KR102800920B1 - 재료 증착 장치, 기판 상에 재료를 증착하는 방법, 및 재료 증착 시스템 - Google Patents

재료 증착 장치, 기판 상에 재료를 증착하는 방법, 및 재료 증착 시스템 Download PDF

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Publication number
KR102800920B1
KR102800920B1 KR1020237039193A KR20237039193A KR102800920B1 KR 102800920 B1 KR102800920 B1 KR 102800920B1 KR 1020237039193 A KR1020237039193 A KR 1020237039193A KR 20237039193 A KR20237039193 A KR 20237039193A KR 102800920 B1 KR102800920 B1 KR 102800920B1
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South Korea
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substrate
processing drum
heater assembly
temperature
material deposition
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KR1020237039193A
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Korean (ko)
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KR20230170951A (ko
Inventor
타마라 하인츠
슈테판 반게르트
수레쉬 마니코트 콜라라트
람고팔 차카라바르티 라마사미
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엘리베이티드 머티어리얼스 저머니 게엠베하
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0421—Methods of deposition of the material involving vapour deposition
    • H01M4/0423—Physical vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139—Processes of manufacture
    • H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020237039193A 2021-04-21 2022-04-11 재료 증착 장치, 기판 상에 재료를 증착하는 방법, 및 재료 증착 시스템 Active KR102800920B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163177491P 2021-04-21 2021-04-21
US63/177,491 2021-04-21
PCT/US2022/024225 WO2022225731A1 (en) 2021-04-21 2022-04-11 Material deposition apparatus, method of depositing material on a substrate, and material deposition system

Publications (2)

Publication Number Publication Date
KR20230170951A KR20230170951A (ko) 2023-12-19
KR102800920B1 true KR102800920B1 (ko) 2025-05-12

Family

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Country Status (7)

Country Link
US (2) US12203164B2 (enExample)
EP (1) EP4326919A4 (enExample)
JP (1) JP7663714B2 (enExample)
KR (1) KR102800920B1 (enExample)
CN (1) CN117120659A (enExample)
TW (1) TWI836404B (enExample)
WO (1) WO2022225731A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117966102B (zh) * 2024-03-11 2026-07-24 北京卫蓝新能源科技股份有限公司 一种用于真空镀膜的阶梯型坩埚

Family Cites Families (18)

* Cited by examiner, † Cited by third party
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EP0311302B1 (en) * 1987-10-07 1992-06-24 THORN EMI plc Apparatus and method for the production of a coating on a web
JP2004315861A (ja) * 2003-04-14 2004-11-11 Matsushita Electric Ind Co Ltd 薄膜形成装置及び薄膜形成方法
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
EP2053663A1 (en) 2007-10-25 2009-04-29 Applied Materials, Inc. Hover cushion transport for webs in a web coating process
JP5081712B2 (ja) 2008-05-02 2012-11-28 富士フイルム株式会社 成膜装置
KR101061731B1 (ko) * 2008-10-15 2011-09-02 주식회사 디알테크넷 필름상 박막형성장치 및 방법
US9856554B2 (en) * 2011-09-07 2018-01-02 Applied Materials, Inc. Method and system for manufacturing a transparent body for use in a touch panel
MX344096B (es) * 2012-01-18 2016-12-05 Nuvosun Inc Sistemas para la formacion de celdas fotovoltaicas en substratos flexibles.
EP2883980B1 (en) 2013-12-10 2017-02-08 Applied Materials, Inc. Vacuum processing apparatus with substrate spreading device and method for operating same
JP6375387B2 (ja) * 2014-04-02 2018-08-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空処理システム、及び処理システムを取り付けるための方法
US9953829B2 (en) * 2015-08-27 2018-04-24 Toshiba Memory Corporation Image processing apparatus with improved slide printout based on layout data
JP6851143B2 (ja) * 2016-04-05 2021-03-31 株式会社アルバック 蒸発源、真空蒸着装置および真空蒸着方法
CN109477203A (zh) * 2016-07-01 2019-03-15 应用材料公司 用于涂布柔性基板的沉积设备和涂布柔性基板的方法
EP3272901A1 (en) 2016-07-18 2018-01-24 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Deposition arrangement and method for depositing
US10156009B2 (en) * 2016-12-05 2018-12-18 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Silver copper indium gallium selenide reactive sputtering method and apparatus, and photovoltaic cell containing same
JPWO2018199169A1 (ja) * 2017-04-26 2019-06-27 株式会社アルバック 成膜装置及び成膜方法
JP7054055B2 (ja) 2018-05-23 2022-04-13 住友金属鉱山株式会社 ガス放出ロール及びその製造方法並びにガス放出ロールを用いた処理装置
WO2020078557A1 (en) * 2018-10-18 2020-04-23 Applied Materials, Inc. Deposition apparatus, system and method for depositing a material on a substrate

Also Published As

Publication number Publication date
EP4326919A4 (en) 2025-08-20
WO2022225731A1 (en) 2022-10-27
JP2024514679A (ja) 2024-04-02
JP7663714B2 (ja) 2025-04-16
TW202305160A (zh) 2023-02-01
US20220341031A1 (en) 2022-10-27
US12203164B2 (en) 2025-01-21
US20250101573A1 (en) 2025-03-27
TWI836404B (zh) 2024-03-21
KR20230170951A (ko) 2023-12-19
EP4326919A1 (en) 2024-02-28
CN117120659A (zh) 2023-11-24

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Patent event date: 20231114

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