KR102896990B1 - 중공 수지 입자, 그 제조 방법, 및 그 용도 - Google Patents
중공 수지 입자, 그 제조 방법, 및 그 용도Info
- Publication number
- KR102896990B1 KR102896990B1 KR1020237019185A KR20237019185A KR102896990B1 KR 102896990 B1 KR102896990 B1 KR 102896990B1 KR 1020237019185 A KR1020237019185 A KR 1020237019185A KR 20237019185 A KR20237019185 A KR 20237019185A KR 102896990 B1 KR102896990 B1 KR 102896990B1
- Authority
- KR
- South Korea
- Prior art keywords
- hollow
- hollow resin
- resin particles
- particles
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/062—Polyethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/12—Powdering or granulating
- C08J3/16—Powdering or granulating by coagulating dispersions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/02—Making microcapsules or microballoons
- B01J13/06—Making microcapsules or microballoons by phase separation
- B01J13/14—Polymerisation; cross-linking
- B01J13/18—In situ polymerisation with all reactants being present in the same phase
- B01J13/185—In situ polymerisation with all reactants being present in the same phase in an organic phase
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
- C08F212/36—Divinylbenzene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/46—Post-polymerisation treatment, e.g. recovery, purification, drying
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
- C09D171/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C09D171/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C09D171/12—Polyphenylene oxides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2371/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
- C08J2371/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08J2371/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C08J2371/12—Polyphenylene oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Polymerisation Methods In General (AREA)
- Polyethers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020209336 | 2020-12-17 | ||
| JPJP-P-2020-209336 | 2020-12-17 | ||
| PCT/JP2021/045348 WO2022131128A1 (ja) | 2020-12-17 | 2021-12-09 | 中空樹脂粒子、その製造方法、およびその用途 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20230104261A KR20230104261A (ko) | 2023-07-07 |
| KR102896990B1 true KR102896990B1 (ko) | 2025-12-05 |
Family
ID=82059154
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237019185A Active KR102896990B1 (ko) | 2020-12-17 | 2021-12-09 | 중공 수지 입자, 그 제조 방법, 및 그 용도 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240059847A1 (https=) |
| EP (1) | EP4265648A4 (https=) |
| JP (1) | JP7583832B2 (https=) |
| KR (1) | KR102896990B1 (https=) |
| CN (1) | CN116635433A (https=) |
| TW (2) | TWI893253B (https=) |
| WO (1) | WO2022131128A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121532448A (zh) * | 2023-07-21 | 2026-02-13 | 积水化成品工业株式会社 | 树脂粒子及半导体构件用树脂组合物 |
| WO2026070397A1 (ja) * | 2024-09-30 | 2026-04-02 | 積水化成品工業株式会社 | 中空樹脂粒子、その製造方法、およびその用途 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002080503A (ja) | 2000-09-04 | 2002-03-19 | New Industry Research Organization | 中空高分子微粒子及びその製造法 |
| JP2009120806A (ja) | 2007-10-22 | 2009-06-04 | Sekisui Chem Co Ltd | 多孔質中空ポリマー粒子、多孔質中空ポリマー粒子の製造方法、香料担持ポリマー粒子、及び、香料担持ポリマー粒子の製造方法 |
| JP2017160399A (ja) * | 2016-03-11 | 2017-09-14 | 旭化成株式会社 | 微少空隙を有するポリフェニレンエーテル紛体と製造方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55147369A (en) | 1979-05-07 | 1980-11-17 | Tokyo Keiki Co Ltd | Information processing system |
| US4782098A (en) * | 1987-06-12 | 1988-11-01 | General Electric, Co. | Expandable thermoplastic resin beads |
| NL8900497A (nl) * | 1989-03-01 | 1990-10-01 | Gen Electric | Werkwijze voor het bereiden van korrels polyfenyleentherpolystyreen, gevormde korrels. |
| JP4409683B2 (ja) | 1999-11-12 | 2010-02-03 | ダイセル化学工業株式会社 | 光学的造形用樹脂組成物、その製造方法及び光学的造形物 |
| JP4651883B2 (ja) | 2001-09-05 | 2011-03-16 | ガンツ化成株式会社 | 球状多孔性架橋ポリマー粒子含有皮膚化粧料 |
| JP4171489B2 (ja) | 2003-01-28 | 2008-10-22 | 松下電工株式会社 | 中空粒子を含有する樹脂組成物、同組成物を含むプリプレグおよび積層板 |
| JP4445495B2 (ja) | 2006-08-17 | 2010-04-07 | 積水化学工業株式会社 | 多孔質中空ポリマー粒子、多孔質中空ポリマー粒子の製造方法、多孔質セラミックフィルタおよび多孔質セラミックフィルタの製造方法 |
| KR101294925B1 (ko) | 2008-05-21 | 2013-08-08 | 도레이 카부시키가이샤 | 중합체 미립자의 제조 방법 |
| CN103814070B (zh) * | 2011-09-09 | 2016-08-24 | 沙特基础工业公司 | 遇水膨胀的聚合物小球 |
| JP2014111728A (ja) | 2012-10-29 | 2014-06-19 | Nippon Shokubai Co Ltd | 多孔質樹脂粒子の製造方法 |
| US10590223B2 (en) | 2013-06-18 | 2020-03-17 | Panasonic Intellectual Property Management Co., Ltd. | Polyphenylene ether resin composition, prepreg, metal-clad laminate and printed wiring board |
| KR102019707B1 (ko) * | 2015-01-08 | 2019-09-09 | 세키스이가세이힝코교가부시키가이샤 | 중공 입자, 그 제조 방법, 그 용도 및 마이크로 캡슐 입자의 제조 방법 |
| CN106750297B (zh) * | 2016-12-09 | 2019-02-26 | 苏州大学 | 一种低介电双马来酰亚胺树脂体系及其制备方法 |
| JP6513273B1 (ja) | 2018-08-31 | 2019-05-15 | 三井化学株式会社 | 樹脂粒子 |
| JP7761380B2 (ja) | 2020-10-05 | 2025-10-28 | 味の素株式会社 | 樹脂組成物 |
| US20230391900A1 (en) * | 2020-12-17 | 2023-12-07 | Sekisui Kasei Co., Ltd. | Hollow resin particles, method for producing hollow resin particles, and use of hollow resin particles |
| JP7236794B1 (ja) * | 2021-10-27 | 2023-03-10 | 日本化薬株式会社 | アミン化合物、マレイミド化合物、硬化性樹脂組成物およびその硬化物 |
-
2021
- 2021-12-09 US US18/267,299 patent/US20240059847A1/en active Pending
- 2021-12-09 CN CN202180084267.1A patent/CN116635433A/zh active Pending
- 2021-12-09 EP EP21906491.2A patent/EP4265648A4/en active Pending
- 2021-12-09 JP JP2022569927A patent/JP7583832B2/ja active Active
- 2021-12-09 WO PCT/JP2021/045348 patent/WO2022131128A1/ja not_active Ceased
- 2021-12-09 KR KR1020237019185A patent/KR102896990B1/ko active Active
- 2021-12-13 TW TW110146558A patent/TWI893253B/zh active
- 2021-12-13 TW TW114126714A patent/TW202544098A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002080503A (ja) | 2000-09-04 | 2002-03-19 | New Industry Research Organization | 中空高分子微粒子及びその製造法 |
| JP2009120806A (ja) | 2007-10-22 | 2009-06-04 | Sekisui Chem Co Ltd | 多孔質中空ポリマー粒子、多孔質中空ポリマー粒子の製造方法、香料担持ポリマー粒子、及び、香料担持ポリマー粒子の製造方法 |
| JP2017160399A (ja) * | 2016-03-11 | 2017-09-14 | 旭化成株式会社 | 微少空隙を有するポリフェニレンエーテル紛体と製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP4265648A4 (en) | 2024-11-20 |
| TW202544098A (zh) | 2025-11-16 |
| WO2022131128A1 (ja) | 2022-06-23 |
| JP7583832B2 (ja) | 2024-11-14 |
| TW202231693A (zh) | 2022-08-16 |
| TWI893253B (zh) | 2025-08-11 |
| CN116635433A (zh) | 2023-08-22 |
| US20240059847A1 (en) | 2024-02-22 |
| EP4265648A1 (en) | 2023-10-25 |
| KR20230104261A (ko) | 2023-07-07 |
| JPWO2022131128A1 (https=) | 2022-06-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| D22 | Grant of ip right intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| PE0701 | Decision of registration |
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| F11 | Ip right granted following substantive examination |
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| PR0701 | Registration of establishment |
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| PR1002 | Payment of registration fee |
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| U12 | Designation fee paid |
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| PG1601 | Publication of registration |
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