KR20010049723A - 조명장치의 하니콤-애스팩트비를 감소시키기 위해서왜상작용을 하는 구성요소 - Google Patents

조명장치의 하니콤-애스팩트비를 감소시키기 위해서왜상작용을 하는 구성요소 Download PDF

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Publication number
KR20010049723A
KR20010049723A KR1020000038498A KR20000038498A KR20010049723A KR 20010049723 A KR20010049723 A KR 20010049723A KR 1020000038498 A KR1020000038498 A KR 1020000038498A KR 20000038498 A KR20000038498 A KR 20000038498A KR 20010049723 A KR20010049723 A KR 20010049723A
Authority
KR
South Korea
Prior art keywords
field
light source
mirror
honeycomb
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020000038498A
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English (en)
Korean (ko)
Inventor
슐쯔외르크
Original Assignee
헨켈 카르스텐
칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 헨켈 카르스텐, 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 filed Critical 헨켈 카르스텐
Publication of KR20010049723A publication Critical patent/KR20010049723A/ko
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
KR1020000038498A 1999-07-09 2000-07-06 조명장치의 하니콤-애스팩트비를 감소시키기 위해서왜상작용을 하는 구성요소 Abandoned KR20010049723A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19931848A DE19931848A1 (de) 1999-07-09 1999-07-09 Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen
DE19931848.4 1999-07-09

Publications (1)

Publication Number Publication Date
KR20010049723A true KR20010049723A (ko) 2001-06-15

Family

ID=7914094

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000038498A Abandoned KR20010049723A (ko) 1999-07-09 2000-07-06 조명장치의 하니콤-애스팩트비를 감소시키기 위해서왜상작용을 하는 구성요소

Country Status (5)

Country Link
US (1) US6507440B1 (https=)
EP (1) EP1067437B1 (https=)
JP (1) JP2001051199A (https=)
KR (1) KR20010049723A (https=)
DE (2) DE19931848A1 (https=)

Families Citing this family (40)

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US20070030948A1 (en) * 1998-05-05 2007-02-08 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
US7126137B2 (en) 1998-05-05 2006-10-24 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
US7006595B2 (en) 1998-05-05 2006-02-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Illumination system particularly for microlithography
US6947120B2 (en) 1998-05-05 2005-09-20 Carl Zeiss Smt Ag Illumination system particularly for microlithography
DE10100265A1 (de) * 2001-01-08 2002-07-11 Zeiss Carl Beleuchtungssystem mit Rasterelementen unterschiedlicher Größe
DE19903807A1 (de) 1998-05-05 1999-11-11 Zeiss Carl Fa Beleuchtungssystem insbesondere für die EUV-Lithographie
US7109497B2 (en) 1998-05-05 2006-09-19 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6947124B2 (en) 1998-05-05 2005-09-20 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7329886B2 (en) 1998-05-05 2008-02-12 Carl Zeiss Smt Ag EUV illumination system having a plurality of light sources for illuminating an optical element
US6858853B2 (en) * 1998-05-05 2005-02-22 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7186983B2 (en) 1998-05-05 2007-03-06 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7142285B2 (en) 1998-05-05 2006-11-28 Carl Zeiss Smt Ag Illumination system particularly for microlithography
DE19935404A1 (de) 1999-07-30 2001-02-01 Zeiss Carl Fa Beleuchtungssystem mit mehreren Lichtquellen
US20050002090A1 (en) * 1998-05-05 2005-01-06 Carl Zeiss Smt Ag EUV illumination system having a folding geometry
USRE41667E1 (en) * 1998-05-05 2010-09-14 Carl Zeiss Smt Ag Illumination system particularly for microlithography
USRE42065E1 (en) 1998-05-05 2011-01-25 Carl Zeiss Smt Ag Illumination system particularly for microlithography
DE102006056035A1 (de) * 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Projektions-Mikrolithographie, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102006059024A1 (de) 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007045396A1 (de) 2007-09-21 2009-04-23 Carl Zeiss Smt Ag Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
DE102008041593A1 (de) * 2007-10-09 2009-04-16 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithographie
EP2243047B1 (en) 2008-02-15 2021-03-31 Carl Zeiss SMT GmbH Facet mirror for use in a projection exposure apparatus for microlithography
EP2182412A1 (en) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Radiation source and lithographic apparatus
DE102009045491A1 (de) 2009-10-08 2010-11-25 Carl Zeiss Smt Ag Beleuchtungsoptik
KR102160046B1 (ko) * 2010-04-02 2020-09-28 가부시키가이샤 니콘 조명 광학계, 노광 방법 및 디바이스 제조 방법
DE102010040811A1 (de) * 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102013204441A1 (de) 2013-03-14 2014-04-03 Carl Zeiss Smt Gmbh Kollektor
DE102013218131A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie
DE102013218128A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungssystem
DE102013218130A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102013218132A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Kollektor
DE102014203187A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102014217608A1 (de) 2014-09-03 2014-11-20 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer zweiten Facette eines im Strahlengang zweiten facettierten Elements einer Beleuchtungsoptik
DE102014223453A1 (de) 2014-11-18 2016-05-19 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithographie
WO2016078818A1 (en) 2014-11-18 2016-05-26 Carl Zeiss Smt Gmbh Optical subsystem for projection lithography and illumination optical unit for projection lithography
DE102015203469A1 (de) 2015-02-26 2015-04-23 Carl Zeiss Smt Gmbh Verfahren zur Erzeugung einer gekrümmten optischen Spiegelfläche
DE102015208514A1 (de) 2015-05-07 2016-11-10 Carl Zeiss Smt Gmbh Facettenspiegel für die EUV-Projektionslithografie sowie Beleuchtungsoptik mit einem derartigen Facettenspiegel
DE102017200663A1 (de) 2017-01-17 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Ausgangs-Kippwinkeln von kippbaren Feldfacetten eines Feldfacettenspiegels für eine Projektionsbelich-tungsanlage für die Projektionslithografie
DE102018201457A1 (de) 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
CN112198768A (zh) * 2020-10-22 2021-01-08 Tcl华星光电技术有限公司 曝光机
DE102021202847A1 (de) * 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie

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Publication number Priority date Publication date Assignee Title
DE68922306T2 (de) * 1988-03-11 1995-11-02 British Tech Group Optische vorrichtungen und methoden für ihre herstellung.
US5222112A (en) 1990-12-27 1993-06-22 Hitachi, Ltd. X-ray pattern masking by a reflective reduction projection optical system
US5581605A (en) 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
US5339346A (en) 1993-05-20 1994-08-16 At&T Bell Laboratories Device fabrication entailing plasma-derived x-ray delineation
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
JP3278277B2 (ja) * 1994-01-26 2002-04-30 キヤノン株式会社 投影露光装置及びこれを用いたデバイス製造方法
US5677939A (en) 1994-02-23 1997-10-14 Nikon Corporation Illuminating apparatus
JP3633002B2 (ja) * 1994-05-09 2005-03-30 株式会社ニコン 照明光学装置、露光装置及び露光方法
DE19651667C2 (de) * 1996-12-12 2003-07-03 Rudolf Groskopf Vorrichtung zur dreidimensionalen Untersuchung eines Objektes
JPH1152289A (ja) 1997-08-05 1999-02-26 Minolta Co Ltd 二次元照明光学系及びこれを用いた液晶プロジェクター
US5844727A (en) * 1997-09-02 1998-12-01 Cymer, Inc. Illumination design for scanning microlithography systems
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6118577A (en) * 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
US6195201B1 (en) 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography

Also Published As

Publication number Publication date
JP2001051199A (ja) 2001-02-23
US6507440B1 (en) 2003-01-14
EP1067437A3 (de) 2005-03-09
DE50014128D1 (de) 2007-04-19
EP1067437A2 (de) 2001-01-10
DE19931848A1 (de) 2001-01-11
EP1067437B1 (de) 2007-03-07

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