 2013-12-18 | 2017-07-13 | Jenoptik Optical Systems Gmbh | Optisches Modul zur Optimierung einer Intensitätsverteilung von Strahlung einer ersten Wellenlänge und zum Transmittieren von Strahlung einer zweiten Wellenlänge |
| WO2015153043A1 (en) | 2014-04-01 | 2015-10-08 | Toyota Motor Engineering & Manufacturing North America, Inc. | Non-color shifting multilayer structures |
| EP3126490B1 (en) | 2014-04-04 | 2020-09-30 | Organovo, Inc. | Engineered three-dimensional breast tissue, adipose tissue, and tumor disease model |
| JP2017529877A (ja) | 2014-10-06 | 2017-10-12 | オルガノボ インコーポレイテッド | 人工の腎臓組織、そのアレイ、およびその作製方法 |
| US11529436B2 (en) | 2014-11-05 | 2022-12-20 | Organovo, Inc. | Engineered three-dimensional skin tissues, arrays thereof, and methods of making the same |
| NL2016732A (en) * | 2015-06-02 | 2016-12-12 | Asml Netherlands Bv | A filter, method of formation thereof, and an image sensor |
| DE102016110314A1 (de) * | 2015-07-07 | 2017-01-12 | Toyota Motor Engineering & Manufacturing North America, Inc. | Omnidirektionale rote strukturelle farbe hoher chroma mit kombination aus halbleiterabsorber- und dielektrischen absorberschichten |
| WO2017083402A1 (en) | 2015-11-09 | 2017-05-18 | Organovo, Inc. | Improved methods for tissue fabrication |
| DE102016205619A1 (de) * | 2016-04-05 | 2017-10-05 | Carl Zeiss Smt Gmbh | Abschwächungsfilter für Projektionsobjektiv, Projektionsobjektiv mit Abschwächungsfilter für Projektionsbelichtungsanlage und Projektionsbelichtungsanlage mit Projektionsobjektiv |
| DE102017214249A1 (de) | 2017-08-16 | 2019-02-21 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Laserbearbeitungskopf mit einem optischen Element zum Herausfiltern von UV-Prozessstrahlung und zugehöriges Laserbearbeitungsverfahren |
| JP2019049633A (ja) * | 2017-09-08 | 2019-03-28 | 東芝メモリ株式会社 | マスク製造方法及びマスクセット |
| CN112666102B (zh) * | 2019-10-15 | 2024-10-22 | 中国科学院大连化学物理研究所 | 一种基于气体吸收的真空紫外光衰减装置及其衰减方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10186102A (ja) * | 1996-12-26 | 1998-07-14 | Yazaki Corp | 反射防止膜 |
| KR20010020931A (ko) * | 1999-08-30 | 2001-03-15 | 가지카와 히로시 | 광필터용 유리 및 광필터 |
| KR20020006388A (ko) * | 2000-07-12 | 2002-01-19 | 박호군 | 두께에 따라 빔의 세기 분포 조절이 용이한 연속 중성밀도필터 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2675740A (en) * | 1954-04-20 | Glare preventing device and method | ||
| DE975553C (de) * | 1948-10-02 | 1962-01-11 | Heraeus Gmbh W C | Optisches Filter |
| DE1157002B (de) * | 1957-08-08 | 1963-11-07 | Balzers Vakuum Ges Mit Beschra | Im sichtbaren Spektralgebiet farbstichfreies UV-Absorptionsfilter |
| LU50238A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1966-01-11 | 1967-07-11 | ||
| DE3009533C2 (de) * | 1980-03-12 | 1986-11-06 | D. Swarovski & Co., Wattens, Tirol | Belag mit mittlerem Brechwert, Verfahren zu dessen Herstellung und Verwendung des Belages |
| FR2566542B1 (fr) * | 1984-06-22 | 1988-01-15 | Videocolor | Procede de fabrication de filtre a coefficient de transmission de la lumiere variable sur sa surface |
| JPS63243726A (ja) | 1987-03-30 | 1988-10-11 | Shimadzu Corp | フオトダイオ−ドアレイ検出器 |
| US5201926A (en) * | 1987-08-08 | 1993-04-13 | Leybold Aktiengesellschaft | Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation |
| US4975328A (en) * | 1987-09-22 | 1990-12-04 | Hoya Corporation | Process for producing polyurethane lens |
| US5181141A (en) * | 1989-03-31 | 1993-01-19 | Hoya Corporation | Anti-reflection optical element |
| US5144498A (en) * | 1990-02-14 | 1992-09-01 | Hewlett-Packard Company | Variable wavelength light filter and sensor system |
| JP3446835B2 (ja) * | 1991-03-27 | 2003-09-16 | Hoya株式会社 | ガラス光学素子用プレス成形型 |
| DE69208712T2 (de) * | 1991-04-19 | 1996-10-17 | Fuji Photo Film Co Ltd | Vorläufer für eine Flachdruckplatte des Direktbildtyps |
| CH695281A5 (de) * | 1993-04-02 | 2006-02-28 | Balzers Hochvakuum | Verfahren zur Herstellung eines Filters, danach hergestellte optische Schicht, optisches Bauelement mit einer derartigen Schicht und Braeunungsanlage mit einem solchen Element. |
| JPH0720312A (ja) | 1993-06-30 | 1995-01-24 | Ushio Inc | 光学フィルター |
| DE4407502A1 (de) * | 1994-03-07 | 1995-09-14 | Leybold Ag | Mehrlagige Beschichtung |
| US5694240A (en) * | 1994-06-24 | 1997-12-02 | Bausch & Lomb Incorporated | Multilayer anti-reflective and ultraviolet blocking coating for sunglasses |
| US6342312B2 (en) * | 1996-03-22 | 2002-01-29 | Canon Kabushiki Kaisha | Calcium fluoride crystal, optical article and exposure apparatus for photo-lithography using the same |
| FR2759360B1 (fr) * | 1997-02-10 | 1999-03-05 | Commissariat Energie Atomique | Materiau polymerique inorganique a base d'oxyde de tantale notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication et materiau optique comprenant ce materiau |
| AU7451600A (en) * | 1999-09-30 | 2001-04-30 | Nikon Corporation | Optical device with multilayer thin film and aligner with the device |
| US6587288B2 (en) * | 2001-03-12 | 2003-07-01 | Optical Coating Laboratory, Inc. | Optical attenuation filter |
| DE10116339B4 (de) * | 2001-04-02 | 2005-05-12 | Danfoss Drives A/S | Verfahren zum Betreiben einer Zentrifugalpumpe |
-
2001
- 2001-05-22 DE DE10127225A patent/DE10127225A1/de not_active Withdrawn
-
2002
- 2002-05-17 DE DE50207537T patent/DE50207537D1/de not_active Expired - Fee Related
- 2002-05-17 JP JP2002143012A patent/JP2003050311A/ja active Pending
- 2002-05-17 EP EP02011010A patent/EP1260835B1/de not_active Expired - Lifetime
- 2002-05-22 KR KR1020020028424A patent/KR20020089201A/ko not_active Ceased
- 2002-05-22 US US10/151,892 patent/US20020191310A1/en not_active Abandoned
-
2004
- 2004-11-29 US US10/998,050 patent/US7196842B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10186102A (ja) * | 1996-12-26 | 1998-07-14 | Yazaki Corp | 反射防止膜 |
| KR20010020931A (ko) * | 1999-08-30 | 2001-03-15 | 가지카와 히로시 | 광필터용 유리 및 광필터 |
| KR20020006388A (ko) * | 2000-07-12 | 2002-01-19 | 박호군 | 두께에 따라 빔의 세기 분포 조절이 용이한 연속 중성밀도필터 |
Also Published As
| Publication number | Publication date |
|---|---|
| US7196842B2 (en) | 2007-03-27 |
| DE10127225A1 (de) | 2002-11-28 |
| EP1260835B1 (de) | 2006-07-19 |
| US20050179996A1 (en) | 2005-08-18 |
| DE50207537D1 (de) | 2006-08-31 |
| JP2003050311A (ja) | 2003-02-21 |
| EP1260835A2 (de) | 2002-11-27 |
| US20020191310A1 (en) | 2002-12-19 |
| EP1260835A3 (de) | 2003-11-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20020089201A (ko) | 자외선용 감쇠 필터 | |
| KR101248328B1 (ko) | 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 | |
| EP1675164B2 (en) | Multilayer film reflection mirror, production method for multilayer film reflection mirror, and exposure system | |
| JP4320970B2 (ja) | 多層膜反射鏡の製造方法 | |
| US20090059189A1 (en) | Pellicle for use in a microlithographic exposure apparatus | |
| US6697194B2 (en) | Antireflection coating for ultraviolet light at large angles of incidence | |
| US11385536B2 (en) | EUV mask blanks and methods of manufacture | |
| US6946199B2 (en) | Optical, additional films and optical elements | |
| KR101918768B1 (ko) | 하프늄 산화물 또는 지르코늄 산화물 코팅 | |
| EP2068325B1 (en) | Optical element for X-ray | |
| JPH077124B2 (ja) | 反射防止膜 | |
| JPH04310899A (ja) | 多層膜反射鏡および該多層膜反射鏡を有する光学装置 | |
| JP2004069865A (ja) | 多層膜光フィルタ及びその製造方法とそれを用いる光学部品 | |
| HK1099603B (en) | Multilayer film reflection mirror, production method for multilayer film reflection mirror, and exposure system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20020522 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20070419 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20020522 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20080723 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20080930 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20080723 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |