CN117120659A - 材料沉积设备、在基板上沉积材料的方法以及材料沉积系统 - Google Patents

材料沉积设备、在基板上沉积材料的方法以及材料沉积系统 Download PDF

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Publication number
CN117120659A
CN117120659A CN202280027506.4A CN202280027506A CN117120659A CN 117120659 A CN117120659 A CN 117120659A CN 202280027506 A CN202280027506 A CN 202280027506A CN 117120659 A CN117120659 A CN 117120659A
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CN
China
Prior art keywords
substrate
heater assembly
drum
temperature
material deposition
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Pending
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CN202280027506.4A
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English (en)
Chinese (zh)
Inventor
塔玛拉·海因茨
斯蒂芬·班格特
苏雷什·曼尼科特·科拉拉斯
拉姆戈帕尔·查克拉瓦蒂·拉马萨米
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN117120659A publication Critical patent/CN117120659A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0421—Methods of deposition of the material involving vapour deposition
    • H01M4/0423—Physical vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139—Processes of manufacture
    • H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CN202280027506.4A 2021-04-21 2022-04-11 材料沉积设备、在基板上沉积材料的方法以及材料沉积系统 Pending CN117120659A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163177491P 2021-04-21 2021-04-21
US63/177,491 2021-04-21
PCT/US2022/024225 WO2022225731A1 (en) 2021-04-21 2022-04-11 Material deposition apparatus, method of depositing material on a substrate, and material deposition system

Publications (1)

Publication Number Publication Date
CN117120659A true CN117120659A (zh) 2023-11-24

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ID=83695101

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CN202280027506.4A Pending CN117120659A (zh) 2021-04-21 2022-04-11 材料沉积设备、在基板上沉积材料的方法以及材料沉积系统

Country Status (7)

Country Link
US (2) US12203164B2 (enExample)
EP (1) EP4326919A4 (enExample)
JP (1) JP7663714B2 (enExample)
KR (1) KR102800920B1 (enExample)
CN (1) CN117120659A (enExample)
TW (1) TWI836404B (enExample)
WO (1) WO2022225731A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117966102B (zh) * 2024-03-11 2026-07-24 北京卫蓝新能源科技股份有限公司 一种用于真空镀膜的阶梯型坩埚

Citations (8)

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EP0311302A1 (en) * 1987-10-07 1989-04-12 THORN EMI plc Apparatus and method for the production of a coating on a web
US20050000448A1 (en) * 2003-07-04 2005-01-06 Verreyken Guido Vapor deposition apparatus
CN104169459A (zh) * 2012-01-18 2014-11-26 纳沃萨恩公司 在柔性衬底上形成光伏电池的系统
CN105980598A (zh) * 2013-12-10 2016-09-28 应用材料公司 用于真空处理设备的基板延展装置、具有基板延展装置的真空处理设备和它们的操作方法
US20170152593A1 (en) * 2014-04-02 2017-06-01 Applied Materials, Inc. Vacuum processing system and method for mounting a processing system
JP2017186603A (ja) * 2016-04-05 2017-10-12 株式会社アルバック 蒸発源、真空蒸着装置および真空蒸着方法
CN109729718A (zh) * 2017-04-26 2019-05-07 株式会社爱发科 成膜装置及成膜方法
JP2019203171A (ja) * 2018-05-23 2019-11-28 住友金属鉱山株式会社 ガス放出ロール及びその製造方法並びにガス放出ロールを用いた処理装置

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JP2004315861A (ja) * 2003-04-14 2004-11-11 Matsushita Electric Ind Co Ltd 薄膜形成装置及び薄膜形成方法
EP2053663A1 (en) 2007-10-25 2009-04-29 Applied Materials, Inc. Hover cushion transport for webs in a web coating process
JP5081712B2 (ja) 2008-05-02 2012-11-28 富士フイルム株式会社 成膜装置
KR101061731B1 (ko) * 2008-10-15 2011-09-02 주식회사 디알테크넷 필름상 박막형성장치 및 방법
US9856554B2 (en) * 2011-09-07 2018-01-02 Applied Materials, Inc. Method and system for manufacturing a transparent body for use in a touch panel
US9953829B2 (en) * 2015-08-27 2018-04-24 Toshiba Memory Corporation Image processing apparatus with improved slide printout based on layout data
CN109477203A (zh) * 2016-07-01 2019-03-15 应用材料公司 用于涂布柔性基板的沉积设备和涂布柔性基板的方法
EP3272901A1 (en) 2016-07-18 2018-01-24 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Deposition arrangement and method for depositing
US10156009B2 (en) * 2016-12-05 2018-12-18 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Silver copper indium gallium selenide reactive sputtering method and apparatus, and photovoltaic cell containing same
WO2020078557A1 (en) * 2018-10-18 2020-04-23 Applied Materials, Inc. Deposition apparatus, system and method for depositing a material on a substrate

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0311302A1 (en) * 1987-10-07 1989-04-12 THORN EMI plc Apparatus and method for the production of a coating on a web
US20050000448A1 (en) * 2003-07-04 2005-01-06 Verreyken Guido Vapor deposition apparatus
CN104169459A (zh) * 2012-01-18 2014-11-26 纳沃萨恩公司 在柔性衬底上形成光伏电池的系统
CN105980598A (zh) * 2013-12-10 2016-09-28 应用材料公司 用于真空处理设备的基板延展装置、具有基板延展装置的真空处理设备和它们的操作方法
US20170152593A1 (en) * 2014-04-02 2017-06-01 Applied Materials, Inc. Vacuum processing system and method for mounting a processing system
JP2017186603A (ja) * 2016-04-05 2017-10-12 株式会社アルバック 蒸発源、真空蒸着装置および真空蒸着方法
CN109729718A (zh) * 2017-04-26 2019-05-07 株式会社爱发科 成膜装置及成膜方法
JP2019203171A (ja) * 2018-05-23 2019-11-28 住友金属鉱山株式会社 ガス放出ロール及びその製造方法並びにガス放出ロールを用いた処理装置
CN112189059A (zh) * 2018-05-23 2021-01-05 住友金属矿山株式会社 气体释放辊及其制造方法以及使用气体释放辊的处理装置

Also Published As

Publication number Publication date
EP4326919A4 (en) 2025-08-20
WO2022225731A1 (en) 2022-10-27
JP2024514679A (ja) 2024-04-02
JP7663714B2 (ja) 2025-04-16
TW202305160A (zh) 2023-02-01
US20220341031A1 (en) 2022-10-27
US12203164B2 (en) 2025-01-21
US20250101573A1 (en) 2025-03-27
TWI836404B (zh) 2024-03-21
KR20230170951A (ko) 2023-12-19
KR102800920B1 (ko) 2025-05-12
EP4326919A1 (en) 2024-02-28

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