KR20010077963A - 가스 레이저 장치 - Google Patents
가스 레이저 장치 Download PDFInfo
- Publication number
- KR20010077963A KR20010077963A KR1020010000387A KR20010000387A KR20010077963A KR 20010077963 A KR20010077963 A KR 20010077963A KR 1020010000387 A KR1020010000387 A KR 1020010000387A KR 20010000387 A KR20010000387 A KR 20010000387A KR 20010077963 A KR20010077963 A KR 20010077963A
- Authority
- KR
- South Korea
- Prior art keywords
- gas
- fan
- laser
- laser device
- chamber
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
Claims (4)
- 레이저 가스가 봉입되는 레이저 챔버와, 이 챔버내에 배치된 소정 간격만큼 이간하여 대향된 한쌍의 주 방전 전극과, 이 챔버내에서 레이저 가스를 적어도 주 방전 전극사이를 흐르는 순환류로 하기 위한 크로스 플로우 팬과, 이 크로스 플로우 팬을 회전 지지하는 베어링 구조로 이루어지고, 반복 주파수가 4kHz 이상인 가스 레이저 장치에 있어서,상기 크로스 플로우 팬의 직경은 150mm 이하이고, 주속도가 25.0m/s 이상인 것 특징으로 하는 가스 레이저 장치.
- 제1항에 있어서, 상기 크로스 플로우 팬의 주속도가 27.0m/s 이상인 것을 특징으로 하는 가스 레이저 장치.
- 제1항에 있어서, 상기 베어링 구조는 회전 베어링으로 이루어지고, 회전수 4500rpm 이하인 것을 특징으로 하는 가스 레이저 장치.
- 제1항에 있어서, 상기 베어링 구조는 자기 베어링으로 이루어지고, 회전수 5000rpm 이하인 것을 특징으로 하는 가스 레이저 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-030748 | 2000-02-08 | ||
JP2000030748A JP3389912B2 (ja) | 2000-02-08 | 2000-02-08 | ガスレーザ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010077963A true KR20010077963A (ko) | 2001-08-20 |
KR100505083B1 KR100505083B1 (ko) | 2005-07-29 |
Family
ID=18555725
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0000387A KR100505083B1 (ko) | 2000-02-08 | 2001-01-04 | 가스 레이저 장치 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6804286B2 (ko) |
EP (1) | EP1124293B1 (ko) |
JP (1) | JP3389912B2 (ko) |
KR (1) | KR100505083B1 (ko) |
DE (1) | DE60140392D1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002026429A (ja) * | 2000-07-03 | 2002-01-25 | Nidek Co Ltd | ガスレーザ装置 |
FR2904820B1 (fr) * | 2006-08-08 | 2010-12-31 | Air Liquide | Unite de production et de traitement d'un gaz de synthese comprenant un reformeur a la vapeur |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5029177A (en) * | 1988-01-15 | 1991-07-02 | Cymer Laser Technologies | Compact excimer laser |
US4959840A (en) * | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
US5033055A (en) * | 1988-01-15 | 1991-07-16 | Cymer Laser Technologies | Compact excimer laser |
DE3813421A1 (de) | 1988-04-21 | 1989-11-02 | Philips Patentverwaltung | Hochdruck-quecksilberdampfentladungslampe |
US5497049A (en) | 1992-06-23 | 1996-03-05 | U.S. Philips Corporation | High pressure mercury discharge lamp |
KR0120729Y1 (ko) * | 1995-08-18 | 1998-08-01 | 김광호 | 공기조화기용 팬 |
US5771258A (en) | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US6330261B1 (en) * | 1997-07-18 | 2001-12-11 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
US6018537A (en) * | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
US6317447B1 (en) * | 2000-01-25 | 2001-11-13 | Cymer, Inc. | Electric discharge laser with acoustic chirp correction |
US5870420A (en) * | 1997-08-18 | 1999-02-09 | Cymer, Inc. | Cross-flow blower with braces |
US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
JP2000138404A (ja) * | 1998-10-29 | 2000-05-16 | Komatsu Ltd | エキシマレーザ装置用の貫流ファン |
US6026103A (en) * | 1999-04-13 | 2000-02-15 | Cymer, Inc. | Gas discharge laser with roller bearings and stable magnetic axial positioning |
EP1119082A3 (en) | 2000-01-18 | 2004-05-26 | Ushiodenki Kabushiki Kaisha | Cross-flow fan for discharge excited gas laser |
JP2001274486A (ja) * | 2000-01-18 | 2001-10-05 | Ushio Inc | 放電励起ガスレーザ装置用クロスフローファン |
JP3327895B2 (ja) | 2000-04-28 | 2002-09-24 | 松下電器産業株式会社 | 高圧放電ランプ、当該ランプの製造方法および当該ランプの点灯方法並びに点灯装置 |
-
2000
- 2000-02-08 JP JP2000030748A patent/JP3389912B2/ja not_active Expired - Lifetime
-
2001
- 2001-01-04 KR KR10-2001-0000387A patent/KR100505083B1/ko active IP Right Grant
- 2001-02-03 EP EP01102472A patent/EP1124293B1/en not_active Expired - Lifetime
- 2001-02-03 DE DE60140392T patent/DE60140392D1/de not_active Expired - Lifetime
- 2001-02-08 US US09/778,897 patent/US6804286B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1124293B1 (en) | 2009-11-11 |
DE60140392D1 (de) | 2009-12-24 |
EP1124293A2 (en) | 2001-08-16 |
US20010012310A1 (en) | 2001-08-09 |
JP3389912B2 (ja) | 2003-03-24 |
KR100505083B1 (ko) | 2005-07-29 |
EP1124293A3 (en) | 2004-06-02 |
JP2001223415A (ja) | 2001-08-17 |
US6804286B2 (en) | 2004-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5771258A (en) | Aerodynamic chamber design for high pulse repetition rate excimer lasers | |
JP2001274488A (ja) | 注入シード方式f2リソグラフィレーザ | |
JP3930704B2 (ja) | スパッタ空洞及び放電ピークを持つ電極を備える放電レーザ | |
KR100505083B1 (ko) | 가스 레이저 장치 | |
KR20010049332A (ko) | 적색 가시광 및 ir 제어부를 구비한 f2 레이저 | |
KR20010076310A (ko) | 방전 여기 가스 레이저 장치용 크로스 플로우 팬 | |
JP3171899B2 (ja) | ガスレーザ装置 | |
JPS63108786A (ja) | ガスレ−ザ発生装置 | |
JP2006054270A (ja) | 極紫外光発生装置 | |
US20220376455A1 (en) | Laser device and electronic device manufacturing method | |
Rebhan et al. | Excimer lasers: current status and future developments | |
JP2001267663A (ja) | 放電励起ガスレーザ装置 | |
JP2001274486A (ja) | 放電励起ガスレーザ装置用クロスフローファン | |
JPS60115280A (ja) | 気体レ−ザ発振器 | |
JP2504271B2 (ja) | レ―ザ発振装置 | |
JP3792446B2 (ja) | 炭酸ガスレーザ発振装置 | |
JP2002076489A (ja) | フッ素レーザ装置及びこれを用いた露光装置 | |
JPH04246873A (ja) | ガスレーザ装置 | |
JP2010212559A (ja) | ガスレーザ発振装置 | |
JPH0344082A (ja) | レーザ用ターボブロア及びそれを用いたレーザ発振装置 | |
WO2003023914A1 (fr) | Oscillateur laser f2 a excitation a direction axiale faible pression | |
JPH04137777A (ja) | 放電励起エキシマレーザ装置 | |
JPH03129888A (ja) | ガスレーザ装置 | |
Takagi et al. | 5 kHz high repetition rate excimer laser | |
JPH0423377A (ja) | ガスレーザ装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
N231 | Notification of change of applicant | ||
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120629 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20130705 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20150618 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20160616 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20170616 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20190617 Year of fee payment: 15 |