CN114245818B - 可固化组合物 - Google Patents
可固化组合物 Download PDFInfo
- Publication number
- CN114245818B CN114245818B CN202080056033.1A CN202080056033A CN114245818B CN 114245818 B CN114245818 B CN 114245818B CN 202080056033 A CN202080056033 A CN 202080056033A CN 114245818 B CN114245818 B CN 114245818B
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- CN
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- monomer
- curable composition
- cured layer
- polymerizable material
- layer
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
- C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1806—C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
- C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F224/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
- C08F212/36—Divinylbenzene
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/562,716 US11345772B2 (en) | 2019-09-06 | 2019-09-06 | Curable composition |
| US16/562,716 | 2019-09-06 | ||
| PCT/US2020/041803 WO2021045843A1 (en) | 2019-09-06 | 2020-07-13 | Curable composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114245818A CN114245818A (zh) | 2022-03-25 |
| CN114245818B true CN114245818B (zh) | 2023-10-31 |
Family
ID=74850365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080056033.1A Active CN114245818B (zh) | 2019-09-06 | 2020-07-13 | 可固化组合物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11345772B2 (https=) |
| JP (1) | JP7663515B2 (https=) |
| KR (1) | KR102790744B1 (https=) |
| CN (1) | CN114245818B (https=) |
| TW (1) | TWI815027B (https=) |
| WO (1) | WO2021045843A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11434312B2 (en) | 2020-12-15 | 2022-09-06 | Canon Kabushiki Kaisha | Photocurable composition for forming cured layers with high thermal stability |
| US11434313B2 (en) * | 2020-12-16 | 2022-09-06 | Canon Kabushiki Kaisha | Curable composition for making cured layer with high thermal stability |
| US12247133B2 (en) * | 2022-02-17 | 2025-03-11 | Canon Kabushiki Kaisha | Photocurable composition including a reactive polymer |
| US11878935B1 (en) * | 2022-12-27 | 2024-01-23 | Canon Kabushiki Kaisha | Method of coating a superstrate |
| TW202535989A (zh) | 2023-12-28 | 2025-09-16 | 德商默克專利有限公司 | 化合物 |
| TW202545859A (zh) | 2023-12-28 | 2025-12-01 | 德商默克專利有限公司 | 化合物 |
| WO2025142787A2 (en) | 2023-12-28 | 2025-07-03 | Canon Kabushiki Kaisha | Curable composition |
| TW202536000A (zh) | 2023-12-28 | 2025-09-16 | 日商佳能股份有限公司 | 可硬化之組成物 |
| TW202600500A (zh) | 2024-03-15 | 2026-01-01 | 德商默克專利有限公司 | 可硬化之組成物 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102149731A (zh) * | 2008-09-09 | 2011-08-10 | 爱克发印艺公司 | 辐射可固化组合物 |
| EP2423278A1 (en) * | 2010-08-31 | 2012-02-29 | Fujifilm Corporation | Ink composition, image forming method and printed matter |
| CN102428112A (zh) * | 2009-05-18 | 2012-04-25 | 爱克发印艺公司 | 可聚合的聚合物光引发剂和辐射可固化组合物 |
| CN104093779A (zh) * | 2012-01-19 | 2014-10-08 | 伊索拉美国有限公司 | 合成树脂以及由其制造的清漆、预浸料和层压板 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4939070A (en) | 1986-07-28 | 1990-07-03 | Brunsvold William R | Thermally stable photoresists with high sensitivity |
| US5274059A (en) | 1988-12-27 | 1993-12-28 | Nippon Oil And Fats Co., Ltd. | Maleimide copolymer and process for preparing same |
| FR2672896B1 (fr) | 1991-02-15 | 1993-06-04 | Aerospatiale Soc Nat Industrielle | Procede de durcissement sous rayonnement ionisant d'une resine bis-maleimide et d'un materiau composite utilisant cette resine. |
| JPH0625359A (ja) * | 1992-07-07 | 1994-02-01 | Kuraray Co Ltd | 低複屈折性成形材料 |
| US5618857A (en) * | 1993-06-24 | 1997-04-08 | Loctite Corporation | Impregnation sealant composition of superior high temperature resistance, and method of making same |
| IT1291204B1 (it) | 1997-03-18 | 1998-12-29 | Comau Spa | Dispositivo per il montaggio automatizzato dei semi-coni di una valvola di un motore a combustione interna. |
| US5990202A (en) * | 1997-10-31 | 1999-11-23 | Hewlett-Packard Company | Dual encapsulation technique for preparing ink-jets inks |
| US6479211B1 (en) | 1999-05-26 | 2002-11-12 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| US20040029044A1 (en) * | 2002-08-08 | 2004-02-12 | 3M Innovative Properties Company | Photocurable composition |
| US20060116492A1 (en) * | 2004-12-01 | 2006-06-01 | 3M Innovative Properties Company | Branched polymer |
| US8088548B2 (en) | 2007-10-23 | 2012-01-03 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions |
| JP5504769B2 (ja) | 2009-09-07 | 2014-05-28 | Jnc株式会社 | 重合性組成物 |
| JP2012214532A (ja) | 2011-03-31 | 2012-11-08 | Taiyo Holdings Co Ltd | インクジェット用硬化性樹脂組成物、その硬化物及び当該硬化物を有するプリント配線板 |
| US8815395B2 (en) | 2012-07-13 | 2014-08-26 | Eastman Kodak Company | High density polymer particles and dispersion of same |
| JP6004971B2 (ja) * | 2013-03-12 | 2016-10-12 | 富士フイルム株式会社 | 加飾シート成形物又はインモールド成形品製造用インクジェットインク組成物、加飾シート成形物又はインモールド成形品製造用インクジェット記録方法、加飾シート成形物又はインモールド成形品製造用インクセット、加飾シート成形物又はインモールド成形品製造用加飾シート、加飾シート成形物、及び、インモールド成形品の製造方法 |
| JP6163801B2 (ja) | 2013-03-13 | 2017-07-19 | Jnc株式会社 | 硬化膜 |
| JP6306358B2 (ja) * | 2014-01-30 | 2018-04-04 | 株式会社日本触媒 | 硬化性樹脂組成物及びその用途 |
| JP6414203B2 (ja) * | 2014-03-14 | 2018-10-31 | Jsr株式会社 | 配線の製造方法、電子回路の製造方法および電子デバイスの製造方法 |
| JP2016002683A (ja) | 2014-06-16 | 2016-01-12 | コニカミノルタ株式会社 | 3d造形物の製造方法、3d造形用光硬化性組成物および3d造形用インクセット |
| EP2960306B1 (en) | 2014-06-26 | 2020-12-23 | Agfa Nv | Aqueous radiation curable inkjet inks |
| JP2016160334A (ja) | 2015-02-27 | 2016-09-05 | 富士フイルム株式会社 | インクジェット記録用インク組成物、及び、インクジェット記録方法 |
| JP2017181617A (ja) * | 2016-03-29 | 2017-10-05 | 株式会社日本触媒 | 感光性樹脂組成物及びその硬化膜 |
-
2019
- 2019-09-06 US US16/562,716 patent/US11345772B2/en active Active
-
2020
- 2020-07-13 WO PCT/US2020/041803 patent/WO2021045843A1/en not_active Ceased
- 2020-07-13 JP JP2021573142A patent/JP7663515B2/ja active Active
- 2020-07-13 KR KR1020227008714A patent/KR102790744B1/ko active Active
- 2020-07-13 CN CN202080056033.1A patent/CN114245818B/zh active Active
- 2020-07-21 TW TW109124600A patent/TWI815027B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102149731A (zh) * | 2008-09-09 | 2011-08-10 | 爱克发印艺公司 | 辐射可固化组合物 |
| CN102428112A (zh) * | 2009-05-18 | 2012-04-25 | 爱克发印艺公司 | 可聚合的聚合物光引发剂和辐射可固化组合物 |
| EP2423278A1 (en) * | 2010-08-31 | 2012-02-29 | Fujifilm Corporation | Ink composition, image forming method and printed matter |
| CN104093779A (zh) * | 2012-01-19 | 2014-10-08 | 伊索拉美国有限公司 | 合成树脂以及由其制造的清漆、预浸料和层压板 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20210070906A1 (en) | 2021-03-11 |
| KR20220050921A (ko) | 2022-04-25 |
| WO2021045843A1 (en) | 2021-03-11 |
| JP2022546754A (ja) | 2022-11-08 |
| KR102790744B1 (ko) | 2025-04-04 |
| TW202110909A (zh) | 2021-03-16 |
| US11345772B2 (en) | 2022-05-31 |
| JP7663515B2 (ja) | 2025-04-16 |
| CN114245818A (zh) | 2022-03-25 |
| TWI815027B (zh) | 2023-09-11 |
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| GR01 | Patent grant | ||
| GR01 | Patent grant |