KR20010039766A - 적외선 복사와 열에 민감한 조성물 및 그 조성물로 코팅된석판 - Google Patents

적외선 복사와 열에 민감한 조성물 및 그 조성물로 코팅된석판 Download PDF

Info

Publication number
KR20010039766A
KR20010039766A KR1020000043729A KR20000043729A KR20010039766A KR 20010039766 A KR20010039766 A KR 20010039766A KR 1020000043729 A KR1020000043729 A KR 1020000043729A KR 20000043729 A KR20000043729 A KR 20000043729A KR 20010039766 A KR20010039766 A KR 20010039766A
Authority
KR
South Korea
Prior art keywords
titanium
zirconium
acetate
zinc
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020000043729A
Other languages
English (en)
Korean (ko)
Inventor
베르나르디니로베르토
티펜트할레르도메니코
볼리안젤로
Original Assignee
질레티 로베르토
라스트라 에스.피.에이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 질레티 로베르토, 라스트라 에스.피.에이. filed Critical 질레티 로베르토
Publication of KR20010039766A publication Critical patent/KR20010039766A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • C08K5/098—Metal salts of carboxylic acids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0091—Complexes with metal-heteroatom-bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C08K5/057—Metal alcoholates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020000043729A 1999-07-30 2000-07-28 적외선 복사와 열에 민감한 조성물 및 그 조성물로 코팅된석판 Withdrawn KR20010039766A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99830490 1999-07-30
EP99830490.1 1999-07-30

Publications (1)

Publication Number Publication Date
KR20010039766A true KR20010039766A (ko) 2001-05-15

Family

ID=8243526

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000043729A Withdrawn KR20010039766A (ko) 1999-07-30 2000-07-28 적외선 복사와 열에 민감한 조성물 및 그 조성물로 코팅된석판

Country Status (9)

Country Link
US (1) US6620572B1 (enExample)
JP (1) JP2001092126A (enExample)
KR (1) KR20010039766A (enExample)
CN (1) CN1296196A (enExample)
AT (1) ATE242121T1 (enExample)
CA (1) CA2314520A1 (enExample)
DE (1) DE60003120T2 (enExample)
ES (1) ES2200779T3 (enExample)
ZA (1) ZA200003798B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4550306B2 (ja) * 2001-03-26 2010-09-22 コダック株式会社 ポジ型感光性組成物、ポジ型感光性平版印刷版及びそれを用いたポジ画像形成方法
TWI491981B (zh) * 2009-11-04 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP6119544B2 (ja) * 2013-10-04 2017-04-26 信越化学工業株式会社 レジスト材料及びこれを用いたパターン形成方法
CN110293783B (zh) * 2019-06-21 2020-11-10 武汉宇恩防伪技术有限公司 一种水性油墨用版材的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1571447A (en) 1922-10-02 1926-02-02 Carleton Ellis Composition for molding and process of making same
US4122235A (en) 1975-11-24 1978-10-24 Monsanto Company Resole resin binder composition
JPS5877738A (ja) 1981-11-02 1983-05-11 Sumitomo Deyurezu Kk レジンコ−テツドサンド
US4568728A (en) 1984-07-16 1986-02-04 Delta Resins & Refractories Foundry binder with improved breakdown and improved thermal reclamation properties
US5085972A (en) * 1990-11-26 1992-02-04 Minnesota Mining And Manufacturing Company Alkoxyalkyl ester solubility inhibitors for phenolic resins
WO1997039894A1 (en) 1996-04-23 1997-10-30 Horsell Graphic Industries Limited Heat-sensitive composition and method of making a lithographic printing form with it
US6196129B1 (en) * 1996-05-14 2001-03-06 New England Sciences & Specialty Products, Inc. Wet lithographic printing plates
JP3814961B2 (ja) 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
GB9722861D0 (en) * 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Improvements in relation to the manufacture of lithographic printing forms
JP3858374B2 (ja) 1997-09-18 2006-12-13 コニカミノルタホールディングス株式会社 感光性組成物及び画像形成材料
GB9722862D0 (en) * 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
US6358669B1 (en) * 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6284433B1 (en) * 1999-03-26 2001-09-04 Toray Industries, Inc. Method of producing directly imageable waterless planographic printing plate
US6686125B2 (en) * 2000-01-14 2004-02-03 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor

Also Published As

Publication number Publication date
HK1034928A1 (en) 2001-11-09
CN1296196A (zh) 2001-05-23
JP2001092126A (ja) 2001-04-06
ATE242121T1 (de) 2003-06-15
ES2200779T3 (es) 2004-03-16
ZA200003798B (en) 2001-02-07
US6620572B1 (en) 2003-09-16
DE60003120T2 (de) 2004-06-17
DE60003120D1 (de) 2003-07-10
CA2314520A1 (en) 2001-01-30

Similar Documents

Publication Publication Date Title
EP1655317B1 (en) Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate
EP1101607B1 (en) Article having imageable coatings
JP5134015B2 (ja) ポジ型輻射線感光性組成物および要素
CN1078132C (zh) 热敏组合物及用其制造平版印刷版型的方法
JP2002510404A (ja) パターン形成方法および放射線感受性材料
EP1101608B1 (en) Articles having imageable coatings
TW201229174A (en) Methods of processing using silicate-free developer compositions
US6620572B1 (en) Composition sensitive to IR radiation and to heat and lithographic plate coated therewith
EP1725402B1 (en) Thermally sensitive imageable element
EP1072405B1 (en) Composition sensitive to IR radiation and to heat and lithographic plate coated therewith
EP1072404B1 (en) Composition sensitive to IR radiation and to heat and lithographic plate coated with this composition
HK1034928B (en) Composition sensitive to ir radiation and to heat and lithographic plate coated therewith
JP2003211860A (ja) 平版印刷版原板
KR20060114974A (ko) 적외선　및　적외선　써멀에　대해　감광성을　가진　조성물　및　이를　사용한　평판 인쇄판　제조기술
US6500600B1 (en) Composition sensitive to IR radiation and to heat and lithographic plate coated with this composition
JP2005309126A (ja) 直描型水なし平版印刷版原版
EP0996544B1 (en) Pattern formation
JP2000263957A (ja) 直描型水なし平版印刷版原版
JP2008158476A (ja) 直描型水なし平版印刷版原版およびその製造方法
JP2004144946A (ja) ポジ型感光性組成物
JPWO2002011996A1 (ja) 感熱記録型平版印刷版材料、平版印刷版の製版方法およびこの製版方法によって製版された平版印刷版

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20000728

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid