KR19990063073A - 감방사선성 조성물 - Google Patents
감방사선성 조성물 Download PDFInfo
- Publication number
- KR19990063073A KR19990063073A KR1019980055148A KR19980055148A KR19990063073A KR 19990063073 A KR19990063073 A KR 19990063073A KR 1019980055148 A KR1019980055148 A KR 1019980055148A KR 19980055148 A KR19980055148 A KR 19980055148A KR 19990063073 A KR19990063073 A KR 19990063073A
- Authority
- KR
- South Korea
- Prior art keywords
- acid
- bis
- substrate
- parts
- biimidazole
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
Claims (1)
- (A) 착색제, (B) 알칼리 가용성 수지, (C) 다관능성 단량체 및 (D) 광중합 개시제를 함유하는 감방사선성 조성물로서, 상기 알칼리 가용성 수지 (B)가(1) 하기 화학식 1로 표시되는 단량체,(2) 분자내에 적어도 1개의 카르복실기를 갖는 에틸렌성 불포화 단량체, 및 필요에 따라서(3) 상기 (1) 및 (2) 이외의 공중합가능한 에틸렌성 불포화 단량체의 공중합체인 것을 특징으로 하는 감방사선성 조성물.화학식 1식 중, R1은 수소 원자 또는 메틸기를 나타낸다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP36324397A JP4282783B2 (ja) | 1997-12-16 | 1997-12-16 | カラーフィルタ用感放射線性組成物 |
JP97-363243 | 1997-12-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990063073A true KR19990063073A (ko) | 1999-07-26 |
KR100423220B1 KR100423220B1 (ko) | 2005-01-15 |
Family
ID=18478853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-1998-0055148A KR100423220B1 (ko) | 1997-12-16 | 1998-12-15 | 감방사선성조성물 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6013415A (ko) |
JP (1) | JP4282783B2 (ko) |
KR (1) | KR100423220B1 (ko) |
TW (1) | TW550395B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100902727B1 (ko) * | 2001-06-15 | 2009-06-15 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 칼라 필터 및 칼라 액정 표시 소자 |
Families Citing this family (66)
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EP0902327A3 (en) * | 1997-09-09 | 2000-04-05 | JSR Corporation | Radiation sensitive composition |
JP2001033620A (ja) * | 1999-07-23 | 2001-02-09 | Jsr Corp | カラーフィルタ用感放射線性組成物およびカラーフィルタ |
JP2001108817A (ja) * | 1999-10-08 | 2001-04-20 | Jsr Corp | カラーフィルタ用感放射線性組成物およびカラーフィルタ |
JP2001154013A (ja) * | 1999-12-01 | 2001-06-08 | Jsr Corp | カラー液晶表示装置用感放射線性組成物 |
TWI289238B (en) * | 2000-01-13 | 2007-11-01 | Fujifilm Corp | Negative resist compositions using for electronic irradiation |
KR20010098809A (ko) * | 2000-04-25 | 2001-11-08 | 마쯔모또 에이찌 | El 표시 소자의 격벽 형성용 감방사선성 수지 조성물,격벽 및 el 표시 소자 |
TWI230321B (en) * | 2000-08-10 | 2005-04-01 | Sumitomo Chemical Co | Photosensitive coloring composition, and color filter and liquid crystal display panel using the same |
JP4153159B2 (ja) * | 2000-12-18 | 2008-09-17 | 富士フイルム株式会社 | ネガ型感光性熱硬化性樹脂組成物、ネガ型感光性熱硬化性樹脂層転写材料、及びネガ型耐性画像形成方法 |
JP2003002924A (ja) * | 2001-06-19 | 2003-01-08 | Hitachi Chem Co Ltd | アルカリ可溶型アクリル樹脂組成物、感光性透明絶縁膜形成材料、カラーフィルタ保護膜の製造法、反射下地層の製造法、着色画像形成材料、カラーフィルタの製造法及びカラーフィルタ |
ATE290570T1 (de) * | 2001-08-13 | 2005-03-15 | Ciba Sc Holding Ag | Polyesterzusammensetzungen mit geringem restaldehydgehalt |
CN100335564C (zh) * | 2001-10-19 | 2007-09-05 | 西巴特殊化学品控股有限公司 | 可用于滤色片和lcd的绿颜料组合物的制备方法 |
KR100870020B1 (ko) * | 2002-10-04 | 2008-11-21 | 삼성전자주식회사 | 용해 특성을 조절하는 감광성 수지 조성물 및 이를 이용한이층 구조의 패턴 형성 방법 |
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US20060109296A1 (en) * | 2004-11-04 | 2006-05-25 | Bassam Shamoun | Methods and apparatus for inkjet printing color filters for displays |
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CN110582709A (zh) * | 2017-05-11 | 2019-12-17 | 日本化药株式会社 | 滤蓝光膜用紫外线硬化型树脂组合物及使用此组合物的滤蓝光膜 |
US20210179764A1 (en) | 2017-11-15 | 2021-06-17 | Byk-Chemie Gmbh | Block co-polymer |
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-
1997
- 1997-12-16 JP JP36324397A patent/JP4282783B2/ja not_active Expired - Lifetime
-
1998
- 1998-12-15 TW TW087120857A patent/TW550395B/zh not_active IP Right Cessation
- 1998-12-15 US US09/210,794 patent/US6013415A/en not_active Expired - Lifetime
- 1998-12-15 KR KR10-1998-0055148A patent/KR100423220B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100902727B1 (ko) * | 2001-06-15 | 2009-06-15 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 칼라 필터 및 칼라 액정 표시 소자 |
Also Published As
Publication number | Publication date |
---|---|
JPH11174224A (ja) | 1999-07-02 |
US6013415A (en) | 2000-01-11 |
TW550395B (en) | 2003-09-01 |
JP4282783B2 (ja) | 2009-06-24 |
KR100423220B1 (ko) | 2005-01-15 |
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