KR20000035913A - 용융 실리카에서 레이저-유도 압축을 결정하는 방법 - Google Patents

용융 실리카에서 레이저-유도 압축을 결정하는 방법 Download PDF

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Publication number
KR20000035913A
KR20000035913A KR1019997001649A KR19997001649A KR20000035913A KR 20000035913 A KR20000035913 A KR 20000035913A KR 1019997001649 A KR1019997001649 A KR 1019997001649A KR 19997001649 A KR19997001649 A KR 19997001649A KR 20000035913 A KR20000035913 A KR 20000035913A
Authority
KR
South Korea
Prior art keywords
fused silica
lens
glass
silica glass
value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019997001649A
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English (en)
Korean (ko)
Inventor
더글라스 씨. 알란
윌리암 알. 포웰
Original Assignee
알프레드 엘. 미첼슨
코닝 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21823466&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR20000035913(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 알프레드 엘. 미첼슨, 코닝 인코포레이티드 filed Critical 알프레드 엘. 미첼슨
Publication of KR20000035913A publication Critical patent/KR20000035913A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/13—Computer control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Thermal Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019997001649A 1996-08-29 1997-08-27 용융 실리카에서 레이저-유도 압축을 결정하는 방법 Withdrawn KR20000035913A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2499596P 1996-08-29 1996-08-29
US60/024,995 1996-08-29

Publications (1)

Publication Number Publication Date
KR20000035913A true KR20000035913A (ko) 2000-06-26

Family

ID=21823466

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1019997001649A Withdrawn KR20000035913A (ko) 1996-08-29 1997-08-27 용융 실리카에서 레이저-유도 압축을 결정하는 방법
KR1019997001594A Withdrawn KR20000035883A (ko) 1996-08-29 1997-08-27 고에너지의 조사하에서 저압축을 갖는 실리카

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1019997001594A Withdrawn KR20000035883A (ko) 1996-08-29 1997-08-27 고에너지의 조사하에서 저압축을 갖는 실리카

Country Status (7)

Country Link
US (2) US6295841B1 (https=)
EP (2) EP0960074B1 (https=)
JP (2) JP2000517284A (https=)
KR (2) KR20000035913A (https=)
DE (2) DE69734675T2 (https=)
RU (1) RU2175647C2 (https=)
WO (2) WO1998008776A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69734675T2 (de) 1996-08-29 2006-06-14 Corning Inc Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz
DE19840525A1 (de) * 1998-09-06 2000-03-09 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Schichten von gleichmäßiger Schichtdicke
KR100824985B1 (ko) * 2001-09-11 2008-04-28 재단법인 포항산업과학연구원 투명 실리카 글래스 제조용 조성물 및 이를 이용한 실리카글래스의 제조 방법
JP2005539245A (ja) * 2002-09-16 2005-12-22 ショット アクチエンゲゼルシャフト 光学素子製造用光学材料の適合性判定方法、同適合性判定装置、及び同光学材料の使用
EP1596424B1 (en) 2003-02-17 2016-11-02 Nikon Corporation Exposure apparatus and method of exposing a pattern
DE10308466A1 (de) * 2003-02-21 2004-09-02 Carl Zeiss Smt Ag Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und Quarzglasmaterial
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
JP2013075827A (ja) * 2005-11-07 2013-04-25 Corning Inc デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
US7934390B2 (en) * 2006-05-17 2011-05-03 Carl Zeiss Smt Gmbh Method for manufacturing a lens of synthetic quartz glass with increased H2 content
EP2467756A1 (en) * 2009-08-18 2012-06-27 Carl Zeiss SMT GmbH Substrates and mirrors for euv microlithography, and methods for producing them
DE102010052685A1 (de) 2010-11-26 2012-05-31 J-Fiber Gmbh Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper
RU2594184C1 (ru) * 2015-03-31 2016-08-10 Федеральное государственное бюджетное учреждение науки Институт минералогии Уральского отделения Российской академии наук Институт минералогии УрО РАН Способ получения изотропного кварцевого стекла
RU2731764C1 (ru) * 2019-12-30 2020-09-08 Акционерное общество "Научно-производственное предприятие "Медикон" (АО "НПП "Медикон") Способ выплавки кварцевого стекла

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US3933454A (en) * 1974-04-22 1976-01-20 Corning Glass Works Method of making optical waveguides
NL8403380A (nl) 1984-11-07 1986-06-02 Philips Nv Werkwijze en inrichting voor het verdichten van een voorgevormd poreus lichaam uit materiaal, waarvan het hoofdbestanddeel uit sio2 bestaat.
US4961767A (en) 1987-05-20 1990-10-09 Corning Incorporated Method for producing ultra-high purity, optical quality, glass articles
US4789389A (en) * 1987-05-20 1988-12-06 Corning Glass Works Method for producing ultra-high purity, optical quality, glass articles
US5161059A (en) * 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
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US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
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JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
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DE69734675T2 (de) * 1996-08-29 2006-06-14 Corning Inc Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz

Also Published As

Publication number Publication date
DE69734675D1 (de) 2005-12-22
EP0958255A1 (en) 1999-11-24
DE69734675T2 (de) 2006-06-14
JP2001500631A (ja) 2001-01-16
RU2175647C2 (ru) 2001-11-10
DE69736563D1 (de) 2006-10-05
EP0960074B1 (en) 2005-11-16
KR20000035883A (ko) 2000-06-26
WO1998008776A1 (en) 1998-03-05
EP0960074A1 (en) 1999-12-01
EP0958255B1 (en) 2006-08-23
US6543254B2 (en) 2003-04-08
EP0960074A4 (en) 2002-09-04
US6295841B1 (en) 2001-10-02
US20020036188A1 (en) 2002-03-28
EP0958255A4 (en) 2004-03-31
WO1998008775A1 (en) 1998-03-05
JP2000517284A (ja) 2000-12-26
DE69736563T2 (de) 2008-01-03

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PA0105 International application

Patent event date: 19990227

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid