GB2358955B - Charged particle beam exposure apparatus and method - Google Patents

Charged particle beam exposure apparatus and method

Info

Publication number
GB2358955B
GB2358955B GB0027160A GB0027160A GB2358955B GB 2358955 B GB2358955 B GB 2358955B GB 0027160 A GB0027160 A GB 0027160A GB 0027160 A GB0027160 A GB 0027160A GB 2358955 B GB2358955 B GB 2358955B
Authority
GB
United Kingdom
Prior art keywords
exposure apparatus
charged particle
particle beam
beam exposure
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0027160A
Other versions
GB2358955A (en
GB0027160D0 (en
Inventor
Kazuto Ashihara
Yoshihisa Ooae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of GB0027160D0 publication Critical patent/GB0027160D0/en
Publication of GB2358955A publication Critical patent/GB2358955A/en
Application granted granted Critical
Publication of GB2358955B publication Critical patent/GB2358955B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
GB0027160A 1999-11-19 2000-11-07 Charged particle beam exposure apparatus and method Expired - Fee Related GB2358955B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33021199A JP2001148340A (en) 1999-11-19 1999-11-19 Method and apparatus for aligning with charged particle beam

Publications (3)

Publication Number Publication Date
GB0027160D0 GB0027160D0 (en) 2000-12-27
GB2358955A GB2358955A (en) 2001-08-08
GB2358955B true GB2358955B (en) 2002-01-09

Family

ID=18230097

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0027160A Expired - Fee Related GB2358955B (en) 1999-11-19 2000-11-07 Charged particle beam exposure apparatus and method

Country Status (5)

Country Link
JP (1) JP2001148340A (en)
KR (1) KR20010051744A (en)
DE (1) DE10057079C2 (en)
GB (1) GB2358955B (en)
TW (1) TW476979B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1530089B1 (en) * 2003-11-05 2011-04-06 ASML Netherlands B.V. Lithographic apparatus and method for clamping an article
US8013300B2 (en) 2008-06-20 2011-09-06 Carl Zeiss Nts, Llc Sample decontamination
DE102008049655A1 (en) 2008-09-30 2010-04-08 Carl Zeiss Nts Gmbh Particle beam system e.g. transmission electron microscope, in semiconductor industry, has source and particle beam formation elements formed for producing electron beam and arranged together with gas supply system in inner chamber
CN104321701B (en) * 2012-03-20 2017-04-12 迈普尔平版印刷Ip有限公司 Arrangement and method for transporting radicals
US9327324B2 (en) 2013-02-26 2016-05-03 Applied Materials Israel Ltd. Method and system for cleaning a vacuum chamber
TWI598924B (en) * 2014-09-19 2017-09-11 Nuflare Technology Inc Ozone supply device, ozone supply method, and charged particle beam drawing device
JP2016201316A (en) * 2015-04-13 2016-12-01 株式会社Ｐａｒａｍ Vacuum system
DE102015211090A1 (en) * 2015-06-17 2016-12-22 Vistec Electron Beam Gmbh Particle beam device and method for operating a particle beam device
US9981293B2 (en) 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems
DE102020111151B4 (en) * 2020-04-23 2023-10-05 Carl Zeiss Microscopy Gmbh Method for ventilating and pumping out a vacuum chamber of a particle beam device, computer program product and particle beam device for carrying out the method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401974A (en) * 1993-03-18 1995-03-28 Fujitsu Limited Charged particle beam exposure apparatus and method of cleaning the same
EP0797236A2 (en) * 1996-03-19 1997-09-24 Fujitsu Limited A charged particle beam exposure method and an apparatus therefor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2405553A (en) * 1941-06-07 1946-08-13 Donald K Allison Means and method of ozonizing liquids
US5466942A (en) * 1991-07-04 1995-11-14 Kabushiki Kaisha Toshiba Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus
JP3253675B2 (en) * 1991-07-04 2002-02-04 株式会社東芝 Charged beam irradiation apparatus and method
JPH05109610A (en) * 1991-10-14 1993-04-30 Nippon Telegr & Teleph Corp <Ntt> Electron-beam aligner and formation method of fine pattern using the aligner
JPH06120321A (en) * 1992-10-06 1994-04-28 Tokyo Electron Tohoku Ltd Substrate handling device
JP3568553B2 (en) * 1993-03-18 2004-09-22 富士通株式会社 Charged particle beam exposure apparatus and cleaning method thereof
JP3466744B2 (en) * 1993-12-29 2003-11-17 株式会社東芝 Charged beam device with cleaning function and method of cleaning charged beam device
US5681789A (en) * 1996-02-12 1997-10-28 Arco Chemical Technology, L.P. Activation of as-synthesized titanium-containing zeolites
JP4181647B2 (en) * 1997-04-15 2008-11-19 キヤノン株式会社 Exposure method
JPH1140478A (en) * 1997-07-18 1999-02-12 Nikon Corp Electron beam projection aligner
JP3923649B2 (en) * 1997-09-18 2007-06-06 株式会社東芝 Suction plate for charged particle beam device, deflection electrode for charged particle beam device, and charged particle beam device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401974A (en) * 1993-03-18 1995-03-28 Fujitsu Limited Charged particle beam exposure apparatus and method of cleaning the same
EP0797236A2 (en) * 1996-03-19 1997-09-24 Fujitsu Limited A charged particle beam exposure method and an apparatus therefor

Also Published As

Publication number Publication date
GB2358955A (en) 2001-08-08
JP2001148340A (en) 2001-05-29
DE10057079A1 (en) 2001-05-31
KR20010051744A (en) 2001-06-25
TW476979B (en) 2002-02-21
GB0027160D0 (en) 2000-12-27
DE10057079C2 (en) 2003-04-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20041107