CN114245818B - 可固化组合物 - Google Patents

可固化组合物 Download PDF

Info

Publication number
CN114245818B
CN114245818B CN202080056033.1A CN202080056033A CN114245818B CN 114245818 B CN114245818 B CN 114245818B CN 202080056033 A CN202080056033 A CN 202080056033A CN 114245818 B CN114245818 B CN 114245818B
Authority
CN
China
Prior art keywords
monomer
curable composition
cured layer
polymerizable material
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202080056033.1A
Other languages
English (en)
Chinese (zh)
Other versions
CN114245818A (zh
Inventor
李飞
刘卫军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN114245818A publication Critical patent/CN114245818A/zh
Application granted granted Critical
Publication of CN114245818B publication Critical patent/CN114245818B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • C08F222/402Alkyl substituted imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1807C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1806C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F224/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36Divinylbenzene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN202080056033.1A 2019-09-06 2020-07-13 可固化组合物 Active CN114245818B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/562,716 US11345772B2 (en) 2019-09-06 2019-09-06 Curable composition
US16/562,716 2019-09-06
PCT/US2020/041803 WO2021045843A1 (en) 2019-09-06 2020-07-13 Curable composition

Publications (2)

Publication Number Publication Date
CN114245818A CN114245818A (zh) 2022-03-25
CN114245818B true CN114245818B (zh) 2023-10-31

Family

ID=74850365

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080056033.1A Active CN114245818B (zh) 2019-09-06 2020-07-13 可固化组合物

Country Status (6)

Country Link
US (1) US11345772B2 (https=)
JP (1) JP7663515B2 (https=)
KR (1) KR102790744B1 (https=)
CN (1) CN114245818B (https=)
TW (1) TWI815027B (https=)
WO (1) WO2021045843A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11434312B2 (en) 2020-12-15 2022-09-06 Canon Kabushiki Kaisha Photocurable composition for forming cured layers with high thermal stability
US11434313B2 (en) * 2020-12-16 2022-09-06 Canon Kabushiki Kaisha Curable composition for making cured layer with high thermal stability
US12247133B2 (en) * 2022-02-17 2025-03-11 Canon Kabushiki Kaisha Photocurable composition including a reactive polymer
US11878935B1 (en) * 2022-12-27 2024-01-23 Canon Kabushiki Kaisha Method of coating a superstrate
TW202535989A (zh) 2023-12-28 2025-09-16 德商默克專利有限公司 化合物
TW202545859A (zh) 2023-12-28 2025-12-01 德商默克專利有限公司 化合物
WO2025142787A2 (en) 2023-12-28 2025-07-03 Canon Kabushiki Kaisha Curable composition
TW202536000A (zh) 2023-12-28 2025-09-16 日商佳能股份有限公司 可硬化之組成物
TW202600500A (zh) 2024-03-15 2026-01-01 德商默克專利有限公司 可硬化之組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102149731A (zh) * 2008-09-09 2011-08-10 爱克发印艺公司 辐射可固化组合物
EP2423278A1 (en) * 2010-08-31 2012-02-29 Fujifilm Corporation Ink composition, image forming method and printed matter
CN102428112A (zh) * 2009-05-18 2012-04-25 爱克发印艺公司 可聚合的聚合物光引发剂和辐射可固化组合物
CN104093779A (zh) * 2012-01-19 2014-10-08 伊索拉美国有限公司 合成树脂以及由其制造的清漆、预浸料和层压板

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4939070A (en) 1986-07-28 1990-07-03 Brunsvold William R Thermally stable photoresists with high sensitivity
US5274059A (en) 1988-12-27 1993-12-28 Nippon Oil And Fats Co., Ltd. Maleimide copolymer and process for preparing same
FR2672896B1 (fr) 1991-02-15 1993-06-04 Aerospatiale Soc Nat Industrielle Procede de durcissement sous rayonnement ionisant d'une resine bis-maleimide et d'un materiau composite utilisant cette resine.
JPH0625359A (ja) * 1992-07-07 1994-02-01 Kuraray Co Ltd 低複屈折性成形材料
US5618857A (en) * 1993-06-24 1997-04-08 Loctite Corporation Impregnation sealant composition of superior high temperature resistance, and method of making same
IT1291204B1 (it) 1997-03-18 1998-12-29 Comau Spa Dispositivo per il montaggio automatizzato dei semi-coni di una valvola di un motore a combustione interna.
US5990202A (en) * 1997-10-31 1999-11-23 Hewlett-Packard Company Dual encapsulation technique for preparing ink-jets inks
US6479211B1 (en) 1999-05-26 2002-11-12 Fuji Photo Film Co., Ltd. Positive photoresist composition for far ultraviolet exposure
US20040029044A1 (en) * 2002-08-08 2004-02-12 3M Innovative Properties Company Photocurable composition
US20060116492A1 (en) * 2004-12-01 2006-06-01 3M Innovative Properties Company Branched polymer
US8088548B2 (en) 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
JP5504769B2 (ja) 2009-09-07 2014-05-28 Jnc株式会社 重合性組成物
JP2012214532A (ja) 2011-03-31 2012-11-08 Taiyo Holdings Co Ltd インクジェット用硬化性樹脂組成物、その硬化物及び当該硬化物を有するプリント配線板
US8815395B2 (en) 2012-07-13 2014-08-26 Eastman Kodak Company High density polymer particles and dispersion of same
JP6004971B2 (ja) * 2013-03-12 2016-10-12 富士フイルム株式会社 加飾シート成形物又はインモールド成形品製造用インクジェットインク組成物、加飾シート成形物又はインモールド成形品製造用インクジェット記録方法、加飾シート成形物又はインモールド成形品製造用インクセット、加飾シート成形物又はインモールド成形品製造用加飾シート、加飾シート成形物、及び、インモールド成形品の製造方法
JP6163801B2 (ja) 2013-03-13 2017-07-19 Jnc株式会社 硬化膜
JP6306358B2 (ja) * 2014-01-30 2018-04-04 株式会社日本触媒 硬化性樹脂組成物及びその用途
JP6414203B2 (ja) * 2014-03-14 2018-10-31 Jsr株式会社 配線の製造方法、電子回路の製造方法および電子デバイスの製造方法
JP2016002683A (ja) 2014-06-16 2016-01-12 コニカミノルタ株式会社 3d造形物の製造方法、3d造形用光硬化性組成物および3d造形用インクセット
EP2960306B1 (en) 2014-06-26 2020-12-23 Agfa Nv Aqueous radiation curable inkjet inks
JP2016160334A (ja) 2015-02-27 2016-09-05 富士フイルム株式会社 インクジェット記録用インク組成物、及び、インクジェット記録方法
JP2017181617A (ja) * 2016-03-29 2017-10-05 株式会社日本触媒 感光性樹脂組成物及びその硬化膜

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102149731A (zh) * 2008-09-09 2011-08-10 爱克发印艺公司 辐射可固化组合物
CN102428112A (zh) * 2009-05-18 2012-04-25 爱克发印艺公司 可聚合的聚合物光引发剂和辐射可固化组合物
EP2423278A1 (en) * 2010-08-31 2012-02-29 Fujifilm Corporation Ink composition, image forming method and printed matter
CN104093779A (zh) * 2012-01-19 2014-10-08 伊索拉美国有限公司 合成树脂以及由其制造的清漆、预浸料和层压板

Also Published As

Publication number Publication date
US20210070906A1 (en) 2021-03-11
KR20220050921A (ko) 2022-04-25
WO2021045843A1 (en) 2021-03-11
JP2022546754A (ja) 2022-11-08
KR102790744B1 (ko) 2025-04-04
TW202110909A (zh) 2021-03-16
US11345772B2 (en) 2022-05-31
JP7663515B2 (ja) 2025-04-16
CN114245818A (zh) 2022-03-25
TWI815027B (zh) 2023-09-11

Similar Documents

Publication Publication Date Title
CN114245818B (zh) 可固化组合物
KR102823723B1 (ko) 광경화성 조성물
US11434312B2 (en) Photocurable composition for forming cured layers with high thermal stability
KR102809445B1 (ko) 광경화성 조성물
Eren et al. Soft and Stiff 3D Microstructures by Step‐Growth Photopolymerization Using a Single Photoresin and Multi‐Photon Laser Printing
TWI891412B (zh) 可光固化之組成物
CN121079640A (zh) 光固化性组合物
JP7808086B2 (ja) 高い熱安定性を有する硬化層を製造するための硬化性組成物
TWI861422B (zh) 光可固化組成物
US20250084269A1 (en) Thermal-curable composition for inkjet adaptive planarization
KR20240154561A (ko) 반응성 중합체를 포함하는 광경화성 조성물
CN116583406B (zh) 光固化性组合物
US12061416B2 (en) Photocurable composition comprising a fullerene
KR20240141318A (ko) 비-반응성 중합체를 포함하는 광경화성 조성물
KR20240113835A (ko) 향상된 열적 안정성을 갖는 광경화성 조성물

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant