JP2000517284A - 石英ガラスのレーザ誘起圧密決定方法 - Google Patents

石英ガラスのレーザ誘起圧密決定方法

Info

Publication number
JP2000517284A
JP2000517284A JP10511954A JP51195498A JP2000517284A JP 2000517284 A JP2000517284 A JP 2000517284A JP 10511954 A JP10511954 A JP 10511954A JP 51195498 A JP51195498 A JP 51195498A JP 2000517284 A JP2000517284 A JP 2000517284A
Authority
JP
Japan
Prior art keywords
quartz glass
densification
irradiation
lens
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP10511954A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000517284A5 (https=
Inventor
シー アラン，ダグラス
アール パウエル，ウィリアム
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21823466&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2000517284(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2000517284A publication Critical patent/JP2000517284A/ja
Publication of JP2000517284A5 publication Critical patent/JP2000517284A5/ja
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/13—Computer control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Thermal Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10511954A 1996-08-29 1997-08-27 石英ガラスのレーザ誘起圧密決定方法 Ceased JP2000517284A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US2499596P 1996-08-29 1996-08-29
US60/024,995 1996-08-29
PCT/US1997/015234 WO1998008776A1 (en) 1996-08-29 1997-08-27 Method for determining laser-induced compaction in fused silica

Publications (2)

Publication Number Publication Date
JP2000517284A true JP2000517284A (ja) 2000-12-26
JP2000517284A5 JP2000517284A5 (https=) 2005-03-10

Family

ID=21823466

Family Applications (2)

Application Number Title Priority Date Filing Date
JP10511954A Ceased JP2000517284A (ja) 1996-08-29 1997-08-27 石英ガラスのレーザ誘起圧密決定方法
JP10511953A Pending JP2001500631A (ja) 1996-08-29 1997-08-27 高エネルギ照射下で低い収縮性を呈する石英

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP10511953A Pending JP2001500631A (ja) 1996-08-29 1997-08-27 高エネルギ照射下で低い収縮性を呈する石英

Country Status (7)

Country Link
US (2) US6295841B1 (https=)
EP (2) EP0960074B1 (https=)
JP (2) JP2000517284A (https=)
KR (2) KR20000035913A (https=)
DE (2) DE69734675T2 (https=)
RU (1) RU2175647C2 (https=)
WO (2) WO1998008776A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004073052A1 (ja) 2003-02-17 2004-08-26 Nikon Corporation 露光装置及び露光装置用光学部材
JP2013502707A (ja) * 2009-08-18 2013-01-24 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィー用基板及びミラーとその製造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69734675T2 (de) 1996-08-29 2006-06-14 Corning Inc Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz
DE19840525A1 (de) * 1998-09-06 2000-03-09 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Schichten von gleichmäßiger Schichtdicke
KR100824985B1 (ko) * 2001-09-11 2008-04-28 재단법인 포항산업과학연구원 투명 실리카 글래스 제조용 조성물 및 이를 이용한 실리카글래스의 제조 방법
JP2005539245A (ja) * 2002-09-16 2005-12-22 ショット アクチエンゲゼルシャフト 光学素子製造用光学材料の適合性判定方法、同適合性判定装置、及び同光学材料の使用
DE10308466A1 (de) * 2003-02-21 2004-09-02 Carl Zeiss Smt Ag Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und Quarzglasmaterial
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
JP2013075827A (ja) * 2005-11-07 2013-04-25 Corning Inc デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
US7934390B2 (en) * 2006-05-17 2011-05-03 Carl Zeiss Smt Gmbh Method for manufacturing a lens of synthetic quartz glass with increased H2 content
DE102010052685A1 (de) 2010-11-26 2012-05-31 J-Fiber Gmbh Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper
RU2594184C1 (ru) * 2015-03-31 2016-08-10 Федеральное государственное бюджетное учреждение науки Институт минералогии Уральского отделения Российской академии наук Институт минералогии УрО РАН Способ получения изотропного кварцевого стекла
RU2731764C1 (ru) * 2019-12-30 2020-09-08 Акционерное общество "Научно-производственное предприятие "Медикон" (АО "НПП "Медикон") Способ выплавки кварцевого стекла

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US3933454A (en) * 1974-04-22 1976-01-20 Corning Glass Works Method of making optical waveguides
NL8403380A (nl) 1984-11-07 1986-06-02 Philips Nv Werkwijze en inrichting voor het verdichten van een voorgevormd poreus lichaam uit materiaal, waarvan het hoofdbestanddeel uit sio2 bestaat.
US4961767A (en) 1987-05-20 1990-10-09 Corning Incorporated Method for producing ultra-high purity, optical quality, glass articles
US4789389A (en) * 1987-05-20 1988-12-06 Corning Glass Works Method for producing ultra-high purity, optical quality, glass articles
US5161059A (en) * 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US4895790A (en) * 1987-09-21 1990-01-23 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
EP0401845B2 (en) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optical members and blanks of synthetic silica glass and method for their production
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
KR0165695B1 (ko) * 1991-06-29 1998-12-15 아이하라 테루히코 엑시머레이저용 합성석영유리 광학부재 및 그의 제조방법
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
JP2859095B2 (ja) * 1993-07-30 1999-02-17 信越化学工業株式会社 エキシマレーザリソグラフィー用合成石英マスク基板
US5547482A (en) * 1994-07-05 1996-08-20 Chalk; Julie B. Method of making fused silica articles
JP3283383B2 (ja) * 1994-07-06 2002-05-20 松下電器産業株式会社 設計検証装置
US5594651A (en) * 1995-02-14 1997-01-14 St. Ville; James A. Method and apparatus for manufacturing objects having optimized response characteristics
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
DE69601749T3 (de) * 1995-06-07 2004-04-29 Corning Inc. Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten
US6205818B1 (en) 1996-07-26 2001-03-27 Corning Incorporated Production of fused silica having high resistance to optical damage
DE69734675T2 (de) * 1996-08-29 2006-06-14 Corning Inc Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004073052A1 (ja) 2003-02-17 2004-08-26 Nikon Corporation 露光装置及び露光装置用光学部材
JP2013502707A (ja) * 2009-08-18 2013-01-24 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィー用基板及びミラーとその製造方法

Also Published As

Publication number Publication date
DE69734675D1 (de) 2005-12-22
EP0958255A1 (en) 1999-11-24
DE69734675T2 (de) 2006-06-14
JP2001500631A (ja) 2001-01-16
RU2175647C2 (ru) 2001-11-10
DE69736563D1 (de) 2006-10-05
EP0960074B1 (en) 2005-11-16
KR20000035883A (ko) 2000-06-26
WO1998008776A1 (en) 1998-03-05
EP0960074A1 (en) 1999-12-01
EP0958255B1 (en) 2006-08-23
US6543254B2 (en) 2003-04-08
EP0960074A4 (en) 2002-09-04
US6295841B1 (en) 2001-10-02
US20020036188A1 (en) 2002-03-28
EP0958255A4 (en) 2004-03-31
KR20000035913A (ko) 2000-06-26
WO1998008775A1 (en) 1998-03-05
DE69736563T2 (de) 2008-01-03

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