KR20020032935A - 액상반응원료 운반시스템 - Google Patents
액상반응원료 운반시스템 Download PDFInfo
- Publication number
- KR20020032935A KR20020032935A KR1020000063712A KR20000063712A KR20020032935A KR 20020032935 A KR20020032935 A KR 20020032935A KR 1020000063712 A KR1020000063712 A KR 1020000063712A KR 20000063712 A KR20000063712 A KR 20000063712A KR 20020032935 A KR20020032935 A KR 20020032935A
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45512—Premixing before introduction in the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S261/00—Gas and liquid contact apparatus
- Y10S261/65—Vaporizers
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Ar(Ba/Sr 운반기체) | Ar(Ti 운반기체) | Ba/Sr전구체 | Ti전구체 | O2(별도로 반응기에 공급) | 기판온도 | 증착시간 | 반응기압력 |
300sccm | 300sccm | 0.2mg/min | 0.05mg/min | 200sccm | 420℃ | 700초 | 2torr |
Claims (4)
- 반도체소자를 제조하기 위한 화학기상증착공정에서 액상의 반응원료를 기화시켜 반응기 내로 공급하는 액상반응원료 운반시스템에 있어서,액상의 반응원료가 저장되는 복수개의 반응원료 저장조와;상기 반응원료 저장조에 각각 연결되도록 설치되어 상기 반응원료 저장조에서 공급되어 오는 상기 액상 반응원료를 각각 기화시키는 기화기와;상기 기화기에 각각 연결되는 반응원료 공급관과;상기 반응원료 공급관에 각각 연결되는 복수개의 유체흐름관이 자신의 밑면과 윗면을 관통하도록 형성되며 자신의 윗면 외주부에는 플랜지가 마련되는 벌크형 하부몸체와, 단차를 가지면서 직경이 밑면으로부터 점점 감소되는 축경부가 자신의 밑면과 윗면을 관통하도록 형성되며 상기 유체흐름관을 통하여 상기 하부몸체의 윗면으로 유출되는 기체원료가 외부로 유출됨이 없이 상기 축경부로 흘러들어가도록 자신의 밑면 외주부에는 플랜지가 마련되어 상기 상부몸체의 플랜지와 플랜지 결합하는 벌크형 상부몸체와, 상기 유체흐름관 및 상기 축경부를 가열하기 위하여 상기 상부몸체 및 상기 하부몸체의 둘레에 설치되는 히터를 포함하여 상기 액체원료 공급관을 통하여 자신에게 유입되는 기체원료를 응축없이 상기 축경부를 통하여 상기 반응기로 공급하는 기체 믹싱 포트를 구비하는 것을 특징으로 하는 액상반응원료 운반시스템.
- 제1항에 있어서, 상기 저장조가 두 개이며, 그 중 하나에는 Ba(METHD)2와 Sr(METHD)2가 솔벤트에 용해되어 형성된 Ba/Sr 전구체가 저장되고, 다른 하나에는 Ti(MPD)(THD)2가 솔벤트에 용해되어 형성된 Ti 전구체가 저장되는 것을 특징으로 하는 액상반응원료 운반시스템.
- 제2항에 있어서, 상기 솔벤트가 메탄올, THF 또는 부틸아세테이트인 것을 특징으로 하는 액상반응원료 운반시스템.
- 제2항에 있어서, 상기 Ba : Sr : Ti 비가 0.03~0.06 : 0.02~0.06 : 0.1~0.4 인 것을 특징으로 하는 액상반응원료 운반시스템.
Priority Applications (1)
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KR1020000063712A KR100756626B1 (ko) | 2000-10-28 | 2000-10-28 | 기체 믹싱 포트 및 이를 이용한 액상반응원료 운반시스템 |
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KR1020000063712A KR100756626B1 (ko) | 2000-10-28 | 2000-10-28 | 기체 믹싱 포트 및 이를 이용한 액상반응원료 운반시스템 |
Publications (2)
Publication Number | Publication Date |
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KR20020032935A true KR20020032935A (ko) | 2002-05-04 |
KR100756626B1 KR100756626B1 (ko) | 2007-09-07 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101334057B1 (ko) * | 2012-08-23 | 2013-11-29 | 한국에너지기술연구원 | 동시기화법을 이용한 다중성분 금속-하이브리드 나노 복합체의 제조방법 및 이에 의해 제조된 다중성분 금속-하이브리드 나노 복합체 |
KR101492102B1 (ko) * | 2013-05-02 | 2015-02-10 | 한국에너지기술연구원 | 연료전지용 합금 촉매 제조방법 및 이에 따라 제조된 연료전지용 합금 촉매 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57114659A (en) * | 1980-12-29 | 1982-07-16 | Seiko Epson Corp | Vacuum cvd device |
JPH11150284A (ja) * | 1997-11-19 | 1999-06-02 | Tdk Corp | 多結晶シリコン薄膜の製造方法 |
KR100273261B1 (ko) * | 1997-12-26 | 2000-12-15 | 김영환 | 반도체 화학기상증착장비의 가스혼합장치 |
-
2000
- 2000-10-28 KR KR1020000063712A patent/KR100756626B1/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101334057B1 (ko) * | 2012-08-23 | 2013-11-29 | 한국에너지기술연구원 | 동시기화법을 이용한 다중성분 금속-하이브리드 나노 복합체의 제조방법 및 이에 의해 제조된 다중성분 금속-하이브리드 나노 복합체 |
US9114387B2 (en) | 2012-08-23 | 2015-08-25 | Korea Institute Of Energy Research | Method of preparing multicomponent metal-hybrid co-gasification, and multicomponent metal-hybrid nanocomposite prepared thereby |
KR101492102B1 (ko) * | 2013-05-02 | 2015-02-10 | 한국에너지기술연구원 | 연료전지용 합금 촉매 제조방법 및 이에 따라 제조된 연료전지용 합금 촉매 |
US9806347B2 (en) | 2013-05-02 | 2017-10-31 | Korea Institute Of Energy Research | Method of preparing alloy catalyst for fuel cells and alloy catalyst for fuel cells prepared by the same |
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KR100756626B1 (ko) | 2007-09-07 |
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