KR102790744B1 - 경화성 조성물 - Google Patents

경화성 조성물 Download PDF

Info

Publication number
KR102790744B1
KR102790744B1 KR1020227008714A KR20227008714A KR102790744B1 KR 102790744 B1 KR102790744 B1 KR 102790744B1 KR 1020227008714 A KR1020227008714 A KR 1020227008714A KR 20227008714 A KR20227008714 A KR 20227008714A KR 102790744 B1 KR102790744 B1 KR 102790744B1
Authority
KR
South Korea
Prior art keywords
curable composition
monomer
cured layer
polymerizable material
curing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227008714A
Other languages
English (en)
Korean (ko)
Other versions
KR20220050921A (ko
Inventor
페이 리
웨이준 리우
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20220050921A publication Critical patent/KR20220050921A/ko
Application granted granted Critical
Publication of KR102790744B1 publication Critical patent/KR102790744B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C08F222/402—Alkyl substituted imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1806—C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F224/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020227008714A 2019-09-06 2020-07-13 경화성 조성물 Active KR102790744B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/562,716 US11345772B2 (en) 2019-09-06 2019-09-06 Curable composition
US16/562,716 2019-09-06
PCT/US2020/041803 WO2021045843A1 (en) 2019-09-06 2020-07-13 Curable composition

Publications (2)

Publication Number Publication Date
KR20220050921A KR20220050921A (ko) 2022-04-25
KR102790744B1 true KR102790744B1 (ko) 2025-04-04

Family

ID=74850365

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227008714A Active KR102790744B1 (ko) 2019-09-06 2020-07-13 경화성 조성물

Country Status (6)

Country Link
US (1) US11345772B2 (https=)
JP (1) JP7663515B2 (https=)
KR (1) KR102790744B1 (https=)
CN (1) CN114245818B (https=)
TW (1) TWI815027B (https=)
WO (1) WO2021045843A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11434312B2 (en) 2020-12-15 2022-09-06 Canon Kabushiki Kaisha Photocurable composition for forming cured layers with high thermal stability
US11434313B2 (en) * 2020-12-16 2022-09-06 Canon Kabushiki Kaisha Curable composition for making cured layer with high thermal stability
US12247133B2 (en) * 2022-02-17 2025-03-11 Canon Kabushiki Kaisha Photocurable composition including a reactive polymer
US11878935B1 (en) * 2022-12-27 2024-01-23 Canon Kabushiki Kaisha Method of coating a superstrate
TW202535989A (zh) 2023-12-28 2025-09-16 德商默克專利有限公司 化合物
TW202545859A (zh) 2023-12-28 2025-12-01 德商默克專利有限公司 化合物
WO2025142787A2 (en) 2023-12-28 2025-07-03 Canon Kabushiki Kaisha Curable composition
TW202536000A (zh) 2023-12-28 2025-09-16 日商佳能股份有限公司 可硬化之組成物
TW202600500A (zh) 2024-03-15 2026-01-01 德商默克專利有限公司 可硬化之組成物

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060116492A1 (en) 2004-12-01 2006-06-01 3M Innovative Properties Company Branched polymer
JP2012051992A (ja) 2010-08-31 2012-03-15 Fujifilm Corp インク組成物、画像形成方法、及び印画物
JP2012214532A (ja) * 2011-03-31 2012-11-08 Taiyo Holdings Co Ltd インクジェット用硬化性樹脂組成物、その硬化物及び当該硬化物を有するプリント配線板
US20140017401A1 (en) 2012-07-13 2014-01-16 James R. Bennett Making high density polymer particles
JP2015140435A (ja) 2014-01-30 2015-08-03 株式会社日本触媒 硬化性樹脂組成物及びその用途
US20170042038A1 (en) 2014-03-14 2017-02-09 Jsr Corporation Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device
JP2017181617A (ja) 2016-03-29 2017-10-05 株式会社日本触媒 感光性樹脂組成物及びその硬化膜

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4939070A (en) 1986-07-28 1990-07-03 Brunsvold William R Thermally stable photoresists with high sensitivity
US5274059A (en) 1988-12-27 1993-12-28 Nippon Oil And Fats Co., Ltd. Maleimide copolymer and process for preparing same
FR2672896B1 (fr) 1991-02-15 1993-06-04 Aerospatiale Soc Nat Industrielle Procede de durcissement sous rayonnement ionisant d'une resine bis-maleimide et d'un materiau composite utilisant cette resine.
JPH0625359A (ja) * 1992-07-07 1994-02-01 Kuraray Co Ltd 低複屈折性成形材料
US5618857A (en) * 1993-06-24 1997-04-08 Loctite Corporation Impregnation sealant composition of superior high temperature resistance, and method of making same
IT1291204B1 (it) 1997-03-18 1998-12-29 Comau Spa Dispositivo per il montaggio automatizzato dei semi-coni di una valvola di un motore a combustione interna.
US5990202A (en) * 1997-10-31 1999-11-23 Hewlett-Packard Company Dual encapsulation technique for preparing ink-jets inks
US6479211B1 (en) 1999-05-26 2002-11-12 Fuji Photo Film Co., Ltd. Positive photoresist composition for far ultraviolet exposure
US20040029044A1 (en) * 2002-08-08 2004-02-12 3M Innovative Properties Company Photocurable composition
US8088548B2 (en) 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
ATE537195T1 (de) * 2008-09-09 2011-12-15 Agfa Graphics Nv Strahlungshärtbare zusammensetzungen
CN102428112B (zh) * 2009-05-18 2014-01-08 爱克发印艺公司 可聚合的聚合物光引发剂和辐射可固化组合物
JP5504769B2 (ja) 2009-09-07 2014-05-28 Ｊｎｃ株式会社 重合性組成物
CN104093779A (zh) * 2012-01-19 2014-10-08 伊索拉美国有限公司 合成树脂以及由其制造的清漆、预浸料和层压板
JP6004971B2 (ja) * 2013-03-12 2016-10-12 富士フイルム株式会社 加飾シート成形物又はインモールド成形品製造用インクジェットインク組成物、加飾シート成形物又はインモールド成形品製造用インクジェット記録方法、加飾シート成形物又はインモールド成形品製造用インクセット、加飾シート成形物又はインモールド成形品製造用加飾シート、加飾シート成形物、及び、インモールド成形品の製造方法
JP6163801B2 (ja) 2013-03-13 2017-07-19 Jnc株式会社 硬化膜
JP2016002683A (ja) 2014-06-16 2016-01-12 コニカミノルタ株式会社 ３ｄ造形物の製造方法、３ｄ造形用光硬化性組成物および３ｄ造形用インクセット
EP2960306B1 (en) 2014-06-26 2020-12-23 Agfa Nv Aqueous radiation curable inkjet inks
JP2016160334A (ja) 2015-02-27 2016-09-05 富士フイルム株式会社 インクジェット記録用インク組成物、及び、インクジェット記録方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060116492A1 (en) 2004-12-01 2006-06-01 3M Innovative Properties Company Branched polymer
JP2012051992A (ja) 2010-08-31 2012-03-15 Fujifilm Corp インク組成物、画像形成方法、及び印画物
JP2012214532A (ja) * 2011-03-31 2012-11-08 Taiyo Holdings Co Ltd インクジェット用硬化性樹脂組成物、その硬化物及び当該硬化物を有するプリント配線板
US20140017401A1 (en) 2012-07-13 2014-01-16 James R. Bennett Making high density polymer particles
JP2015140435A (ja) 2014-01-30 2015-08-03 株式会社日本触媒 硬化性樹脂組成物及びその用途
US20170042038A1 (en) 2014-03-14 2017-02-09 Jsr Corporation Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device
JP2017181617A (ja) 2016-03-29 2017-10-05 株式会社日本触媒 感光性樹脂組成物及びその硬化膜

Also Published As

Publication number Publication date
US20210070906A1 (en) 2021-03-11
KR20220050921A (ko) 2022-04-25
WO2021045843A1 (en) 2021-03-11
JP2022546754A (ja) 2022-11-08
CN114245818B (zh) 2023-10-31
TW202110909A (zh) 2021-03-16
US11345772B2 (en) 2022-05-31
JP7663515B2 (ja) 2025-04-16
CN114245818A (zh) 2022-03-25
TWI815027B (zh) 2023-09-11

Similar Documents

Publication Publication Date Title
KR102790744B1 (ko) 경화성 조성물
KR102823723B1 (ko) 광경화성 조성물
US11434312B2 (en) Photocurable composition for forming cured layers with high thermal stability
KR20210084258A (ko) 광경화성 조성물
JP7773661B2 (ja) 光硬化性組成物
TWI849315B (zh) 可光固化之組成物
KR20260006642A (ko) 광경화성 조성물
TWI861422B (zh) 光可固化組成物
JP7808086B2 (ja) 高い熱安定性を有する硬化層を製造するための硬化性組成物
US20200308320A1 (en) Curable composition comprising dual-functional photoinitiator
KR102899614B1 (ko) 광경화성 조성물
KR102909537B1 (ko) 유기 이온성 화합물을 포함하는 광경화성 조성물
US20250084269A1 (en) Thermal-curable composition for inkjet adaptive planarization
KR20240154561A (ko) 반응성 중합체를 포함하는 광경화성 조성물
TW202229476A (zh) 光可固化組成物

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20220316

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20220316

Comment text: Request for Examination of Application

PG1501 Laying open of application
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20240701

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20250109

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20250331

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20250401

End annual number: 3

Start annual number: 1

PG1601 Publication of registration