KR20010051744A - 하전 입자 빔 노광 장치 및 방법 - Google Patents

하전 입자 빔 노광 장치 및 방법 Download PDF

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Publication number
KR20010051744A
KR20010051744A KR1020000068226A KR20000068226A KR20010051744A KR 20010051744 A KR20010051744 A KR 20010051744A KR 1020000068226 A KR1020000068226 A KR 1020000068226A KR 20000068226 A KR20000068226 A KR 20000068226A KR 20010051744 A KR20010051744 A KR 20010051744A
Authority
KR
South Korea
Prior art keywords
ozone
vacuum chamber
chamber
vacuum
charged particle
Prior art date
Application number
KR1020000068226A
Other languages
English (en)
Korean (ko)
Inventor
카즈토 아시하라
요시히사 오아에
Original Assignee
히로시 오우라
주식회사 아도반테스토
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 히로시 오우라, 주식회사 아도반테스토 filed Critical 히로시 오우라
Publication of KR20010051744A publication Critical patent/KR20010051744A/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020000068226A 1999-11-19 2000-11-16 하전 입자 빔 노광 장치 및 방법 KR20010051744A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11-330211 1999-11-19
JP33021199A JP2001148340A (ja) 1999-11-19 1999-11-19 荷電粒子ビーム露光方法及び装置

Publications (1)

Publication Number Publication Date
KR20010051744A true KR20010051744A (ko) 2001-06-25

Family

ID=18230097

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000068226A KR20010051744A (ko) 1999-11-19 2000-11-16 하전 입자 빔 노광 장치 및 방법

Country Status (5)

Country Link
JP (1) JP2001148340A (zh)
KR (1) KR20010051744A (zh)
DE (1) DE10057079C2 (zh)
GB (1) GB2358955B (zh)
TW (1) TW476979B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170069969A (ko) * 2014-09-19 2017-06-21 가부시키가이샤 뉴플레어 테크놀로지 오존 공급 장치, 오존 공급 방법, 및 하전 입자빔 묘화 시스템

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2267535A1 (en) * 2003-11-05 2010-12-29 ASML Netherlands BV Lithographic apparatus and device manufacturing method
US8013300B2 (en) 2008-06-20 2011-09-06 Carl Zeiss Nts, Llc Sample decontamination
DE102008049655A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Nts Gmbh Partikelstrahlsystem und Verfahren zum Betreiben desselben
US9123507B2 (en) * 2012-03-20 2015-09-01 Mapper Lithography Ip B.V. Arrangement and method for transporting radicals
US9327324B2 (en) 2013-02-26 2016-05-03 Applied Materials Israel Ltd. Method and system for cleaning a vacuum chamber
JP2016201316A (ja) * 2015-04-13 2016-12-01 株式会社Ｐａｒａｍ 真空システム
DE102015211090A1 (de) 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Korpuskularstrahlgerät und Verfahren zum Betreiben eines Korpuskularstrahlgeräts
US9981293B2 (en) 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems
DE102020111151B4 (de) * 2020-04-23 2023-10-05 Carl Zeiss Microscopy Gmbh Verfahren zum Belüften und Abpumpen einer Vakuumkammer eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens
US20240321543A1 (en) * 2021-07-01 2024-09-26 Hitachi High-Tech Corporation Charged Particle Beam Device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05109610A (ja) * 1991-10-14 1993-04-30 Nippon Telegr & Teleph Corp <Ntt> 電子ビーム露光装置及びその装置による微細パターン形成法
JPH05144716A (ja) * 1991-07-04 1993-06-11 Toshiba Corp 荷電ビーム照射装置及び方法
JPH10289853A (ja) * 1997-04-15 1998-10-27 Canon Inc 露光方法
JPH1140478A (ja) * 1997-07-18 1999-02-12 Nikon Corp 電子線投影露光装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2405553A (en) * 1941-06-07 1946-08-13 Donald K Allison Means and method of ozonizing liquids
US5466942A (en) * 1991-07-04 1995-11-14 Kabushiki Kaisha Toshiba Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus
JPH06120321A (ja) * 1992-10-06 1994-04-28 Tokyo Electron Tohoku Ltd 基板ハンドリング装置
JP3568553B2 (ja) * 1993-03-18 2004-09-22 富士通株式会社 荷電粒子ビーム露光装置及びそのクリーニング方法
US5401974A (en) * 1993-03-18 1995-03-28 Fujitsu Limited Charged particle beam exposure apparatus and method of cleaning the same
JP3466744B2 (ja) * 1993-12-29 2003-11-17 株式会社東芝 洗浄機能付き荷電ビーム装置および荷電ビーム装置の洗浄方法
US5681789A (en) * 1996-02-12 1997-10-28 Arco Chemical Technology, L.P. Activation of as-synthesized titanium-containing zeolites
JP3827359B2 (ja) * 1996-03-19 2006-09-27 富士通株式会社 荷電粒子ビーム露光方法及びその装置
JP3923649B2 (ja) * 1997-09-18 2007-06-06 株式会社東芝 荷電粒子ビーム装置用吸着板、荷電粒子ビーム装置用偏向電極及び荷電粒子ビーム装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05144716A (ja) * 1991-07-04 1993-06-11 Toshiba Corp 荷電ビーム照射装置及び方法
JPH05109610A (ja) * 1991-10-14 1993-04-30 Nippon Telegr & Teleph Corp <Ntt> 電子ビーム露光装置及びその装置による微細パターン形成法
JPH10289853A (ja) * 1997-04-15 1998-10-27 Canon Inc 露光方法
JPH1140478A (ja) * 1997-07-18 1999-02-12 Nikon Corp 電子線投影露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170069969A (ko) * 2014-09-19 2017-06-21 가부시키가이샤 뉴플레어 테크놀로지 오존 공급 장치, 오존 공급 방법, 및 하전 입자빔 묘화 시스템

Also Published As

Publication number Publication date
JP2001148340A (ja) 2001-05-29
GB2358955B (en) 2002-01-09
DE10057079C2 (de) 2003-04-24
TW476979B (en) 2002-02-21
GB0027160D0 (en) 2000-12-27
GB2358955A (en) 2001-08-08
DE10057079A1 (de) 2001-05-31

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