KR20020053427A - 세정 장치 - Google Patents
세정 장치 Download PDFInfo
- Publication number
- KR20020053427A KR20020053427A KR1020000083063A KR20000083063A KR20020053427A KR 20020053427 A KR20020053427 A KR 20020053427A KR 1020000083063 A KR1020000083063 A KR 1020000083063A KR 20000083063 A KR20000083063 A KR 20000083063A KR 20020053427 A KR20020053427 A KR 20020053427A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- roll brush
- cleaning
- roll
- cleaning apparatus
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims 1
- 238000011109 contamination Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 3
- 238000005202 decontamination Methods 0.000 description 2
- 230000003588 decontaminative effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- B08B1/32—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Abstract
Description
Claims (4)
- 기판을 세정하는 세정 장치에 있어서,상기 기판의 상측과 하측에 각각 적어도 하나 이상 설치된 롤 브러시;상기 롤 브러시에 연결되어 상기 롤 브러시를 회전 및 진동시켜 주는 구동모터를 포함하여 구성되는 것을 특징으로 하는 세정 장치.
- 제 1 항에 있어서, 상기 세정 장치는상기 기판을 향해 세정수를 분사시켜 주는 파이프 샤워;상기 기판을 이동시켜 주는 롤러를 더 포함하여 구성되는 것을 특징으로 하는 세정 장치.
- 제 1 항에 있어서, 상기 롤 브러시의 진동방향은 서로 무관한 것을 특징으로 하는 세정 장치.
- 제 1 항에 있어서, 상기 롤 블러시의 표결이 어느 한쪽으로 치우치지 않는 것을 특징으로 하는 세정 장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000083063A KR100720437B1 (ko) | 2000-12-27 | 2000-12-27 | 세정 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000083063A KR100720437B1 (ko) | 2000-12-27 | 2000-12-27 | 세정 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020053427A true KR20020053427A (ko) | 2002-07-05 |
KR100720437B1 KR100720437B1 (ko) | 2007-05-22 |
Family
ID=27686802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020000083063A KR100720437B1 (ko) | 2000-12-27 | 2000-12-27 | 세정 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100720437B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100636709B1 (ko) * | 2004-10-01 | 2006-10-19 | 주식회사 신안에스엔피 | 로터리식 세정기 |
KR100753566B1 (ko) * | 2001-05-28 | 2007-08-30 | 엘지.필립스 엘시디 주식회사 | 엘시디 패널 세정장비의 브러싱장치 |
CN112978365A (zh) * | 2021-05-13 | 2021-06-18 | 新乡职业技术学院 | 一种用于物流运输的货物自动抓取提升装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100923531B1 (ko) | 2008-03-19 | 2009-10-27 | (주)와이티에스 | 디스플레이 패널 세정롤러유닛 요동장치 |
KR100903175B1 (ko) * | 2008-09-22 | 2009-06-17 | 주식회사 에이유테크 | 복수 개의 세정휠이 구비된 디스플레이용 패널세정장치 |
KR101056528B1 (ko) * | 2008-11-06 | 2011-08-11 | 엠.씨.케이 (주) | Lcd 패널용 세정장치 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH076987A (ja) * | 1993-06-15 | 1995-01-10 | Toshiba Corp | 洗浄装置 |
JPH081103A (ja) * | 1994-06-20 | 1996-01-09 | Shimada Phys & Chem Ind Co Ltd | 板状体の洗浄装置 |
US5937469A (en) * | 1996-12-03 | 1999-08-17 | Intel Corporation | Apparatus for mechanically cleaning the edges of wafers |
JP2998687B2 (ja) * | 1997-03-14 | 2000-01-11 | 日本電気株式会社 | ブラシスクラブ装置 |
JP3343503B2 (ja) * | 1997-12-12 | 2002-11-11 | 東京エレクトロン株式会社 | 洗浄装置 |
-
2000
- 2000-12-27 KR KR1020000083063A patent/KR100720437B1/ko not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100753566B1 (ko) * | 2001-05-28 | 2007-08-30 | 엘지.필립스 엘시디 주식회사 | 엘시디 패널 세정장비의 브러싱장치 |
KR100636709B1 (ko) * | 2004-10-01 | 2006-10-19 | 주식회사 신안에스엔피 | 로터리식 세정기 |
CN112978365A (zh) * | 2021-05-13 | 2021-06-18 | 新乡职业技术学院 | 一种用于物流运输的货物自动抓取提升装置 |
Also Published As
Publication number | Publication date |
---|---|
KR100720437B1 (ko) | 2007-05-22 |
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