KR102896990B1 - 중공 수지 입자, 그 제조 방법, 및 그 용도 - Google Patents

중공 수지 입자, 그 제조 방법, 및 그 용도

Info

Publication number
KR102896990B1
KR102896990B1 KR1020237019185A KR20237019185A KR102896990B1 KR 102896990 B1 KR102896990 B1 KR 102896990B1 KR 1020237019185 A KR1020237019185 A KR 1020237019185A KR 20237019185 A KR20237019185 A KR 20237019185A KR 102896990 B1 KR102896990 B1 KR 102896990B1
Authority
KR
South Korea
Prior art keywords
hollow
hollow resin
resin particles
particles
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020237019185A
Other languages
English (en)
Korean (ko)
Other versions
KR20230104261A (ko
Inventor
하루히코 마츠우라
신야 마츠노
Original Assignee
세키스이가세이힝코교가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세키스이가세이힝코교가부시키가이샤 filed Critical 세키스이가세이힝코교가부시키가이샤
Publication of KR20230104261A publication Critical patent/KR20230104261A/ko
Application granted granted Critical
Publication of KR102896990B1 publication Critical patent/KR102896990B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • C08F290/062Polyethers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/12Powdering or granulating
    • C08J3/16Powdering or granulating by coagulating dispersions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02Making microcapsules or microballoons
    • B01J13/06Making microcapsules or microballoons by phase separation
    • B01J13/14Polymerisation; cross-linking
    • B01J13/18In situ polymerisation with all reactants being present in the same phase
    • B01J13/185In situ polymerisation with all reactants being present in the same phase in an organic phase
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/12Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36Divinylbenzene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/46Post-polymerisation treatment, e.g. recovery, purification, drying
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C09D171/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C09D171/12Polyphenylene oxides
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2371/00Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
    • C08J2371/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08J2371/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08J2371/12Polyphenylene oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyethers (AREA)
KR1020237019185A 2020-12-17 2021-12-09 중공 수지 입자, 그 제조 방법, 및 그 용도 Active KR102896990B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020209336 2020-12-17
JPJP-P-2020-209336 2020-12-17
PCT/JP2021/045348 WO2022131128A1 (ja) 2020-12-17 2021-12-09 中空樹脂粒子、その製造方法、およびその用途

Publications (2)

Publication Number Publication Date
KR20230104261A KR20230104261A (ko) 2023-07-07
KR102896990B1 true KR102896990B1 (ko) 2025-12-05

Family

ID=82059154

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237019185A Active KR102896990B1 (ko) 2020-12-17 2021-12-09 중공 수지 입자, 그 제조 방법, 및 그 용도

Country Status (7)

Country Link
US (1) US20240059847A1 (https=)
EP (1) EP4265648A4 (https=)
JP (1) JP7583832B2 (https=)
KR (1) KR102896990B1 (https=)
CN (1) CN116635433A (https=)
TW (2) TWI893253B (https=)
WO (1) WO2022131128A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121532448A (zh) * 2023-07-21 2026-02-13 积水化成品工业株式会社 树脂粒子及半导体构件用树脂组合物
WO2026070397A1 (ja) * 2024-09-30 2026-04-02 積水化成品工業株式会社 中空樹脂粒子、その製造方法、およびその用途

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002080503A (ja) 2000-09-04 2002-03-19 New Industry Research Organization 中空高分子微粒子及びその製造法
JP2009120806A (ja) 2007-10-22 2009-06-04 Sekisui Chem Co Ltd 多孔質中空ポリマー粒子、多孔質中空ポリマー粒子の製造方法、香料担持ポリマー粒子、及び、香料担持ポリマー粒子の製造方法
JP2017160399A (ja) * 2016-03-11 2017-09-14 旭化成株式会社 微少空隙を有するポリフェニレンエーテル紛体と製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147369A (en) 1979-05-07 1980-11-17 Tokyo Keiki Co Ltd Information processing system
US4782098A (en) * 1987-06-12 1988-11-01 General Electric, Co. Expandable thermoplastic resin beads
NL8900497A (nl) * 1989-03-01 1990-10-01 Gen Electric Werkwijze voor het bereiden van korrels polyfenyleentherpolystyreen, gevormde korrels.
JP4409683B2 (ja) 1999-11-12 2010-02-03 ダイセル化学工業株式会社 光学的造形用樹脂組成物、その製造方法及び光学的造形物
JP4651883B2 (ja) 2001-09-05 2011-03-16 ガンツ化成株式会社 球状多孔性架橋ポリマー粒子含有皮膚化粧料
JP4171489B2 (ja) 2003-01-28 2008-10-22 松下電工株式会社 中空粒子を含有する樹脂組成物、同組成物を含むプリプレグおよび積層板
JP4445495B2 (ja) 2006-08-17 2010-04-07 積水化学工業株式会社 多孔質中空ポリマー粒子、多孔質中空ポリマー粒子の製造方法、多孔質セラミックフィルタおよび多孔質セラミックフィルタの製造方法
KR101294925B1 (ko) 2008-05-21 2013-08-08 도레이 카부시키가이샤 중합체 미립자의 제조 방법
CN103814070B (zh) * 2011-09-09 2016-08-24 沙特基础工业公司 遇水膨胀的聚合物小球
JP2014111728A (ja) 2012-10-29 2014-06-19 Nippon Shokubai Co Ltd 多孔質樹脂粒子の製造方法
US10590223B2 (en) 2013-06-18 2020-03-17 Panasonic Intellectual Property Management Co., Ltd. Polyphenylene ether resin composition, prepreg, metal-clad laminate and printed wiring board
KR102019707B1 (ko) * 2015-01-08 2019-09-09 세키스이가세이힝코교가부시키가이샤 중공 입자, 그 제조 방법, 그 용도 및 마이크로 캡슐 입자의 제조 방법
CN106750297B (zh) * 2016-12-09 2019-02-26 苏州大学 一种低介电双马来酰亚胺树脂体系及其制备方法
JP6513273B1 (ja) 2018-08-31 2019-05-15 三井化学株式会社 樹脂粒子
JP7761380B2 (ja) 2020-10-05 2025-10-28 味の素株式会社 樹脂組成物
US20230391900A1 (en) * 2020-12-17 2023-12-07 Sekisui Kasei Co., Ltd. Hollow resin particles, method for producing hollow resin particles, and use of hollow resin particles
JP7236794B1 (ja) * 2021-10-27 2023-03-10 日本化薬株式会社 アミン化合物、マレイミド化合物、硬化性樹脂組成物およびその硬化物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002080503A (ja) 2000-09-04 2002-03-19 New Industry Research Organization 中空高分子微粒子及びその製造法
JP2009120806A (ja) 2007-10-22 2009-06-04 Sekisui Chem Co Ltd 多孔質中空ポリマー粒子、多孔質中空ポリマー粒子の製造方法、香料担持ポリマー粒子、及び、香料担持ポリマー粒子の製造方法
JP2017160399A (ja) * 2016-03-11 2017-09-14 旭化成株式会社 微少空隙を有するポリフェニレンエーテル紛体と製造方法

Also Published As

Publication number Publication date
EP4265648A4 (en) 2024-11-20
TW202544098A (zh) 2025-11-16
WO2022131128A1 (ja) 2022-06-23
JP7583832B2 (ja) 2024-11-14
TW202231693A (zh) 2022-08-16
TWI893253B (zh) 2025-08-11
CN116635433A (zh) 2023-08-22
US20240059847A1 (en) 2024-02-22
EP4265648A1 (en) 2023-10-25
KR20230104261A (ko) 2023-07-07
JPWO2022131128A1 (https=) 2022-06-23

Similar Documents

Publication Publication Date Title
KR102896987B1 (ko) 중공 수지 입자, 그 제조 방법, 및 그 용도
JP7586964B2 (ja) 中空樹脂粒子およびその製造方法
KR102896990B1 (ko) 중공 수지 입자, 그 제조 방법, 및 그 용도
KR102940057B1 (ko) 중공 수지 입자, 그 제조 방법, 및 그 용도
WO2024203876A1 (ja) 中空樹脂粒子、その製造方法、およびその用途
TWI915467B (zh) 中空樹脂粒子、其製造方法、及其用途
JP2025092448A (ja) 中空樹脂粒子、半導体部材用樹脂組成物、半導体部材、および中空樹脂粒子の製造方法
WO2025033521A1 (ja) 中空樹脂粒子、その製造方法、およびその用途
JP2024044239A (ja) 中空樹脂粒子および中空樹脂粒子の製造方法
WO2025135137A1 (ja) 中空樹脂粒子、その製造方法、およびその用途
KR20260027346A (ko) 중공 수지 입자, 그 용도, 및 그 제조 방법
CN118715257A (zh) 中空树脂颗粒、其制造方法及其用途
WO2025053095A1 (ja) 中空樹脂粒子、その製造方法、およびその用途

Legal Events

Date Code Title Description
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D22 Grant of ip right intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

F11 Ip right granted following substantive examination

Free format text: ST27 STATUS EVENT CODE: A-2-4-F10-F11-EXM-PR0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

U12 Designation fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U12-OTH-PR1002 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

Q13 Ip right document published

Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE)